EP0142414A2 - Ionenquelle insbesondere zum Erzeugen eines Stroms mehrfachgeladener metallischer Ionen, bei der der Ionenstrom geregelt wird - Google Patents

Ionenquelle insbesondere zum Erzeugen eines Stroms mehrfachgeladener metallischer Ionen, bei der der Ionenstrom geregelt wird Download PDF

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Publication number
EP0142414A2
EP0142414A2 EP84402080A EP84402080A EP0142414A2 EP 0142414 A2 EP0142414 A2 EP 0142414A2 EP 84402080 A EP84402080 A EP 84402080A EP 84402080 A EP84402080 A EP 84402080A EP 0142414 A2 EP0142414 A2 EP 0142414A2
Authority
EP
European Patent Office
Prior art keywords
cavity
controlling
ion current
regulating device
electromagnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP84402080A
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English (en)
French (fr)
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EP0142414B1 (de
EP0142414A3 (en
Inventor
Bernard Jacquot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Commissariat a lEnergie Atomique CEA
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Publication of EP0142414A2 publication Critical patent/EP0142414A2/de
Publication of EP0142414A3 publication Critical patent/EP0142414A3/fr
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Publication of EP0142414B1 publication Critical patent/EP0142414B1/de
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Definitions

  • the present invention relates to a device for regulating a current of ions, especially metallic, highly charged.
  • This highly charged ion current is used in particular for the measurement of physical constants and especially intended to equip particle accelerators, used both in the scientific and medical fields.
  • One of the methods used to obtain a stream of highly charged, or multicharged, ions consists in evaporating a solid material, for example a metal sample placed in a microwave cavity, and in ionizing the vapors produced.
  • the vaporization and then the ionization of the material are obtained by interaction of a hot electron plasma, confined in said enclosure, with said material.
  • This electron plasma is formed by ionizing a gas, injected into the cavity, thanks to the combined action of a high frequency electromagnetic field, established in said cavity, and a magnetic field prevailing inside this same cavity.
  • the object of the present invention is precisely a device for regulating an ion current making it possible to solve this problem.
  • the invention relates to a device for regulating a current of ions, especially metal, highly charged, obtained according to the evaporation process described above.
  • this device comprises means for pulsing the electromagnetic field, injected into the cavity, and for controlling the average power of this electromagnetic field.
  • These means preferably consist of a high frequency pulse generator, the useful cycle of which is adjusted, that is to say the ratio t / T, t being the duration of a pulse and T the period of the pulses.
  • the pulse generator is controlled so that the intensity of the ion current remains constant.
  • control means preferably comprise means for measuring the intensity of the ion current, connected to a microprocessor.
  • the regulation device comprises a valve used to modify the flow of gas introduced into the cavity and means making it possible to control said valve so that the pressure prevailing in the cavity remains constant.
  • the means for controlling the valve consist of pressure measuring means, connected to a microprocessor.
  • the regulation device comprises means making it possible to slowly move, in the cavity, the solid material so that it intercepts the electron plasma as well as possible.
  • the displacement means are controlled so that the intensity of the ion current is constant.
  • control means preferably consist of means for measuring the intensity of the ion current, connected to a microprocessor.
  • the gas introduced into the cavity consists of argon, nitrogen or oxygen.
  • This type of gas is particularly suitable for obtaining metal ions from the vaporization of refractory metals such as tungsten, tantalum, molybdenum, zirconium, etc.
  • This device comprises a containment vacuum enclosure 2 which constitutes a resonant cavity for before being excited by a microwave electromagnetic field, which is according to the invention pulsed.
  • This electromagnetic field produced by a source 3, such as a klystron, is introduced into the cavity by means of a waveguide 4, of circular or rectangular section.
  • This source 3 is supplied with current by a power source 6.
  • a line -8 makes it possible to introduce a gas into the microwave cavity 2 such as argon, nitrogen or oxygen.
  • Means shown schematically in broken lines and bearing the reference 10, make it possible to create a magnetic field prevailing inside the cavity 2.
  • This magnetic field has an amplitude which satisfies the condition of electronic cyclotron resonance, a condition explained above.
  • reference may be made to French patent application no. 2 475 798 filed on February 13, 1980 by the applicant and entitled “Process and device for the production of highly charged heavy ions and an application implementing the process ".
  • the association of the electromagnetic field and the magnetic field makes it possible to strongly ionize the gas introduced into the cavity 2.
