EP0227517A1 - Process and apparatus for controlling the amount of metal electrolytically deposited on a continuously moving strip - Google Patents

Process and apparatus for controlling the amount of metal electrolytically deposited on a continuously moving strip Download PDF

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Publication number
EP0227517A1
EP0227517A1 EP86402522A EP86402522A EP0227517A1 EP 0227517 A1 EP0227517 A1 EP 0227517A1 EP 86402522 A EP86402522 A EP 86402522A EP 86402522 A EP86402522 A EP 86402522A EP 0227517 A1 EP0227517 A1 EP 0227517A1
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European Patent Office
Prior art keywords
strip
metal
bridge
bridges
intensity
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EP86402522A
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German (de)
French (fr)
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EP0227517B1 (en
Inventor
Bernard Backelandt
Daniel Piquet
Jean-Claude Gythiel
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Sollac SA
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USINOR Aciers
Sollac SA
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Priority to AT86402522T priority Critical patent/ATE52546T1/en
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation

Definitions

  • the present invention relates to the technique of depositing an electrolytic coating on a continuously moving metal strip and relates more particularly to the regulation of metal deposition using a microprocessor.
  • the tin is supplied to the tinning installation in the form of bars placed on a copper support serving as an anode.
  • the number of tin bars on each support depends on the width of the strip to be tinned.
  • tin bars which are in fact consumable electrodes are mounted on conductive slides, which makes it possible to replace them when they are worn, continuously and without stopping the line.
  • each tray In each tray are placed a lower rubber roller and a chromed upper roller between which the band is stretched. Together, they form the cathode of the corresponding tank.
  • the bridges are supplied with a direct voltage of 24V and receive a current limited to 4500 A.
  • the amount of tin deposited is a function of the width of the strip, of the running speed of the latter and of the overall current which is distributed over the different bridges in service.
  • the operator sets the target tin rate by intervening directly on the global current (1G). It must first display the width of the strip.
  • the tinning rate is kept constant by regulating the current to a value proportional to the line speed.
  • this regulation does not prevent under-tinning and over-tinning during intermediate states (speed change, rate change, cut or addition of a bridge).
  • a continuous measurement gauge has been installed. This allows the measurement to be transcribed in the form of a graph via a screen. The operator can therefore immediately correct the errors.
  • the measurement is based on the principle of X-ray fluorescence.
  • the gauge uses two sources of curium 244 with a radioactive period of 17.6 years. The energy released by the source causes an emission of fluorescent rays from iron, part of which is absorbed by tin. It is by determining the quantity of radiation remaining that the tin deposited is calculated.
  • the signal processing is as follows. - Conversion of the exponential signal sent by the cells into a linear signal proportional to the coating. - Calculation of the difference between the measurement and the nominal rate targeted. - Possible correction of the signal value of plus or minus 5% depending on the aging of the sources for example. - Finally, a microcomputer records the signals and transmits them to a cathode-ray screen located on the tinning line.
  • the gauge scans approximately every 30 seconds. Simultaneously, the transverse profiles of the coating appear, the instantaneous average measured values and those of the last scan, and the minimum threshold authorized by the standards in force for tinning operations such as EURONORM. For comparison, the last saved profile remains on the screen.
  • the invention therefore aims to create a method and a device for regulating the electrolytic deposition of a metal coating on a continuously moving strip of metal enabling these drawbacks to be remedied by taking into account the quantities of metal deposited by each bridge and by adapting the settings on the deposit line according to these quantities.
  • It therefore relates to a method of regulating the quantity of a metal deposited electrolytically on a strip to be coated continuously scrolling in a deposition installation comprising several reservoirs filled with electrolyte, the strip passing over a conductive roller forming cathode associated with each tank and the coating metal being supplied by bars of said metal carried by conductive bridges forming anodes arranged in each tank on a part of the path of the strip in said tank, characterized in that it consists in calculating at each movement of the strip between two successive bridges, the deposition of metal on each bridge in function of the intensity of the supply current of this bridge, of the speed of the strip and of the efficiency of the bridge, to follow separately each length of strip equal to the distance between two successive bridges by cumulating the successive metal deposits, to be established the balance sheet of the deposit under the last bridge delivering current in order to determine the intensity necessary under this bridge in order to complete the metal deposit, to determine the overall intensity necessary to obtain the desired intensity under this last bridge, and at each acquisition of an average measurement over the entire width
  • the process defined above also comprises the phases consisting in determining experimental curves of the yield as a function of the intensity of the supply current of each bridge of the installation, in collecting indications relating to bridges in service or out of service, to establish the analog values of the intensity on each bridge and of the maximum current intensity on all the bridges, to measure the speed of travel of the strip, to establish, set values relating to the quantity of metal to be deposited, to measure the overall quantity of metal deposited using a dipstick periodic lay-up, determining the lower and upper averages of the quantity of metal measured by the gauge on each scan and establishing from the above data a regulation model.
  • - Fig.1 is a schematic perspective view with partial cutaway of a tinning tank used in the construction of a tinning installation to which the invention is applied
  • - Fig.2 is a schematic top view of the tray of Fig.1
  • - Fig.3 is a schematic view of implantation of the tin level measurement gauges in an installation to which the invention is applied
  • - Fig.4 is a block diagram of a circuit for processing the data relating to the coating applied to the sheet and for developing the correction coefficients
  • - Fig.5 is a flowchart of data acquisition operations relating to the deposited tin rates
  • - Fig.6 is a flow diagram of the fast loop for controlling the tin deposit calculation operations on each bridge
  • - Fig.7 is a flowchart for controlling the return of the gauge
  • - Fig.8 is a set of yield curve
  • tinning tank used in the construction of an installation tinning to which the invention is applied.
  • the invention also applies to installations for the electrolytic deposition of coatings of metals other than tin such as chromium, copper or the like.
  • the tank comprises a reservoir 1 containing electrolyte not shown.
  • a roller 2 In the bottom of the tank is rotatably mounted a roller 2 on which passes continuously a strip B to be coated with a layer of tin.
  • the roller 2 is made for example of rubber.
  • a second roller 3 Above the reservoir 1 is disposed a second roller 3, for example chrome-plated, of conductive material which ensures the tension of the strip and its transfer into the reservoir 1 from an identical reservoir, not shown, which, with other reservoirs of the same type, arranged upstream and downstream of the tank 1, is part of the tinning installation.
  • the roller 3 acts as a cathode associated with the reservoir 1.
  • a wringing roller presses the strip B against the roller 3 in order to avoid the formation of electric arcs.
  • the strip B passes into the tank 1 between two pairs of supports 4 and 5 (Fig. 2) constituted by copper bars on which are placed side by side vertical tin bars 6 whose feet are engaged in a guide 7 U-shaped.
  • the copper bars 4 and 5 form slides for the tin bars and are connected to a corresponding bar 7 for supplying current.
  • the strip B therefore passes through two passages formed by the tin bars 6 carried by their corresponding supports 4 and 5, formed respectively on its descent and ascent path in the reservoir 1 filled with electrolyte.
  • the supports or bridges 4,5 and the tin bars 6 act as the anode of the device.
  • the container thus formed is carried by a frame 10 which also supports the other containers of the installation (not shown).
  • a lining 11 made of insulating material is interposed between the frame and the connection 12 of the supports 4,5 to the bar 7 for supplying current.
  • a gauge formed by two cells arranged as shown in Fig.3.
  • the strip B on the two faces of which a coating of tin has just been deposited passes over a deflector roller 15 opposite which is disposed a first cell 16 intended to measure the coating of tin of a first face of the loop B.
  • the cell 16 comprises a source 17 of curium 244 placed on a support 18 mounted oscillating on a base 19 and movable around its axis of oscillation 20 by a pneumatic cylinder 21.
  • the strip B then passes over a second deflector roller 22 opposite which is disposed a second cell 23 similar to the cell 16 and intended to measure the coating of tin on the opposite face of the strip B.
  • This cell also includes a source 24 of curium 244 placed on a support 25 mounted oscillating on a base 26 and actuated by a pneumatic cylinder 27.
  • This circuit includes an analog-digital and digital-analog converter 30, for example of the ADAC 735 type which comprises, for an installation with twelve tinning tanks forty eight analog inputs 31 relating to the intensities of the currents applied to the supports of all the tanks, such as the bridges 4,5 of the tank in Fig. 1 and 2.
  • the converter 30 also comprises two analog inputs 32 intended to receive information on the position of the cells 16, 23 from the gauges and two analog inputs 33 intended to receive information relating to the average values of the deposits of tin on the two faces of the strip. .
  • the converter 30 further comprises an analog input 34 intended to receive signals relating to the width of the band B processed, two analog inputs 35 relating to the maximum upper and lower intensities and two analog outputs relating to the overall lower and upper intensity to be distributed on the bridges of the installation.
  • the converter 30 is connected to a multi-conductor bus 36.
  • the circuit of Fig.4 further includes a counter 37 whose input is connected to the output of a band B pulse generator (not shown) and which is also connected to bus 36, a circuit interface 38 of the SBC 519 type manufactured and sold by Intel, with thirty two digital inputs 39 relating to the lower and upper set values of the tin rate to be obtained, thirty two digital inputs 40 relating to the commercial set values, one input 41 for validation of automatic / manual operation and an input 42 of setpoint validation. Circuit 38 is also connected to bus 36.
  • circuit in Fig. 4 includes a microprocessor 43 of the Intel 8088 type for example, connected to bus 36 and intended to control changes in the level of tin to be deposited in the various tanks of the installation as a function of the information qu 'he receives.
  • a first phase of operation of the installation is the phase of acquiring information relating to the operation in progress.
  • the converter 30 receives on its forty-eight inputs measurements of the intensities on the bridges 4.5 of the twelve tanks of the installation.
  • the converter 30 reads the currents on each of the bridges. This intensity information is transmitted to the microprocessor 43 which, during phase 51, calculates the values of the tin deposits under each bridge, taking into account the information on the speed of travel of the strip which is supplied to it by the counter 37, of the efficiency of each bridge and of the position of the gauge materializing the width of the strip, these two pieces of information being delivered by the converter 30.
  • the microprocessor 43 cumulates information relating to the deposit in progress with the previous deposit.
  • the information relating to the last bridge depositing tin during a sweep of the gauge is received on the analog inputs 31 of the converter 30.
  • the quantity of tin to be deposited by the last bridge is calculated from the information on set point rates, lower and higher to be obtained, entered by the operator on the inputs 39 of the interface circuit 38. Then, during phase 55, the microprocessor 43 calculates the approximate intensity necessary as a function of the information on the quantity of tin to be deposited by the last bridge and the information on bandwidth, the value of the coating measured by the gauge and the speed of travel of the strip it receives by the bus 36, coming from the converter 30 and the counter 37.
  • the microprocessor 43 calculates the efficiency of the bridge from the intensity calculated during phase 55 and this from pre-established curves shown in FIG. 8.
  • the microprocessor calculates the necessary intensity corresponding to the yield determined during phase 56, taking into account the value of the coating measured by the gauge and the speed of travel of the strip.
  • phase 58 there is a question about the difference between the intensity required and the intensity actually applied to the last bridge.
  • phase 60 the strip is brought forward by one step.
  • phase 58 If the answer to the interrogation of phase 58 is no, the calculations of phases 56 and 57 are repeated on the data relating to the deposit of tin by a bridge located downstream until the difference in intensity is low.
  • the flowchart in Fig.7 is a "slow loop" flowchart which controls drift corrections.
  • the acquisition of a measurement made during phase 61 is the reading of the average tin deposit value made by the converter 30 of FIG. 4 at each end of scanning of the gauge of FIG. 3.
  • This phase is followed by an interrogation phase 62 relating to the transition from installation to automatic.
  • the microprocessor 43 proceeds during phase 65, to the calculation of a gauge yield, that is to say of the ratio between the deposit of tin measured by the gauge and the deposit to be obtained.
  • phase 64 The affirmative response to the interrogation of phase 64 causes the setpoint to be validated via the interface circuit 38.
  • a regulation current (IC) will be calculated which will be applied to the last bridge.
  • TC 2 g / m2
  • the actual measurement of the deposited rate does not take place at each step but at each sweep of the gauge.

