EP0155584A1 - Méthode de traitement d'interrupteur sous vide et interrupteur sous vide traité selon la méthode - Google Patents

Méthode de traitement d'interrupteur sous vide et interrupteur sous vide traité selon la méthode Download PDF

Info

Publication number
EP0155584A1
EP0155584A1 EP85102407A EP85102407A EP0155584A1 EP 0155584 A1 EP0155584 A1 EP 0155584A1 EP 85102407 A EP85102407 A EP 85102407A EP 85102407 A EP85102407 A EP 85102407A EP 0155584 A1 EP0155584 A1 EP 0155584A1
Authority
EP
European Patent Office
Prior art keywords
contact piece
electrode
vacuum switch
electrodes
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP85102407A
Other languages
German (de)
English (en)
Other versions
EP0155584B1 (fr
EP0155584B2 (fr
Inventor
Koichi Yasuoka
Tohru Green Heights Tamagawa
Eiji 109 Nikku Haimu Hodogaya No Kaneko
Mitsutaka Homma
Satoru Yanabu
Takumi Tsurukame-So Funahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=12655837&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP0155584(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Toshiba Corp filed Critical Toshiba Corp
Publication of EP0155584A1 publication Critical patent/EP0155584A1/fr
Publication of EP0155584B1 publication Critical patent/EP0155584B1/fr
Application granted granted Critical
Publication of EP0155584B2 publication Critical patent/EP0155584B2/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H33/00—High-tension or heavy-current switches with arc-extinguishing or arc-preventing means
    • H01H33/60—Switches wherein the means for extinguishing or preventing the arc do not include separate means for obtaining or increasing flow of arc-extinguishing fluid
    • H01H33/66—Vacuum switches
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00—Contacts
    • H01H1/02—Contacts characterised by the material thereof
    • H01H1/0203—Contacts characterised by the material thereof specially adapted for vacuum switches
    • H01H1/0206—Contacts characterised by the material thereof specially adapted for vacuum switches containing as major components Cu and Cr
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00—Contacts
    • H01H1/02—Contacts characterised by the material thereof
    • H01H1/0203—Contacts characterised by the material thereof specially adapted for vacuum switches
    • H01H2001/0205—Conditioning of the contact material through arcing during manufacturing, e.g. vacuum-depositing of layer on contact surface

