EP0578953A1 - High power emitting device - Google Patents
High power emitting device Download PDFInfo
- Publication number
- EP0578953A1 EP0578953A1 EP93108758A EP93108758A EP0578953A1 EP 0578953 A1 EP0578953 A1 EP 0578953A1 EP 93108758 A EP93108758 A EP 93108758A EP 93108758 A EP93108758 A EP 93108758A EP 0578953 A1 EP0578953 A1 EP 0578953A1
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- European Patent Office
- Prior art keywords
- discharge space
- dielectric
- discharge
- power radiator
- radiator according
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J65/00—Lamps without any electrode inside the vessel; Lamps with at least one main electrode outside the vessel
- H01J65/04—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels
- H01J65/042—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field
- H01J65/046—Lamps in which a gas filling is excited to luminesce by an external electromagnetic field or by external corpuscular radiation, e.g. for indicating plasma display panels by an external electromagnetic field the field being produced by using capacitive means around the vessel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/54—Igniting arrangements, e.g. promoting ionisation for starting
Definitions
- the invention relates to a high-power radiator, in particular for ultraviolet light, with a discharge space filled with filling gas emitting radiation under discharge conditions, the walls of which are formed by an outer and an inner dielectric, the outer surfaces of the outer dielectric being provided with first electrodes, with second electrodes Electrodes on the surface of the second dielectric facing away from the discharge space, and with an alternating current source connected to the first and second electrodes for supplying the discharge.
- the invention relates to a prior art, such as that which results from EP-A 054 111, US patent application 07/485544 from February 27, 1990 or also EP patent application 90103082.5 from February 17, 1990.
- UV sources The industrial use of photochemical processes depends heavily on the availability of suitable UV sources.
- the classic UV lamps deliver low to medium UV intensities at some discrete wavelengths, such as the mercury low pressure lamps at 185 nm and especially at 254 nm.
- Really high UV powers can only be obtained from high-pressure lamps (Xe, Hg), which then distribute their radiation over a larger wavelength range.
- the new excimer lasers have provided some new wavelengths for basic photochemical experiments. for cost reasons for an industrial process probably only suitable in exceptional cases.
- Excimer UV lamps based on the principle of silent electrical discharges require a significantly higher voltage than the voltage required for normal operation when they are first ignited or after longer breaks. This is due to the fact that surface charges form on the dielectrics during operation, which in each case ensure easier ignition in the subsequent voltage half-wave. These surface charges are missing the first time you ignite and after long breaks.
- the object of the invention is to create a high-performance radiator, in particular for UV or VUV radiation, which ignites reliably without complex measures.
- the invention is based on the knowledge of forcing an initial ignition at one point by local field distortion or field elevation.
- the resulting UV radiation and the charge carriers of this local discharge then force the reliable ignition of the entire discharge volume.
- the local field distortion can be e.g. by narrowing the discharge gap, e.g. cause a dent or hump directed against the gap volume, or preferably by means of a disturbing body made of dielectric material in the discharge gap.
- This latter variant can be implemented in a simple manner by means of a quartz ball or a ball made of aluminum or titanium oxide in the discharge gap.
- the invention makes it possible for the first time to create excimer UV lamps that ignite safely.
- the measures to be taken are simple and economical. They can also be carried out retrospectively in existing units when using an interference body, which is considered the most preferred means for field distortion.
- FIGS. 1 and 2 there is an outer quartz tube 1 with a wall thickness of approximately 0.5 to 1.5 mm and an outer diameter
- An inner quartz tube 2 of approximately 20 to 30 mm is arranged coaxially.
- a helical inner electrode 3 bears against the inner surface of the inner quartz tube 2.
- An outer electrode 4 in the form of a wire mesh or an applied electrode structure extends over the entire outer circumference of the outer quartz tube 1.
- a wire 4 is inserted into the inner quartz tube 3.
- the quartz tubes 1 and 2 are closed or melted at both ends by a cover 5 and 6, respectively.
- the space between the two tubes 1 and 2, the discharge space 7, is filled with a gas / gas mixture which emits radiation under discharge conditions.
- This liquid also serves to cool the radiator.
- the coolant is supplied or removed via the connections 9 and 10.
- the cooling liquid also serves for the electrical coupling of the inner electrode 3 to the inner quartz tube 2, so that it is not necessary for the helical electrode 3 to rest against the inner wall everywhere.