Abstract

Process for regulating the quantity of metal electrolytically deposited on a continuously travelling band to be coated in a coating plant comprising a plurality of tanks filled with electrolyte. The process comprises determining experimental curves of the yield as a function of the strength of the supply current of each bridge of the plant, collecting (32) indications relating to the bridges in operation or out of operation, establishing analog values of the strength for each bridge and of the maximum strength of the current for all of the bridges, measuring the velocity of the travel of the band (37), establishing set values (39) relating to the quantity of metal to be deposited, measuring the total quantity of metal deposited by means of a gauge employing a periodic scanning, determining the lower and upper means of the quantity of metal measured by the gauge in each scan, and establishing a regulation model from the aforementioned data.

Description

La présente invention est relative à la technique du dépôt d'un revêtement électrolytique sur une bande métallique défilant en continu et se rap­porte plus particulièrement à la régulation du dépôt de métal à l'aide d'un microprocesseur.The present invention relates to the technique of depositing an electrolytic coating on a continuously moving metal strip and relates more particularly to the regulation of metal deposition using a microprocessor.

Il est connu pour procéder à l'étamage d'une bande de faire passer cette bande successivement dans plusieurs réservoirs remplis d'électrolyte.It is known to proceed with the tinning of a strip by passing this strip successively through several reservoirs filled with electrolyte.

L'étain est fourni à l'installation d'étama­ge sous la forme de barres posées sur un support de cuivre faisant office d'anode.The tin is supplied to the tinning installation in the form of bars placed on a copper support serving as an anode.

A titre d'exemple, on peut citer une instal­lation d'étamage comportant douze réservoirs succes­sifs.By way of example, mention may be made of a tinning installation comprising twelve successive tanks.

A raison de deux supports ou ponts par face de métal dans chaque bac, il y a en tout vingt quatre ponts par face.With two supports or bridges per side of metal in each bin, there are a total of twenty four bridges per side.

Le nombre de barres d'étain sur chaque sup­port est fonction de la largeur de la bande à étamer.The number of tin bars on each support depends on the width of the strip to be tinned.

Les barres d'étain qui sont en fait des électrodes consommables sont montées sur des glissiè­res conductrices, ce qui permet de les remplacer lors­qu'elles sont usées, de façon continue et sans arrêt de la ligne.The tin bars which are in fact consumable electrodes are mounted on conductive slides, which makes it possible to replace them when they are worn, continuously and without stopping the line.

Dans chaque bac sont placés un rouleau infé­rieur en caoutchouc et un rouleau supérieur chromé entre lesquels est tendue la bande. Ensemble, ils for­ment la cathode du réservoir correspondant.In each tray are placed a lower rubber roller and a chromed upper roller between which the band is stretched. Together, they form the cathode of the corresponding tank.

Les ponts sont alimentés sous une tension continue de 24V et reçoivent un courant limité à 4500 A.The bridges are supplied with a direct voltage of 24V and receive a current limited to 4500 A.

Le taux d'étain déposé est fonction de la largeur de la bande, de la vitesse de défilement de celle-ci et du courant global qui se répartit sur les différents ponts en service.The amount of tin deposited is a function of the width of the strip, of the running speed of the latter and of the overall current which is distributed over the different bridges in service.

L'intensité du courant est donnée par la relation suivante tirée de la loi de Faraday.

