DK143571B - METHOD OF DEPOSITION OF METAL - Google Patents

METHOD OF DEPOSITION OF METAL Download PDF

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DK143571B
DK143571B DK604170A DK604170A DK143571B DK 143571 B DK143571 B DK 143571B DK 604170 A DK604170 A DK 604170A DK 604170 A DK604170 A DK 604170A DK 143571 B DK143571 B DK 143571B
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metal
plating solution
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T D Andrews
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Ici Ltd
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • B41M5/32Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers one component being a heavy metal compound, e.g. lead or iron
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1608Process or apparatus coating on selected surface areas by direct patterning from pretreatment step, i.e. selective pre-treatment
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1603Process or apparatus coating on selected surface areas
    • C23C18/1607Process or apparatus coating on selected surface areas by direct patterning
    • C23C18/1612Process or apparatus coating on selected surface areas by direct patterning through irradiation means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1633Process of electroless plating
    • C23C18/1646Characteristics of the product obtained
    • C23C18/165Multilayered product
    • C23C18/1653Two or more layers with at least one layer obtained by electroless plating and one layer obtained by electroplating
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/733Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds with macromolecular compounds as photosensitive substances, e.g. photochromic
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/58Processes for obtaining metallic images by vapour deposition or physical development

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemically Coating (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Battery Electrode And Active Subsutance (AREA)

Description

(19) DANMARK(19) DENMARK

W (12) FREMLÆGGELSESSKRIFT <n> 11+3571 BW (12) PUBLICATION <n> 11 + 3571 B

DIREKTORATET FOR PATENT- OQ VAREMÆRKEVÆSENETDIRECTORATE OF THE PATENT-OQ TRADEMARK

(21) Ansøgning nr. 6041/70 (51) |m.CI.3 0 23 C 3/02 (22) Indleveringsdag 26. nov. 1970 (24) Løbedag 26. nov. 1970 (41) Aim. tilgængelig 27. maj 1971 (44) Fremlagt 7. s ep. 1981 (86) International ansøgning nr. -(86) International indleveringsdag -(85) Videreførelsesdag -(62) Stamansøgning nr. -(21) Application No. 6041/70 (51) | m.CI.3 0 23 C 3/02 (22) Filing date 26 Nov. 1970 (24) Race day Nov 26 1970 (41) Aim. available May 27, 1971 (44) Presented 7. s ep. 1981 (86) International Application No. - (86) International Filing Day - (85) Continuation Day - (62) Master Application No. -

(30) Prioritet 26. nov. 1969, 57862/69, GB 26. maj 1970, 25205/70, GB(30) Priority 26 Nov. 1969, 57862/69, GB May 26, 1970, 25205/70, GB

(71) Ansøger MPERIAL CHEMICAL INDUSTRIES LIMITED, London S.W.1 ., GB.(71) Applicant MPERIAL CHEMICAL INDUSTRIES LIMITED, London S.W.1., GB.

(72) Opfinder Timothy Douglas Andrews, GB.(72) Inventor Timothy Douglas Andrews, GB.

(74) Fuldmægtig Firmaet Chas. Hude.(74) Associate Company Chas. Hude.

(54) Fremgangsmåde til udfældning af metal.(54) Method of precipitating metal.

Opfindelsen angår en fremgangsmåde til udfældning af metal i eller på et substrat ved at bringe substratet i kontakt med en strømløs pletteringsopløsning.The invention relates to a method for precipitating metal into or onto a substrate by contacting the substrate with a powerless plating solution.

Aflejringen af metal på et substrat ved strømløs plettering er ikke ny og er blevet beskrevet f.eks. i U.S. patentskrift nr. 3.033.703 og svensk fremlæggelsesskrift nr. 304.662. Den foreliggende opfln-The deposition of metal on a substrate by powerless plating is not new and has been described e.g. in the U.S. Patent Specification No. 3,033,703 and Swedish Publication No. 304,662. The present invention

GQGQ

delse anvender en særlig nyttig gruppe af organiske forbindelser T*““ som centrer for aflejring, hvilket giver en særlig fordelagtig foto-^ producerbar radikal kationreducerende form med betydelig oxidativ stabilitet, hvilket muliggør fremstillingen af stabile billedmæssige aflejringer.The compound utilizes a particularly useful group of organic compounds T * '' as deposition centers, providing a particularly advantageous photo-reproducible radical cation-reducing form with significant oxidative stability, which enables the production of stable image deposits.

* ® Fremgangsmåden ifølge opfindelsen er ejendommelig ved, at der i eller 2 143571 på substratet er en aktiv komponent dannet ved mindst partiel reduktion af et salt med formlen:The process of the invention is characterized in that in or on the substrate there is an active component formed by at least partial reduction of a salt of the formula:

'Jof-(CH=CH, n 7^X'Jof- (CH = CH, n 7 ^ X

Λ N R RΛ N R R

— Ill —1- Ill —1

RR

eller 3 8or 3 8

R RR R

"ΐΛ/'4 Vv*9 T 04- (CH = CH) n —01 2x rJA^A r* „sA^A.« ]l2 R11 hvori R1-r1° betegner hydrogen, halogen eller hydrocarbongrupper, idet en eller flere af grupperne kan være forbundet med andre på den 11 12 samme ring eller naboheterocykliske ringe, R og R betegner hydrogen, hydrocarbon- eller substituerede hydrocarbongrupper, n er 0 eller et helt tal, og X er en anion."ΐΛ / '4 Vv * 9 T 04- (CH = CH) n -01 2x rJA ^ A r *" sA ^ A. "] l2 R11 wherein R1-r1 ° represents hydrogen, halogen or hydrocarbon groups, one or more of the groups may be linked to others on the same ring or neighboring heterocyclic rings, R and R represent hydrogen, hydrocarbon or substituted hydrocarbon groups, n is 0 or an integer, and X is an anion.

Udtrykket "strømløs pletteringsopløsning" anvendes i sin sædvanlige betydning i elektropletteringsteknologien, d.v.s. en opløsning indeholdende et metalsalt og et reduktionsmiddel, som er i stand til at udfælde metal uden påtrykning af et ydre elektrisk potentiale. Den foreliggende opfindelse består i opdagelsen af, at de ovenfor definerede organiske forbindelser efter reduktion er i stand til at forårsage, at metal udfældes fra den strømløse pletteringsopløsning.The term "powerless plating solution" is used in its usual sense in electroplating technology, i.e. a solution containing a metal salt and a reducing agent capable of precipitating metal without exerting an external electrical potential. The present invention consists in the discovery that, after reduction, the above-described organic compounds are capable of causing metal to precipitate from the powerless plating solution.

Når et metalspor en gang er blevet udfældet på det organiske materiale, er det således udfældede metal i stand til at katalysere yderligere udfældning af det samme metal eller et andet metal fra den passende opløsning, og et metallag kan opbygges.Once a metal trace has been precipitated on the organic material, the thus precipitated metal is capable of catalyzing further precipitation of the same metal or another metal from the appropriate solution and a metal layer can be built up.

