EP0485401A1 - Detecteur de rayonnement a thermopiles - Google Patents
Detecteur de rayonnement a thermopilesInfo
- Publication number
- EP0485401A1 EP0485401A1 EP19900910570 EP90910570A EP0485401A1 EP 0485401 A1 EP0485401 A1 EP 0485401A1 EP 19900910570 EP19900910570 EP 19900910570 EP 90910570 A EP90910570 A EP 90910570A EP 0485401 A1 EP0485401 A1 EP 0485401A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- radiation detector
- thermopile
- detector according
- silicon
- chip
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 76
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 26
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 25
- 239000010703 silicon Substances 0.000 claims abstract description 25
- 239000000463 material Substances 0.000 claims abstract description 22
- 239000004020 conductor Substances 0.000 claims description 26
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 7
- 235000012239 silicon dioxide Nutrition 0.000 claims description 5
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 238000010521 absorption reaction Methods 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 3
- 239000002184 metal Substances 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 230000002745 absorbent Effects 0.000 claims 1
- 239000002250 absorbent Substances 0.000 claims 1
- 239000006117 anti-reflective coating Substances 0.000 claims 1
- 239000004071 soot Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 16
- 238000000034 method Methods 0.000 abstract description 10
- 239000000758 substrate Substances 0.000 description 11
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 10
- 239000012528 membrane Substances 0.000 description 7
- 239000006096 absorbing agent Substances 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 238000010561 standard procedure Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- NHWNVPNZGGXQQV-UHFFFAOYSA-J [Si+4].[O-]N=O.[O-]N=O.[O-]N=O.[O-]N=O Chemical compound [Si+4].[O-]N=O.[O-]N=O.[O-]N=O.[O-]N=O NHWNVPNZGGXQQV-UHFFFAOYSA-J 0.000 description 1
- 229910021486 amorphous silicon dioxide Inorganic materials 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000000725 suspension Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/10—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
- G01J5/12—Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using thermoelectric elements, e.g. thermocouples
Definitions
- thermopile radiation detector according to the preamble of patent claim 1.
- Thermopile radiation detectors consist of several thermocouples connected in series and are often used to measure the intensity of infrared radiation. For each thermocouple, heat is supplied to one of two so-called “thermal contacts", namely the so-called “hot” thermal contact, by exposing one radiation-receiving surface to infrared radiation, while the other, so-called “cold” thermal contact Radiation is protected.
- the size of the thermoelectric signal generated by the thermopile radiation detector increases with the intensity of the infrared radiation impinging on the radiation-receiving surface.
- the absorber, thermal resistance and heat sink of a thermopile radiation detector must be adapted to the type of infrared radiation to be detected.
- the hot thermal contacts themselves serve as absorbers, the connecting lines between hot and cold thermal contacts as heat resistance, while the heat sink consists of a metal ring that is in good thermal contact with the cold thermal contacts.
- the absorber should be so well thermally insulated that almost nothing is given off to the environment by the heat flow, so that it almost completely flows to the heat sink via the thermal resistance.
- thermopile radiation detector is known, for example, from the product description S07 from Isabellendazzling, Postfach 1453, D-6430 Dillenburg.
- the thermal column radiation detector consists of 16 Cu-CuN thermocouples connected in series, which are sealed between two Kapton foils (thickness 25-50 ⁇ m).
- the hot thermal contacts of the thermocouples are evenly distributed on a circular surface (6 mm diameter), while the cold thermal contacts are arranged on a circle with a 10 mm diameter.
- thermopile radiation detector then delivers a thermoelectric signal when there is a temperature difference between the internal (hot) and the external (cold) thermo contacts.
- the temperature difference is generated by the infrared radiation impinging on the hot thermal contacts, which is converted into heat in the Kapton films acting as absorbers and is dissipated into a heat sink (heat sink) via a thermal resistor.
- thermopile radiation detector known from the product description mentioned is relatively complex and therefore expensive.
- thermopile radiation detector manufactured using thin-film technology is known, which is applied to a so-called “substrate” consisting of silicon, in the following the one with the thermopile radiation detector provided substrate is referred to as a "chip".
- substrate consisting of silicon
- thermopile radiation detector provided substrate is referred to as a "chip”.
- methods known from the manufacture of integrated circuits and from micromechanics, such as anisotropic etching, are used.