Figure imgb0001
v = vitesse de ligne en m/mn
l = largeur de la bande en mètres
E = taux d'étain en g/m2
n = rendementThe intensity of the current is given by the following relation taken from Faraday's law.
Figure imgb0001
v = line speed in m / min
l = width of the strip in meters
E = tin content in g / m2
n = yield

Dans des installations connues, l'opérateur règle le taux d'étain visé en intervenant directement sur le courant global (1G). Il doit préalablement af­ficher la largeur de la bande. Le taux d'étamage est maintenu constant par régulation du courant à une va­leur proportionnelle à la vitesse de la ligne. Cepen­dant, cette régulation ne permet pas d'éviter le sous-­étamage et le sur-étamage lors des états intermédiai­res (changement de vitesse, changement de taux, coupu­re ou rajout d'un pont).In known installations, the operator sets the target tin rate by intervening directly on the global current (1G). It must first display the width of the strip. The tinning rate is kept constant by regulating the current to a value proportional to the line speed. However, this regulation does not prevent under-tinning and over-tinning during intermediate states (speed change, rate change, cut or addition of a bridge).

En effet, la quantité d'étain déposé est égale à :

Figure imgb0002
Indeed, the quantity of tin deposited is equal to:
Figure imgb0002

A l'état stable toutes les vitesses de pas­sage sous les ponts sont identiques, donc on a :

Figure imgb0003
In the stable state all the speeds of passage under the bridges are identical, so we have:
Figure imgb0003

A chaque transitoire cependant, cette rela­tion n'est plus vraie, tous les vi pouvant être diffé­rents, et donc la quantité d'étain peut différer de plus de 20% de la valeur visée.With each transient, however, this relationship is no longer true, as all of the vi can be different, and therefore the quantity of tin can differ by more than 20% from the target value.

Dans un passé récent, la mesure du taux d'étain déposé était effectuée comme suit.In the recent past, the measurement of the rate of deposited tin was carried out as follows.

Les opérateurs affichaient à l'aide d'une table, une référence de courant en fonction du revête­ment à effectuer. Une mesure était effectuée par con­trôle destructif. On réajustait alors le courant. Cet­te mesure prenait entre quelques minutes et trois quarts d'heure et il fallait recommencer plusieurs fois ces opérations avant d'obtenir un résultat satis­faisant.The operators displayed using a table, a current reference according to the coating to be made. A measurement was made by destructive testing. The current was then readjusted. This measurement took between a few minutes and three quarters of an hour and it was necessary to repeat these operations several times before obtaining a satisfactory result.

Etant donnée l'inertie du système, sur des programmes courts, le réglage était souvent obtenu en fin d'opération. De plus, pour éviter des litiges, on visait dès le départ un taux plus élevé que le taux nominal. D'où un coût excessif de l'opération d'étama­ge.Given the inertia of the system, on short programs, the setting was often obtained at the end of the operation. In addition, to avoid litigation, we aimed at a rate higher than the nominal rate from the start. Hence the excessive cost of the tinning operation.

Plus récemment encore, une jauge de mesure en continu a été installée. Celle-ci permet de re­transcrire la mesure sous la forme d'un graphe par l'intermédiaire d'un écran. L'opérateur peut donc cor­riger immédiatement les erreurs.More recently, a continuous measurement gauge has been installed. This allows the measurement to be transcribed in the form of a graph via a screen. The operator can therefore immediately correct the errors.

Cette jauge fonctionne de la façon suivante.This gauge works as follows.

La mesure est basée sur le principe de la fluorescence X. La jauge utilise deux sources de cu­rium 244 d'une période radioactive de 17,6 ans. L'é­nergie libérée par la source provoque une émission de rayons fluorescents provenant du fer dont une partie est absorbée par l'étain. C'est en déterminant la quantité de rayonnement restante que l'on calcule l'étain déposé.The measurement is based on the principle of X-ray fluorescence. The gauge uses two sources of curium 244 with a radioactive period of 17.6 years. The energy released by the source causes an emission of fluorescent rays from iron, part of which is absorbed by tin. It is by determining the quantity of radiation remaining that the tin deposited is calculated.

Le traitement du signal est le suivant.
- Conversion du signal exponentiel envoyé par les cellules en un signal linéaire proportionnel au revêtement.
- Calcul de l'écart entre la mesure et le taux nominal visé.
- Correction possible de la valeur du signal de plus ou moins 5% selon le vieillissement des sour­ces par exemple.
- Enfin, un microcalculateur enregistre les signaux et les transmet à un écran cathodique situé sur la ligne d'étamage.
The signal processing is as follows.
- Conversion of the exponential signal sent by the cells into a linear signal proportional to the coating.
- Calculation of the difference between the measurement and the nominal rate targeted.
- Possible correction of the signal value of plus or minus 5% depending on the aging of the sources for example.
- Finally, a microcomputer records the signals and transmits them to a cathode-ray screen located on the tinning line.

La jauge effectue un balayage toutes les 30 secondes environ. Simultanément, apparaissent les pro­fils transversaux du revêtement, les valeurs moyennes mesurées instantanées et celles du dernier balayage, et le seuil minimal autorisé par les normes en vigueur pour les opérations d'étamage telles qu'EURONORM. A titre de comparaison, le dernier profil enregistré reste sur l'écran.The gauge scans approximately every 30 seconds. Simultaneously, the transverse profiles of the coating appear, the instantaneous average measured values and those of the last scan, and the minimum threshold authorized by the standards in force for tinning operations such as EURONORM. For comparison, the last saved profile remains on the screen.

Avec les techniques connues évoquées plus haut, on se trouve en présence du problème de la va­riation du taux d'étain à chaque transitoire de vites­se.With the known techniques mentioned above, we are faced with the problem of the variation of the tin rate at each speed transient.

L'invention vise donc à créer un procédé et un dispositif de régulation du dépôt électrolytique d'un revêtement métallique sur une bande de métal dé­filant en continu permettant de remédier à ces incon­vénients en prenant en compte les quantités de métal déposées par chaque pont et en adaptant les réglages sur la ligne de dépôt en fonction de ces quantités.The invention therefore aims to create a method and a device for regulating the electrolytic deposition of a metal coating on a continuously moving strip of metal enabling these drawbacks to be remedied by taking into account the quantities of metal deposited by each bridge and by adapting the settings on the deposit line according to these quantities.

Elle a donc pour objet un procédé de régu­lation de la quantité d'un métal déposée par voie électrolytique sur une bande à revêtir défilant en continue dans une installation de dépôt comportant plusieurs réservoirs remplis d'électrolyte, la bande passant sur un rouleau conducteur formant cathode associé à chaque réservoir et le métal de revêtement étant fourni par des barres dudit métal portées par des ponts conducteurs formant anodes disposés dans chaque réservoir sur une partie du trajet de la bande dans ledit réservoir, caractérisé en ce qu'il consiste à calculer à chaque déplacement de la bande entre deux ponts successifs, le dépôt de métal sur chaque pont en fonction de l'intensité du courant d'alimentation de ce pont, de la vitesse de la bande et du rendement du pont, à suivre séparément chaque longueur de bande égale à la distance entre deux ponts successifs en cu­mulant les dépôts de métal successifs, à établir le bilan du dépôt sous le dernier pont débitant du cou­rant afin de déterminer l'intensité nécessaire sous ce pont afin de compléter le dépôt de métal, à déterminer l'intensité globale nécessaire pour obtenir l'intensi­té désirée sous ce dernier pont, et à chaque acquisi­tion d'une mesure moyenne sur toute la largeur de la bande, à calculer en tenant compte de la distance de transfert, l'écart entre cette valeur moyenne et une valeur de consigne préétablie en déterminant un coef­ficient correcteur des rendements théoriques du dépôt de métal sous chaque pont.It therefore relates to a method of regulating the quantity of a metal deposited electrolytically on a strip to be coated continuously scrolling in a deposition installation comprising several reservoirs filled with electrolyte, the strip passing over a conductive roller forming cathode associated with each tank and the coating metal being supplied by bars of said metal carried by conductive bridges forming anodes arranged in each tank on a part of the path of the strip in said tank, characterized in that it consists in calculating at each movement of the strip between two successive bridges, the deposition of metal on each bridge in function of the intensity of the supply current of this bridge, of the speed of the strip and of the efficiency of the bridge, to follow separately each length of strip equal to the distance between two successive bridges by cumulating the successive metal deposits, to be established the balance sheet of the deposit under the last bridge delivering current in order to determine the intensity necessary under this bridge in order to complete the metal deposit, to determine the overall intensity necessary to obtain the desired intensity under this last bridge, and at each acquisition of an average measurement over the entire width of the strip, to be calculated taking into account the transfer distance, the difference between this average value and a preset preset value in determining nt a correction coefficient for the theoretical yields of the metal deposit under each bridge.

