DK407884D0 - Selvkompenserende hydrostatisk udfladning af halvledersubstrater - Google Patents
Selvkompenserende hydrostatisk udfladning af halvledersubstraterInfo
- Publication number
- DK407884D0 DK407884D0 DK407884A DK407884A DK407884D0 DK 407884 D0 DK407884 D0 DK 407884D0 DK 407884 A DK407884 A DK 407884A DK 407884 A DK407884 A DK 407884A DK 407884 D0 DK407884 D0 DK 407884D0
- Authority
- DK
- Denmark
- Prior art keywords
- flats
- self
- semiconductor substrates
- compensating hydrostatic
- hydrostatic
- Prior art date
Links
- 230000002706 hydrostatic effect Effects 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0203—Containers; Encapsulations, e.g. encapsulation of photodiodes
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Bipolar Transistors (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/464,442 US4470856A (en) | 1983-02-07 | 1983-02-07 | Self-compensating hydrostatic flattening of semiconductor substrates |
US46444283 | 1983-02-07 | ||
PCT/US1983/001989 WO1984003176A1 (en) | 1983-02-07 | 1983-12-16 | Self-compensating hydrostatic flattening of semiconductor substrates |
US8301989 | 1983-12-16 |
Publications (4)
Publication Number | Publication Date |
---|---|
DK407884D0 true DK407884D0 (da) | 1984-08-27 |
DK407884A DK407884A (da) | 1984-08-27 |
DK160113B DK160113B (da) | 1991-01-28 |
DK160113C DK160113C (da) | 1991-07-01 |
Family
ID=23843970
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK407884A DK160113C (da) | 1983-02-07 | 1984-08-27 | Fremgangsmaade ved fremstilling af en halvleder struktur |
Country Status (8)
Country | Link |
---|---|
US (1) | US4470856A (da) |
EP (1) | EP0137790B1 (da) |
JP (1) | JPS60500554A (da) |
AU (1) | AU568629B2 (da) |
CA (1) | CA1202710A (da) |
DE (1) | DE3371446D1 (da) |
DK (1) | DK160113C (da) |
WO (1) | WO1984003176A1 (da) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4537827A (en) * | 1983-02-07 | 1985-08-27 | Hughes Aircraft Company | Optically flat semiconductor baseplate structure |
US4766426A (en) * | 1985-02-14 | 1988-08-23 | Matsushita Electric Industrial Co., Ltd. | Display panel assembly having a plurality of film carrier tapes on each of which a semiconductor divice is mounted |
GB2195465A (en) * | 1986-09-29 | 1988-04-07 | Atomic Energy Authority Uk | Misalignment detection |
US5160560A (en) * | 1988-06-02 | 1992-11-03 | Hughes Aircraft Company | Method of producing optically flat surfaces on processed silicon wafers |
JP3198779B2 (ja) * | 1994-03-04 | 2001-08-13 | 株式会社デンソー | 半導体圧力検出器の製造方法 |
TW281795B (da) * | 1994-11-30 | 1996-07-21 | Sharp Kk | |
US5721602A (en) * | 1995-10-11 | 1998-02-24 | International Business Machines Corporation | Mechanical packaging and thermal management of flat mirror arrays |
US5932045A (en) * | 1997-06-02 | 1999-08-03 | Lucent Technologies Inc. | Method for fabricating a multilayer optical article |
JP2001344710A (ja) * | 2000-06-05 | 2001-12-14 | Tdk Corp | ウエハの平面度制御方法及び薄膜磁気ヘッドの製造方法 |
US20030017424A1 (en) * | 2001-07-18 | 2003-01-23 | Miri Park | Method and apparatus for fabricating complex grating structures |
US6721076B2 (en) | 2001-08-03 | 2004-04-13 | Inphase Technologies, Inc. | System and method for reflective holographic storage with associated multiplexing techniques |
US7112359B2 (en) | 2001-08-22 | 2006-09-26 | Inphase Technologies, Inc. | Method and apparatus for multilayer optical articles |
US20030151832A1 (en) * | 2002-01-14 | 2003-08-14 | Arthur Berman | Method and apparatus for enclosing optical assemblies |