Substratet, som indeholder eller består af de i krav 1 omhandlede 3 1*3571 organiske forbindelser, kan eventuelt først bringes i kontakt med en sensibilisator, som omfatter en opløsning af en forbindelse af et metal fra platingruppen (Hu, Rh, Pd, Os, Ir, Pt), sølv eller guld, og derpå med den strømløse pletteringsopløsning. Denne teknik foretrækkes i nogle tilfælde, hvor strømløs plettering ligeud uden sensibilisafcoren kræver en for lang behandlingstid eller en for høj temperatur til, at det er hensigtsmæssigt.The substrate containing or consisting of the 3 1 * 3571 organic compounds of claim 1 may optionally be first contacted with a sensitizer which comprises a solution of a compound of a metal from the plate group (Hu, Rh, Pd, Os, Ir, Pt), silver or gold, and then with the powerless plating solution. This technique is preferred in some cases where powerless plating without the sensitivities requires too long processing time or too high a temperature to be appropriate.

SubstratetThe substrate

Den aktive komponent i substratet er dannet ved reduktion af de i krav 1 angivne forbindelser. Den aktive komponent kan selv udgøre substratet, eller en bærer kan anvendes til at bære den aktive komponent på sig eller i sig. Bæreren kan være inaktiv over for den aktive komponent eller kan have en stabiliserende indvirkning derpå. På denne måde kan nogle normalt særdeles aktive radikaler stabiliseres til at tillade behandling med den strømløse pletteringsopløsning, selv om der er en forsinkelse mellem deres dannelse og reaktion med pletteringsopløsningen.The active component of the substrate is formed by reducing the compounds of claim 1. The active component may itself constitute the substrate, or a carrier may be used to carry the active component on or in itself. The carrier may be inactive to the active component or may have a stabilizing effect thereon. In this way, some usually extremely active radicals can be stabilized to allow treatment with the powerless plating solution, although there is a delay between their formation and reaction with the plating solution.

Foretrukne radikalkatloner} som kan anvendes, er de, som indeholder to umættede heterocycliske.eller azulenringsystemer (som begge kan være substitueret) bundet direkte eller ved hjælp af en kæde af konjugeret umætning. Eksempler på sådanne radikalkabioner er tetrathiotetracen, tetraselentetracen, bis-(indolizinum)-ethylen, bis-(benzthiazolinyli= den)-azin, bis-(quinolyl)-azin og bis-(azulenyl)-ethylen og substituerede derivater deraf, specielt med lavere alkyl (1-10 carbonatomer) og aryl, f.eks. phenylsubstituenter. Disse radikalkationer anvendes i form af salte af anioner, såsom halogenid, perchlorat, tetrafluorborat, methylsulfat, bisulfat, acetat og polymere anioner, såsom poly-(p-vi= nylbenzensulfonat), poly-(acrylat) og poly-(styrylphosphonat).Preferred radical catalysts which may be used are those containing two unsaturated heterocyclic or azulene ring systems (both of which may be substituted) bonded directly or by a chain of conjugated unsaturation. Examples of such radical cations are tetrathiotetracene, tetraselentetracene, bis- (indolizinum) -ethylene, bis- (benzthiazolinylidene) -azine, bis- (quinolyl) -azine and bis- (azulenyl) -ethylene and substituted derivatives thereof, especially with lower alkyl (1-10 carbon atoms) and aryl, e.g. phenyl residues. These radical cations are used in the form of salts of anions such as halide, perchlorate, tetrafluoroborate, methylsulfate, bisulfate, acetate and polymeric anions such as poly (p-viylnylbenzenesulfonate), poly (acrylate) and poly (styrylphosphonate).

En anden gruppe af radikalkationer er den, som ved reduktion er afledt af gruppen af dikationer, hvorpå den ovennævnte definition af aktive neutrale forbindelser er baseret. Denne sammenhæng vil fremgå tydligere ved hjælp af følgende ligning. Forbindelser, såsom bipyridyler kan oxideres/reduceres ifølge skemaet: + +Λ ,, e .* e z fc-----------------> z+ ,............--> z -e -eAnother group of radical cations is that which, by reduction, is derived from the group of dications on which the aforementioned definition of active neutral compounds is based. This relationship will become clearer by using the following equation. Compounds such as bipyridyls can be oxidized / reduced according to the scheme: + + Λ ,, e. * Ez fc -----------------> z +, ......... ...--> z -e -e

En dikation (den normalt stabile oxidationstilstand i vandige medier), leveret med en enkelt elektron, danner således en radikalkation, som *43571 4 med en yderligere elektron omdannes til den neutrale forbindelse. Både Z+* og Z er aktive på den krævede måde i overensstemmelse med opfindelsen med elektrolysefri pletteringsopløsninger, hvor Z+ er den stabile form i vandige medier.Thus, a dication (the normally stable oxidation state in aqueous media), delivered with a single electron, forms a radical cation which * 43571 4 with an additional electron is converted to the neutral compound. Both Z + * and Z are active in the required manner in accordance with the invention with electrolysis-free plating solutions, where Z + is the stable form in aqueous media.

Som nævnt anvendes i forbindelse med den foreliggende opfindelse neutrale forbindelser og radikalkationer afledt af dikationer med den almene formel (1).As mentioned, in the context of the present invention, neutral compounds and radical cations derived from dictations of the general formula (1) are used.

R3 R8 i*9R3 R8 i * 9

Yl·- * ch,^OL (i> r1 IT R^ R6 N R10 11 R1^ jjll 1-12 hvor R har de ovenfor anførte betydninger.Yl · - * ch, ^ OL (i> r1 IT R ^ R6 N R10 11 R1 ^ jjll 1-12 where R has the meanings given above.

Bindingen sammenkæder sædvanligvis de to aromatiske ringe i 4,4'- eller 2,2'-stillingen, når den erstatter R3'8 eller R5'6, f.eks. 2,2'-bipyri-dyler og 4,4'-bipyridyler.The bond usually links the two aromatic rings in the 4,4 'or 2,2' position when replacing R3'8 or R5'6, e.g. 2,2'-bipyridyls and 4,4'-bipyridyls.

Substituentpar på den samme ring eller naboringe kan være bindinger, som danner cycliske sturkturer. X forbindelser, som indeholder en !+,V-bipyridylstruktur (2) h1\/r2 h9 \/10 B12 " R11 ^2' B? Ή*· b7 r6 kan par af R-grupper, f.eks. være forbundet således, at der dannes en 12 h.Substituent pairs on the same ring or neighboring rings can be bonds that form cyclic structures. X compounds containing a +, V-bipyridyl structure (2) h1 \ / r2 h9 \ / 10 B12 "R11 ^ 2 'B? Ή * b7 r6 may be pairs of R groups, e.g. , that a 12 h.

enkelt divalent umættet organisk gruppe, specielt parrene R 5 , R ’·, jj9j10, r2,9 0g ^7. x (Xe første fire af disse tilfælde kan den divalente organiske gruppe danne en sammensmeltet aromatisk ring, så- 2 Q Ll 7 som i biquinolylforbindelser. Når savel R ’7 og R ’1 er bundet ved hjælp af ethyleniske grupper, dannes en diazapyrenkerne.single divalent unsaturated organic group, especially the pairs R 5, R '·, jj9j10, r2.9 0g ^ 7. x (Xe. In the first four of these cases, the divalent organic group can form a fused aromatic ring, such as 2 Q Ll7 as in biquinolyl compounds. When both R '7 and R' 1 are bonded by ethylenic groups, a diazapyrene nucleus is formed.

win Όwin Ό

Den aktive forbindelse kan være en simpel forbindelse eller radikalkat= ion,eller den kan være en del af et mere komplekst molekyle, som i di« mere. Den kan også være polymer, i hvilket tilfælde den aktive enhed kan indgå i polymerskelettet i endegrupper eller i sidekæder eller i kombinationer af sådanne stillinger.The active compound may be a simple compound or radical cation, or it may be part of a more complex molecule, as in di. It may also be polymer, in which case the active moiety may form in the polymer backbone in end groups or in side chains or in combinations of such positions.