- the two electrodes 3, 4 are connected to the two poles of an alternating current source 11.
- the alternating current source supplies an adjustable alternating voltage in the order of magnitude of several 100 volts to 20,000 volts at frequencies in the range of technical alternating current up to a few 1000 kHz - depending on the electrode geometry, pressure in the discharge space and composition of the filling gas.
- the filling gas is, for example, mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, optionally under Use of an additional further noble gas, preferably Ar, He, Ne, as a buffer gas.
- a substance / substance mixture according to the following table can be used: Filling gas radiation helium 60-100 nm neon 80 - 90 nm argon 107 - 165 nm Argon + fluorine 180-200 nm Argon + chlorine 165-190 nm Argon + krypton + chlorine 165-190, 200-240 nm xenon 160-190 nm nitrogen 337 - 415 nm krypton 124, 140-160 nm Krypton + fluorine 240 - 255 nm Krypton + chlorine 200-240 nm mercury 185, 254,320-370,390-420nm selenium 196, 204, 206 nm deuterium 150-250 nm Xenon + fluorine 340 - 360 nm, 400 - 550 nm Xenon + chlorine 300-320 nm
- the electron energy distribution can be optimally adjusted by the thickness of the dielectrics and their properties as well as pressure and / or temperature in the discharge space.
- FIG. 1 A first variant is shown in Fig. 1, right upper half (Fig. 2 in dashed lines).
- the outer dielectric tube 1 is provided with an indentation or dent 12. This extends up to half the gap width to the inner dielectric tube 2.
- a second variant shows Fig. 1, lower right half (Fig. 2 also dashed).
- the inner dielectric tube 2 is provided with a dent or bump 12a, which reaches the outer dielectric tube 1 approximately up to half the gap width.
- FIG. 1, left half, and FIG. 2 can also be used retrospectively in the case of emitters.
- a ball 13 made of dielectric material, e.g. Quartz, preferably made of aluminum or titanium oxide, with an outer sphere diameter equal to or slightly smaller than the gap width of the discharge space 7.
- This sphere can - but need not - be attached to one wire on both dielectric walls.
- the exact spherical geometry is not important. Two or more of these balls can also be provided, in particular in the case of elongated radiators. The combination of ball (s) and dents or humps is also possible.
- Another measure, which can also be taken subsequently with radiators, is to melt quartz drops 12b or 12c on the inner surface of the outer dielectric tube 1 or on the outer surface of the inner dielectric tube 2 in order to achieve the desired field distortion.
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Discharge Lamps And Accessories Thereof (AREA)
- Vessels And Coating Films For Discharge Lamps (AREA)
- Lasers (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Radiation-Therapy Devices (AREA)
Abstract
Description
Die Erfindung bezieht sich auf einen Hochleistungsstrahler, insbesondere für ultraviolettes Licht, mit einem mit unter Entladungsbedingungen Strahlung aussendendem Füllgas gefüllten Entladungsraum, dessen Wandungen durch ein äusseres und ein inneres Dielektrikum gebildet sind, wobei die Aussenflächen des äusseren Dielektrikums mit ersten Elektroden versehen sind, mit zweiten Elektroden an der dem Entladungsraum abgewandten Oberfläche des zweiten Dielektrikums, und mit einer an die ersten und zweiten Elektroden angeschlossenen Wechselstromquelle zur Speisung der Entladung.The invention relates to a high-power radiator, in particular for ultraviolet light, with a discharge space filled with filling gas emitting radiation under discharge conditions, the walls of which are formed by an outer and an inner dielectric, the outer surfaces of the outer dielectric being provided with first electrodes, with second electrodes Electrodes on the surface of the second dielectric facing away from the discharge space, and with an alternating current source connected to the first and second electrodes for supplying the discharge.
Die Erfindung nimmt dabei Bezug auf einen Stand der Technik, wie er sich etwa aus der EP-A 054 111, der US-Patentanmeldung 07/485544 vom 27.02.1990 oder auch der EP-Patentanmeldung 90103082.5 vom 17.02.1990 ergibt.The invention relates to a prior art, such as that which results from EP-A 054 111, US patent application 07/485544 from February 27, 1990 or also EP patent application 90103082.5 from February 17, 1990.