  • the electrons produced are then strongly accelerated by electronic cyclotron resonance, which leads to the formation of a hot plasma of electrons, confined in the cavity.
  • the confinement space of the electron plasma is represented by a hatched ellipse bearing the reference 11.
  • a sample 12 is arranged from which the ion current will be formed.
  • This sample fixed on a support 14, is in particular a sample of metal such as, for example, tungsten, tantalum, molybdenum, zirconium, etc.
  • This sample is subjected to the action of the hot plasma of elec sections 11, which makes it possible to vaporize it, then to ionize the vapors produced.
  • the metal ions formed are then extracted from the cavity 2, for example by means of electrodes 16 between which a negative potential difference is created using a power source 17.
  • the ions from the cavity (arrow F ) can then be analyzed, for example selected according to their degree of ionization, using any known means, shown diagrammatically in 18, using an electric field and / or a magnetic field.
  • This device comprises a motor 20, connected by means of a rod 22, to the support 14 of the sample 12 making it possible to slowly move the latter, so that it best intercepts the electron plasma 11. More l sample 12 enters the interior of cavity 2, the higher its temperature and therefore its vaporization rate.
  • the vaporization rate and therefore the ionization rate of the vapors, especially metallic depend on the average power of the pulsed electromagnetic field injected into the cavity 2 and this for a given depth of penetration of the sample into the electron plasma.
  • the average power of the pulsed electromagnetic field injected into the cavity 2 and this for a given depth of penetration of the sample into the electron plasma.
  • an electromagnetic field having a power at least equal to 300 watts .
  • Control of the average power of the electromagnetic field is obtained by pulsating the electromagnetic field.
  • This pulsed field can be obtained using a pulse generator 24, the cy of which is adjusted useful key, that is to say the ratio t / T, t being the duration of a pulse and T the period of the pulses, this generator controlling the power supply source 6 supplying the electromagnetic wave source 3.
  • the plasma electrons acquire the energy necessary to vaporize the sample 12 and then ionize the vapors produced upon application of the microwave electromagnetic field and lose this energy almost immediately after the disappearance of said field.
  • the hot electron plasma is obtained firstly by ionization of a gas, in particular argon, nitrogen or oxygen, introduced into the cavity 2 by a pipe 8
  • a gas in particular argon, nitrogen or oxygen
  • the gas supply line 8 is equipped with a valve 26 used to modulate the flow of gas introduced into the cavity.
  • a device 28 for measuring the total pressure prevailing in the cavity 2 such as a pressure gauge, makes it possible, by means of an appropriate device, to ensure the operation of the valve 26 so that the total pressure prevailing in the cavity remains constant.
  • This suitable device can be constituted, as shown in FIG. 1, by a device 30, connected to a reference voltage R, making it possible to compare the voltage supplied by the measuring device 28 and the reference voltage R and to supply a signal control valve 26, signal which corresponds to the voltage difference between the voltage supplied by the measuring device 28 and the reference voltage R.
  • This suitable device can also be constituted, as shown in the fioure 2. by a microprocessor 32 controlling the opening or closing of the valve 26 according to the voltage supplied by the measuring device 28.
  • the microprocessor is, for example, the one sold under reference 6800 from MOTOROLA.
  • the starting of the motor 20, serving to move the sample 12, and that of the pulse generator 24, serving to generate the pulsed electromagnetic field can be carried out manually as shown in FIG. 1 or else automatically as shown in FIG. 2.
  • a device 34 for measuring the intensity of the ion current leaving the cavity 2, such as a Faraday cage, must be provided.
  • the signal supplied by the device 34 is entered into the microprocessor 32 controlling the starting or stopping on the one hand of the motor 20 and, on the other hand, of the pulse generator 24.
  • the drive motor 20 and the pulse generator 24 controlled by the intensity of the ion current as well as the valve 26 controlled so that the total pressure prevailing in the enclosure is constant, constitute, according to the invention, the device making it possible to obtain a current of ions, especially metallic, of constant intensity.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
EP84402080A 1983-10-17 1984-10-16 Ionenquelle insbesondere zum Erzeugen eines Stroms mehrfachgeladener metallischer Ionen, bei der der Ionenstrom geregelt wird Expired EP0142414B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8316465 1983-10-17
FR8316465A FR2553574B1 (fr) 1983-10-17 1983-10-17 Dispositif de regulation d'un courant d'ions notamment metalliques fortement charges

Publications (3)

Publication Number Publication Date
EP0142414A2 true EP0142414A2 (de) 1985-05-22
EP0142414A3 EP0142414A3 (en) 1986-06-04
EP0142414B1 EP0142414B1 (de) 1989-03-22

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP84402080A Expired EP0142414B1 (de) 1983-10-17 1984-10-16 Ionenquelle insbesondere zum Erzeugen eines Stroms mehrfachgeladener metallischer Ionen, bei der der Ionenstrom geregelt wird

Country Status (5)