De definerede neutrale forbindelser og radikalkationer, som er beskrevet alment ovenfor og som vil blive beskrevet mere indgående i de efterfølgende eksempler, har det fælles træk, at de kan dannes af en kat« ionisk forbindelse ved påvirkning af varme eller stråling. Salte, som indeholder monokationer, reduceres til neutrale radikaler.The defined neutral compounds and radical cations described above and which will be described in more detail in the following Examples have the common feature that they can be formed by a cationic compound under the influence of heat or radiation. Salts containing monocations are reduced to neutral radicals.

Eksempler på monomere kationer med de ovennævnte egenskaber er (3)-(8).Examples of monomeric cations having the above properties are (3) - (8).

«(O).....^jV-bipyridylium (P) (3) --o—O IJ+- H-jVbiquinolinium (¾) (*f)((O) ^ ^ b-bipyridylium (P) (3) -o-O IJ + - H-V biquinolinium (¾) (f f)

o Bo B

-+ø>CH= ljP-bis-i^-pyridyl)-ethylen (E) (5) Λ"0>-Λ -+N ( ) )-/( ) N+- 2,7-diazapyrinium (A) (6) 2,2'- bipyridyl (B) (7) I+ | + ........(^^+- !+-(V-pyridyl)-pyridinlum (M) (8) 6 143571- + δ> CH = 1β-bis-1β-pyridyl) -ethylene (E) (5) Λ "0> -Λ - + N ()) - / () N + - 2,7-diazapyrinium (A) ( 6) 2,2'-bipyridyl (B) (7) I + | + ........ (^^ + - + + - (V-pyridyl) -pyridine lumen (M)

Referencebogstavet, som er anført efter hvert navn, vil i den følgende beskrivelse blive anvendt til at angive den passende kationenhed for at undgå at gentage hele strukturformlen. CH^-P-CH^,2C1“ repræsenterer således N,Ν' -dimethyl-1·!-, V -bipyridyliumchlorid. Det er underforstået, at i denne nomenklatur er CH^-grupperne bundet til nitrogenet. Det må imidlertid forstås, at substitution på carbonatornerne i kerneenheden er mulig. Sådanne substituenter omfatter alkyl-, aryl-, aral= kyl-, alkaryl- og oxyhydrocarbylgrupper. Blandt halogenerne foretrækkes chlor og fluor. Det er ønskeligt, at der ikke forefindes grupper, som let reduceres, f.eks. NOg. Når symbolerne P, D, Q etc. således anvendes, er det klart at såvel som stamforbindelsen kan der også anvendes passende substituerede derivater, f.eks. 2,2'-bipyri= dyliumforbindelser.The reference letter, listed after each name, will be used in the following description to indicate the appropriate cation unit to avoid repeating the entire structural formula. CH 2 -P-CH 2, 2 Cl 1 thus represents N, Ν '-dimethyl-1 · -1, V-bipyridylium chloride. It is understood that in this nomenclature the CH 2 groups are bound to the nitrogen. However, it is to be understood that substitution on the carbon nanotubes in the core unit is possible. Such substituents include alkyl, aryl, aralkyl, alkaryl and oxyhydrocarbyl groups. Among the halogens, chlorine and fluorine are preferred. It is desirable that there be no groups which are easily reduced, e.g. Nog. Thus, when the symbols P, D, Q etc. are used, it is clear that as well as the parent compound, appropriately substituted derivatives, e.g. 2,2'-bipyric = dylium compounds.

Den aktive komponent kan dannes i eller inkorporeres i substratet på forskellige måder. En opløsning af den aktive komponent kan anvendes til at imprægnere et porøst underlag, såsom papir, tøj, træ eller plastskum. Der anvendes et opløsningsmiddel, som er egnet til den aktive komponent, f.eks. organiske opløsningsmidler til neutrale radikaler og neutrale forbindelser, vandige eller organiske opløsningsmidler til kationiske forbindelser. Til mange anvendelser er det gunstigt at fremstille substratet i form af en film. Dette kan let opnås ved opløsningsstøbning, fortrinsvis i nærværelse af et polymert underlag. I tilfældet med radikalkationerne og neutrale forbindelser fremstillet ud fra de definerede dikationer, er den foretrukne metode at understøtte den dikationiske forbindelse i en vandopløselig eller kvældbar .filmdannende polymermatrix og at omdanne den dikationiske enhed til radikalkation eller neutral forbindelse in situ ved hjælp af stråling eller varme. Fremgangsmåden til fremstilling af sådanne film er beskrevet detaljeret vedrørende bipyridyl og beslægtede forbindelser i britisk patentskrift nr. 1.310.812,The active component can be formed into or incorporated into the substrate in various ways. A solution of the active component can be used to impregnate a porous substrate such as paper, clothing, wood or plastic foam. A solvent suitable for the active component is used, e.g. organic solvents for neutral radicals and neutral compounds, aqueous or organic solvents for cationic compounds. For many applications, it is advantageous to prepare the substrate in the form of a film. This can be easily accomplished by solution casting, preferably in the presence of a polymeric support. In the case of the radical cations and neutral compounds prepared from the defined dications, the preferred method is to support the dicationic compound in a water-soluble or swellable film-forming polymer matrix and to convert the dicationic unit to radical cation or neutral compound in situ by radiation or heat . The process for making such films is described in detail regarding bipyridyl and related compounds in British Patent Specification No. 1,310,812.

Til de monomere kationer, som er blevet nævnt tidligere som P, Q, E, A, B, M er ultraviolet bestråling og elektronstråler de foretrukne former for bestråling til omdannelse til radikalkationen, og ved længere tids påvirkning til den neutrale forbindelse.For the monomeric cations previously mentioned as P, Q, E, A, B, M, ultraviolet radiation and electron beams are the preferred forms of radiation for conversion to the radical cation, and for longer exposure to the neutral compound.

Vandopløselig eller en kvældbar polymer, som er velegnet som matrix-materialet, omfatter polyvinylalkohol, polyammoniummethacrylat, gelatine, alginater og maleinsyreanhydrid copolymere, f.eks. med styren-vinylether eller ethylen.Water-soluble or a swellable polymer suitable as the matrix material includes polyvinyl alcohol, polyammonium methacrylate, gelatin, alginates and maleic anhydride copolymers, e.g. with styrene-vinyl ether or ethylene.