Der industrielle Einsatz photochemischer Verfahren hängt stark von der der Verfügbarkeit geeigneter UV-Quellen ab. Die klassischen UV-Strahler liefern niedrige bis mittlere UV-Intensitäten bei einigen diskreten Wellenlängen, wie z.B. die Quecksilber-Niederdrucklampen bei 185 nm und insbesondere bei 254 nm. Wirklich hohe UV-Leistungen erhält man nur aus Hochdrucklampen (Xe, Hg), die dann aber ihre Strahlung über einen grösseren Wellenlängenbereich verteilen. Die neuen Excimer-Laser haben einige neue Wellenlängen für photochemische Grundlagenexperimente bereitgestellt, sind z.Zt. aus Kostengründen für einen industriellen Prozess wohl nur in Ausnahmefällen geeignet.The industrial use of photochemical processes depends heavily on the availability of suitable UV sources. The classic UV lamps deliver low to medium UV intensities at some discrete wavelengths, such as the mercury low pressure lamps at 185 nm and especially at 254 nm. Really high UV powers can only be obtained from high-pressure lamps (Xe, Hg), which then distribute their radiation over a larger wavelength range. The new excimer lasers have provided some new wavelengths for basic photochemical experiments. for cost reasons for an industrial process probably only suitable in exceptional cases.
In der eingangs genannten EP-Patentanmeldung oder auch in dem Konferenzdruck "Neue UV- und VUV Excimerstrahler" von U. Kogelschatz und B. Eliasson, verteilt an der 10. Vortragstagung der Gesellschaft Deutscher Chemiker, Fachgruppe Photochemie, in Würzburg (BRD) 18.-20. November 1987, wird ein neuer Excimerstrahler beschrieben. Dieser neue Strahlertyp basiert auf der Grundlage, dass man Excimerstrahlung auch in stillen elektrischen Entladungen erzeugen kann, einem Entladungstyp, der in der Ozonerzeugung grosstechnisch eingesetzt wird. In den nur kurzzeitig (< 1 Mikrosekunde) vorhandenen Stromfilamenten dieser Entladung werden durch Elektronenstoss Edelgasatome angeregt, die zu angeregten Molekülkomplexen (Excimeren) weiterreagieren. Diese Excimere leben nur einige 100 Nanosekunden und geben beim Zerfall ihre Bindungsenergie in Form von UV-Strahlung ab.In the EP patent application mentioned at the beginning or in the conference paper "New UV and VUV excimer emitters" by U. Kogelschatz and B. Eliasson, distributed at the 10th lecture conference of the Society of German Chemists, Photochemistry Group, in Würzburg (FRG) 18. -20. November 1987, a new excimer radiator is described. This new type of emitter is based on the fact that excimer radiation can also be generated in silent electrical discharges, a type of discharge that is used on a large scale in ozone generation. In the current filaments of this discharge, which exist only for a short time (<1 microsecond), noble gas atoms are excited by electron impact, which react further to excited molecular complexes (excimers). These excimers only live for a few 100 nanoseconds and release their binding energy in the form of UV radiation when they decay.
Auf dem Prinzip der stillen elektrischen Entladungen basierende Excimer-UV-Strahler erfordern beim ersten Zünden bzw. nach längeren Pausen eine wesentlich höhere Spannung als die für den Normalbetrieb erforderliche Spannung. Das hängt damit zusammen, dass sich während des Betriebs Oberflächenladungen auf den Dielektrika bilden, die jeweils für eine erleichterte Zünden in der nachfolgenden Spannungshalbwelle sorgen. Beim ersten Zünden und nach längeren Pausen fehlen diese Oberflächenladungen.Excimer UV lamps based on the principle of silent electrical discharges require a significantly higher voltage than the voltage required for normal operation when they are first ignited or after longer breaks. This is due to the fact that surface charges form on the dielectrics during operation, which in each case ensure easier ignition in the subsequent voltage half-wave. These surface charges are missing the first time you ignite and after long breaks.