Suivant une caractéristique particulière de l'invention, le procédé défini ci-dessus comporte en outre les phases consistant à déterminer des courbes expérimentales du rendement en fonction de l'intensité du courant d'alimentation de chaque pont de l'instal­lation, à recueillir des indications relatives aux ponts en service ou hors service, à établir les va­leurs analogiques de l'intensité sur chaque pont et de l'intensité maximale du courant sur l'ensemble des ponts, à mesurer la vitesse de défilement de la bande, à établir, des valeurs de consigne relatives à la quantité de métal à déposer, à mesurer la quantité globale de métal déposée à l'aide d'une jauge à ba­ layage périodique, à déterminer les moyennes inférieu­re et supérieure de la quantité de métal mesurée par la jauge à chaque balayage et à établir à partir des données précitées un modèle de régulation.According to a particular characteristic of the invention, the process defined above also comprises the phases consisting in determining experimental curves of the yield as a function of the intensity of the supply current of each bridge of the installation, in collecting indications relating to bridges in service or out of service, to establish the analog values of the intensity on each bridge and of the maximum current intensity on all the bridges, to measure the speed of travel of the strip, to establish, set values relating to the quantity of metal to be deposited, to measure the overall quantity of metal deposited using a dipstick periodic lay-up, determining the lower and upper averages of the quantity of metal measured by the gauge on each scan and establishing from the above data a regulation model.

L'invention sera mieux comprise à l'aide de la description qui va suivre, donnée uniquement à titre d'exemple et faite en se référant aux dessins annexés, sur lesquels :
- la Fig.1 est une vue schématique en pers­pective avec arrachement partiel d'un bac d'étamage entrant dans la construction d'une installation d'é­tamage à laquelle est appliquée l'invention;
- la Fig.2 est une vue schématique de dessus du bac de la Fig.1;
- la Fig.3 est une vue schématique d'implan­tation des jauges de mesure du taux d'étain dans une installation à laquelle est appliquée l'invention;
- la Fig.4 est un schéma synoptique d'un circuit de traitement des données relatives au revête­ment appliqué à la tôle et d'élaboration des coeffi­cients de correction;
- la Fig.5 est un organigramme des opéra­tions d'acquisition des données relatives aux taux d'étain déposé;
- la Fig.6 est un organigramme de la boucle rapide de commande des opérations de calcul du dépôt d'étain sur chaque pont;
- la Fig.7 est un organigramme de commande du retour de jauge; et
- la Fig.8 est une ensemble de courbes de rendement des ponts de l'installation pour divers cou­rants d'alimentation.
The invention will be better understood with the aid of the description which follows, given solely by way of example and made with reference to the appended drawings, in which:
- Fig.1 is a schematic perspective view with partial cutaway of a tinning tank used in the construction of a tinning installation to which the invention is applied;
- Fig.2 is a schematic top view of the tray of Fig.1;
- Fig.3 is a schematic view of implantation of the tin level measurement gauges in an installation to which the invention is applied;
- Fig.4 is a block diagram of a circuit for processing the data relating to the coating applied to the sheet and for developing the correction coefficients;
- Fig.5 is a flowchart of data acquisition operations relating to the deposited tin rates;
- Fig.6 is a flow diagram of the fast loop for controlling the tin deposit calculation operations on each bridge;
- Fig.7 is a flowchart for controlling the return of the gauge; and
- Fig.8 is a set of yield curves of the installation bridges for various supply currents.

Sur la Fig.1, on a représenté un bac d'éta­mage entrant dans la construction d'une installation d'étamage à laquelle est appliquée l'invention.In Fig.1, there is shown a tinning tank used in the construction of an installation tinning to which the invention is applied.

Il convient toutefois de remarquer que l'in­vention s'applique également à des installation de dé­pôt électrolytique de revêtements de métaux autres que l'étain tels que le chrome, le cuivre ou autre.It should however be noted that the invention also applies to installations for the electrolytic deposition of coatings of metals other than tin such as chromium, copper or the like.

Le bac comprend un réservoir 1 contenant de l'électrolyte non représenté.The tank comprises a reservoir 1 containing electrolyte not shown.

Dans le fond du bac est monté à rotation un rouleau 2 sur lequel passe en continu une bande B à revêtir d'une couche d'étain. Le rouleau 2 est réalisé par exemple en caoutchouc. Au-dessus du réservoir 1 est disposé un second rouleau 3, par exemple chromé, en matière conductrice qui assure la tension de la bande et son transfert dans le réservoir 1 à partir d'un réservoir identique non représenté qui, avec d'autres réservoirs de même type, disposés en amont et en aval du réservoir 1, fait partie de l'installation d'étamage.In the bottom of the tank is rotatably mounted a roller 2 on which passes continuously a strip B to be coated with a layer of tin. The roller 2 is made for example of rubber. Above the reservoir 1 is disposed a second roller 3, for example chrome-plated, of conductive material which ensures the tension of the strip and its transfer into the reservoir 1 from an identical reservoir, not shown, which, with other reservoirs of the same type, arranged upstream and downstream of the tank 1, is part of the tinning installation.

Le rouleau 3 fait office de cathode associée au résevoir 1.The roller 3 acts as a cathode associated with the reservoir 1.

Un rouleau essoreur (non representé) plaque la bande B contre le rouleau 3 afin d'éviter la forma­tion d'arcs électriques.A wringing roller (not shown) presses the strip B against the roller 3 in order to avoid the formation of electric arcs.

La bande B passe dans le réservoir 1 entre deux paires de supports 4 et 5 (Fig.2) constitués par des barres de cuivre sur lesquelles sont disposées côte à côte des barres d'étain verticales 6 dont les pieds sont engagés dans un guide 7 en forme de U.The strip B passes into the tank 1 between two pairs of supports 4 and 5 (Fig. 2) constituted by copper bars on which are placed side by side vertical tin bars 6 whose feet are engaged in a guide 7 U-shaped.

Les barres de cuivre 4 et 5 forment des glissières pour les barres d'étain et sont connectées à une barre 7 correspondante d'amenée de courant.The copper bars 4 and 5 form slides for the tin bars and are connected to a corresponding bar 7 for supplying current.

La bande B défile donc dans deux passages formés par les barres d'étain 6 portées par leurs sup­ports correspondants 4 et 5, ménagés respectivement sur son trajet de descente et de montée dans le réser­voir 1 rempli d'électrolyte.The strip B therefore passes through two passages formed by the tin bars 6 carried by their corresponding supports 4 and 5, formed respectively on its descent and ascent path in the reservoir 1 filled with electrolyte.

Les supports ou ponts 4,5 et les barres d'é­tain 6 font office d'anode du dispositif.The supports or bridges 4,5 and the tin bars 6 act as the anode of the device.

Le bac ainsi constitué est porté par un bâti 10 qui supporte également les autres bacs de l'instal­lation (non représentés).The container thus formed is carried by a frame 10 which also supports the other containers of the installation (not shown).

Une garniture 11 en matière isolante est in­terposée entre le bâti et la connexion 12 des supports 4,5 à la barre 7 d'amenée de courant.A lining 11 made of insulating material is interposed between the frame and the connection 12 of the supports 4,5 to the bar 7 for supplying current.

En aval du denier bac de l'installation est installée, une jauge formée de deux cellules disposées de la façon représentée à la Fig.3.Downstream of the last tank of the installation is installed, a gauge formed by two cells arranged as shown in Fig.3.