7 U3&7 17 U3 & 7 1

Egnede polysaccharider, såsom polysucrose kan også anvendes. Poly= vinylpyrrolidon er også velegnet, og gode resultater er blevet opnået med blandinger af filmdannende polymere, specielt med blandinger af polyvinylalkohol med polyvinylpyrrolidon under anvendelse af 40-80% af sidstnævnte.Suitable polysaccharides such as polysucrose may also be used. Poly = vinylpyrrolidone is also suitable and good results have been obtained with mixtures of film-forming polymers, especially with mixtures of polyvinyl alcohol with polyvinylpyrrolidone using 40-80% of the latter.

De anvendte mængder af salt og filmdannende polymer er ikke særlig kritiske, idet de hovedsageligt dikteres af praktiske overvejelser og krævet sensibilitet. En opløsning til filmstøbning består typisk af vandopløseligt polymer 5-20 dele, salt givende strålingssensibilitet, ligegyldigt om det er simpelt eller polymert, 0,1-10 dele og vand, indtil 100 dele. Alle delene er vægtdele. Lagring og behandling skal naturligvis ske, hvor der ikke er bestråling af den art, som materialerne er følsomme overfor.The amounts of salt and film-forming polymer used are not very critical as they are mainly dictated by practical considerations and required sensitivity. A film casting solution typically consists of water-soluble polymer 5-20 parts, salt-giving radiation sensitivity, whether simple or polymeric, 0.1-10 parts and water up to 100 parts. All parts are parts by weight. Of course, storage and processing must take place where there is no radiation of the kind to which the materials are sensitive.

Selv om vandopløselige polymere foretrækkes kan visse i vand uopløselige polymere anvendes, hvis de er opløst i et egnet opløsningsmiddel. Et eksempel er en copolymer af 1,6-diaminotrimethylhexaner og tereph= thaisyre, som kan støbes til film under anvendelse af et polært opløsningsmiddel, såsom dimethylformamid og et passende salt.Although water-soluble polymers are preferred, certain water-insoluble polymers can be used if dissolved in a suitable solvent. An example is a copolymer of 1,6-diaminotrimethylhexanes and terephthalic acid, which can be cast into films using a polar solvent such as dimethylformamide and a suitable salt.

Eksempler på forbindelser, som indeholder dikationer, som i det mindste kan omdannes til radikalkationer ved varme eller bestråling i nærværelse af en vandopløselig eller kvældbar polymer, er: R - P - R 2X-, hvor R er: (9) -CH3, X = Cl, Br, SiF6, HSO^-, CH^SO^- (10) -CH2-CH2-<gN, X = Cl (21) -CHgCHgOH X = Cl (11) -CH CH.-(0\ X = Cl .i-prop d (22) -(CH2)nC0N^ X = Cl (12) X = Cl i-prop 0CH3 CH3 (23) -CHgCO NH-^-0CH3 X = Cl (13) - ch0coJq\ x = ci * V-/ (2V) -CH.C00C„Hk X = Br CH' 225 (25) -^0)-CN X = Cl (W-CH2^> (26) -<0>o ch3 8 t*SS71 U5) X = C1 (27)-^)-01 (16) -CELC0 NCC^)« X = Cl /—\ 2 252 (28) -<g)-OC2H5 X = Cl (17) -CH.-/0) X = Cl /—v 2 \^/ (29) -(g) X = 01 (18) -CHpCo m-(o) x = ci ^ t-but = tertiær butyl (19) -CH2C0 NH-t-but X = Cl i-prop = isopropyl (20) -(CH2)C0 CH3 X = Br Grupperne R kan være forskellige som iExamples of compounds containing dications which can at least be converted to radical cations by heat or irradiation in the presence of a water-soluble or swellable polymer are: R - P - R 2X-, where R is: (9) -CH 3, X = Cl, Br, SiF6, HSO2 -, CH2 SO2 - (10) -CH2-CH2- <gN, X = Cl (21) -CHgCHgOH X = Cl (11) -CH CH .- (0 \ X = Cl. I -prop d (22) - (CH2) nC0N ^ X = Cl (12) X = Cl i -prop OCH3 CH3 (23) -CHgCO NH - ^ - OCH3 X = Cl (13) - ch0coJq \ x = ci * V- / (2V) -CH.C00C "Hk X = Br CH '225 (25) - ^ 0) -CN X = Cl (W-CH2 ^> (26) - <0> o ch3 8 t * SS71 U5) X = C1 (27) - ^) - 01 (16) -CELC0 NCC ^) «X = Cl / - \ 2 252 (28) - <g) -OC2H5 X = Cl (17) -CH. - / O) X = Cl / -v 2 \ / / (29) - (g) X = 01 (18) -CHpCo m- (o) x = ci ^ t-but = tertiary butyl (19) -CH2CO NH -t-but X = Cl i-prop = isopropyl (20) - (CH 2) CO CH 3 X = Br The groups R may be different as in

(30) ch3-p <g)-CR(30) ch3-p <g) -CR

M-R' X" hvor R' er (3D -(g)-MC0CH? X = Cl (32) -<g)-0C2H5 X = Cl (33) - ch3 X = ClM-R 'X "where R' is (3D - (g) -MCOCH? X = Cl (32) - <g) -0C2H5 X = Cl (33) - ch3 X = Cl

Andre afprøvede forbindelser er (3^) ch3-q-ch3 (CH3S0lf")2 05) <^>-A-<g) (bf,-)2 (36) CH3-E-CH3 (CH^O^ ^CH2 (37) bC^| (Ci")2 ^ch2 9 U9B71Other compounds tested are (3 ^) ch3-q-ch3 (CH3 SO0f) 055 <^> - A- <g) (bf, -) 2 (36) CH3-E-CH3 (CH ^ O ^^ CH2 (37) bC ^ | (Ci ") 2 ^ ch2 9 U9B71

Radikalkationernes farver er i hovedsagen grønne eller blå eller purpur, men andre farver kan opnås, således giver forbindelse C3^-) en lyserød farve.The colors of the radical cations are generally green or blue or purple, but other colors can be obtained, thus compound C3 ^ -) gives a pink color.

(38) CH2 " P " k01~ (39) CH3 - P - ^ 201“ CIL - P - CfL /-v CH5 - P - CH, (M>) Jjf CH3 - P - - P - CH3(38) CH2 "P" k01 ~ (39) CH3 - P - ^ 201 "CIL - P - CfL / -v CH5 - P - CH, (M>) Compare CH3 - P - - P - CH3

CN CNCN CN

V1ø (b-l) 8C1" P - CH„ Cft, - jør ølV1o (b-l) 8C1 "P - CH" Cft, - beer beer

CN CNCN CN

ZPCH2 n^v°V2 ZPCH2vv/\v CH2PZZPCH2 n ^ v ° V2 ZPCH2vv / \ v CH2PZ

(^2) |(ST KM lk C1’ ivØj— ch„ - p - ch„ J\yl ZPCH2^\/^ ^ ^ ch2pz hvor Z er — CN eller -CH^(^ 2) | (ST KM lk C1 'before - ch' - p - ch 'J \ yl ZPCH2 ^ \ / ^^^ ch2pz where Z is - CN or -CH ^

PP

N N , _ (,3) ΛΛN N, _ (, 3) ΛΛ

Y TY T

hvor Y er en base, såsom pyridin, quinolin eller et monokvaternærise-ret blpyrldyl (M).wherein Y is a base such as pyridine, quinoline or a monoquaternized blpyrldyl (M).