Ganz allgemein kann gesagt werden, dass für das Zünden einer Gasentladung zwei Kriterien erfüllt sein müssen. Einerseits müssen Anfangselektronen vorhanden sein, und andererseits muss die elektrische Feldstärke einen kritischen Wert überschreiten (Zündkriterium), damit es zu einer ausreichenden Multiplikation der Anfangselektronen und damit zur Bildung von Elektronenlawinen unter dem Einfluss des angelegten elektrischen Feldes kommen kann.In general it can be said that two criteria must be met for the ignition of a gas discharge. On the one hand initial electrons must be present and, on the other hand, the electric field strength must exceed a critical value (ignition criterion) so that there can be a sufficient multiplication of the initial electrons and thus the formation of electron avalanches under the influence of the applied electric field.
Aus der Lampentechnologie bekannte Methoden sind die Benutzung eines radioaktiven Präparates (z.B. Thorium) oder Gases (Krypton 85), um die Startelektronen zur Verfügung zu stellen, und eines Ueberspannungsimpulses, um die Startfeldstärke zu erhöhen. Insbesondere letztere Massnahme erfordert einen zusätzlichen Aufwand bei der Auslegung der elektrischen Speisgeräte und des Isolationsniveaus von Kabel, Steckern, Halterungen etc.Methods known from lamp technology are the use of a radioactive preparation (e.g. thorium) or gas (Krypton 85) to provide the starting electrons and an overvoltage pulse to increase the starting field strength. The latter measure in particular requires additional effort in the design of the electrical power supplies and the insulation level of cables, plugs, brackets, etc.
Ausgehend vom Stand der Technik liegt der Erfindung die Aufgabe zugrunde, einen Hochleistungsstrahler, insbesondere für UV- oder VUV-Strahlung, zu schaffen, der ohne aufwendige Massnahmen zuverlässig zündet.Proceeding from the prior art, the object of the invention is to create a high-performance radiator, in particular for UV or VUV radiation, which ignites reliably without complex measures.
Zur Lösung dieser Aufgabe ist bei einem Hochleistungsstrahler der eingangs genannten Gattung erfindungsgemäss vorgesehen, dass im Entladungsraum Mittel zur lokalen Feldverzerrung vorgesehen sind.To achieve this object, in a high-power radiator of the type mentioned at the outset, it is provided according to the invention that means for local field distortion are provided in the discharge space.
Der Erfindung liegt dabei die Erkenntnis zugrunde, durch eine lokale Feldverzerrung bzw. Feldüberhöhung an einer Stelle eine Initialzündung zu erzwingen. Durch die dabei entstehende UV-Strahlung und die Ladungsträger dieser lokalen Entladung wird dann die zuverlässige Zündung des gesamten Entladungsvolumens erzwungen.The invention is based on the knowledge of forcing an initial ignition at one point by local field distortion or field elevation. The resulting UV radiation and the charge carriers of this local discharge then force the reliable ignition of the entire discharge volume.
Die lokale Feldverzerrung kann man z.B. durch eine Verengung des Entladungsspaltes, z.B. eine gegen das Spaltvolumen gerichtete Delle oder Buckel, oder bevorzugt durch einen Störkörper aus dielektrischen Material im Entladungsspalt herbeiführen. Auf einfache Weise lässt sich diese letztgenannte Variante durch eine Quarzkugel oder durch eine Kugel aus Aluminium- oder Titanoxid im Entladungsspalt realisieren.The local field distortion can be e.g. by narrowing the discharge gap, e.g. cause a dent or hump directed against the gap volume, or preferably by means of a disturbing body made of dielectric material in the discharge gap. This latter variant can be implemented in a simple manner by means of a quartz ball or a ball made of aluminum or titanium oxide in the discharge gap.
Mit der Erfindung wird es erstmals möglich, Excimer-UV-Strahler zu schaffen, die sicher zünden. Die dabei zu ergreifenden Massnahmen sind einfach und wirtschaftlich. Sie lassen sich bei Verwendung eines Störkörpers, der als bevorzugstes Mittel zur Feldverzerrung angesehen wird, auch nachträglich in bestehende Einheiten durchführen.The invention makes it possible for the first time to create excimer UV lamps that ignite safely. The measures to be taken are simple and economical. They can also be carried out retrospectively in existing units when using an interference body, which is considered the most preferred means for field distortion.
Ausführungsformen der Erfindung sowie die damit erzielbaren Vorteile werden nachstehend anhand der Zeichnung näher erläutert.Embodiments of the invention and the advantages which can be achieved thereby are explained in more detail below with reference to the drawing.