Definitions

  • This invention relates to a method for process- in g a vacuum switch utilizing an axial magnetic field in which a contact piece made of a copper-chromium alloy is specifically processed to improve the surface condition thereof.
  • This invention also relates to a vacuum switch made in accordance with the method of this invention.
  • FIG. 1 illustrates a typical construction of the conventional vacuum switch.
  • a vacuum vessel 1 made of a substantially tubular insulating material has two ends closed by flanges 2 and 3.
  • a stationary electrode S and a movable electrode M are provided in the vessel 1 opposingly, and supported by current carrying rods 4 and 5 that penetrate the flanges 2 and 3 in an air-tight manner.
  • the stationary electrode S comprises a main electrode 6 and a coil electrode 7, while the movable electrode M comprises a main electrode 8 and a coil electrode 9.
  • the electrodes 6, 7, 8 and 9 are basically made of copper.
  • the current carrying rod 5 supporting the movable electrode M is driven in its axial direction by a driving device, not shown.
  • Bellows 10 is provided for ensuring an air-tight condition during the movement of the rod 5 through the flange 3.
  • the coil electrodes 7 and 9 produce an axial magnetic field in parallel with the arc created between the main electrodes 6 and 8 at the time of current interruption.
  • a shield 12 is further provided in the vacuum vessel 1 for preventing deposition of metal vapor created during current interruption on the internal surface of the vessel 1, and further preventing deterioration of the insulation and ultimate damage of the vessel 1.
  • FIG. 2 illustrates the movable electrode M having the main electrode 8 comprising an electrode 14 and a contact piece 13 secured to the upper surface of the electrode 14.
  • various copper alloys are used for producing the contact piece 13.
  • radial slits 15 are formed along the upper surface of the contact piece 13, as viewed in FIG. 2, so as to improve efficiency of the magnetic field.
  • the coil electrode 9 has a portion formed into a coil which extends circumferentially in a plane perpendicular to the central axis of the current carrying rod 5 for generating the axial magnetic field.
  • the contact piece 13 made of a copper alloy tends to absorb impurities such as oxygen and hydrogen more than the remaining portions of the electrode M made of copper. Since the impurities tend to react with the copper alloy to form compounds, the impurities cannot be removed easy.
  • various methods have been proposed for removing the impurities, methods utilizing glow discharge which is caused by applying a voltage across the electrodes, or utilizing arc which is produced by flowing an electric current through the electrodes are widely used.
  • either of the methods requires a considerable length of time which is varied in accordance with the amount of the surface area of the contact piece.
  • the impurities contained in the slits 15 and nearby area could not be removed satisfactorily even by the application of the above described methods.
  • An object of this invention is to provide a vacuum switch and a method for producing the same wherein the above described difficulties can be eliminated substantially.
  • Another object of the invention is to provide a vacuum switch and a method for producing the same wherein the impurities absorbed in the contact piece can be removed effectively and any defects presenting on the surface of the contact piece can be eliminated sufficiently.
  • a method for processing a vacuum switch of the type comprising a vacuum vessel, a pair of relatively separable electrodes disposed in the vacuum vessel, and a pair of current carrying rods extending from the electrodes to outside of the vacuum vessel in an air-tight manner, the method being characterized by the steps of providing at least one contact piece made of a copper-chromium alloy on an outer surface of at least one of the electrodes and flowing and interrupting an electric current of a predetermined current density for a predetermined number of times through the electrodes to generate arcs therebetween for improving surface condition of the contact piece.
  • the electric current is of a current density more than 1000 A/cm 2 (in effective value) which is caused to flow and interrupted with the main electrode provided with the contact piece held to be anode and the other main electrode held to be cathode, for a number of times sufficient for eliminating defects on the surface of the contact piece.
  • another electric current of a current density ranging from 500 to 1000 A/cm 2 (in effective value) is caused to flow and interrupted with the main electrode provided with the contact piece held to be anode and the other main electrode held to be cathode for a number of times sufficient for producing a recrystalized layer of a predetermined thickness on the surface of the contact piece.
  • the movable electrode M and the stationary electrode S provided in a vacuum vessel are basically constructed in a similar manner to that described hereinbefore, only the movable electrode M is illustrated in FIG. 3 which comprises a main electrode 8 and a coil electrode 9 supported by a current carrying rod 5.
  • the main electrode 8 further comprises an electrode portion 14 and a contact piece 16 secured on the surface of the electrode portion 14.
  • the contact piece 16 is made of a copper-chromium alloy containing chromium in a range of 20 - 70 %, preferably 25 - 55 % by weight, and formed into a planar configuration.
  • the surface area of the contact piece 16 is selected about or less than 30 % of the surface area of the central portion of the electrode portion 14.
  • the movable electrode M of the above described construction is assembled in a vacuum vessel shown in FIG. 1 together with a stationary electrode S of a similar construction with or without the contact piece, and air is removed out of the vessel while the thus assembled switch is subjected to a baking process. Then an electric current of a current density higher than 1000 A/cm 2 (in effective value) is caused to flow through the electrodes M and S and interrupted several times while maintaining the movable electrode M having the contact piece 16 to be anode and the stationary electrode- S to be cathode, thereby creating arc between the two electrodes for eliminating the impurities and improving the surface condition of the contact piece.
  • a current density higher than 1000 A/cm 2 in effective value
  • an electric current of a current density ranging from 500 to 1000 A/cm 2 (in effective value) is cause to flow through the electrodes and interrupted several times preferably 2 - 3 times and less than 10 times, while maintaining the movable electrode M to be cathode and the stationary electrode S to be anode, thereby creating arc between the two electrodes for creating a recrsytalized layer on the surface of the contact piece.
  • Impurities contained in the electrodes made of copper can be removed comparatively easily by the baking process carried out during the air exhausting process.
  • the impurities contained in the contact piece 16 made of copper-chromium alloy cannot be removed sufficiently by the baking process because chromium easily combines with oxygen.
  • the first mentioned arc discharging process is thus required for eliminating impurities from the contact piece made of copper-chromium alloy.
  • the surface area of the contact piece 16 is reduced to approximately 30 % of the surface area of the electrode portion 14 supporting the contact piece 16 for economizing the arc discharging process.
  • the defects presenting on the surface of the contact piece 16 are melted by the energy supplied to the anode and eliminated from the surface of the contact piece 16.
  • the layer 18 formed by a single interruption step of the current is thin and weak, easily evaporated by the arc produced during ordinary interrupting operations of the vacuum switch. For this reason, the interruption process utilizing the heavy current density must be repeated several times for increasing the thickness and strength of the deposited layer 18.
  • the second-mentioned arc discharging process at a current density ranging from 500 to 1000 A/cm with the contact piece 16 utilized as a cathode then produces a recrystalized layer 19 on the surface of the contact piece 16, as shown in FIG. 5, whose defects have been eliminated as descirbed before, thereby smoothing the surface of the contact piece 16.
  • one part of the copper-chromium layer - 18 deposited on the surface of the opposing stationary electrode S is vaporized again to be deposited on the contact piece 16 and nearby area. Since no large amount of energy is required in this process, the current density utilized in the process is held in a range of from 500 to 1000 A/ cm 2 .
  • the surface of the contact piece 16 is made smooth and clean having substantially no defects, and a copper-chromium layer is deposited all over the electrodes of the vacuum switch inclusive of the interior of the slits 15, and particularly with a thickness of about several tens ⁇ m or less than 100 ⁇ m on the contact piece 16, so that the impact-resisting property and the current interrupting property of the electrodes can be substantially improved.
  • the reduction in size of the contact piece 16 renders the formation of the slits thereon to be utterly unnecessary, thereby reducing the source of trouble to produce defects.
  • the electrodes are basically made of copper from which any defect can be eliminated easily, while a small amount of copper-chromium material, which is superior in the impact-resisting and current-interrupting properties, is utilized in the contact piece, the time and cost required for removing defects in the copper-chromium material can be significantly reduced. Furthermore, by executing arc discharging processes in a predetermined sequence, a copper-chromium layer is deposited to cover most part of the surfaces of the electrodes, thereby providing a vacuum switch of high impact resistivity and high current-interrupting property in a comparatively simple manner.
  • a contact piece of, for instance, a rounded cross shape as shown in FIG. 6 adapted to the arrangement of the slits 15 may also be utilized.
  • the contact piece is ordinarily provided at the center of the electrode 14, the contact piece may otherwise be provided at an off-center position.
  • the electrode 14 made of copper may also be constructed into any suitable configuration other than the above described circular planar configuration so far as a contact piece of a small surface area can be provided.on the electrode.
  • a plurality of contact pieces may be provided on the electrode 14 instead of the above described single contact piece 16, so far as the copper-chromium material can be deposited evenly on the surfaces of the plurality of contact pieces.