US6999237B2 (en) * | 2001-09-12 | 2006-02-14 | Lightmaster Systems, Inc. | Method and apparatus for configuration and assembly of a video projection light management system |
US7001541B2 (en) * | 2001-09-14 | 2006-02-21 | Inphase Technologies, Inc. | Method for forming multiply patterned optical articles |
US6825960B2 (en) * | 2002-01-15 | 2004-11-30 | Inphase Technologies, Inc. | System and method for bitwise readout holographic ROM |
JP4038679B2 (ja) * | 2003-05-13 | 2008-01-30 | 住友電気工業株式会社 | 半導体レーザーバーの固定用治具 |
EP1522550A3 (de) * | 2003-10-09 | 2010-10-13 | Weidmann Plastics Technology AG | Verfahren zum fremdstofffreien Fugen zweier Werkstücke sowie nach diesem Verfahren gefugtes Werkstück |
US20070082179A1 (en) * | 2005-10-07 | 2007-04-12 | Wade James J | Method and apparatus for forming optical articles |
JP5074291B2 (ja) * | 2008-05-15 | 2012-11-14 | 浜松ホトニクス株式会社 | 分光モジュール |
JP5970330B2 (ja) * | 2012-10-17 | 2016-08-17 | 株式会社アマダホールディングス | 金型測長装置 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB820027A (en) * | 1956-06-08 | 1959-09-16 | Radiation Ltd | Means for shaping sheet metal articles |
US3229224A (en) * | 1963-07-03 | 1966-01-11 | Gen Time Corp | Apparatus for maintaining parallelism and distance between two objects |
US3510374A (en) * | 1964-04-20 | 1970-05-05 | Industrial Nucleonics Corp | Method and control apparatus for regulating apparatuses |
US3573455A (en) * | 1968-09-13 | 1971-04-06 | Ibm | Examination of articles by x-rays |
US3681958A (en) * | 1970-10-15 | 1972-08-08 | Grumman Aerospace Corp | High pressure forming press |
US3751956A (en) * | 1971-09-27 | 1973-08-14 | I P Spa Sa | Fluid-dynamic press for the cold forming of sheet metal |
US3802065A (en) * | 1972-03-16 | 1974-04-09 | Gen Electric | Method and structure for mounting semiconductor chips |
US3843401A (en) * | 1972-07-14 | 1974-10-22 | Texas Instruments Inc | Bismuth masking technique for use on injection laser diodes as means of uniformity evaluation and spontaneous control and product |
US3914969A (en) * | 1973-04-18 | 1975-10-28 | Nasa | Apparatus for forming dished ion thruster grids |
JPS5382278A (en) * | 1976-12-28 | 1978-07-20 | Toshiba Corp | Production of semiconductor device |
DE3588046T2 (de) * | 1984-03-19 | 1996-01-11 | Univ Kent | Lichtmodulierendes Material, das in einer Kunstharzmatrix dispergierte Flüssigkristalle umfasst. |
AU576219B2 (en) * | 1985-02-18 | 1988-08-18 | Stc Plc | Dynamic hologram recording |
-
1983
- 1983-02-07 US US06/464,442 patent/US4470856A/en not_active Expired - Fee Related
- 1983-12-16 WO PCT/US1983/001989 patent/WO1984003176A1/en active IP Right Grant
- 1983-12-16 JP JP59500608A patent/JPS60500554A/ja active Pending
- 1983-12-16 DE DE8484900442T patent/DE3371446D1/de not_active Expired
- 1983-12-16 AU AU24349/84A patent/AU568629B2/en not_active Expired
- 1983-12-16 EP EP84900442A patent/EP0137790B1/en not_active Expired
-
1984
- 1984-02-06 CA CA000446795A patent/CA1202710A/en not_active Expired
- 1984-08-27 DK DK407884A patent/DK160113C/da not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
AU2434984A (en) | 1984-08-30 |
EP0137790B1 (en) | 1987-05-06 |
CA1202710A (en) | 1986-04-01 |
DK407884A (da) | 1984-08-27 |
EP0137790A1 (en) | 1985-04-24 |
WO1984003176A1 (en) | 1984-08-16 |
JPS60500554A (ja) | 1985-04-18 |
AU568629B2 (en) | 1988-01-07 |
DK160113C (da) | 1991-07-01 |
DE3371446D1 (en) | 1987-06-11 |
US4470856A (en) | 1984-09-11 |
DK160113B (da) | 1991-01-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUP | Patent expired |