10 ttwi10 ttwi

CH0 CELCH0 CEL

3\_/ 3 (W — ch2 —n^V- CH2 - P-- )-( 2C1- CEL' CH-, o J n (W --CH2 -/ØV ch2 - a-- '- 2C1~ n ' γγ.3 \ _ / 3 (W - ch2 - n ^ V- CH2 - P--) - (2C1- CEL 'CH-, o J n (W --CH2 - / OV ch2 - a--' - 2C1 ~ n 'γγ.

H NH N

(*t6) 3C1"(* t6) 3C1 "

OISLAND

Polymere anioner kan også anvendes.Polymeric anions can also be used.

Zwitterionforbindelser er også effektive, f.eks.Zwitterion compounds are also effective, e.g.

- 00C. ^C00“ (^7) ^γΗ0 - P - CH^ h3c^ ^ch3 n 143571- 00C. ^ C00 '(^ 7) ^ γΗ0 - P - CH ^ h3c ^^ ch3 n 143571

Strømløse pletteringsopløsninger er indgående beskrevet i litteraturen, specielt pletteringsopløsningerne til udfældning af sølv, kobber og nikkel. En almen litteraturhenvisning, som indeholder nyttige formler er W. G-oldie - "Metal Coating of Plastics", Vol. 1 (I968). Andre nyttige . formler findes i beskrivelsen til hollandsk patent-ansøgning nr. 69OI919 og beskrivelsen til tysk patentansøgning nr, ’ I9OO983. Opløsninger, som er i handelen, såsom "Enplate"-serierne er velegnede.Streamless plating solutions are extensively described in the literature, especially the plating solutions for the precipitation of silver, copper and nickel. A general literature reference which contains useful formulas is W. G-oldie - "Metal Coating of Plastics", Vol. 1 (I968). Other useful. formulas can be found in the disclosure of Dutch Patent Application No. 69OI919 and the disclosure of German Patent Application No. 199983. Commercial solutions such as the "Enplate" series are suitable.

De lettest tilgængelige opløsninger til brug i forbindelse med den foreliggende opfindelse er de, som indeholder metaller fra gruppe VIU og IB sammen med kviksølv, bly, tin, antimon og vismuth.The most readily available solutions for use in the present invention are those containing Group VIU and IB metals together with mercury, lead, tin, antimony and bismuth.

Sølv- og kobberholdige opløsninger, hvori det reducerende middel er et aldehyd, såsom formaldehyd, kan anvendes. Sølvholdige opløsninger, hvori reduktionsmidlet er en aminophenol eller en eller flere af de andre almindelige organiske reducerende midler, som er blevet anvendt i fotografiske fremkaldere, er også af almen anvendelighed. Et velegnet jern-, kobolt- eller nikkeludfældningssystem omfatter en hypo= phosphitopløsning. Fremstillingen af specifikke opløsninger vil blive beskrevet i eksemplerne.Silver and copper-containing solutions in which the reducing agent is an aldehyde such as formaldehyde can be used. Silver containing solutions wherein the reducing agent is an aminophenol or one or more of the other common organic reducing agents used in photographic developers are also of general utility. A suitable iron, cobalt or nickel precipitation system comprises a hypo = phosphite solution. The preparation of specific solutions will be described in the Examples.

Det er kendt, at palladium og i mindre omfang andre platinmetaller, sølv og guld katalyserer dekomponeringen af Btrømløse pletteringsopløsninger. Dette fænomen kan anvendes i den foreliggende opfindelse ved sensibilisering af det aktive substrat ved at bringe det i kontakt med en forbindelse af det krævede metal, hensigtsmæssigt i opløsning og derpå bringe dette sensibiliserede substrat i kontakt med den strømløse pletteringsopløsning. Der kan anvendes et simpelt palladiumsalt j palladiumchlorid er særdeles velegnet ved en koncentration i intervallet 0,001-10 dele pr. 1000 dele vand. Platin, andre platinmetaller, sølv-eller guldsalte kan ligeledes anvendes. Den foretrukne koncentration af platin- eller palladiumopløsningen er ca. 0,1 dele pr. 1000 dele vand, beregnet på halogenidets vægt. Det aktive substrat neddyppes typisk i den sensibiliserende opløsning i 0,^-5" minutter ved 15-30°C, vaskes og overføres derpå til den strømløse pletteringsopløsning.It is known that palladium and, to a lesser extent, other platinum metals, silver and gold, catalyze the decomposition of Beamless plating solutions. This phenomenon can be used in the present invention in sensitizing the active substrate by contacting it with a compound of the required metal, conveniently in solution, and then contacting this sensitized substrate with the powerless plating solution. A simple palladium salt can be used. Palladium chloride is particularly suitable at a concentration in the range of 0.001-10 parts per ml. 1000 parts of water. Platinum, other platinum metals, silver or gold salts can also be used. The preferred concentration of the platinum or palladium solution is approx. 0.1 parts per 1000 parts of water, based on the weight of the halide. The active substrate is typically immersed in the sensitizing solution for 0.5-5 minutes at 15-30 ° C, washed and then transferred to the powerless plating solution.

12 *4357112 * 43571

Det aktive, eventuelt sensibiliserede substrat bringes i kontakt med den strømløse pletteringsopløsning, indtil den krævede metal-mængde er blevet udfældet„ Dette kan sædvanligvis bestemmes visuelt: Den organiske forbindelses farve forsvinder og erstattes med findelt metal, som giver et mørkt billede. Det metalliserede billede bliver mørkere, når det først dannede metal katalyserer opløsningens reduktion. På denne måde kan billedets optiske tætbed identificeres.The active, possibly sensitized substrate is contacted with the electroless plating solution until the required amount of metal has been precipitated. "This can usually be determined visually: the color of the organic compound disappears and is replaced by a finely divided metal which produces a dark image. The metallized image becomes darker when the first formed metal catalyzes the reduction of the solution. In this way, the optical close-up of the image can be identified.

