DK15979A - Poleremiddel til silicium og germaniumflader - Google Patents
Poleremiddel til silicium og germaniumfladerInfo
- Publication number
- DK15979A DK15979A DK15979A DK15979A DK15979A DK 15979 A DK15979 A DK 15979A DK 15979 A DK15979 A DK 15979A DK 15979 A DK15979 A DK 15979A DK 15979 A DK15979 A DK 15979A
- Authority
- DK
- Denmark
- Prior art keywords
- silicium
- polisher
- germany
- germany surfaces
- Prior art date
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30625—With simultaneous mechanical treatment, e.g. mechanico-chemical polishing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/869,402 US4260396A (en) | 1978-01-16 | 1978-01-16 | Compositions for polishing silicon and germanium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK15979A true DK15979A (da) | 1979-07-17 |
Family
ID=25353488
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK15979A DK15979A (da) | 1978-01-16 | 1979-01-15 | Poleremiddel til silicium og germaniumflader |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US4260396A (da) |
| JP (1) | JPS54128890A (da) |
| BE (1) | BE873482A (da) |
| DE (1) | DE2901401A1 (da) |
| DK (1) | DK15979A (da) |
| FR (1) | FR2414387A1 (da) |
| GB (1) | GB2013234B (da) |
| IT (1) | IT1110025B (da) |
| NL (1) | NL7900298A (da) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4474824A (en) | 1978-05-24 | 1984-10-02 | W. R. Grace & Co. | Methods of preparing hydrous silica gels |
| US5037484A (en) * | 1981-04-20 | 1991-08-06 | Alcon Laboratories, Inc. | Cleaning agent for optical surfaces |
| US4670060A (en) * | 1981-04-20 | 1987-06-02 | Alcon Laboratories, Inc. | Cleaning agent for optical surfaces |
| US4493783A (en) * | 1981-04-20 | 1985-01-15 | Alcon Laboratories, Inc. | Cleaning agent for optical surfaces |
| US4792414A (en) * | 1981-04-20 | 1988-12-20 | Alcon Laboratories, Inc. | Cleaning agent for optical surfaces |
| JPS5935429A (ja) * | 1982-08-12 | 1984-02-27 | インタ−ナシヨナル ビジネス マシ−ンズ コ−ポレ−シヨン | 半導体ウエハの製造方法 |
| DE3236180A1 (de) * | 1982-09-30 | 1984-04-05 | Akzo Gmbh, 5600 Wuppertal | Mit tensid beladene kieselsaeure, verfahren zu deren herstellung und deren verwendung |
| JPS61136909A (ja) * | 1984-12-04 | 1986-06-24 | Mitsubishi Chem Ind Ltd | 無水ケイ酸の水分散液組成物 |
| US4752628A (en) * | 1987-05-15 | 1988-06-21 | Nalco Chemical Company | Concentrated lapping slurries |
| EP0322721B1 (en) * | 1987-12-29 | 1993-10-06 | E.I. Du Pont De Nemours And Company | Fine polishing composition for wafers |
| KR930002764B1 (ko) * | 1988-06-03 | 1993-04-10 | 닛뽄 몬산토 가부시끼가이샤 | 실리콘 웨이퍼 연마용 화합물 |
| US4867757A (en) * | 1988-09-09 | 1989-09-19 | Nalco Chemical Company | Lapping slurry compositions with improved lap rate |
| US5234493A (en) * | 1988-11-08 | 1993-08-10 | Rhone-Poulenc Chimie | Stable, pumpable aqueous suspensions of precipitated silica particulates |
| FR2638756B1 (fr) * | 1988-11-08 | 1992-04-24 | Rhone Poulenc Chimie | Suspension aqueuse stable de silice de precipitation |
| US5352277A (en) * | 1988-12-12 | 1994-10-04 | E. I. Du Pont De Nemours & Company | Final polishing composition |
| JP2714411B2 (ja) * | 1988-12-12 | 1998-02-16 | イー・アイ・デュポン・ドゥ・ヌムール・アンド・カンパニー | ウェハーのファイン研摩用組成物 |
| JPH0445231U (da) * | 1990-08-20 | 1992-04-16 | ||
| CA2126137A1 (en) * | 1993-06-23 | 1994-12-24 | Robert Anthony Labrash | Low misting sprayable dispersion of colloidal silica with xanthan gum |
| US5709593A (en) * | 1995-10-27 | 1998-01-20 | Applied Materials, Inc. | Apparatus and method for distribution of slurry in a chemical mechanical polishing system |
| KR970042941A (ko) * | 1995-12-29 | 1997-07-26 | 베일리 웨인 피 | 기계적 화학적 폴리싱 공정을 위한 폴리싱 합성물 |
| US5645736A (en) * | 1995-12-29 | 1997-07-08 | Symbios Logic Inc. | Method for polishing a wafer |
| ATE214418T1 (de) * | 1997-04-17 | 2002-03-15 | Merck Patent Gmbh | Pufferlösungen für suspensionen, verwendbar zum chemisch-mechanischen polieren |