A la sortie de l'installation, la bande B sur les deux faces de laquelle vient d'être déposé un revêtement d'étain passe sur un rouleau déflecteur 15 en regard duquel est disposée une première cellule 16 destinée à mesurer le revêtement d'étain d'une pre­mière face de la boucle B. La cellule 16 comporte une source 17 de curium 244 placée sur un support 18 monté oscillant sur un socle 19 et déplaçable autour de son axe d'oscillation 20 par un vérin pneumatique 21.At the exit of the installation, the strip B on the two faces of which a coating of tin has just been deposited passes over a deflector roller 15 opposite which is disposed a first cell 16 intended to measure the coating of tin of a first face of the loop B. The cell 16 comprises a source 17 of curium 244 placed on a support 18 mounted oscillating on a base 19 and movable around its axis of oscillation 20 by a pneumatic cylinder 21.

La bande B passe ensuite sur un second rou­leau déflecteur 22 en regard duquel est disposée une seconde cellule 23 analogue à la cellule 16 et desti­née à mesurer le revêtement d'étain de la face opposée de la bande B.The strip B then passes over a second deflector roller 22 opposite which is disposed a second cell 23 similar to the cell 16 and intended to measure the coating of tin on the opposite face of the strip B.

Cette cellule comporte elle aussi une source 24 de curium 244 placée sur un support 25 monté oscil­lant sur un socle 26 et actionné par un vérin pneuma­tique 27.This cell also includes a source 24 of curium 244 placed on a support 25 mounted oscillating on a base 26 and actuated by a pneumatic cylinder 27.

Les sorties (non représentées des deux cel­lules 16 et 23 de la jauge sont connectées à des en­trées correspondantes du circuit de traitement de la Fig.4 qui va maintenant être décrit.The outputs (not shown from the two cells 16 and 23 of the gauge are connected to corresponding inputs of the processing circuit of the Fig.4 which will now be described.

Ce circuit comprend un convertisseur analo­gique-numérique et numérique-analogique 30, par exem­ple du type ADAC 735 qui comporte, pour une installa­tion à douze bacs d'étamage quarante huit entrées ana­logiques 31 relatives aux intensités des courants ap­pliqués aux supports de tous les bacs, tels que les ponts 4,5 du bac des Fig.1 et 2.This circuit includes an analog-digital and digital-analog converter 30, for example of the ADAC 735 type which comprises, for an installation with twelve tinning tanks forty eight analog inputs 31 relating to the intensities of the currents applied to the supports of all the tanks, such as the bridges 4,5 of the tank in Fig. 1 and 2.

Le convertisseur 30 comporte en outre deux entrées analogiques 32 destinées à recevoir des in­formations de position des cellules 16,23 des jauges et deux entrées analogiques 33 destinées à recevoir des informations relatives aux valeurs moyennes des dépôts d'étain sur les deux faces de la bande.The converter 30 also comprises two analog inputs 32 intended to receive information on the position of the cells 16, 23 from the gauges and two analog inputs 33 intended to receive information relating to the average values of the deposits of tin on the two faces of the strip. .

Le convertisseur 30 comporte de plus une entrée analogique 34 destinée à recevoir des signaux concernant la largeur de la bande B traitée, deux entrées analogiques 35 concernant les intensités ma­ximales inférieure et supérieure et deux sorties ana­logiques relatives à l'intensité globale inférieure et supérieure à répartir sur les ponts de l'installation.The converter 30 further comprises an analog input 34 intended to receive signals relating to the width of the band B processed, two analog inputs 35 relating to the maximum upper and lower intensities and two analog outputs relating to the overall lower and upper intensity to be distributed on the bridges of the installation.

Le convertisseur 30 est connectée à un bus à conducteurs multiples 36.The converter 30 is connected to a multi-conductor bus 36.

Le circuit de la Fig.4 comporte en outre un compteur 37 dont l'entrée est connectée à la sortie d'un générateur d'impulsions de défilement de la ban­de B (non représenté) et qui est également connecté au bus 36, un circuit d'interface 38 du type SBC 519 fa­briqué et vendu par Intel, à trente deux entrées numé­riques 39 relatives aux valeurs de consigne inférieure et supérieure du taux d'étain à obtenir, trente deux entrées numériques 40 relatives aux valeurs de consi­gne commerciales, une entrée 41 de validation du fonc­tionnement automatique/manuel et une entrée 42 de validation de consigne. Le circuit 38 est également connecté au bus 36.The circuit of Fig.4 further includes a counter 37 whose input is connected to the output of a band B pulse generator (not shown) and which is also connected to bus 36, a circuit interface 38 of the SBC 519 type manufactured and sold by Intel, with thirty two digital inputs 39 relating to the lower and upper set values of the tin rate to be obtained, thirty two digital inputs 40 relating to the commercial set values, one input 41 for validation of automatic / manual operation and an input 42 of setpoint validation. Circuit 38 is also connected to bus 36.

Enfin, le circuit de la Fig.4 comporte un microprocesseur 43 du type Intel 8088 par exemple, connecté au bus 36 et destiné à commander les modifi­cations du taux d'étain à déposer dans les divers bacs de l'installation en fonction des informations qu'il reçoit.Finally, the circuit in Fig. 4 includes a microprocessor 43 of the Intel 8088 type for example, connected to bus 36 and intended to control changes in the level of tin to be deposited in the various tanks of the installation as a function of the information qu 'he receives.

Le fonctionnement de l'installation va main­tenant être décrit en référence à la Fig.4 et aux organigrammes des Fig.5 à 7.The operation of the installation will now be described with reference to Fig. 4 and to the flowcharts in Figs. 5 to 7.

Une première phase de fonctionnement de l'installation est la phase d'acquisition des infor­mations relatives à l'opération en cours.A first phase of operation of the installation is the phase of acquiring information relating to the operation in progress.

Le convertisseur 30 reçoit sur ses quarante huit entrées des mesures des intensités sur les ponts 4,5 des douze bacs de l'installation.The converter 30 receives on its forty-eight inputs measurements of the intensities on the bridges 4.5 of the twelve tanks of the installation.

Au cours de la phase 50 de l'organigramme de la Fig.5, le convertisseur 30 procède à la lecture des courants sur chacun des ponts. Ces informations d'in­tensité sont transmises au microprocesseur 43 qui, au cours de la phase 51, calcule les valeurs des dépôts d'étain sous chaque pont, compte tenu de l'information de vitesse de défilement de la bande qui lui est four­nie par le compteur 37, du rendement de chaque pont et de la position de la jauge matérialisant la largeur de la bande, ces deux informations étant délivrées par le convertisseur 30.During phase 50 of the flow diagram of FIG. 5, the converter 30 reads the currents on each of the bridges. This intensity information is transmitted to the microprocessor 43 which, during phase 51, calculates the values of the tin deposits under each bridge, taking into account the information on the speed of travel of the strip which is supplied to it by the counter 37, of the efficiency of each bridge and of the position of the gauge materializing the width of the strip, these two pieces of information being delivered by the converter 30.

Au cours de la phase 52, le microprocesseur 43 procède au cumul des informations relatives au dé­pôt en cours avec le dépôt précédent.During phase 52, the microprocessor 43 cumulates information relating to the deposit in progress with the previous deposit.

Ensuite, comme représenté sur l'organigramme de la Fig.6, il y a détermination du dernier pont dé­posant de l'étain. Cette opération est réalisée au cours de la phase 53 de l'organigramme de "boucle ra­pide" de la Fig.6.Then, as shown in the flow diagram of Fig. 6, there is determination of the last bridge depositing the tin. This operation is carried out at during phase 53 of the "fast loop" flowchart in Fig.6.

L'information relative au dernier pont dépo­sant de l'étain au cours d'un balayage de la jauge est reçue sur les entrées analogiques 31 du convertisseur 30.The information relating to the last bridge depositing tin during a sweep of the gauge is received on the analog inputs 31 of the converter 30.

