EP0290445A1 - Appareil incorporant des miroirs conjugues en phase - Google Patents
Appareil incorporant des miroirs conjugues en phaseInfo
- Publication number
- EP0290445A1 EP0290445A1 EP19870900676 EP87900676A EP0290445A1 EP 0290445 A1 EP0290445 A1 EP 0290445A1 EP 19870900676 EP19870900676 EP 19870900676 EP 87900676 A EP87900676 A EP 87900676A EP 0290445 A1 EP0290445 A1 EP 0290445A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- beam splitter
- image
- projecting apparatus
- radiation
- phase conjugate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/10—Beam splitting or combining systems
- G02B27/14—Beam splitting or combining systems operating by reflection only
- G02B27/144—Beam splitting or combining systems operating by reflection only using partially transparent surfaces without spectral selectivity
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/353—Frequency conversion, i.e. wherein a light beam is generated with frequency components different from those of the incident light beams
- G02F1/3536—Four-wave interaction
- G02F1/3538—Four-wave interaction for optical phase conjugation
Definitions
- This invention relates to phase conjugate mirrors and to apparatus incorporating phase conjugate mirrors.
- phase conjugate mirror reflects light directly back along its incident path, whatever the angle of incidence. Hence light from a point source is refocused on to the point whatever its distance from the mirror. Thus the phase conjugate mirror behaves as if it was a curved mirror the axis of which always points towards the source and the radius of curvature of which is equal to the distance to the source. Moreover, this behaviour is still obtained if a phase distorter is interposed in the path of the beam.
- Phase conjugate reflection may be realised in practice, by methods such as four wave mixing (FWM) and stimulated Brillouin scattering (SBS) (see D.M. Pepper Optical Engineering 21 156 (1982). Phase conjugate mirror action has been demonstrated at many wave-lengths in the visible, infra-red and ultraviolet.
- image projecting apparatus comprising a source of radiation to illuminate an object, partially reflecting beam splitter means to reflect radiation from the object on to a phase conjugate mirror arranged to reflect said radiation back through said beam splitter to construct a real image of said object and compensator means interposed between said object and said beam splitter means to compensate at least partially for abberations in said image caused by said beam splitter means.
- FIG. 1 is an explanatory diagram showing a distorter in the path of radiation reflected by a phase conjugate mirror.
- Figure 2 is a development of the apparatus of Figure 1 incorporating a beam splitter.
- FIG 3 is a schematic view of apparatus in accordance with the invention.
- Figure 4 is a modification of the apparatus of Figure 2; and
- Figure 5 is an adaptation of the apparatus of Figure 4.
- a phase conjugate mirror PCM reflects radiation from a point source S back to the source.
- the interposition of a phase distorter D has no effect on the quality of image formed. Since an illuminated object may be considered as an array of point sources a phase conjugate mirror and beam splitter constitute a 1 to 1 imaging structure, as shown in Figure 2.
- a point on an object at A is imaged at A 1 . Again, this is unaffected by a phase distorter, D, provided it is placed in the part of the beam in which it is traversed twice.
- Distortion cancellation is not obtained when radiation passes only once through an element placed between the beam splitter and A and A 1 .
- phase distortion due to the beam splitter is not cancelled.
- the quality of an optical image, obtained by a conventional lens system or otherwise, can be characterised by three parameters:
- the resolution is given by the Rayleigh criterion as ⁇ /2NA where ⁇ is the wavelength of the illumination and NA the numerical aperture.
- NA is simply sin ⁇ where ⁇ is half the angle of convergence of the beam at the image.
- a beam splitter is fabricated from a suitable transparent material, e.g. glass or quartz, and not less than a few mm thick to permit polishing by conventional techniques of the optically transmissive and reflective surfaces to be flat and parallel to better than about 0.1 ⁇ .
- the surface nearest the phase conjugate mirror is coated to obtain 50% reflectivity and the other surface antireflection coated.
- the numerical aperture of the system and hence the resolution and image pixel number, will be maximised by placing the PCM as near to the image/object plane as possible (Figure 3).
- NA 0.25
- the image width in the plane shown is about 0.25D where D is the width of the phase conjugate mirror.
- a suitable width for the phase conjugate mirror is 4 cm.
- Improved quality images in a structure of the type shown in Figure 3 is obtained through the presence of a compensation plate of which the width is equal to that of the beam splitter to an accuracy of a few wavelengths. This is conveniently and simply achieved by fabricating the beam splitter and compensator as one flat plate and then cutting at right angles to the polished optical surfaces.
- a compensator plate arises because the beam to and from the PCM is non-parallel: a plate at normal incidence in a non-parallel beam produces spherical aberration and an angled plate astigmatism. The aberrations due to a component in front of a PCM are cancelled if the radiation passes through it twice.
- This apparatus may be adapted to provide apparatus suitable for use in photolithography.
- One such apparatus was first described by Giuliano (Physics Today 34, 27 (1981)) and is shown in Figure 4.
- This apparatus comprises an illuminating beam B from a radiation source (not shown) reflected by a beam splitter BS to a phase conjugate mirror PCM from which it is reflected to the beam spliiter.
- the beam passes through an amplifier A.
- Radiation passing through the beam splitter forms an image on the surface of a layer of photoresist PR. Since no compensator plate is included, the image is astigmatic.
- the amplifier can provide a higher power on the photoresist than incident on the mask, which is valuable, while any aberrations due to the amplifier are cancelled as it is double passed.