In der Zeichnung sind Ausführungsbeispiele der Erfindung schematisch dargestellt; darin zeigt
- Fig.1
- einen UV-Zylinderstrahlers mit konzentrischer Anordnung von innerem und äusserem Dielektrikumsrohr im Längsschnitt;
- Fig.2
- einen Schnitt durch den UV-Strahler nach Fig.1 längs deren Linie AA;
- Fig. 1
- a UV cylinder lamp with a concentric arrangement of the inner and outer dielectric tube in longitudinal section;
- Fig. 2
- a section through the UV lamp according to Figure 1 along the line AA;
Gemäss Fig.1 und 2. ist in einem äusseren Quarzrohr 1 mit einer Wandstärke von etwa 0,5 bis 1,5 mm und einem Aussendurchmesser von etwa 20 bis 30 mm ist ein inneres Quarzrohr 2 koaxial angeordnet. An der Innenfläche des inneren Quarzrohrs 2 liegt eine wendelförmige Innenelektrode 3 an.According to FIGS. 1 and 2, there is an
Eine Aussenelektrode 4 in Form eines Drahtnetzes oder einer aufgebrachten Elektrodenstruktur erstreckt sich über den gesamten Aussenumfangs des äusseres Quarzrohrs 1.An
In das innere Quarzrohr 3 ist ein Draht 4 eingeschoben. Dieser bildet die Innenelektrode des Strahlers, das Drahtnetz 2 die Aussenelektrode des Strahlers. Die Quarzrohre 1 und 2 sind an beiden Enden durch je einen Deckel 5 bzw. 6 verschlossen oder zugeschmolzen. Der Raum zwischen den beiden Rohren 1 und 2, der Entladungsraum 7, ist mit einem unter Entladungsbedingungen Strahlung aussendendem Gas/Gasgemisch gefüllt. Das Innere 8 des inneren Quarzrohres 2 ist mit einer Flüssigkeit mit hoher Dielektrizitätskonstante, vorzugsweise demineralisiertem Wasser (ε=81), gefüllt. Diese Flüssigkeit dient gleichzeitig zur Kühlung des Strahlers. Die Kühlflüssigkeit wird über die Anschlüsse 9 und 10 zu- bzw. abgeführt. Die Kühlflüssigkeit dient auch zur elektrischen Ankopplung der Innenelektrode 3 an das innere Quarzrohr 2, so dass es nicht nötig ist, dass die wendelförmige Elektrode 3 überall an der Innenwandung anliegt.A
Die beiden Elektroden 3,4 sind mit den beiden Polen einer Wechselstromquelle 11 verbunden. Die Wechselstromquelle liefert eine einstellbare Wechselspannung in der Grössenordnung von mehreren 100 Volt bis 20000 Volt bei Frequenzen im Bereich des technischen Wechselstroms bis hin zu einigen 1000 kHz - abhängig von der Elektrodengeometrie, Druck im Entladungsraum und Zusammensetzung des Füllgases.The two
Das Füllgas ist, z.B. Quecksilber, Edelgas, Edelgas-Metalldampf-Gemisch, Edelgas-Halogen-Gemisch, gegebenenfalls unter Verwendung eines zusätzlichen weiteren Edelgases, vorzugsweise Ar, He, Ne, als Puffergas.The filling gas is, for example, mercury, noble gas, noble gas-metal vapor mixture, noble gas-halogen mixture, optionally under Use of an additional further noble gas, preferably Ar, He, Ne, as a buffer gas.
Je nach gewünschter spektraler Zusammensetzung der Strahlung kann dabei eine Substanz/Substanzgemisch gemäss nachfolgender Tabelle Verwendung finden:
Daneben kommen eine ganze Reihe weiterer Füllgase in Frage:
- Ein Edelgas (Ar, He, Kr, Ne, Xe) oder Hg mit einem Gas bzw. Dampf aus F₂, J₂, Br₂, Cl₂ oder eine Verbindung die in der Entladung ein oder mehrere Atome F, J, Br oder Cl abspaltet;
- ein Edelgas (Ar, He, Kr, Ne, Xe) oder Hg mit O₂ oder einer Verbindung, die in der Entladung ein oder mehrere 0-Atome abspaltet;
- ein Edelgas (Ar, He, Kr, Ne, Xe) mit Hg.