Landscapes

  • High-Tension Arc-Extinguishing Switches Without Spraying Means (AREA)
  • Manufacture Of Switches (AREA)
  • Organic Insulating Materials (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Discharge Heating (AREA)
EP85102407A 1984-03-07 1985-03-04 Méthode de traitement d'interrupteur sous vide et interrupteur sous vide traité selon la méthode Expired - Lifetime EP0155584B2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP59043151A JPS60189126A (ja) 1984-03-07 1984-03-07 真空遮断器とその処理方法
JP43151/84 1984-03-07

Publications (3)

Publication Number Publication Date
EP0155584A1 true EP0155584A1 (fr) 1985-09-25
EP0155584B1 EP0155584B1 (fr) 1988-03-02
EP0155584B2 EP0155584B2 (fr) 1992-02-12

Family

ID=12655837

Family Applications (1)

Application Number Title Priority Date Filing Date
EP85102407A Expired - Lifetime EP0155584B2 (fr) 1984-03-07 1985-03-04 Méthode de traitement d'interrupteur sous vide et interrupteur sous vide traité selon la méthode

Country Status (4)

Country Link
EP (1) EP0155584B2 (fr)
JP (1) JPS60189126A (fr)
KR (1) KR890001720B1 (fr)
DE (1) DE3561780D1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0224983A2 (fr) 1985-10-30 1987-06-10 Westinghouse Air Brake Company Dispositif pour le relevage et l'abaissement d'une perche de trolley
WO1987006052A1 (fr) * 1986-03-26 1987-10-08 Siemens Aktiengesellschaft Berlin Und München Systeme de contacts pour interrupteur a vide avec champ magnetique axial
EP0865057A2 (fr) * 1997-03-10 1998-09-16 Gec Alsthom Limited Dispositif interrupteur sous vide

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4420346A (en) * 1980-11-28 1983-12-13 Belkin German S Method of preparing contacts and electrodes of electric vacuum apparatuses
EP0115292A2 (fr) * 1983-01-31 1984-08-08 Siemens Aktiengesellschaft Procédé pour la fabrication par fusion d'alliages cuivre-chrome, utilisables comme matériau de contact pour interrupteurs à vide