- thermopile radiation detector known from the magazine "Measurement” is attached to a membrane made of silicon nitrite (Si-J.) and quartz (Si0 2 ), which is produced by anisotropic etching becomes. Bismuth / antimony thermal contacts are used to generate the thermoelectric signal.
- This thermopile radiation detector has the advantage that the thermoelectric signal is relatively high due to the low thermal conductivity of the membrane.
- this thermopile radiation detector has the disadvantage that it is difficult to manufacture and the chip can easily be damaged during its handling during the manufacturing process.
- thermopile radiation detector see, for example, pages 68 and 86
- the radiation-receiving surface is no longer mechanically and therefore thermally connected to the substrate on all sides Membrane, but at the end of one or more cantileve beam infrared detector which extends in the interior of the substrate, which otherwise only consists of four borders.
- Such a cantilever is designed to be considerably thinner than the four enclosures delimiting the inner region of the chip.
- the reason for the relatively small thermoelectric signal is the radiation receiving area, which is too small in relation to the thermal resistance of the cantilever.
- Thermopiles can also be used to measure the pressure for pressures below about 10 kPa in gas-filled containers.
- thermopiles The decisive difference to the radiation-detecting thermopiles is that the thermal resistance of a surface-like structure to the surrounding gas is used as a measure of the changing pressure of the gas.
- the flat structure is heated in such a way that a heat flow which is constant over time via the variable thermal resistance of the surrounding gas produces a temperature difference between the flat structure and the surroundings. This usually very small temperature difference is converted into an electrical signal using a thermopile.
- thermopile for measuring pressure in a vacuum
- the surface in thermal contact with the gas is not applied to a membrane that is mechanically and thus thermally connected to the substrate on all sides, but to an inside of the membrane Chips floating membrane suspended on four webs ("floating membrane").
- thermopile radiation detector If one were to use such an arrangement as a radiation detector, this would be unsuitable for this, since due to the large number (four) and the relatively short length of the webs, the thermal resistance between the radiation-receiving surface and the heat sink is very small. However, a small thermal resistance basically reduces the sensitivity of the radiation detector. However, since it is fundamentally desirable to keep the entire surface of a thermopile radiation detector and thus also its radiation-receiving area small, a sufficiently large thermoelectric signal is no longer available with relatively small thermal resistances. It is therefore an object of the invention to provide an even more economical thermopile radiation detector in which " on the one hand the chip area is further reduced and on the other hand emits an even larger thermoelectric signal without impairing its functionality.
- thermopile radiation detector according to the preamble of claim 1 by the features contained in the characterizing part thereof.
- thermopile radiation detector with a minimal chip area but good thermal efficiency. ie a relatively large thermoelectric signal for a given infrared radiation.
- the meandering or spiral course of the tape has the advantage that the area required for the entire chip is less. Furthermore, the radiation-receiving surface can be arranged in the center of the chip in the case of a spiral formation of the band, which allows a simple rotationally symmetrical structure.
- thermopile radiation detector If a band is selected which has a small width in comparison to the longitudinal dimensions of the radiation-receiving surface (claim 2), its thermal conductivity is further reduced, which further increases the efficiency of the thermopile radiation detector.
- thermoelectric materials are used for both the cold and the hot TM thermal contacts (claim 6), since such an arrangement uses standard methods known from the manufacture of integrated circuits (CMOS or bipolar) can be produced.
- thermoelectric materials are used as thermoelectric materials in both thermo contacts (claim 9).
- processes can be used which are known from the manufacture of integrated circuits, the particular advantage lies in the temperature independence of the thermoelectric coefficient with a suitably chosen doping of the silicon.
- the conductor tracks used for connecting the thermocouples in series can be made of the same material as the corresponding contact surfaces of the thermal contacts themselves (claim 10). This leads to cost savings, since the number of masks is reduced and a manufacturing step is also omitted in the further manufacturing process.
- a suspension of the radiation-sensitive surface on a single band is not easy to carry out.
- the layer structure on the chip must be matched to the materials and the layer thicknesses, since otherwise the tape can warp or warp due to internal tensions.
- a thermopile radiation detector with deformed bands is unusable. If one chooses materials for an arrangement according to claim 5 for the tape, the insulating layer, the thermal contacts and the conductor tracks according to claims 8-11 and if one bases their dimensioning on dimensions according to claim 12, the two can be described below Compensate the effects described so far that warping or warping no longer occur. It is known from thin-film technology that layers which are produced by vapor deposition of a substrate build up considerable stresses during the condensation. The reason for this is that the materials for vapor deposition are considerably hotter than the substrate; when cooling, tensile stresses will occur, for example, on aluminum on silicon.