- A noble gas (Ar, He, Kr, Ne, Xe) or Hg with a gas or vapor from F₂, J₂, Br₂, Cl₂ or a compound that splits off one or more atoms F, J, Br or Cl in the discharge;
- a noble gas (Ar, He, Kr, Ne, Xe) or Hg with O₂ or a compound that splits off one or more 0 atoms in the discharge;
- an inert gas (Ar, He, Kr, Ne, Xe) with Hg.
Bei Anliegen einer Wechselspannung zwischen den Elektroden 3 und 4 bildet sich eine Vielzahl von Entladungskanälen (Teilentladungen) im Entladungsraum 7 aus. Diese treten mit den Atomen/Molekülen des Füllgases in Wechselwirkung, was schlussendlich zur UV oder VUV-Strahlung führt.When an alternating voltage is applied between the
In der sich bildenden stillen elektrischen Entladung (silent discharge) kann die Elektronenenergieverteilung durch Dicke der Dielektrika und deren Eigenschaften sowie Druck und/oder Temperatur im Entladungsraum optimal eingestellt werden.In the silent discharge that forms, the electron energy distribution can be optimally adjusted by the thickness of the dielectrics and their properties as well as pressure and / or temperature in the discharge space.
Soweit sind Excimer-UV-Strahler bekannt.So far, excimer UV lamps are known.
Um nun das eingangs beschriebene Zündproblem zu lösen, sind erfindungsgemäss eine Reihe von Möglichkeiten vorgesehen, die allesamt auf der Idee beruhen, an einer Stelle im Entladungsraum 7 lokal eine Feldverzerrung bzw. Feldüberhöhung zu erzwingen. Durch die dabei entstehende UV-Strahlung und die Ladungsträger dieser lokalen Entladung wird dann die zuverlässige Zündung des gesamten Entladungsvolumens erzwungen.In order to solve the ignition problem described at the outset, a number of possibilities are provided according to the invention, all of which are based on the idea of locally forcing a field distortion or field increase at a point in the
Eine erste Variante ist in Fig.1 rechte obere Hälfte (Fig.2 strichliert) dargestellt. Das äussere Dielektrikumsrohr 1 ist mit einer nach innen weisenden Delle oder Buckel 12 versehen. Diese reicht etwa bis zur halben Spaltweite an das innere Dielektrikumsrochr 2 heran.A first variant is shown in Fig. 1, right upper half (Fig. 2 in dashed lines). The outer
Eine zweite Variante zeigt Fig.1, rechte untere Hälfte, (Fig.2 gleichfalls strichliert). Dort ist das innere Dielektrikumsrohr 2 mit eine Delle oder Buckel 12a versehen, der etwa bis zur halben Spaltweite an das äussere Dielektrikumsrohr 1 heranreicht.A second variant shows Fig. 1, lower right half (Fig. 2 also dashed). There, the
Während diese beiden Varianten der Feldverzerrung vonvornherein vorgesehen werden müssten, kann die in Fig.1, linke Hälfte, und Fig.2 dargestellte Ausführungsform auch nachträglich bei ausgeführten Strahlern verwendet werden.While these two variants of field distortion would have to be provided from the outset, the embodiment shown in FIG. 1, left half, and FIG. 2 can also be used retrospectively in the case of emitters.