Country Link
US (1) US4582997A (de)
EP (1) EP0142414B1 (de)
JP (1) JPS60101843A (de)
DE (1) DE3477444D1 (de)
FR (1) FR2553574B1 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2595868A1 (fr) * 1986-03-13 1987-09-18 Commissariat Energie Atomique Source d'ions a resonance cyclotronique electronique a injection coaxiale d'ondes electromagnetiques
FR2757310A1 (fr) * 1996-12-18 1998-06-19 Commissariat Energie Atomique Systeme magnetique, en particulier pour les sources ecr, permettant la creation de surfaces fermees d'equimodule b de forme et de dimensions quelconques
DE19933762A1 (de) * 1999-07-19 2001-02-01 Andrae Juergen Gepulste magnetische Öffnung von Elektronen-Zyklotron-Resonanz-Jonenquellen zur Erzeugung kurzer, stromstarker Pulse hoch geladener Ionen oder von Elektronen

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
HU190959B (en) * 1984-04-20 1986-12-28 Gyulai,Jozsef,Hu Method and apparatus for the irradiation of solid materials with ions
US4780608A (en) * 1987-08-24 1988-10-25 The United States Of America As Represented By The United States Department Of Energy Laser sustained discharge nozzle apparatus for the production of an intense beam of high kinetic energy atomic species
DE3834984A1 (de) * 1988-10-14 1990-04-19 Leybold Ag Einrichtung zur erzeugung von elektrisch geladenen und/oder ungeladenen teilchen
US5208512A (en) * 1990-10-16 1993-05-04 International Business Machines Corporation Scanned electron cyclotron resonance plasma source
DE19513345C2 (de) * 1995-04-08 2000-08-03 Ehret Hans P ECR-Ionenquelle
CN103974517A (zh) * 2014-05-22 2014-08-06 哈尔滨工业大学 高频电磁场条件下的束缚等离子体聚集器及采用该聚集器实现的聚集方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2475798A1 (fr) 1980-02-13 1981-08-14 Commissariat Energie Atomique Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede
FR2512623A1 (fr) 1981-09-10 1983-03-11 Commissariat Energie Atomique Procede de fusion et/ou d'evaporation pulsee d'un materiau solide

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2826708A (en) * 1955-06-02 1958-03-11 Jr John S Foster Plasma generator
US3792251A (en) * 1971-04-08 1974-02-12 Phillips Petroleum Co Surface analysis
US3898496A (en) * 1974-08-12 1975-08-05 Us Energy Means for obtaining a metal ion beam from a heavy-ion cyclotron source
US4206383A (en) * 1978-09-11 1980-06-03 California Institute Of Technology Miniature cyclotron resonance ion source using small permanent magnet

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2475798A1 (fr) 1980-02-13 1981-08-14 Commissariat Energie Atomique Procede et dispositif de production d'ions lourds fortement charges et une application mettant en oeuvre le procede
FR2512623A1 (fr) 1981-09-10 1983-03-11 Commissariat Energie Atomique Procede de fusion et/ou d'evaporation pulsee d'un materiau solide

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2595868A1 (fr) * 1986-03-13 1987-09-18 Commissariat Energie Atomique Source d'ions a resonance cyclotronique electronique a injection coaxiale d'ondes electromagnetiques
EP0238397A1 (de) * 1986-03-13 1987-09-23 Commissariat A L'energie Atomique Elektronenzyklotronresonanz-Ionenquelle mit koaxialer Injektion elektromagnetischer Wellen
US4780642A (en) * 1986-03-13 1988-10-25 Commissariat A L'energie Atomique Electron cyclotron resonance ion source with coaxial injection of electromagnetic waves
FR2757310A1 (fr) * 1996-12-18 1998-06-19 Commissariat Energie Atomique Systeme magnetique, en particulier pour les sources ecr, permettant la creation de surfaces fermees d'equimodule b de forme et de dimensions quelconques
WO1998027572A1 (fr) * 1996-12-18 1998-06-25 Commissariat A L'energie Atomique Systeme magnetique, en particulier pour les sources ecr, permettant la creation de surfaces fermees d'equimodule b de forme et de dimensions quelconques
US6194836B1 (en) 1996-12-18 2001-02-27 Commissariat A L'energie Atomique Magnetic system, particularly for ECR sources, for producing closed surfaces of equimodule B of form dimensions
DE19933762A1 (de) * 1999-07-19 2001-02-01 Andrae Juergen Gepulste magnetische Öffnung von Elektronen-Zyklotron-Resonanz-Jonenquellen zur Erzeugung kurzer, stromstarker Pulse hoch geladener Ionen oder von Elektronen
DE19933762C2 (de) * 1999-07-19 2002-10-17 Juergen Andrae Gepulste magnetische Öffnung von Elektronen-Zyklotron-Resonanz-Jonenquellen zur Erzeugung kurzer, stromstarker Pulse hoch geladener Ionen oder von Elektronen

Also Published As

Publication number Publication date
US4582997A (en) 1986-04-15
FR2553574B1 (fr) 1985-12-27
EP0142414B1 (de) 1989-03-22
DE3477444D1 (en) 1989-04-27
EP0142414A3 (en) 1986-06-04
JPS60101843A (ja) 1985-06-05
FR2553574A1 (fr) 1985-04-19

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