| JPH10309660A (ja) | 1997-05-07 | 1998-11-24 | Tokuyama Corp | 仕上げ研磨剤 |
| TW419518B (en) * | 1998-02-20 | 2001-01-21 | Ind Tech Res Inst | Non-Newtonian-fluid-behaviored formulation |
| JP5017574B2 (ja) * | 2001-05-25 | 2012-09-05 | エア プロダクツ アンド ケミカルズ インコーポレイテッド | 酸化セリウム研磨剤及び基板の製造方法 |
| US6685540B2 (en) | 2001-11-27 | 2004-02-03 | Cabot Microelectronics Corporation | Polishing pad comprising particles with a solid core and polymeric shell |
| US7405098B2 (en) * | 2005-02-28 | 2008-07-29 | Sharp Laboratories Of America, Inc. | Smooth surface liquid phase epitaxial germanium |
| CN115466573B (zh) * | 2022-09-05 | 2024-02-20 | 广州飞雪芯材有限公司 | 一种用于单晶硅晶圆片的抛光液及其应用 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2765223A (en) * | 1952-08-05 | 1956-10-02 | Lea Mfg Company | Buffing compositions |
| US3170273A (en) * | 1963-01-10 | 1965-02-23 | Monsanto Co | Process for polishing semiconductor materials |
| US3275460A (en) * | 1964-11-23 | 1966-09-27 | Foseco Int | Mold dressings for use in foundry practice |
| US3428464A (en) * | 1965-02-02 | 1969-02-18 | Alchem Ltd | Refractory coating compositions |
| US3462251A (en) * | 1965-10-08 | 1969-08-19 | Ford Motor Co | Aqueous based lapping composition |
| US3328141A (en) * | 1966-02-28 | 1967-06-27 | Tizon Chemical Corp | Process for polishing crystalline silicon |
| US3429080A (en) * | 1966-05-02 | 1969-02-25 | Tizon Chem Corp | Composition for polishing crystalline silicon and germanium and process |
| US3455705A (en) * | 1968-03-07 | 1969-07-15 | Du Pont | Silicious compositions for coating heat sensitive surfaces |
| US3619962A (en) * | 1969-09-25 | 1971-11-16 | Gordon C Combe | Metal cleaner |
| US3715842A (en) * | 1970-07-02 | 1973-02-13 | Tizon Chem Corp | Silica polishing compositions having a reduced tendency to scratch silicon and germanium surfaces |
| US3817727A (en) * | 1972-03-17 | 1974-06-18 | Union Carbide Corp | Abrasive polishing suspensions and method for making same |
| US3821008A (en) * | 1972-03-20 | 1974-06-28 | Gen Mills Chem Inc | Suspending agent for refractory paints |
| DE2248719A1 (de) * | 1972-10-04 | 1974-04-11 | Alexandr Serafimowits Artjomow | Poliermittel fuer oberflaechen von festen koerpern |
| GB1471278A (en) * | 1973-07-06 | 1977-04-21 | Colgate Palmolive Co | Liquid abrasive compositions |
| US4038048A (en) * | 1975-02-14 | 1977-07-26 | Thrower Jr Herbert T | Lapping composition containing a carboxy vinyl polymer |
| US4057939A (en) * | 1975-12-05 | 1977-11-15 | International Business Machines Corporation | Silicon wafer polishing |
-
1978
- 1978-01-16 US US05/869,402 patent/US4260396A/en not_active Expired - Lifetime
-
1979
- 1979-01-15 GB GB7901473A patent/GB2013234B/en not_active Expired
- 1979-01-15 IT IT19307/79A patent/IT1110025B/it active
- 1979-01-15 BE BE192901A patent/BE873482A/xx not_active IP Right Cessation
- 1979-01-15 DK DK15979A patent/DK15979A/da not_active Application Discontinuation
- 1979-01-15 NL NL7900298A patent/NL7900298A/xx not_active Application Discontinuation
- 1979-01-15 DE DE19792901401 patent/DE2901401A1/de not_active Withdrawn
- 1979-01-15 FR FR7900906A patent/FR2414387A1/fr active Pending
- 1979-01-16 JP JP233679A patent/JPS54128890A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| IT7919307A0 (it) | 1979-01-15 |
| DE2901401A1 (de) | 1979-07-19 |
| GB2013234A (en) | 1979-08-08 |
| FR2414387A1 (fr) | 1979-08-10 |
| JPS6114655B2 (da) | 1986-04-19 |
| IT1110025B (it) | 1985-12-23 |
| US4260396A (en) | 1981-04-07 |
| JPS54128890A (en) | 1979-10-05 |
| BE873482A (fr) | 1979-05-02 |
| GB2013234B (en) | 1982-09-02 |
| NL7900298A (nl) | 1979-07-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| AHS | Application shelved for other reasons than non-payment |