- the SiO 2 In order to achieve a flat design of the thermopile radiation detector without warping, the SiO 2 must therefore be as thin as possible. Furthermore, the thickness and width of the aluminum conductor tracks should be as small as possible in order to minimize the stresses.
- the radiation-receiving surface is circular and is covered in the region of the openings with a layer that is well absorbing infrared radiation in order to increase the thermal voltage.
- thermopile radiation detector with a wavelength-dependent Em - to make sensitive. With such a thermopile radiation detector, it is then possible to use additional filters to selectively select the wavelength of interest. in the area of the incident radiation, which makes the manufacture significantly cheaper.
- an electronic component is attached to measure the temperature of the edge of the chip on one of its borders, in which at least one material property changes to a known extent with its temperature.
- the component supplies an input signal for a compensation circuit in order to compensate for the temperature dependence of the thermal voltage that exists in certain pairs of thermoelectric contacts.
- thermoelectric signal if necessary linearises it and / or compensates for it (Claim 16), in order to combine very weak infrared radiation emitted by a distant object convert the electrical signal proportional to the temperature of the object with a voltage level of the size of a few volts.
- thermopile radiation detector according to the invention with a spiral band
- FIG. 2 shows a partially represented section through the radiation-receiving surface along the direction denoted by AA in FIG. 1 and, in a perspective representation, the partial course of the strip including the conductor tracks attached to it, 3a and 3b the schematic course of the two conductor tracks arranged on the tape.
- the chip 1 shows a square-shaped chip 1 made of monocrystalline, p-doped silicon with a total thickness in the range of 300-750 / um, which has a layer of n-doped silicon on its entire surface Ver ⁇ thickness of 5-10 / um see and the edge is designated 2.
- the chip 1 can be produced using methods known from the manufacture of integrated circuits and serves as the starting product (substrate) for the manufacture of the thermopile radiation detector according to the invention.
- the width and the length of the chip 1 are each approximately
- the chip 1 originally formed as a square cuboid is further processed in such a way that it only has four borders 2 ', 2 ", 2 at its edge 2 '", 2" "with an unchanged thickness of 300-750 // m, which delimit a rectangle.
- the border 2 'of the chip 1 which runs to the right in FIG. 1 is shown broken away, although all four borders 2', 2 ", 2 '", 2 "" of the square chip 1 are continuously formed.
- a strip 3 which is articulated at right angles and then bent three times clockwise in the clockwise direction remains on the bezel 2 'and consists entirely of monocrystalline, n-doped silicon.
- a disk-shaped body is formed on the free end of the band 3, on which the radiation-receiving surface 4 is produced by further method steps becomes.
- the thickness of the band 3 and the disc-shaped body is of the order of 5 / ⁇ m, so that originally about 300-780 / 411. a considerable proportion of the thick substrate is removed, for example etched away.
- the approximately 130 ⁇ m wide band 3 is guided along the borders 2 ', 2 ", 2"', 2 "” in such a way that a gap 5 is present between the relevant border and the band 3.
- the band 3 can be slotted, perforated or provided with other cutouts.
- the material removal carried out in this way has the purpose of further reducing the thermal conductivity of the strip 3, without the mechanical stability being decisively impaired.
- the band can be meandering.
- the same advantages essential to the invention come into play again, namely that a thermopile radiation detector with a high sensitivity is produced with a large length of the belt and at the same time a minimal space requirement.
- the radiation-receiving surface lies outside the center of the chip, which can be advantageous if one deliberately wants to attach it outside the axis of symmetry of the chip. This is e.g. This is the case, for example, if only the radiation incident on the thermopile radiation detector outside its axis of symmetry is to be measured.
- thermopile radiation detector which correspond to one another are designated by the same reference numerals as in FIG. 1.
- Fig. 2 shows the basic structure of the hot thermal contacts of the thermopile radiation detector.
- Over the entire course of the band 3 are in total n-doped silicon material six trough-shaped deposits 6 with p-doped silicon arranged parallel to each other.
- the inclusions 6 extend from the disc-shaped body over the end 14 of the band 3 facing it, along the entire band 3 over the end 13 of the band 3 facing the edge 2 to the socket 2 'of the chip 1.
