EP0363437A1 - Heating system for reaction chamber of chemical vapor deposition equipment. - Google Patents

Heating system for reaction chamber of chemical vapor deposition equipment.

Info

Publication number
EP0363437A1
EP0363437A1 EP88906646A EP88906646A EP0363437A1 EP 0363437 A1 EP0363437 A1 EP 0363437A1 EP 88906646 A EP88906646 A EP 88906646A EP 88906646 A EP88906646 A EP 88906646A EP 0363437 A1 EP0363437 A1 EP 0363437A1
Authority
EP
European Patent Office
Prior art keywords
heating system
treatment cycle
reaction chamber
deposition equipment
vapor deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP88906646A
Other languages
German (de)
French (fr)
Other versions
EP0363437A4 (en
EP0363437B1 (en
Inventor
Mcdonald Robinson
Albert E Ozias
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Semiconductor Materials America Inc
Original Assignee
Epsilon Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Epsilon Technology Inc filed Critical Epsilon Technology Inc
Publication of EP0363437A1 publication Critical patent/EP0363437A1/en
Publication of EP0363437A4 publication Critical patent/EP0363437A4/en
Application granted granted Critical
Publication of EP0363437B1 publication Critical patent/EP0363437B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation by radiant heating of the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Dans un système de chauffage destiné à être utilisé dans un équipement de déposition en phase gazeuse par procédé chimique, un gaz réactif est dirigé dans un flux horizontal pour permettre le dépôt de matériaux sur un substrat maintenu dans une chambre de réaction (10) sur une base (''susceptor'') (20) à entraînement rotatif, de façon à faire tourner le substrat autour d'un axe qui s'étend perpendiculairement à son centre. Le système de chauffage agit conjointement avec un agencement spécial de détection thermique et comprend un assemblage d'élément chauffant supérieur (32), un assemblage d'élément chauffant inférieur (34) ainsi qu'un mécanisme de concentration thermique (36) qui travaille en interaction, afin de permettre une accumulation rapide de température au début du cycle de traitement, une atténuation rapide de température à la fin du cycle de traitement et une courbe de température plate soumise à régulation durant le cycle de traitement.In a heating system for use in gas-phase chemical deposition equipment, a reactive gas is directed in a horizontal flow to allow the deposition of materials on a substrate held in a reaction chamber (10) on a base (“susceptor”) (20) with rotary drive, so as to rotate the substrate around an axis which extends perpendicular to its center. The heating system acts in conjunction with a special thermal sensing arrangement and includes an upper heating element assembly (32), a lower heating element assembly (34) and a heat concentrating mechanism (36) which operates in interaction, to allow rapid temperature accumulation at the start of the treatment cycle, rapid temperature attenuation at the end of the treatment cycle and a flat temperature curve subject to regulation during the treatment cycle.

EP88906646A 1987-06-18 1988-06-17 Heating system for reaction chamber of chemical vapor deposition equipment Expired - Lifetime EP0363437B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US07/063,409 US4836138A (en) 1987-06-18 1987-06-18 Heating system for reaction chamber of chemical vapor deposition equipment
US63409 1987-06-18
PCT/US1988/002117 WO1988010322A1 (en) 1987-06-18 1988-06-17 Heating system for reaction chamber of chemical vapor deposition equipment

Publications (3)

Publication Number Publication Date
EP0363437A1 true EP0363437A1 (en) 1990-04-18
EP0363437A4 EP0363437A4 (en) 1990-11-28
EP0363437B1 EP0363437B1 (en) 1994-12-28

Family

ID=22049003

Family Applications (1)

Application Number Title Priority Date Filing Date
EP88906646A Expired - Lifetime EP0363437B1 (en) 1987-06-18 1988-06-17 Heating system for reaction chamber of chemical vapor deposition equipment

Country Status (8)

Country Link
US (1) US4836138A (en)
EP (1) EP0363437B1 (en)
JP (1) JPH07100863B2 (en)
AT (1) ATE116381T1 (en)
DE (1) DE3852642T2 (en)
HK (1) HK76095A (en)
SG (1) SG38910G (en)
WO (1) WO1988010322A1 (en)

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US6217662B1 (en) 1997-03-24 2001-04-17 Cree, Inc. Susceptor designs for silicon carbide thin films
US5792273A (en) * 1997-05-27 1998-08-11 Memc Electric Materials, Inc. Secondary edge reflector for horizontal reactor
US5960158A (en) * 1997-07-11 1999-09-28 Ag Associates Apparatus and method for filtering light in a thermal processing chamber
US5990454A (en) 1997-09-23 1999-11-23 Quadlux, Inc. Lightwave oven and method of cooking therewith having multiple cook modes and sequential lamp operation
US5958271A (en) 1997-09-23 1999-09-28 Quadlux, Inc. Lightwave oven and method of cooking therewith with cookware reflectivity compensation
US6013900A (en) 1997-09-23 2000-01-11 Quadlux, Inc. High efficiency lightwave oven
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US6210484B1 (en) 1998-09-09 2001-04-03 Steag Rtp Systems, Inc. Heating device containing a multi-lamp cone for heating semiconductor wafers
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US6771895B2 (en) * 1999-01-06 2004-08-03 Mattson Technology, Inc. Heating device for heating semiconductor wafers in thermal processing chambers
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Non-Patent Citations (1)

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Title
See references of WO8810322A1 *

Also Published As

Publication number Publication date
HK76095A (en) 1995-05-26
US4836138A (en) 1989-06-06
EP0363437A4 (en) 1990-11-28
DE3852642D1 (en) 1995-02-09
DE3852642T2 (en) 1995-07-27
JPH03500549A (en) 1991-02-07
JPH07100863B2 (en) 1995-11-01
SG38910G (en) 1995-09-01
WO1988010322A1 (en) 1988-12-29
EP0363437B1 (en) 1994-12-28
ATE116381T1 (en) 1995-01-15

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