DK2937954T3 - Excimer-laser-kombinationsresonator - Google Patents

Excimer-laser-kombinationsresonator Download PDF

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Publication number
DK2937954T3
DK2937954T3 DK12890192.3T DK12890192T DK2937954T3 DK 2937954 T3 DK2937954 T3 DK 2937954T3 DK 12890192 T DK12890192 T DK 12890192T DK 2937954 T3 DK2937954 T3 DK 2937954T3
Authority
DK
Denmark
Prior art keywords
excimer laser
laser combination
combination resonator
resonator
excimer
Prior art date
Application number
DK12890192.3T
Other languages
English (en)
Inventor
Yi Zhou
Yaoying Shan
Yuanyuan Fan
Xingliang Song
Lijia Zhang
Huirong Cui
Yu Wang
Original Assignee
Rainbow Source Laser
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rainbow Source Laser filed Critical Rainbow Source Laser
Application granted granted Critical
Publication of DK2937954T3 publication Critical patent/DK2937954T3/da

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/082—Construction or shape of optical resonators or components thereof comprising three or more reflectors defining a plurality of resonators, e.g. for mode selection or suppression
    • H01S3/0823—Construction or shape of optical resonators or components thereof comprising three or more reflectors defining a plurality of resonators, e.g. for mode selection or suppression incorporating a dispersive element, e.g. a prism for wavelength selection
    • H01S3/0826—Construction or shape of optical resonators or components thereof comprising three or more reflectors defining a plurality of resonators, e.g. for mode selection or suppression incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H01S3/08009—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection using a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/081—Construction or shape of optical resonators or components thereof comprising three or more reflectors
    • H01S3/082—Construction or shape of optical resonators or components thereof comprising three or more reflectors defining a plurality of resonators, e.g. for mode selection or suppression
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08018—Mode suppression
    • H01S3/08022—Longitudinal modes
    • H01S3/08031—Single-mode emission
    • H01S3/08036—Single-mode emission using intracavity dispersive, polarising or birefringent elements

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
DK12890192.3T 2012-12-20 2012-12-20 Excimer-laser-kombinationsresonator DK2937954T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/CN2012/086971 WO2014094262A1 (zh) 2012-12-20 2012-12-20 准分子激光器复合腔

Publications (1)

Publication Number Publication Date
DK2937954T3 true DK2937954T3 (da) 2020-10-19

Family

ID=50977555

Family Applications (1)

Application Number Title Priority Date Filing Date
DK12890192.3T DK2937954T3 (da) 2012-12-20 2012-12-20 Excimer-laser-kombinationsresonator

Country Status (7)

Country Link
US (1) US9325143B2 (da)
EP (1) EP2937954B1 (da)
JP (1) JP2016500482A (da)
KR (1) KR101804551B1 (da)
DK (1) DK2937954T3 (da)
RU (1) RU2607815C1 (da)
WO (1) WO2014094262A1 (da)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101710792B1 (ko) 2015-07-14 2017-02-28 주식회사 유영제약 세레콕시브 및 트라마돌을 함유하는 약제학적 조성물
CN111541142A (zh) * 2020-05-08 2020-08-14 中国航空制造技术研究院 脉冲激光光束的合成方法及装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2715608B2 (ja) * 1990-01-12 1998-02-18 松下電器産業株式会社 狭帯域化レーザ装置
US5150370A (en) 1989-06-14 1992-09-22 Matsushita Electric Industrial Co., Ltd. Narrow-band laser apparatus
JP2631567B2 (ja) * 1989-10-25 1997-07-16 株式会社小松製作所 狭帯域発振エキシマレーザ
JPH03255688A (ja) * 1990-03-05 1991-11-14 Nec Corp 波長狭帯域化エキシマレーザ発振器
JPH05291674A (ja) * 1992-04-06 1993-11-05 Mitsubishi Electric Corp 狭帯域化光学素子
JP2729447B2 (ja) * 1992-11-18 1998-03-18 株式会社小松製作所 狭帯域レーザ装置
CN1050234C (zh) * 1996-01-05 2000-03-08 中国科学院物理研究所 复合腔调谐光参量振荡器
US6286326B1 (en) * 1998-05-27 2001-09-11 Worksmart Energy Enterprises, Inc. Control system for a refrigerator with two evaporating temperatures
US6700915B2 (en) * 1999-03-12 2004-03-02 Lambda Physik Ag Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections
US6801560B2 (en) * 1999-05-10 2004-10-05 Cymer, Inc. Line selected F2 two chamber laser system
US6594291B1 (en) * 1999-06-16 2003-07-15 Komatsu Ltd. Ultra narrow band fluorine laser apparatus and fluorine exposure apparatus
JP2001044550A (ja) * 1999-08-03 2001-02-16 Komatsu Ltd 超狭帯域化レーザ装置
JP3365500B2 (ja) * 2000-01-19 2003-01-14 ウシオ電機株式会社 狭帯化ＡｒＦエキシマレーザ装置
CN1411113A (zh) * 2001-10-08 2003-04-16 中国科学院物理研究所 大功率全固态红、黄、蓝光激光装置
WO2007053335A2 (en) * 2005-11-01 2007-05-10 Cymer, Inc. Laser system
JP4972427B2 (ja) * 2007-02-15 2012-07-11 株式会社小松製作所 高繰返し動作が可能で狭帯域化効率の高いエキシマレーザ装置
CN102810810A (zh) * 2012-03-02 2012-12-05 中国科学院光电研究院 单腔双电极放电腔及准分子激光器
CN102969649A (zh) * 2012-12-20 2013-03-13 中国科学院光电研究院 准分子激光器复合腔

Also Published As

Publication number Publication date
WO2014094262A1 (zh) 2014-06-26
EP2937954B1 (en) 2020-07-22
US20150372443A1 (en) 2015-12-24
EP2937954A4 (en) 2016-09-07
JP2016500482A (ja) 2016-01-12
KR20150099808A (ko) 2015-09-01
EP2937954A1 (en) 2015-10-28
RU2607815C1 (ru) 2017-01-20
US9325143B2 (en) 2016-04-26
KR101804551B1 (ko) 2017-12-04

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