- the embedded, p- doped silicon forms conductor tracks 10b (cf. FIG. 3b), of which a total of six are arranged on the band 3 and of which only the ends 7 thereof can be seen in FIG. 2.
- the p-doped silicon in the deposits 6 is produced using known methods, for example diffusion or ion implantation methods.
- FIG. 2 Furthermore, it can be seen from FIG. 2 that about 0.15> s. ⁇ each above the band 3 except for openings 8 present in the area of the interface AA. thick, electrically insulating layer 9 of silicon dioxide (SiO ⁇ ) is attached, the width of which corresponds approximately to the width of the band 3.
- the openings 8 have the purpose that there the ends 15 of further, made of aluminum and running on the insulating layer 9 conductor tracks 10a (see also Fig. 3a) with the corresponding ends 7 of the conductor tracks 10b made of p-doped silicon in electrical Get in touch.
- the resulting electrical connection between the conductor tracks 10a and 10b forms the hot thermal contact of the thermocouples, of which only three out of a total of six are shown in FIG. 2.
- the thickness or maximum thickness of the strip conductors 10a and 10b is about 0, ⁇ ⁇ m, its width or maximum width of about 12 / wm.
- thermopile radiation detector has six thermocouples connected in series and consisting of a combination of p-doped silicon and aluminum.
- the thermal contacts can be made from other elements, e.g. n-doped polysilicon or gold.
- parts of the chip 1 e.g. the tape 3
- the entire radiation-receiving surface 4 is covered with a layer (not shown), which is made of carbon black or, in another embodiment, for wavelength-selective absorption from a dielectric layer or from dielectric material exists, which has antireflective properties in the infrared radiation range.
- a layer (not shown), which is made of carbon black or, in another embodiment, for wavelength-selective absorption from a dielectric layer or from dielectric material exists, which has antireflective properties in the infrared radiation range.
- a is not shown in the figures Housing surrounding chip 1, which is filled with a protective gas, for example xenon, and is sealed gas-tight to the outside.
- the enclosure V can also be provided with an electronic circuit which amplifies the sensor signal, if necessary temperature-compensated and / or linearized.
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Radiation Pyrometers (AREA)
Abstract
Un détecteur de rayonnement à thermopiles comprend des thermoéléments formés sur une puce de silicium. Celle-ci est réalisée par des procédés micromécaniques utilisés dans la fabrication des circuits intégrés. Une puce de silicium (1) en forme de plaquette, initialement relativement épaisse subit un enlèvement de matière, ce qui laisse une bordure relativement épaisse (2) et une bandelette (3) sinueuse ou spiralée relativement mince qui est articulée uniquement par son extrémité (13) à la bordure (2). Les thermocontacts dits ''froids'' sont situés sur la bordure (2) de la puce (1) dans la région de l'extrémité (13) de la bandelette (3) et les thermocontacts dits ''chauds'' sont situés sur l'autre extrémité libre (14) de la bandelette mince (3). Cette configuration permet de produire un signal thermoélectrique relativement important pour un rayonnement infrarouge donné, même pour une surface de puce relativement faible.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3925391 | 1989-08-01 | ||
DE19893925391 DE3925391A1 (de) | 1989-08-01 | 1989-08-01 | Thermosaeule |
Publications (1)
Publication Number | Publication Date |
---|---|
EP0485401A1 true EP0485401A1 (fr) | 1992-05-20 |
Family
ID=6386259
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19900910570 Withdrawn EP0485401A1 (fr) | 1989-08-01 | 1990-07-27 | Detecteur de rayonnement a thermopiles |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0485401A1 (fr) |
DE (3) | DE3925391A1 (fr) |