Hvor de aktive komponenter er indeholdt i en filmbærer, baseret på en vandopløselig eller kvældbar polymer, såsom polyvinylalkohol, er det nødvendigt at tage visse forholdsregler for at hindre beskadigelse af eller tab af substratet under behandlingen. Hvis substratet bringes i kontakt med pletteringsopløsningen i kolde opløsninger (f.eks. stuetemperatur) bør den vandopløselige polymer vælges således, at dens opløselighed i kolde vandige medier er langt ringere end i varme vandige medier. En passende polyvinylalkoholkvalitet er en middel til højmolekulær 99-100 % hydrolyseret polyvinylalkohol, f.eks.Where the active components are contained in a film carrier based on a water-soluble or swellable polymer such as polyvinyl alcohol, certain precautions are necessary to prevent damage to or loss of the substrate during processing. If the substrate is contacted with the plating solution in cold solutions (e.g. room temperature), the water-soluble polymer should be chosen such that its solubility in cold aqueous media is far inferior to that of hot aqueous media. A suitable polyvinyl alcohol grade is a high molecular weight 99-100% hydrolyzed polyvinyl alcohol, e.g.

"Elvanol" kvaliteter 71-30, 72-60 eller 73-12?, eller "Gohsenol", alle "N" kvaliteter. Som et alternativ eller en yderligere forholdsregel kan metalbilleddannelsesprocessen gennemføres i nærværelse af en høj koncentration af ioner ved tilsætning af inaktive salte. 1-30 vægtprocent alkalimetal- eller ammoniumsalte kan anvendes: ammonium-,natrium- eller kaliumsulfater foretrækkes i koncentrationer fra 1-? vægtprocent af pletteringsopløsningerne„"Elvanol" grades 71-30, 72-60 or 73-12 ?, or "Gohsenol", all "N" grades. As an alternative or further precaution, the metal imaging process can be carried out in the presence of a high concentration of ions by the addition of inactive salts. 1-30% by weight of alkali metal or ammonium salts can be used: ammonium, sodium or potassium sulphates are preferred at concentrations of 1- % by weight of the plating solutions „

En yderligere alternativ eller ekstra forholdsregel er at forbehandle en polyvinylalkoholfilm med en vandig boraxopløsning eller glyoxalop-løsning til dannelse af tværbindingerne mellem polymerkæderj borax kan indgå i pletteringsopløsningen.A further alternative or additional precaution is to pretreat a polyvinyl alcohol film with an aqueous borax solution or glyoxal solution to form the cross-links between polymer chain borax can be included in the plating solution.

Det er også fordelagtigt at lade et overfladeaktivt middel indgå i pletteringsopløsningen. Dette formindsker tendensen til for tidlig metaludfældningo Langkædede aminer kan anvendes. Til det samme formål kan der anvendes indtil ? %, fortrinsvis ca. 2 vægtprocent poly= vinylpyrrolidon.It is also advantageous to include a surfactant in the plating solution. This reduces the tendency for premature metal precipitation. Long-chain amines can be used. For the same purpose can be used until? %, preferably approx. 2% by weight poly = vinylpyrrolidone.

13 r«&s7i Når der anvendes en pletteringsopløsning på sølvbasis, er det nødvendigt at tage nogle forholdsregler for at hindre udfældning af sølv-halogenider. Der anvendes enten et halogenidfrit substrat eller et egnet kompleksdannende middel, og anvendelsen af polyvinylpyrrolidon i den ovennævnte koncentration giver denne ekstra fordel.When using a silver plating solution, some precautions are necessary to prevent the precipitation of silver halides. Either a halide-free substrate or a suitable complexing agent is used, and the use of polyvinylpyrrolidone in the above concentration gives this added benefit.

Hvis strømløs plettering fortsættes i en tilstrækkelig periode, udfældes der tilstrækkeligt metal til, at gøre substratet ledende.If powerless plating is continued for a sufficient period, sufficient metal is precipitated to conduct the substrate.

Det udfældede ledende metal kan derpå metalliseres yderligere ved hjælp af sædvanlig elektrolytisk plettering med det samme eller andet metal. Plastskum kan også gøres ledende ved hjælp af en tilsvarende teknik.The precipitated conductive metal can then be further metallized by conventional electrolytic plating with the same or other metal. Plastic foam can also be made conductive using a similar technique.

Dataregistreringsanvendelser.Data capture applications.

En vigtig anvendelse af den foreliggende opfindelse er at gøre billeder permanente eller intensivere billeder (latente eller synlige) i de sølvfri fotografiske systemer, hvor billedet er i form af organiske neutrale frie radikaler, radikalkationer eller definerede neutrale forbindelser. Et eksempel på et sådant system er beskrevet i britisk patentskrift nr.1.310.812 og er baseret på nitrogenholdige salte, som ved bestråling danner radikalkationer. Foretrukne salte er de, som er baseret på forbindelser indeholdende to kvaternæriserede nitrogenatomer med en kæde af konjugerede umætningssteder mellem nitrogenatomerne.An important application of the present invention is to render images permanent or intensified images (latent or visible) in the silver-free photographic systems, where the image is in the form of organic neutral free radicals, radical cations or defined neutral compounds. An example of such a system is described in British Patent Specification No. 1,310,812 and is based on nitrogenous salts which, upon irradiation, form radical cations. Preferred salts are those based on compounds containing two quaternized nitrogen atoms with a chain of conjugated unsaturation sites between the nitrogen atoms.

Alle de tidligere beskrevne lysfølsomme forbindelser er anvendelige i forbindelse med denne opfindelse. Den lysfølsomme forbindelse bæres i en vandopløselig eller kvældbar filmdannende polymer og omdannes ved bestråling, specielt ultraviolet eller kortbølget synlig stråling til hovedsagelig radikalkationer. Det polymere støttemateriale er i stand til at stabilisere de dannede radikalkationer, men til sidst bleger den forenede påvirkning af oxygen og fugt billedet, med mindre dette holdes i dessikator eller under lignende tørre betingelser. Hvis radi= kalkationbilledet behandles i overensstemmelse med den foreliggende fremgangsmåde, gøres det lige så holdbart som i sædvanlige fotografiske systemer, medens det bevarer de fleste af fordelene ved høj opløsning, som besiddes af det lysfølsomme materiale, som allerede beskrevet. Der kan opløses 1500 liniepar pr. ran. Det må imidlertid påses, at man ikke 14 t*3S71 går for langt med den metalliserende proces, hvis det eneste man sigter efter er høj opløsning, da det voksende areal af metaludfældning vil reducere opløsningen. Det kan således i nogle tilfælde blive nødvendigt at afpasse opløsning med optisk tæthed.All of the previously described photosensitive compounds are useful in the context of this invention. The photosensitive compound is carried in a water-soluble or swellable film-forming polymer and converted by radiation, in particular ultraviolet or short-wave visible radiation, into essentially radical cations. The polymeric support material is capable of stabilizing the radical cations formed, but eventually the combined effect of oxygen and moisture blurs the image, unless kept in the desiccator or under similar dry conditions. If the radiative image is processed in accordance with the present method, it is rendered as durable as in conventional photographic systems, while retaining most of the high-resolution advantages of the photosensitive material, as already described. 1500 line pairs per resolution can be resolved. ran. However, care must be taken not to go too far with the metallizing process if the only aim is high resolution, as the growing area of metal precipitation will reduce the solution. Thus, in some cases, it may be necessary to adjust optical density resolution.

