EP0015807B1 - Verfahren zur Herstellung einer radioaktiven Strahlungsquelle und so erhaltene Strahlungsquelle - Google Patents

Verfahren zur Herstellung einer radioaktiven Strahlungsquelle und so erhaltene Strahlungsquelle Download PDF

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Publication number
EP0015807B1
EP0015807B1 EP19800400238 EP80400238A EP0015807B1 EP 0015807 B1 EP0015807 B1 EP 0015807B1 EP 19800400238 EP19800400238 EP 19800400238 EP 80400238 A EP80400238 A EP 80400238A EP 0015807 B1 EP0015807 B1 EP 0015807B1
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EP
European Patent Office
Prior art keywords
layer
source
substrate
radioelement
deposited
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP19800400238
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English (en)
French (fr)
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EP0015807A1 (de
Inventor
Jean-Pierre Galmiche
Francine Moser
Denise Remy
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
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Commissariat a lEnergie Atomique CEA
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Publication of EP0015807A1 publication Critical patent/EP0015807A1/de
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21G—CONVERSION OF CHEMICAL ELEMENTS; RADIOACTIVE SOURCES
    • G21G4/00—Radioactive sources
    • G21G4/04—Radioactive sources other than neutron sources
    • G21G4/06—Radioactive sources other than neutron sources characterised by constructional features

Definitions

  • the subject of the present invention is a method of making a radioactive source and the source obtained by said method.
  • French patent FR-A-2,028,679 illustrates a process for manufacturing a radiation source, which consists in depositing on a support coated with enamel a radioactive material and then depositing on this material a tight layer of metal oxide by hydrolyzing a chloride of this metal on the heated radioactive layer.
  • This method has the drawback of requiring an intermediate decontamination operation to remove the radioactive material which is not fixed on the support and of being unsuitable for industrial manufacture.
  • Also known from Swiss Patent CH-A-225,654 is a process for producing a radioactive source, according to which a radioactive substance is introduced into the pores of a porous layer produced on the surface of a metal support, which does not may lead to obtaining a source with satisfactory safety characteristics.
  • the process according to the invention overcomes the drawbacks of the processes mentioned above, in particular in that it makes it possible to carry out directly on the substrate the deposition of the active layer of radio-element from a nitric solution of this radio element.
  • the process which is the subject of the invention is characterized in that a metal substrate capable of resisting corrosion by nitric solutions is deposited on a substrate, chosen from the group comprising titanium, zirconium, a thin active layer d '' a radio element by contacting a nitric solution of said radio element with said substrate and dry evaporation of said solution, the substrate thus coated is subjected to a heat treatment so as to obtain a layer of an inactive coating consisting of an oxide of the metal constituting said substrate, then a refractory material is deposited by sputtering.
  • a layer of tantalum is also deposited on said refractory material.
  • the radio element used as active layer of the source considered is generally a radio element such as americium 241, plutonium 238 and curium 242 or 244.
  • a radio element such as americium 241, plutonium 238 and curium 242 or 244.
  • the subsequent heat treatment causes the oxidation of the metal constituting the substrate, the metal oxide layer thus formed developing by oxidation of this metal which has diffused through the layers of atoms constituting the active coating; therefore, the active radio-element layer is always at the metal-oxide interface.
  • a nitric solution of radioactive element 4N is used.
  • a refractory material for example an enamel
  • a refractory material is deposited on the inactive coating layer.
  • the deposition of this layer of enamel preferably between 3 and 10 microns thick, is carried out by sputtering, the enamel being, for example a compound based on silicates.
  • the enamel instead of enamel, you can use a glass, calcium fluoride, titanium oxide or alumina.
  • the purpose of this refractory coating is to protect the inactive deposit in case of abrasion or accidental scratches, its role is also to perfect the source by the multilayer process.
  • a layer of tantalum is also deposited on the layer of refractory material; this deposition of a tantalum layer, preferably between 1 and 2 microns thick, is carried out by sputtering.
  • This tantalum layer allows the radioactive source to retain its character of safety in the course of use, can withstand corrosion appropriately and not undergo any degradation, either in air or in humidity. In addition, it can resist any rise in temperature: in fact, if the temperature remains below 600 ° C, the source does not undergo any destruction; moreover, if the temperature becomes higher than 600 ° C., the tantalum oxidizes.
  • the active layer of radio-element can be deposited from a nitric solution of this radio-element; this allows a simpler, less expensive deposition technique and easier to automate than the implementation of vacuum evaporation or sputtering techniques involved in the previous process mentioned above.
  • the nitric solutions used are very stable and allow automation for mass production.
  • the resistance of titanium or zirconium to corrosion is very good and the radioactive sources obtained are of good quality.
  • the invention also relates to radioactive sources as obtained by the process considered. These sources are characterized in that they successively comprise a substrate made of a metal chosen from the group comprising titanium, zirconium, an active thin layer of a radio-element such as americium, plutonium, curium , a layer of an inactive coating consisting of an oxide of said metal and a layer of a refractory material.
  • a radio-element such as americium, plutonium, curium
  • a layer of an inactive coating consisting of an oxide of said metal and a layer of a refractory material.
  • the sources further comprise a layer of tantalum deposited on the layer of refractory material.
  • FIGS. 1 to 3 This description refers to the appended FIGS. 1 to 3 in which curves have been shown which give for different sources, on the one hand, on the ordinate the number N of the particles leaving the sources and, on the other hand, on the abscissa the energy E in MeV of the particles.
  • a source of americium 241 is prepared in the following manner.
  • an argon pressure of about 10- 2 torr is introduced into the vacuum chamber and the glass sputtering is started for about 30 minutes: the thickness of the deposit is 3 ⁇ . Finally, a 2 ⁇ m thick tantalum film is deposited by sputtering.
  • the energy of the particles is lower in the case of a source of the invention with coating of tantalum (curve C s ) compared to a source of the invention without coating of tantalum (curve C 3 ).
  • the radioactive sources according to the invention are more particularly intended for use in devices liable to undergo high temperature increases such as fire detectors, lightning conductors, or static electricity eliminators.