- the maximum efficiency of a beam splitter (25%) is achieved when the reflectivity is 50%. This, however, can usually only be achieved by the use of multiple dielectric coatings on the beam splitter surface and such coatings can be damaged by laser light at the high intensities required to expose a photoresist in a single, brief, pulse. Hence uncoated surfaces, with inevitably lower reflectivities (e.g. quartz; reflectivity at 45 , 9%) will often be preferred. Fortunately a low beam splitter reflectivity is consistent with - indeed essential for - the achievement of a higher power on the photoresist than incident on the mask. Taking Into account the light reflected back to the mask the power on the photoresist will exceed that on the mask if
- R c and R B are the PCM and beam splitter reflectivities respectively and g is the single pass gain of the amplifier.
- the amplifier considerably increases the distance between phase conjugate mirror and image/mask thus reducing the numerical aperture and the system resolution.
- the numerical aperture can be maintained at a high value by placing a lens or lens system L between the beam splitter and amplifier. Since the lens(es) is double passed its aberrations are cancelled and it does not have to be of high quality.
- a structure with a single lens is shown in Figure 5. If the mask and photoresist are mounted normal to the beams incident upon them as in the prior art structure, ( Figure 4) some light will be reflected back to and through the amplifier. Laser oscillations may then build up in one or all of three effective laser "cavities": between the photoresist and itself, the mask and itself and the photoresist and the mask, each via the phase conjugate mirror. If R M is the reflectivity of the mask, R p the reflectivity of the photoresist the following three conditions must all be met if oscillation, and consequent obliteration of the image, is to be avoided.
- condition (1) can be solved by placing the mask and photoresist at non-normal incidence: if both are at the same angle relative to the beam axis the image of the mask will be in focus at all equivalent points on the photoresist surface.
- the effective value of R M and R p decrease with angle to reach zero when the angle between the normal to the mask/photoresist plane and the optic axis exceeds ⁇ , as defined above.
- An uncoated, and hence relatively low reflectivity, beam splitter together with an amplifier, can ensure a high power incident on the photoresist and a low power transmitted back to the mask, in the ratio (1-R B )/R B .
- the power to be transmitted through the beam splitter may be so high that not only reflective coatings but also anti reflection coatings will be damaged. If both surfaces of the beam splitter have to be uncoated they will have equal reflectivities and the second surface (nearest the photoresist, Figure 5) will produce a "ghost" image of the mask at the photoresist, displaced with respect to the wanted image but of comparable intensity.
- a solution to this problem is to make the beam splitter thick enough to displace the ghost image outside the primary image area. The displacement can be calculated from the condition that all rays incident on the PCM return along the same path. The displacement equals the image width, d, when
- D the diameter of the lens ( Figure 5) or PCM ( Figure 3) and 1 is the thickness of the beam splitter.
- 1 D.
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lenses (AREA)
Abstract
Un appareil de production d'images comprend un source de rayonnement pour éclairer un objet (O), un diviseur de faisceau partiellement réfléchissant pour réfléchir le rayonnement provenant de l'objet sur un miroir conjugé en phase (PCM), un miroir conjugué en phase pour réfléchir ledit rayonnement à travers ledit diviseur de faisceau afin de construire une image réelle (I) dudit objet et un compensateur (C) interposé entre ledit objet et ledit diviseur de faisceau afin de compenser au moins partiellement les abérrations dans ladite image causées par le diviseur de faisceau.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB8600749 | 1986-01-14 | ||
GB868600749A GB8600749D0 (en) | 1986-01-14 | 1986-01-14 | Apparatus incorporating phase conjugate mirrors |
Publications (1)
Publication Number | Publication Date |
---|---|
EP0290445A1 true EP0290445A1 (fr) | 1988-11-17 |
Family
ID=10591318
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP19870900676 Withdrawn EP0290445A1 (fr) | 1986-01-14 | 1987-01-13 | Appareil incorporant des miroirs conjugues en phase |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP0290445A1 (fr) |
JP (1) | JPH01502056A (fr) |
GB (2) | GB8600749D0 (fr) |
WO (1) | WO1987004265A1 (fr) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61236035A (ja) * | 1985-04-09 | 1986-10-21 | Sony Corp | 光学ヘツド |
DK160524C (da) * | 1987-05-04 | 1991-09-23 | Eskofot As | Fremgangsmaade til eliminering af pudeformet fortegning |
US5155623A (en) * | 1988-09-23 | 1992-10-13 | At&T Bell Laboratories | Arrangement for imaging multiple arrays of light beams |
DE3922572C1 (fr) * | 1989-07-08 | 1990-09-13 | Messerschmitt-Boelkow-Blohm Gmbh, 8012 Ottobrunn, De |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4412723A (en) * | 1981-05-28 | 1983-11-01 | The Perkin-Elmer Corporation | Optical system for correcting the aberrations of a beamsplitter in converging light |
US4541688A (en) * | 1984-06-11 | 1985-09-17 | Eastman Kodak Company | Optical beam splitters |
-
1986
- 1986-01-14 GB GB868600749A patent/GB8600749D0/en active Pending
-
1987
- 1987-01-13 JP JP50067687A patent/JPH01502056A/ja active Pending
- 1987-01-13 WO PCT/GB1987/000015 patent/WO1987004265A1/fr not_active Application Discontinuation
- 1987-01-13 EP EP19870900676 patent/EP0290445A1/fr not_active Withdrawn
- 1987-01-13 GB GB08700671A patent/GB2186709A/en not_active Withdrawn
Non-Patent Citations (1)
Title |
---|
See references of WO8704265A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO1987004265A1 (fr) | 1987-07-16 |
GB8700671D0 (en) | 1987-02-18 |
JPH01502056A (ja) | 1989-07-13 |
GB2186709A (en) | 1987-08-19 |
GB8600749D0 (en) | 1986-02-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 19880628 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): DE FR NL |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 19900801 |