Den filmdannende polymer kan foruden den aktive komponent indeholde de i britisk patentskrift nr. 1310812 beskrevne additiver til (1) hastighedsforøgelse (d.v.s. forbindelser indeholdende aktivt hydrogen, som i alkoholer og aminer, inklusive alkoholer, phenoler, carboxylsyrer og sukkerarter, f.eks. glucose, oxalsyre, p-chlorbenzoesyrer, glycerol,phe= nol, ethylendiamintetraeddikesyre (dinatriumsalt), picrinsyre, glycin, β-alanin, mellitsyre, triethanolamin, thiazin og nicotinamidadrenosin= dinucleotidphosphat)} (2) sensibilisatorer (d.v.s. forbindelser, som udstrækker reaktionsevnen godt ind i det synlige område af spektret. Riboflavin i form af fri base, acronolgult (et farvestof, som omfatter 3,6-dimethyl-2-(4-dimethylaminophenyl)-benzthiazoliumchlorid) og alkaliske opløsninger af træharpiksderivatet, der er kendt som collophoni= um, er i stand til at udstrække følsomheden op til eller over 50° nm og andre sensibilisatorer som omfatter 3j3'-diethylthiacyanidiodid, proflavin, acridinorange , acriflavin, N-methylphenaziniummethylsulfat, 4-cyanoquinoliniummethiodid og erythrosin),(3) desensibilisatorer, (d.v.s. forbindelser, som kan tilsættes for at formindske den spektra-le reaktionsevne, således at filmen kan forarbejdes i dagslys) omfatter p-aminobenzoesyre, 6-amino-3,4-phthaloylacridon og urazol, (4) forskellige additiver (d.v.s. forbindelser, som kan inkorporeres i filmen til at modificere strålingsfølsomheden eller de fysiske egenskaber hos det færdige materiale. Ammoniumchlorid forbedrer f.eks. lysfølsomheden og filmens bøjelighed, og andre vandopløselige plastificerings-midler, såsom urinstof, glycerol og andre polyoler kan også anvendes til at forbedre denne egenskab. Følsomheden overfor røntgenstråler kan forøges ved indførelse af en metalforbindelse med høj atomvægt, såsom bariumchlorid).The film-forming polymer may contain, in addition to the active component, the additives described in British Patent No. 1310812 for (1) rate increase (i.e., compounds containing active hydrogen, as in alcohols and amines, including alcohols, phenols, carboxylic acids and sugars, e.g. glucose , oxalic acid, p-chlorobenzoic acids, glycerol, pheolene, ethylenediaminetetraacetic acid (disodium salt), picric acid, glycine, β-alanine, intermediate acid, triethanolamine, thiazine and nicotinamide adrenosine = dinucleotide phosphate)} (2) free base riboflavin in the visible region of the spectrum, acronol yellow (a dye comprising 3,6-dimethyl-2- (4-dimethylaminophenyl) benzthiazolium chloride) and alkaline solutions of the wood resin derivative known as collophonium , is capable of extending the sensitivity up to or above 50 ° nm and other sensitizers comprising 3'3'-diethylthiacyanide iodide, proflavin, acridino range, acriflavine, N-methylphenazinium methylsulfate, 4-cyanoquinolinium methiodide and erythrosine), (3) desensitizers, (i.e. compounds which can be added to decrease the spectral reactivity so that the film can be processed in daylight) include p-aminobenzoic acid, 6-amino-3,4-phthaloylacridone and urazole, (4) various additives (i.e. For example, ammonium chloride improves photosensitivity and film flexibility, and other water-soluble plasticizers such as urea, glycerol and other polyols may also be used to enhance this property. The sensitivity to X-rays can be increased by introducing a high atomic weight metal compound such as barium chloride).

Selvbærende film kan fremstilles af vandapløselige polymere, hensigtsmæssigt med en tykkelse på 0,2 - 2 mm. Filmen fremstilles imidlertid fortrinsvis som en belægning på eh bøjelig bærer, såsom polyethy-lenterephthalatfilm, i hvilket tilfælde belægningens tykkelse kan reduceres til 0,001-0,1 mm.Self-supporting films can be made from water-soluble polymers, conveniently having a thickness of 0.2 - 2 mm. However, the film is preferably made as a coating on a flexible support such as polyethylene terephthalate film, in which case the thickness of the coating can be reduced to 0.001-0.1 mm.

1515

Data kan registreres på filmen ved hjælp af ultraviolet eller synlig stråling af en passende bølgelængde ved elektronstråler eller ved infrarød bestråling, som bevirker, at filmen lokalt opvarmes til en temperatur, ved hvilken radikalkationen dannes. Den eksponerede film bør derefter behandles i overensstemmelse med opfindelsen så hurtigt som muligt. Hvis det foreslås at lagre den eksponerede film i længere tid før behandling, er det ønskeligt at dette sker under tørre og oxygen= fri betingelser.Data can be recorded on the film by ultraviolet or visible radiation of a suitable wavelength by electron beams or by infrared radiation which causes the film to be locally heated to a temperature at which the radical cation is formed. The exposed film should then be treated in accordance with the invention as soon as possible. If it is suggested to store the exposed film for a long time before treatment, it is desirable to do so under dry and oxygen = free conditions.

Andre anvendelser.Other uses.

Der kan i høj grad drages nytte af den kendsgerning, at såfremt strømløs plettering fortsættes i tilstrækkelig lang tid, opnås et elektrisk ledende produkt. Dette kan derpå eventuelt pletteres yderligere ved hjælp af sædvanlig elektrolytisk plettering. Enhver genstand kan således i realiteten gøres ledende, forudsat at den passende aktiverende komponent kan indføres derpå eller deri ved belægning, opsugning, sprøjtning, imprægnering eller anden påføringsmetode. Den aktiverende komponent kan naturligvis være afledt af forbindelser af bipyridyl- og beslægtede typer, som diskuteret ovenfor. Efter indføring eller dannelse af den aktiverende komponent, anbringes genstanden i det strømløse pletteringsbad, indtil den ønskede metal mængde er udfældet, eventuelt med et forudgående sensibiliseringstrin.The fact that if electricityless plating is continued for a sufficiently long time an electrically conductive product can be greatly utilized. This may then be further plated by ordinary electrolytic plating. Thus, any article can be made conductive, provided that the appropriate activating component can be introduced thereon or therein by coating, aspirating, spraying, impregnating or other application method. The activating component may, of course, be derived from compounds of bipyridyl and related types, as discussed above. After insertion or formation of the activating component, the article is placed in the electroless plating bath until the desired metal amount is precipitated, optionally with a prior sensitization step.

Metalliserede skumstoffer kan fremstilles ved at tage et plastskumstof, indføre den aktive komponent, plettere strømløst, konsolidere det udfældede metal ved elektrolytisk plettering og eventuel fjernelse af plastmaterialet ved opløsning, brænding eller på anden måde.Metallized foams can be made by taking a plastic foam, introducing the active component, plating without power, consolidating the precipitated metal by electrolytic plating, and possibly removing the plastic material by dissolution, firing or otherwise.