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4420346A (en) * 1980-11-28 1983-12-13 Belkin German S Method of preparing contacts and electrodes of electric vacuum apparatuses
EP0115292A2 (fr) * 1983-01-31 1984-08-08 Siemens Aktiengesellschaft Procédé pour la fabrication par fusion d'alliages cuivre-chrome, utilisables comme matériau de contact pour interrupteurs à vide

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0224983A2 (fr) 1985-10-30 1987-06-10 Westinghouse Air Brake Company Dispositif pour le relevage et l'abaissement d'une perche de trolley
WO1987006052A1 (fr) * 1986-03-26 1987-10-08 Siemens Aktiengesellschaft Berlin Und München Systeme de contacts pour interrupteur a vide avec champ magnetique axial
US4935588A (en) * 1986-03-26 1990-06-19 Siemens Aktiengesellschaft Contact arrangement for vacuum switches with axial magnetic fields
EP0865057A2 (fr) * 1997-03-10 1998-09-16 Gec Alsthom Limited Dispositif interrupteur sous vide
GB2323213A (en) * 1997-03-10 1998-09-16 Gec Alsthom Ltd Vacuum switching device
EP0865057A3 (fr) * 1997-03-10 1999-06-30 Alstom Uk Ltd Dispositif interrupteur sous vide
GB2323213B (en) * 1997-03-10 2001-10-17 Gec Alsthom Ltd Vacuum switching device
US6326573B1 (en) 1997-03-10 2001-12-04 Gec Alsthom Limited Vacuum switching device

Also Published As

Publication number Publication date
KR890001720B1 (ko) 1989-05-18
EP0155584B1 (fr) 1988-03-02
JPS60189126A (ja) 1985-09-26
EP0155584B2 (fr) 1992-02-12
DE3561780D1 (en) 1988-04-07
KR850007164A (ko) 1985-10-30

Similar Documents

Publication Publication Date Title
US3014107A (en) Vacuum switch
US3792214A (en) Vacuum interrupter for high voltage application
JP2002334641A (ja) 真空遮断器の電極及びその製造方法
EP0924729B1 (fr) Disposition de contacts pour interrupteur à vide avec élément magnétique pour la magnétisation longitudinale
EP0155584A1 (fr) Méthode de traitement d'interrupteur sous vide et interrupteur sous vide traité selon la méthode
US4736078A (en) Method for processing vacuum switch and vacuum switch processed by the method
EP0911847A1 (fr) Bouclier de vapeur pour les interrupteurs à vide
US4695689A (en) Vacuum circuit breaker
US4546222A (en) Vacuum switch and method of manufacturing the same
US4553003A (en) Cup type vacuum interrupter contact
US4129765A (en) Electrical switching contact
US3469049A (en) High voltage vacuum device with improved means for inhibiting sparkover adjacent the edge of a tubular metal part
JP2695902B2 (ja) 真空バルブ用接点
JPS60198023A (ja) 真空遮断器
JPS634519A (ja) 真空バルブ
US4760222A (en) Vacuum circuit interrupter
JPS598274Y2 (ja) 真空しや断器
JPH02201833A (ja) 真空インタラプタ用磁気駆動型電極
JPS58171541A (ja) しや断器用接点材料
JPH04155721A (ja) 真空バルブ
JPS63269430A (ja) 真空インタラプタ
JPH0244622A (ja) 真空インタラプタ用電極
JPS6079627A (ja) 真空遮断器
KR970030078A (ko) Fed의 게이트에 절연보호막을 형성시키는 방법 및 그에 따른 게이트 구조
JPH03295119A (ja) 真空スイッチ管

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 19850402

AK Designated contracting states

Designated state(s): DE GB

17Q First examination report despatched

Effective date: 19860709

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE GB

REF Corresponds to:

Ref document number: 3561780

Country of ref document: DE

Date of ref document: 19880407

PLBI Opposition filed

Free format text: ORIGINAL CODE: 0009260

26 Opposition filed

Opponent name: SIEMENS AKTIENGESELLSCHAFT, BERLIN UND MUENCHEN

Effective date: 19881130

PUAH Patent maintained in amended form

Free format text: ORIGINAL CODE: 0009272

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: PATENT MAINTAINED AS AMENDED

27A Patent maintained in amended form

Effective date: 19920212

AK Designated contracting states

Kind code of ref document: B2

Designated state(s): DE GB

REG Reference to a national code

Ref country code: GB

Ref legal event code: 746

Effective date: 19981008

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 19991231

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20000301

Year of fee payment: 16

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20010304

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20010304

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20020101

PLAB Opposition data, opponent's data or that of the opponent's representative modified

Free format text: ORIGINAL CODE: 0009299OPPO