In den Entladungsraum 7 ist eine Kugel 13 aus dielektrischem Material, z.B. Quarz, vorzugsweise aus Aluminium- oder Titanoxid, eingelegt, mit einem Kugelaussendurchmesser gleich oder wenig kleiner als die Spaltweite des Entladungsraums 7. Diese Kugel kann - muss aber nicht - an einer ader an beiden Dielektrikumswänden befestigt sein. Dabei kommt es nicht auf die exakte Kugelgeometrie an. Auch können insbesondere bei langgestreckten Strahlern zwei oder mehrere dieser Kugeln vorgesehen werden. Auch ist die Kombination von Kugel(n) und Dellen oder Buckeln möglich.In the
Eine weitere, durchaus auch bei Strahlern nachträglich zu ergreifende Massnahme besteht darin, an die Innenfläche des äusseren Dielektrikumsrohres 1 oder an die Aussenfläche des inneren Dielektrikumsrohres 2 Quarztropfen 12b bzw. 12c anzuschmelzen, um die gewünschte Feldverzerrung zu erreichen.Another measure, which can also be taken subsequently with radiators, is to melt quartz drops 12b or 12c on the inner surface of the outer
- 11
- äusseres Quarzrohrouter quartz tube
- 22nd
- inneres Quarzrohrinner quartz tube
- 33rd
- wendelförmige Innenelektrodehelical inner electrode
- 3'3 '
- zentrale Innenelektrodecentral inner electrode
- 44th
- AussenelektrodeOutside electrode
- 5,65.6
- Deckelcover
- 77
- EntladungsraumDischarge space
- 88th
- Innenraum von 2Interior of 2
- 99
- KühlflüssigkeitsabflussCoolant drain
- 1010th
- KühlflüssigkeitsabflussCoolant drain
- 1111
- WechselstromquelleAC power source
- 1212th
- Delle oder Buckel an 1Dent or hump on 1st
- 12a12a
- Delle oder Buckel an 2Dent or hump on 2
- 12b12b
- Quarztrofen an 1Quartz trofen on 1st
- 12c12c
- Quarztrofen an 2Quartz trofen on 2nd
- 1313
- Kugel aus Aluminium- oder TitanoxidBall made of aluminum or titanium oxide
Claims (6)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4222130A DE4222130C2 (en) | 1992-07-06 | 1992-07-06 | High-power radiation |
| DE4222130 | 1992-07-06 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP0578953A1 true EP0578953A1 (en) | 1994-01-19 |
| EP0578953B1 EP0578953B1 (en) | 1997-09-17 |
Family
ID=6462570
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP93108758A Expired - Lifetime EP0578953B1 (en) | 1992-07-06 | 1993-06-01 | High power emitting device |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US5432398A (en) |
| EP (1) | EP0578953B1 (en) |
| JP (1) | JP2771428B2 (en) |
| CA (1) | CA2099073C (en) |
| DE (1) | DE4222130C2 (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0703602A1 (en) * | 1994-09-20 | 1996-03-27 | Ushiodenki Kabushiki Kaisha | Light source device using a dielectric barrier discharge lamp |
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Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0703602A1 (en) * | 1994-09-20 | 1996-03-27 | Ushiodenki Kabushiki Kaisha | Light source device using a dielectric barrier discharge lamp |
| WO1998011596A1 (en) * | 1996-09-11 | 1998-03-19 | Patent-Treuhand-Gesellschaft für elektrische Glühlampen mbH | Electric radiation source and irradiation system with this radiation source |
| US6060828A (en) * | 1996-09-11 | 2000-05-09 | Patent-Treuhand-Gesellschaft Fuer Elektrische Gluehlampen Mbh | Electric radiation source and irradiation system with this radiation source |
| EP0871203A2 (en) * | 1997-04-11 | 1998-10-14 | Nec Corporation | Noble gas discharge lamp |
| EP0871203A3 (en) * | 1997-04-11 | 1999-03-17 | Nec Corporation | Noble gas discharge lamp |
| EP0948030A2 (en) * | 1998-03-30 | 1999-10-06 | Toshiba Lighting & Technology Corporation | Rare gaseous discharge lamp, lighting circuit, and lighting device |
| EP0948030A3 (en) * | 1998-03-30 | 1999-12-29 | Toshiba Lighting & Technology Corporation | Rare gaseous discharge lamp, lighting circuit, and lighting device |
| EP1220285A2 (en) * | 2000-09-09 | 2002-07-03 | GSF-Forschungszentrum für Umwelt und Gesundheit GmbH | Ion source in which a UV/VUV light source is used for ionization |
| EP1220285B1 (en) * | 2000-09-09 | 2014-08-20 | Helmholtz Zentrum München Deutsches Forschungszentrum für Gesundheit und Umwelt (GmbH) | Ion source in which a UV/VUV light source is used for ionization |
| WO2011117045A1 (en) * | 2010-03-26 | 2011-09-29 | Osram Gesellschaft mit beschränkter Haftung | Dielectric barrier discharge lamp having a holding disc |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2771428B2 (en) | 1998-07-02 |
| EP0578953B1 (en) | 1997-09-17 |
| DE4222130C2 (en) | 1995-12-14 |
| JPH06209131A (en) | 1994-07-26 |
| CA2099073A1 (en) | 1994-01-07 |
| CA2099073C (en) | 1999-03-02 |
| US5432398A (en) | 1995-07-11 |
| DE4222130A1 (en) | 1994-01-13 |
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