Au cours de la phase 54, il y a calcul de la quantité d'étain à déposer par le dernier pont à par­tir des informations de consignes de taux d'étain, in­férieur et supérieur à obtenir introduites par l'opé­rateur sur les entrées 39 du circuit d'interface 38. Ensuite, au cours de la phase 55, le microprocesseur 43 calcule l'intensité approximative nécessaire en fonction de l'information de la quantité d'étain à déposer par le dernier pont et des informations de largeur de bande, de la valeur du revêtement mesurée par la jauge et de la vitesse de défilement de la bande, qu'il reçoit par le bus 36, en provenance du convertisseur 30 et du compteur 37.During phase 54, the quantity of tin to be deposited by the last bridge is calculated from the information on set point rates, lower and higher to be obtained, entered by the operator on the inputs 39 of the interface circuit 38. Then, during phase 55, the microprocessor 43 calculates the approximate intensity necessary as a function of the information on the quantity of tin to be deposited by the last bridge and the information on bandwidth, the value of the coating measured by the gauge and the speed of travel of the strip it receives by the bus 36, coming from the converter 30 and the counter 37.

Au cours de la phase 56, le microprocesseur 43 calcule le rendement du pont à partir de l'inten­sité calculée au cours de la phase 55 et ceci à partir de courbes pré-établies représentées à la Fig.8.During phase 56, the microprocessor 43 calculates the efficiency of the bridge from the intensity calculated during phase 55 and this from pre-established curves shown in FIG. 8.

Puis, au cours de la phase 57, le micropro­cesseur calcule l'intensité nécessaire correspondant au rendement déterminé au cours de la phase 56, en te­nant compte de la valeur du revêtement mesuré par la jauge et de la vitesse de défilement de la bande.Then, during phase 57, the microprocessor calculates the necessary intensity corresponding to the yield determined during phase 56, taking into account the value of the coating measured by the gauge and the speed of travel of the strip.

Au cours de la phase 58, il y a interroga­tion au sujet de l'écart entre l'intensité nécessaire et l'intensité réellement appliquée au dernier pont.During phase 58, there is a question about the difference between the intensity required and the intensity actually applied to the last bridge.

Si l'écart est faible, il y a envoi au cours de la phase 59 de signaux correspondant à l'intensité globale calculée qui apparaissent sur les sorties ana­ logiques 36 du convertisseur 30, cette intensité étant à répartir sur les divers ponts de l'installation.If the difference is small, there is a sending during phase 59 of signals corresponding to the calculated overall intensity which appear on the ana outputs. logic 36 of converter 30, this intensity being distributed over the various bridges of the installation.

Enfin, au cours de la phase 60, on provoque l'avance de la bande d'un pas.Finally, during phase 60, the strip is brought forward by one step.

Si la réponse à l'interrogation de la phase 58 est non, on répète les calculs des phases 56 et 57 sur les données relatives au dépôt d'étain par un pont situé en aval jusqu'à ce que l'écart d'intensité soit faible.If the answer to the interrogation of phase 58 is no, the calculations of phases 56 and 57 are repeated on the data relating to the deposit of tin by a bridge located downstream until the difference in intensity is low.

L'organigramme de la Fig.7 est un organi­gramme de " boucle lente " qui commande les correc­tions de dérive.The flowchart in Fig.7 is a "slow loop" flowchart which controls drift corrections.

L'acquisition d'une mesure faite au cours de la phase 61 est la lecture de la valeur moyenne de dépôt d'étain faite par le convertisseur 30 de la Fig.4 à chaque fin de balayage de la jauge de la Fig. 3.The acquisition of a measurement made during phase 61 is the reading of the average tin deposit value made by the converter 30 of FIG. 4 at each end of scanning of the gauge of FIG. 3.

Cette phase est suivie d'une phase 62 d'in­terrogation relative au passage de l'installation en automatique.This phase is followed by an interrogation phase 62 relating to the transition from installation to automatic.

Si la réponse est non, on passe à une phase d'interrogation 63 relative au démarrage de la ligne.If the answer is no, we pass to an interrogation phase 63 relating to the start of the line.

Si la réponse à cette nouvelle interrogation est non, on procéde à une troisième interrogation au cours de la phase 64 en ce qui concerne le changement de taux d'étain.If the answer to this new interrogation is no, a third interrogation is carried out during phase 64 with regard to the change in tin rate.

En cas de réponse négative, le microproces­seur 43 procède au cours de la phase 65, au calcul d'un rendement de jauge, c'est à dire du rapport entre le dépôt d'étain mesuré par la jauge et le dépôt à ob­tenir.In the event of a negative response, the microprocessor 43 proceeds during phase 65, to the calculation of a gauge yield, that is to say of the ratio between the deposit of tin measured by the gauge and the deposit to be obtained.

Si les réponses aux trois interrogations précédentes sont oui, on laisse passer un balayage de la jauge et on procède à de nouvelles interrogations.If the answers to the three preceding interrogations are yes, one lets pass a sweep of the gauge and one proceeds to new interrogations.

Pendant ce temps, le réponse affirmative à l'interrogation relative au passage en automatique provoque la validation du fonctionnement automatique.During this time, the affirmative answer to the interrogation relating to the passage to automatic causes the validation of the automatic operation.

La réponse affirmative à l'interrogation re­lative au démarrage de ligne commande le générateur d'impuslions (non représenté) qui est associé au comp­teur 37 de la Fig.4.The affirmative response to the query relating to line starting controls the pulse generator (not shown) which is associated with the counter 37 in FIG. 4.

La réponse affirmative à l'interrogation de la phase 64 provoque la validation de la consigne par l'intermédiaire du circuit d'interface 38.The affirmative response to the interrogation of phase 64 causes the setpoint to be validated via the interface circuit 38.

Le procédé qui vient d'être décrit présente vis à vis des procédés connus les avantages suivants.The process which has just been described has the following advantages over known processes.

Il permet de prendre en compte tous les transitoires tels que la variation de la vitesse de défilement de la bande, les arrêts ou les mises en service des ponts.It makes it possible to take into account all the transients such as the variation of the speed of travel of the strip, the stops or the putting into service of the bridges.

Il tient compte du rendement de l'électroly­se sous chaque pont, ce qui permet d'avoir une grande précision dans l'obtention directe du bon étamage à chaque changement de consigne.It takes into account the efficiency of the electrolysis under each bridge, which allows great precision in the direct obtaining of good tinning at each set point change.

Ceci est particulièrement important dans le cas de revêtements minces ou lorsque l'intensité maxi­male des ponts est faible, car on a alors des rende­ments pouvant être très bas sur les premiers ponts.This is particularly important in the case of thin coatings or when the maximum intensity of the bridges is low, since there are then yields which can be very low on the first bridges.

Les corrections de courants sont également faibles en valeurs absolues et les interventions de l'opérateur sont plus précises.Current corrections are also small in absolute values and operator intervention is more precise.

Il permet enfin d'obtenir un faible écart entre le dépôt d'étain obtenu et la valeur de consi­gne.Finally, it makes it possible to obtain a small difference between the tin deposit obtained and the set value.

On donne ci-après à titre d'exemple le déroulement des opérations de régulation du dépôt d'é­tain dans une installation d'étamage à douze bacs et vingt quatre ponts.An example is given below of the sequence of operations for regulating the deposit of tin in a tinning installation with twelve tanks and twenty four bridges.

A) Entrée des donnéesA) Data entry

- Vitesse de la ligne
- Largeur de la bande
- Taux d'étain visé
- Courant débité par pont
- Line speed
- Band width
- Targeted tin rate
- Current charged by bridge

B) Calcul du nombre de ponts théroriquesB) Calculation of the number of theoretical bridges

Il faut tout d'abord savoir qu'à chaque fois que l'on boucle le programme, la bande a parcouru en­viron 4 mètres. Ceci correspond à un pas de programme et à la distance séparant le pont N du pont N + 1.First of all, you should know that each time the program is finished, the tape has traveled approximately 4 meters. This corresponds to a program step and to the distance separating the N bridge from the N + 1 bridge.

