DK1491950T3 - Mikroindretning og fremgangsmåde til dens fremstilling - Google Patents
Mikroindretning og fremgangsmåde til dens fremstillingInfo
- Publication number
- DK1491950T3 DK1491950T3 DK03014140.2T DK03014140T DK1491950T3 DK 1491950 T3 DK1491950 T3 DK 1491950T3 DK 03014140 T DK03014140 T DK 03014140T DK 1491950 T3 DK1491950 T3 DK 1491950T3
- Authority
- DK
- Denmark
- Prior art keywords
- micro
- manufacture
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0035—Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C99/00—Subject matter not provided for in other groups of this subclass
- B81C99/0075—Manufacture of substrate-free structures
- B81C99/0085—Manufacture of substrate-free structures using moulds and master templates, e.g. for hot-embossing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
- ing And Chemical Polishing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03014140A EP1491950B1 (en) | 2003-06-24 | 2003-06-24 | Micro device and process for producing it |
Publications (1)
Publication Number | Publication Date |
---|---|
DK1491950T3 true DK1491950T3 (da) | 2012-02-27 |
Family
ID=33395851
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK03014140.2T DK1491950T3 (da) | 2003-06-24 | 2003-06-24 | Mikroindretning og fremgangsmåde til dens fremstilling |
Country Status (4)
Country | Link |
---|---|
US (1) | US6953751B2 (da) |
EP (1) | EP1491950B1 (da) |
JP (1) | JP2005014203A (da) |
DK (1) | DK1491950T3 (da) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102249181A (zh) * | 2011-03-28 | 2011-11-23 | 大连理工大学 | 一种su-8胶微力传感器的制作方法 |
CN111071984B (zh) * | 2019-12-23 | 2023-04-07 | 湖南大学 | 一种选择性剥离光刻胶制备微纳结构的方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3746823B2 (ja) * | 1996-01-25 | 2006-02-15 | イビデン株式会社 | プリント配線板における永久レジストの形成方法 |
US6178221B1 (en) * | 1998-12-04 | 2001-01-23 | Advanced Micro Devices, Inc. | Lithography reflective mask |
US6482553B1 (en) * | 1999-06-28 | 2002-11-19 | Board Of Supervisors Of Louisiana State University And Agricultural And Mechanical College | Graphite mask for x-ray or deep x-ray lithography |
US6391523B1 (en) * | 2000-09-15 | 2002-05-21 | Microchem Corp. | Fast drying thick film negative photoresist |
JP2002161388A (ja) * | 2000-11-24 | 2002-06-04 | Canon Inc | マイクロ構造体の作製方法、該作製方法によるレンズ支持具の作製方法とフレア絞りの作製方法、及びレンズ支持具とフレア絞り |
JP2002192497A (ja) * | 2000-12-27 | 2002-07-10 | Matsushita Electric Works Ltd | 半導体マイクロアクチュエータ |
US6821896B1 (en) * | 2001-05-31 | 2004-11-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method to eliminate via poison effect |
KR100396559B1 (ko) * | 2001-11-05 | 2003-09-02 | 삼성전자주식회사 | 일체형 잉크젯 프린트헤드의 제조 방법 |
-
2003
- 2003-06-24 EP EP03014140A patent/EP1491950B1/en not_active Expired - Lifetime
- 2003-06-24 DK DK03014140.2T patent/DK1491950T3/da active
- 2003-07-30 US US10/631,421 patent/US6953751B2/en not_active Expired - Fee Related
-
2004
- 2004-05-07 JP JP2004138462A patent/JP2005014203A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP1491950B1 (en) | 2011-11-09 |
US20040266049A1 (en) | 2004-12-30 |
US6953751B2 (en) | 2005-10-11 |
EP1491950A1 (en) | 2004-12-29 |
JP2005014203A (ja) | 2005-01-20 |
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