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)

Claims (7)

1. Verfahren zur Herstellung einer radioaktiven Strahlungsquelle, dadurch gekennzeichnet, daß man auf einem Substrat aus Titan oder Zirkonium eine dünne aktive Schicht eines Radioelements niederschlägt durch Kontaktieren einer salpetersauren Lösung des genannten Radioelements mit dem genannten Substrat und Eindampfen bis zur Trockene der genannten Lösung, das so überzogene Substrat einer thermischen Behandlung unterwirft um eine Schicht eines inaktiven Überzugs bestehend aus einem Oxid des das genannte Substrat bildenden Metalls zu erhalten, dann durch kathodische Pulverisation ein hitzebeständiges Material niederschlägt.
2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß man außerdem auf dem genannten hitzebeständigen Material eine Schicht aus Tantal niederschlägt.
3. Verfahren nach den Ansprüchen 1 und 2, dadurch gekennzeichnet, daß das hitzebeständige Material aus der Gruppe bestehend aus einem Email, einem Glas, Calcium-fluorid, Titanoxid, Aluminium ausgewählt wird.
4. Verfahren nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß die salpetersaure Lösung des Radioelements aus einer salpetersauren Lösung eines Radioelements ausgewählt aus der Gruppe enthaltend Plutonium, Americium, Curium besteht.
5. Verfahren nach Anspruch 4, dadurch gekennzeichnet, daß die salpetersaure Lösung des Radioelements eine 4n Salpetersäure-Lösung ist.
6. Radioaktive Strahlungsquelle, dadurch gekennzeichnet, daß sie aufeinanderfolgend ein Substrat bestehend aus einem Metall ausgewählt aus der Gruppe enthaltend Titan, Zirkonium, eine dünne aktive Schicht eines Radioelements wie Americium, Plutonium, Curium, eine Schicht eines inaktiven Überzugs bestehend aus einem Oxid des genannten Metalls und schließlich eine Schicht eines hitzebeständigen Materials enthält.
7. Strahlungsquelle nach Anspruch 6, dadurch gekennzeichnet, daß sie außerdem noch eine auf die Schicht des hitzebeständigen Überzugs niedergeschlagene Schicht aus Tantal enthält.
EP19800400238 1979-03-02 1980-02-19 Verfahren zur Herstellung einer radioaktiven Strahlungsquelle und so erhaltene Strahlungsquelle Expired EP0015807B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR7905498 1979-03-02
FR7905498A FR2450498A1 (fr) 1979-03-02 1979-03-02 Procede de fabrication d'une source radioactive et source obtenue par ledit procede

Publications (2)

Publication Number Publication Date
EP0015807A1 EP0015807A1 (de) 1980-09-17
EP0015807B1 true EP0015807B1 (de) 1983-04-13

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
EP19800400238 Expired EP0015807B1 (de) 1979-03-02 1980-02-19 Verfahren zur Herstellung einer radioaktiven Strahlungsquelle und so erhaltene Strahlungsquelle

Country Status (4)

Country Link
EP (1) EP0015807B1 (de)
JP (1) JPS55119100A (de)
DE (1) DE3062662D1 (de)
FR (1) FR2450498A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2152840B1 (es) * 1998-08-10 2002-02-01 Ct Investig Energeticas Ciemat Procedimiento para la incorporacion de sustancias peligrosas o de elevado coste en soportes de aluminio con muy bajo espesor de anodizado.
TWI408903B (zh) * 2004-06-30 2013-09-11 Noriyoshi Tsuyuzaki 隨機脈衝產生源及半導體裝置、使用該源產生隨機數及／或機率之方法與程式

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH225654A (de) * 1940-12-19 1943-02-15 Robert Dr Haefeli Radioaktiver Gegenstand.
FR2028679A1 (en) * 1969-01-21 1970-10-16 Drabkina Lidiya Radioactive source for eliminating static charges
FR2279206A1 (fr) * 1973-12-17 1976-02-13 Commissariat Energie Atomique Procede de fabrication de sources de rayonnements ionisants scellees et sources obtenues par ce procede

Also Published As

Publication number Publication date
FR2450498A1 (fr) 1980-09-26
JPS55119100A (en) 1980-09-12
FR2450498B1 (de) 1982-03-19
DE3062662D1 (en) 1983-05-19
EP0015807A1 (de) 1980-09-17

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