WO (1) | WO1991002229A1 (fr) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4425972A1 (de) * | 1994-07-22 | 1996-03-14 | Kundo Systemtechnik Gmbh | Stromversorgungseinrichtung, insbesondere für elektrisch betriebene Meßinstrumente |
FR2760530B1 (fr) * | 1997-03-07 | 1999-04-16 | Setaram Societe D Etudes D Aut | Dispositif de mesure des proprietes thermiques et/ou reactionnelles d'un ou plusieurs echantillons de matiere |
DE10033589A1 (de) * | 2000-07-11 | 2002-01-31 | Bosch Gmbh Robert | Mikrostrukturierter Thermosensor |
DE10144343A1 (de) * | 2001-09-10 | 2003-03-27 | Perkinelmer Optoelectronics | Sensor zum berührugslosen Messen einer Temperatur |
DE102004028032B4 (de) | 2004-06-09 | 2008-04-17 | Perkinelmer Optoelectronics Gmbh & Co.Kg | Sensorelement |
DE102010042108B4 (de) * | 2010-01-18 | 2013-10-17 | Heimann Sensor Gmbh | Thermopile-Infrarot-Sensor in monolithischer Si-Mikromechanik |
JP2019518960A (ja) | 2016-06-21 | 2019-07-04 | ハイマン・ゼンゾル・ゲゼルシャフト・ミト・ベシュレンクテル・ハフツング | 温度測定又はガス検出のためのサーモパイル赤外線単一センサ |
CN112964396B (zh) * | 2021-02-08 | 2022-08-02 | 中国科学院力学研究所 | 一种基于辐射测温的量热计 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2064584A5 (fr) * | 1969-09-30 | 1971-07-23 | Labo Electronique Physique | |
US4558342A (en) * | 1983-05-31 | 1985-12-10 | Rockwell International Corporation | Thermoelectric infrared detector array |
-
1989
- 1989-08-01 DE DE19893925391 patent/DE3925391A1/de not_active Withdrawn
-
1990
- 1990-07-27 DE DE90DE9000578D patent/DE4091364D2/de not_active Expired - Lifetime
- 1990-07-27 WO PCT/DE1990/000578 patent/WO1991002229A1/fr not_active Application Discontinuation
- 1990-07-27 EP EP19900910570 patent/EP0485401A1/fr not_active Withdrawn
- 1990-07-27 DE DE4091364A patent/DE4091364C1/de not_active Expired - Fee Related
Non-Patent Citations (1)
Title |
---|
See references of WO9102229A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO1991002229A1 (fr) | 1991-02-21 |
DE4091364D2 (en) | 1992-01-30 |
DE3925391A1 (de) | 1991-02-07 |
DE4091364C1 (fr) | 1993-07-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0966660B1 (fr) | Capteur a thermopile et thermometre a rayonnement avec capteur a thermopile | |
DE4102524C2 (de) | Infrarotsensor | |
DE60117929T2 (de) | Infrarotdetektorelement und Temperaturmessgerät | |
EP1296122B1 (fr) | Capteur pour la mesure sans contact d'une température | |
DE112009002170B4 (de) | Planarer Thermosäulen-Infrarotsensor | |
DE19633849B4 (de) | Infrarotdetektor und Herstellungsverfahren für diesen | |
DE3437334C2 (de) | Infrarotdetektor | |
WO2006122529A2 (fr) | Reseau de capteurs a infrarouge a thermopile | |
DE102017113023A1 (de) | Thermopile Infrarot Einzelsensor für Temperaturmessungen oder zur Gasdetektion | |
DE2204153B2 (de) | Temperaturmeßfühler für sehr tiefe Temperaturen | |
DE102005047164B4 (de) | Thermosäulenelement und dasselbe verwendender Infrarotsensor | |
WO2004102140A1 (fr) | Capteur d'infrarouge a utilisation de surface optimisee | |
GB2144908A (en) | Bolometer | |
DE3438764A1 (de) | Thermoelektrischer detektor | |
DE60314804T2 (de) | Supraleitendes, antennengekoppeltes, einen Hot-Spot aufweisendes Mikrobolometer, dessen Herstellungsverfahren und Gebrauch sowie ein bolometrisches Abbildungssystem | |
EP0485401A1 (fr) | Detecteur de rayonnement a thermopiles | |
DE102008002157B4 (de) | Sensorelement zur Messung von Infrarot-Strahlung und Verfahren zu dessen Herstellung | |
DE4221037C2 (de) | Thermischer Strahlungssensor | |
DE19605384C1 (de) | Thermoelektrischer Sensor | |
EP1198699A1 (fr) | Thermocapteur a microstructure | |
DE2653865C2 (fr) | ||
DE202012103703U1 (de) | Bolometer | |
DD147872B1 (de) | Strahlungsdetektor fuer absolutmessungen | |
EP0025529B1 (fr) | Récepteur de radiation bolométrique et procédé pour sa réalisation | |
DE19833391C2 (de) | Thermoelektrisches Sensorsystem und Herstellungsverfahren |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19910917 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT CH DE FR GB LI |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 19920801 |