Lors du premier pas N = 1 et à chaque pas on ajoutera 1 à N. On demandera donc à chaque pas de met­tre un pont supplémentaire en aval, à l'intensité ma­ximum possible.During the first step N = 1 and at each step we will add 1 to N. We will therefore ask each step to put an additional bridge downstream, at the maximum possible intensity.

C) Calcul de l'étain déposé par pontC) Calculation of the tin deposited by bridge

A chaque pas, on calculera le taux d'étain théorique déposé sous chaque pont.At each step, the theoretical tin rate deposited under each bridge will be calculated.

Exemple de configurationConfiguration example

Figure imgb0004
Figure imgb0004

Afin de simplifier l'exemple, on prendra ici pour principe qu'un pont dépose théoriquement 0,5 g/m² d'étain sur le métal.In order to simplify the example, it will be assumed here that a bridge theoretically deposits 0.5 g / m² of tin on the metal.

D) Test sur le taux obtenu sous le dernier pontD) Test on the rate obtained under the last bridge

Une fois le calcul de l'étain déposé effec­tué, on regardera le taux obtenu sous le dernier pont mis à l'intensité maximale. Deux cas de traitement possible suivant que le taux est supérieur ou infé­rieur à ce qui l'on vise. Dans les applications numé­riques cette intensité maximale est prise à 4500 Ampè­res.Once the calculation of the deposited tin has been carried out, we will look at the rate obtained under the last bridge set to maximum intensity. Two cases of possible treatment depending on whether the rate is higher or lower than what is targeted. In digital applications this maximum intensity is taken at 4500 Amps.

E) Régulation pour taux supérieur au taux visé sinon rajoût d'un pont.E) Regulation for a rate higher than the target rate, if not a bridge upgrade.

Dans le premier cas, on calculera un courant (IC) de régulation que l'on appliquera sur le dernier pont.In the first case, a regulation current (IC) will be calculated which will be applied to the last bridge.

En reprenant l'exemple précédent et en sup­posant que le taux visé (TV) est de l,8 g/m², on s'a­percevra lors du pas 4 que le taux calculé (TC = 2 g/m²) est supérieur au taux visé TV. On calculera alors la correction C.
C = TC - TV
Using the previous example and assuming that the target rate (TV) is 1.8 g / m², it will be seen in step 4 that the calculated rate (TC = 2 g / m²) is higher than the target rate TV. We will then calculate the correction C.
C = TC - TV

On en déduira le courant IC nécessaire sur le pont 4 pour obtenir 1,8 g/m².We will deduct the IC current required on deck 4 to obtain 1.8 g / m².

Dans le deuxième cas, on ajoutera des ponts supplémentaires pour arriver au premier cas.In the second case, we will add additional bridges to arrive at the first case.

F) Edition des résultatsF) Editing of results

Quand les calculs sont terminés, on envoie le courant demandé.When the calculations are finished, we send the requested current.

Suite de l'exemple précédent (TV = 1,8 g/m²)

Figure imgb0005
Continuation of the previous example (TV = 1.8 g / m²)
Figure imgb0005

G) Changement de pasG) Change of pitch

Une fois le courant envoyé, on passe au pas suivant :
P + 1
Once the current is sent, we go to the next step:
P + 1

H) Nouvelles donnéesH) New data

On prend en compte les nouvelles données.We take into account the new data.

I) Mesure jauge d'étainI) Tin gauge measurement

C'est alors qu'intervient la mesure du taux réellement déposé (MJ).Then comes the measurement of the rate actually deposited (MJ).

Celui-ci permettra de déterminer le nouveau Rendement Jauge (RJ) qui interviendra dans les calculs au pas suivant.
RJ - 3/4 (1 - (MJ/TV) )
This will determine the new Yield Gauge (RJ) which will be used in the calculations at the next step.
RJ - 3/4 (1 - (MJ / TV))

(Le coefficient 3/4 est là pour amortir la correction du rendement).(The coefficient 3/4 is there to cushion the correction of the yield).

La mesure réelle du taux déposé n'intervient pas à chaque pas mais a chaque balayage de la jauge.The actual measurement of the deposited rate does not take place at each step but at each sweep of the gauge.

Claims (5)

