EP0025694A1 - Bad zum Glanzvernickeln und Verfahren und Zusammensetzung hierfür - Google Patents

Bad zum Glanzvernickeln und Verfahren und Zusammensetzung hierfür Download PDF

Info

Publication number
EP0025694A1
EP0025694A1 EP80303183A EP80303183A EP0025694A1 EP 0025694 A1 EP0025694 A1 EP 0025694A1 EP 80303183 A EP80303183 A EP 80303183A EP 80303183 A EP80303183 A EP 80303183A EP 0025694 A1 EP0025694 A1 EP 0025694A1
Authority
EP
European Patent Office
Prior art keywords
sulfonated
nickel
acetylenic compound
compound
per liter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP80303183A
Other languages
English (en)
French (fr)
Other versions
EP0025694B1 (de
Inventor
Kenneth William Lemke
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
M&T Chemicals Inc
Original Assignee
M&T Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by M&T Chemicals Inc filed Critical M&T Chemicals Inc
Priority to AT80303183T priority Critical patent/ATE6873T1/de
Publication of EP0025694A1 publication Critical patent/EP0025694A1/de
Application granted granted Critical
Publication of EP0025694B1 publication Critical patent/EP0025694B1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/16—Acetylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt

Definitions

  • Class I brighteners as used herein, and as described in Modern Electroplating, Third Edition, F. Lowenheim, Editor, is meant to include aromatic sulfonates, sulfonamides, sulfonimides, etc., as well as aliphatic or aromatic-aliphatic olefinically unsaturated sulfonates, sulfonamides, sulfonimides, etc. Specific examples of such plating additives are:
  • solution agitation may be employed. Air agitation, mechanical stirring, pumping, cathode rod and other means of solution agitation are all satisfactory. Additionally, the solutions may be operated without agitation.
  • the average cathode current density may range from about 0.5 to 12 amperes per square decimeter, with 3 to 6 amperes per square decimeter providing an optimum range.
  • the pH may normally tend to rise and may be adjusted with acids such as hydrochloric, acid, sulfuric acid, etc.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Chemically Coating (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Electrolytic Production Of Metals (AREA)
EP80303183A 1979-09-13 1980-09-10 Bad zum Glanzvernickeln und Verfahren und Zusammensetzung hierfür Expired EP0025694B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT80303183T ATE6873T1 (de) 1979-09-13 1980-09-10 Bad zum glanzvernickeln und verfahren und zusammensetzung hierfuer.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US7495379A 1979-09-13 1979-09-13
US74953 1979-09-13

Publications (2)

Publication Number Publication Date
EP0025694A1 true EP0025694A1 (de) 1981-03-25
EP0025694B1 EP0025694B1 (de) 1984-03-28

Family

ID=22122633

Family Applications (1)

Application Number Title Priority Date Filing Date
EP80303183A Expired EP0025694B1 (de) 1979-09-13 1980-09-10 Bad zum Glanzvernickeln und Verfahren und Zusammensetzung hierfür

Country Status (11)

Country Link
EP (1) EP0025694B1 (de)
JP (1) JPS5647583A (de)
AT (1) ATE6873T1 (de)
AU (1) AU532948B2 (de)
BR (1) BR8005852A (de)
DE (1) DE3067275D1 (de)
ES (1) ES495007A0 (de)
HK (1) HK80384A (de)
MX (1) MX153967A (de)
NZ (1) NZ194923A (de)
ZA (1) ZA805658B (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2189258B (en) * 1986-04-15 1991-01-16 Omi Int Corp Zinc-nickel alloy electrolyte and process
WO2018015168A1 (en) 2016-07-18 2018-01-25 Basf Se Composition for cobalt plating comprising additive for void-free submicron feature filling
EP3680366A4 (de) * 2017-09-06 2021-06-09 Kanto Denka Kogyo Co., Ltd. Elektrode und herstellungsverfahren dafür sowie herstellungsverfahren für regenerierte elektrode

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3632514A1 (de) * 1986-09-22 1988-03-24 Schering Ag (alpha)-hydroxi propinsulfonsaeure und deren salze, saure nickelbaeder enthaltend diese verbindungen sowie verfahren zu ihrer herstellung

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3884773A (en) * 1973-08-17 1975-05-20 Metalux Corp Electrodeposition of nickel
DE2460247A1 (de) * 1973-12-27 1975-07-10 Du Pont Primaerglanzmittel-zusatzstoff fuer saure nickelgalvanisierungsbaeder
GB1441972A (en) * 1972-10-30 1976-07-07 Oxy Metal Finishing Corp Nickel electroplating baths and their use in forming corrosion protective metallic coatings containing electrodeposited nickel and microporous chrome
GB1456583A (en) * 1970-12-11 1976-11-24 Oxy Metal Industries Corp Electroplating composition and process
US4016051A (en) * 1975-05-02 1977-04-05 Starlite Chemicals, Inc. Additives for bright plating nickel, cobalt and nickel-cobalt alloys
DE2654040A1 (de) * 1975-12-04 1977-06-08 Mcgean Chemical Co Verfahren zum abscheiden einer glaenzenden schicht auf der basis von nickel auf einem substrat durch elektroplattierung

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1456583A (en) * 1970-12-11 1976-11-24 Oxy Metal Industries Corp Electroplating composition and process
GB1441972A (en) * 1972-10-30 1976-07-07 Oxy Metal Finishing Corp Nickel electroplating baths and their use in forming corrosion protective metallic coatings containing electrodeposited nickel and microporous chrome
US3884773A (en) * 1973-08-17 1975-05-20 Metalux Corp Electrodeposition of nickel
DE2460247A1 (de) * 1973-12-27 1975-07-10 Du Pont Primaerglanzmittel-zusatzstoff fuer saure nickelgalvanisierungsbaeder
US4016051A (en) * 1975-05-02 1977-04-05 Starlite Chemicals, Inc. Additives for bright plating nickel, cobalt and nickel-cobalt alloys
DE2654040A1 (de) * 1975-12-04 1977-06-08 Mcgean Chemical Co Verfahren zum abscheiden einer glaenzenden schicht auf der basis von nickel auf einem substrat durch elektroplattierung

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2189258B (en) * 1986-04-15 1991-01-16 Omi Int Corp Zinc-nickel alloy electrolyte and process
WO2018015168A1 (en) 2016-07-18 2018-01-25 Basf Se Composition for cobalt plating comprising additive for void-free submicron feature filling
EP3885475A1 (de) 2016-07-18 2021-09-29 Basf Se Zusammensetzung zur kobaltbeschichtung mit additiv zur lückenlosen submikronmerkmalfüllung
EP3680366A4 (de) * 2017-09-06 2021-06-09 Kanto Denka Kogyo Co., Ltd. Elektrode und herstellungsverfahren dafür sowie herstellungsverfahren für regenerierte elektrode
US11821099B2 (en) 2017-09-06 2023-11-21 Kanto Denka Kogyo Co., Ltd. Electrode production method

Also Published As

Publication number Publication date
ZA805658B (en) 1982-03-31
BR8005852A (pt) 1981-03-24
MX153967A (es) 1987-03-03
JPS6252035B2 (de) 1987-11-02
HK80384A (en) 1984-11-02
ATE6873T1 (de) 1984-04-15
AU6236580A (en) 1981-03-19
ES8205437A1 (es) 1982-06-01
DE3067275D1 (en) 1984-05-03
JPS5647583A (en) 1981-04-30
EP0025694B1 (de) 1984-03-28
NZ194923A (en) 1982-05-25
ES495007A0 (es) 1982-06-01
AU532948B2 (en) 1983-10-20

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