1. Procédé de régulation de la quantité d'un métal déposée par voie électrolytique sur une bande à revêtir défilant en continu dans une installation de dépôt comportant plusieurs réservoirs (1) remplis d'électrolyte, la bande (B) passant sur un rouleau conducteur (3) formant cathode associé à chaque réser­voir et le métal de revêtement étant fourni par des barres (6) dudit métal portées par des ponts conduc­teurs (4,5) formant anodes disposés dans chaque réser­voir sur une partie du trajet de la bande dans ledit réservoir, caractérisé en ce qu'il consiste à calculer (51) à chaque déplacement de la bande entre deux ponts successifs, le dépôt de métal sur chaque pont en fonc­tion de l'intensité du courant d'alimentation de ce pont, de la vitesse de la bande et du rendement du pont, à suivre séparément chaque longueur de bande (B) égale à la distance entre deux ponts successifs, en cumulant les dépôts de métal successifs (52), à éta­blir le bilan du dépôt sous le dernier pont débitant du courant (53) afin de déterminer l'intensité néces­saire (55) sous ce pont afin de compléter le dépôt de métal, à déterminer l'intensité globale nécessaire pour obtenir l'intensité désirée sous ce dernier pont (57), et à chaque acquisition (61) d'une mesure moyenne sur toute la largeur de la bande, à calculer (65) en tenant compte de la distance de transfert, l'écart entre cette valeur moyenne et une valeur de consigne préétablie en déterminant un coefficient correcteur des rendements théoriques du dépôt de métal sous chaque pont.1. Method for regulating the quantity of a metal deposited electrolytically on a strip to be coated continuously passing through a deposition installation comprising several reservoirs (1) filled with electrolyte, the strip (B) passing over a conductive roller (3) forming a cathode associated with each reservoir and the coating metal being supplied by bars (6) of said metal carried by conductive bridges (4,5) forming anodes disposed in each reservoir on part of the path of the strip in said tank, characterized in that it consists in calculating (51) at each movement of the strip between two successive bridges, the metal deposition on each bridge as a function of the intensity of the supply current of this bridge, of the speed of the strip and the yield of the bridge, to follow separately each length of strip (B) equal to the distance between two successive bridges, by cumulating the successive metal deposits (52), to establish the balance sheet of the deposit under the last flow bridge of current (53) in order to determine the necessary intensity (55) under this bridge in order to complete the metal deposition, to determine the overall intensity necessary to obtain the desired intensity under this last bridge (57), and at each acquisition (61) of an average measurement over the entire width of the strip, to be calculated (65) taking into account the transfer distance, the difference between this average value and a preset preset value by determining a coefficient correcting the yields theory of metal deposition under each bridge. 2. Procédé suivant la revendication 1, ca­ractérisé en ce qu'il comporte en outre les phases consistant à déterminer des courbes expérimentales du rendement en fonction de l'intensité du courant d'a­limentation de chaque pont de l'installation, à re­cueillir (32) des indications relatives aux ponts en service ou hors service, à établir les valeurs ana­logiques de l'intensité sur chaque pont et de l'in­tensité maximale du courant sur l'ensemble des ponts, à mesurer la vitesse de défilement de la bande (37), à établir, des valeurs de consigne (39) relatives à la quantité de métal à déposer, à mesurer la quantité globale de métal déposée à l'aide d'une jauge (16, 23) à balayage périodique, à déterminer les moyennes infé­rieure et supérieure de la quantité de métal mesurée par la jauge (16,23) à chaque balayage et à établir à partir des données précitées un modèle de régulation.2. Method according to claim 1, characterized in that it also comprises the phases consisting in determining experimental curves of the efficiency as a function of the intensity of the supply current of each bridge in the installation, to collect (32) indications relating to bridges in service or out of service, to establish the analogical values of the intensity on each bridge and the maximum current intensity on all the bridges, to measure the running speed of the strip (37), to establish, set values (39) relating to the quantity of metal to be deposited, to measure the overall quantity of metal deposited using a gauge (16, 23) with periodic scanning, determining the lower and upper averages of the quantity of metal measured by the gauge (16,23) at each scanning and establishing from above data a regulatory model. 3. Procédé suivant l'une quelconque des re­vendications 1 et 2, charactérisé en ce que le métal dont on contrôle le dépôt électrolytique est de l'é­tain, du chrome ou du cuivre.3. Method according to any one of claims 1 and 2, characterized in that the metal whose electrolytic deposition is controlled is tin, chromium or copper. 4. Procédé suivant l'une quelconque des revendications 1 à 3, caractérisé en ce que le dépôt électrolytique du revêtement de la bande ayant lieu sur les deux faces de celle-ci, la régulation du dépôt est assurée à partir de données délivrées par une jau­ge formée de deux cellules (16,23) disposées chacune d'un côté de la bande (B) à la sortie de l'installa­tion de dépôt électrolytique.4. Method according to any one of claims 1 to 3, characterized in that the electroplating of the coating of the strip taking place on both sides of the latter, the regulation of the deposition is ensured from data delivered by a gauge formed by two cells (16,23) each arranged on one side of the strip (B) at the outlet of the electrolytic deposition installation. 5. Dispositif destiné à la mise en oeuvre du procédé suivant l'une quelconque des revendications précédentes, caractérisé en ce qu'il comporte un con­vertisseur analogique-numérique, numérique-analogique (30) destiné à recevoir des données analogiques rela­tives à l'intensité des courants d'alimentation des ponts de l'installation, à la valeur du dépôt de mé­tal mesuré par la jauge (16,23), à la position de cel­ le-ci et à la largeur de la bande (B) à revêtir ainsi qu'aux intensités maximales inférieure et supérieure des courants d'alimentation des ponts et à transmettre ces données sous forme numérique à un microprocesseur (43) auquel est également relié un compteur (37) de la vitesse de défilement de la bande (B) dans l'installa­tion ainsi qu'un circuit d'interface (38) de transmis­sion audit micro-processeur de données (39) relatives aux consignes de taux de métal inférieur et supérieur à obtenir, à la validation de fonctionnement automati­que-manuel (41) et à la validation des consignes (42), ledit convertisseur (30) comprenant de plus des sor­ties analogiques destinées à la transmission, à l'ins­tallation d'instructions relatives à l'intensité des courants d'alimentation à appliquer aux ponts de l'installation élaborées par le microprocesseur (43) en fonction des données reçues.5. Device for implementing the method according to any one of the preceding claims, characterized in that it comprises an analog-digital, digital-analog converter (30) intended to receive analog data relating to the intensity supply currents to the bridges of the installation, at the value of the metal deposit measured by the gauge (16,23), at the position of this the latter and to the width of the strip (B) to be coated as well as to the maximum lower and upper intensities of the supply currents of the bridges and to transmit this data in digital form to a microprocessor (43) to which is also connected a counter (37) for the speed of travel of the strip (B) in the installation as well as an interface circuit (38) for transmitting to said microprocessor data (39) relating to the instructions for lower metal content and greater than obtaining, on the validation of automatic-manual operation (41) and on the validation of the setpoints (42), said converter (30) further comprising analog outputs intended for transmission, for the installation of instructions relating to the intensity of the supply currents to be applied to the bridges of the installation produced by the microprocessor (43) as a function of the data received.
EP86402522A 1985-11-19 1986-11-13 Process and apparatus for controlling the amount of metal electrolytically deposited on a continuously moving strip Expired - Lifetime EP0227517B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT86402522T ATE52546T1 (en) 1985-11-19 1986-11-13 METHOD AND DEVICE FOR CONTROL OF METAL DEPOSITION BY ELECTROLYTIC WAY ON A CONTINUOUSLY RUNNING BELT.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8517095 1985-11-19
FR8517095A FR2590278B1 (en) 1985-11-19 1985-11-19 METHOD AND DEVICE FOR CONTROLLING THE QUANTITY OF A METAL ELECTROLYTICALLY DEPOSITED ON A CONTINUOUSLY TRAVELING STRIP

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EP0227517A1 true EP0227517A1 (en) 1987-07-01
EP0227517B1 EP0227517B1 (en) 1990-05-09

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EP86402522A Expired - Lifetime EP0227517B1 (en) 1985-11-19 1986-11-13 Process and apparatus for controlling the amount of metal electrolytically deposited on a continuously moving strip

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US (1) US4699694A (en)
EP (1) EP0227517B1 (en)
JP (1) JPH0765238B2 (en)
AT (1) ATE52546T1 (en)
CA (1) CA1308686C (en)
DE (1) DE3671045D1 (en)
ES (1) ES2016270B3 (en)
FR (1) FR2590278B1 (en)
GR (1) GR3000694T3 (en)

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AT516722A4 (en) * 2015-07-27 2016-08-15 Berndorf Band Gmbh Method and device for producing a metal strip of uniform thickness

Families Citing this family (6)

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Publication number Priority date Publication date Assignee Title
FR2704241B1 (en) * 1993-04-22 1995-06-30 Lorraine Laminage METHOD FOR REGULATING ELECTRO-DEPOSITION ON A METAL STRIP.
US5668570A (en) * 1993-06-29 1997-09-16 Ditzik; Richard J. Desktop computer with adjustable flat panel screen
US5914022A (en) * 1996-01-05 1999-06-22 Lowry; Patrick Ross Method and apparatus for monitoring and controlling electrodeposition of paint
US6019886A (en) * 1996-09-17 2000-02-01 Texas Instruments Incorporated Comparator for monitoring the deposition of an electrically conductive material on a leadframe to warn of improper operation of a leadframe electroplating process
US6187153B1 (en) * 1997-09-16 2001-02-13 Texas Instruments Incorporated Comparator for monitoring the deposition of an electrically conductive material on a leadframe to warn of improper operation of a leadframe electroplating process
JP5884169B2 (en) * 2012-03-01 2016-03-15 Jfeスチール株式会社 Automatic monitoring system and method for self-fluxing electrode consumption in electroplated steel sheet production line

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GB688189A (en) * 1950-12-13 1953-02-25 United States Steel Corp Electrical measuring instrument
DE2347759A1 (en) * 1973-09-22 1975-04-24 Oelsch Fernsteuergeraete Electrolytic plating thickness measurement - by electrode array current density adjusted to that in bath comparing layer thickness
US4240881A (en) * 1979-02-02 1980-12-23 Republic Steel Corporation Electroplating current control

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JPH0233800B2 (en) * 1983-08-23 1990-07-30 Nippon Steel Corp RENZOKUDENKIMETSUKINIOKERUMETSUKIDENRYUSEIGYOHOHO

Patent Citations (3)

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Publication number Priority date Publication date Assignee Title
GB688189A (en) * 1950-12-13 1953-02-25 United States Steel Corp Electrical measuring instrument
DE2347759A1 (en) * 1973-09-22 1975-04-24 Oelsch Fernsteuergeraete Electrolytic plating thickness measurement - by electrode array current density adjusted to that in bath comparing layer thickness
US4240881A (en) * 1979-02-02 1980-12-23 Republic Steel Corporation Electroplating current control

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT516722A4 (en) * 2015-07-27 2016-08-15 Berndorf Band Gmbh Method and device for producing a metal strip of uniform thickness
AT516722B1 (en) * 2015-07-27 2016-08-15 Berndorf Band Gmbh Method and device for producing a metal strip of uniform thickness

Also Published As

Publication number Publication date
EP0227517B1 (en) 1990-05-09
ATE52546T1 (en) 1990-05-15
US4699694A (en) 1987-10-13
FR2590278B1 (en) 1988-02-05
DE3671045D1 (en) 1990-06-13
ES2016270B3 (en) 1990-11-01
CA1308686C (en) 1992-10-13
FR2590278A1 (en) 1987-05-22
JPS62260099A (en) 1987-11-12
GR3000694T3 (en) 1991-09-27
JPH0765238B2 (en) 1995-07-12

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