Ved en anden anvendelse fremstilles et kredsløb til konstruktionen af elektrisk eller elektronisk udstyr ved at danne en kredsløbsagtig fordeling af aktiverende komponent over en bærer, f.eks. plastlaminat-ark, plettere strømløst (eventuelt efter sensibilisering) og opbygge metallaget til en tilstrækkelig tykkelse ved yderligere strømløs eller sædvanlig elektrolytisk pletteringsteknik. Det skal bemærkes, at der ikke kræves noget ætsningstrin. Også på grund af den høje opløsningsevne af filmen er en høj komponenttæthed mulig.In another application, a circuit for the construction of electrical or electronic equipment is produced by forming a circuit-like distribution of activating component over a carrier, e.g. plastic laminate sheets, electrically plating (possibly after sensitization), and building the metal layer to a sufficient thickness by additional powerless or conventional electrolytic plating technique. It should be noted that no etching step is required. Also, due to the high resolution capability of the film, a high component density is possible.

f«5571 16f «5571 16

Der kan også fremstilles kredsløb med områder med differentiel specifik modstand ved anvendelse af forskellige metaller i forskellige dele deraf. En første kredsløbsagtig fordeling af aktiv komponent pletteres med et meget ledende metal, f.eks. kobber. Mellemrum lades åbne, hvor der kræves lavere specifik ledningsevne, og en anden kredsløbs-agtig fordeling af aktiv komponent påføres til forbindelse af mellemrummene. Derpå pletteres til den krævede grad med et metal med højere specifik modstand, f.eks. blandinger af nikkel og jern. Denne teknik er anvendelig, hvor der anvendes et substrat, hvori den aktive komponent er bundet i en polymer, f.eks. polymere indeholdende bipyridyl-radikalkationer i skelettet eller sidekæden. En film, som indeholder et bipyridylsalt udsættes f.eks. for ultraviolet bestråling til dannelse af et første kredsløbsbillede af radikalkationer, og dette pletteres 'strømløst med en første pletteringsopløsning, f.eks. kobber. Mellemrum lades åbne i kredsløbet, hvor der kræves en modstandskompo= nent. Da bipyridylsalt et, som ikke omdannes til radikalkation, er bundet i substratet, kan det derpå yderligere udsættes for ultraviolet bestråling til dannnelse af et andet billede af radikalkationer bundet til det første. Dette pletteres derpå med en anden pletteringsopløsning 3 f.eks. en blanding af jern og nikkel til dannelse af modstandselementer. Operationen kan gentages med forskellige metaller om ønsket, men metallet med lavest specifik modstand bør udfældes først.Circuits with regions of differential specific resistance can also be made using different metals in different parts thereof. An initial circuit-like distribution of active component is plated with a highly conductive metal, e.g. copper. Spacers are left open where lower specific conductivity is required and a second circuit-like distribution of active component is applied to connect the gaps. Then plaster to the required degree with a metal of higher specific resistance, e.g. mixtures of nickel and iron. This technique is applicable where a substrate is used in which the active component is bound in a polymer, e.g. polymers containing bipyridyl radical cations in the skeleton or side chain. For example, a film containing a bipyridyl salt is exposed. for ultraviolet radiation to form a first orbital image of radical cations, and this is electrically plated with a first plating solution, e.g. copper. Spaces are left open in the circuit where a resistance component is required. Since the bipyridyl salt, which is not converted to radical cation, is bound in the substrate, it can then be further subjected to ultraviolet radiation to form a second image of radical cations bound to the first. This is then plated with another plating solution 3 e.g. a mixture of iron and nickel to form resistance elements. The operation can be repeated with different metals if desired, but the metal with the lowest specific resistance should be precipitated first.

Typiske fremgangsmåder ifølge opfindelsen illustreres i de følgende eksempler, hvori delene er vægtdele.Typical methods of the invention are illustrated in the following examples wherein the parts are parts by weight.

Eksempel 1.Example 1.

En polyvinylalkoholfilm, indeholdende 10 vægtprocent N,N*-dimethylbi= pyridyliumdichlorid, blev belyst med ultraviolet lys gennem en negativ med varierende optisk tæthed. Det dannede billede var mørkeblåt med en optisk tæthed i intervallet 0,1-1,5. Denne film blev behandlet ved neddypning i en strømløs pletteringsopløsning i 20 minutter ved 20°C. Fremkalderen blev fremstillet på grundlag af følgende komponenter opløst i vand og fyldt op til 1000 dele.A polyvinyl alcohol film containing 10% by weight of N, N * dimethylbi = pyridylium dichloride was illuminated with ultraviolet light through a negative of varying optical density. The resulting image was dark blue with an optical density in the range 0.1-1.5. This film was treated by immersing in a powerless plating solution for 20 minutes at 20 ° C. The developer was made on the basis of the following components dissolved in water and filled up to 1000 parts.

«3571 17«3571 17

Vandfri natriumsulfit 20 deleAnhydrous sodium sulfite 20 parts

Natriumthiosulfatpentahydrat 30 dele Sølvnitrat 3j0 dele 2,^-diaminophenoldihydrochlorid 1,5 deleSodium thiosulfate pentahydrate 30 parts Silver nitrate 30 parts 2,2 - diaminophenol dihydrochloride 1.5 parts

Vandfri natriumcarbonat 1,2 deleAnhydrous sodium carbonate 1.2 parts

Vandfri natriumsulfat !+0 deleAnhydrous sodium sulfate! +0 parts

Natriumtetraborat deleSodium tetraborate parts

De første fire komponenter er baseret på en fysisk fremkalder, offentliggjort af A.F. Odell (J. Ind. Eng. Chem. 877 (1933) . De sidste to komponenter blev tilsat for at reducere vands virkning på polyvi= nylalkoholfilmen.The first four components are based on a physical developer, published by A.F. Odell (J. Ind. Eng. Chem. 877 (1933). The last two components were added to reduce the effect of water on the polyvinyl alcohol film).

Den blå farve blev fjernet og erstattet med et mørkebrunt billede med en optisk tæthed i intervallet 0,1-2,2 efter vaskning og tørring.The blue color was removed and replaced with a dark brown image with an optical density in the range of 0.1-2.2 after washing and drying.

Der blev opnået tilsvarende resultater ved erstatning af natriumsulfatet med kaliumsulfat (^-0 dele) eller ammoniumsulfat (60 dele).Similar results were obtained by replacing the sodium sulphate with potassium sulphate (-0 -0 parts) or ammonium sulphate (60 parts).

2,^-diaminodiphenoldihydrochloridet blev erstattet med samme vægtmængde p-methylaminophenolsulfat ("metol"), p-hydroxyphenylaminoeddikesyre ("glycin") eller p-aminophenol, og der blev opnået gode resultater.The 2,3-diaminodiphenol dihydrochloride was replaced by the same weight amount of p-methylaminophenol sulfate ("metol"), p-hydroxyphenylaminoacetic acid ("glycine") or p-aminophenol and good results were obtained.

Højere kontrast og optisk tæthed kan opnås ved at reducere natrium= thiosulfatmængden og forøge pH-værdien ved tilsætning af ammoniakopløsning eller natriumcarbonat. Det er nødvendigt, at denne opløsning stabiliseres overfor sølvudfældning ved tilsætning af et kationisk overfladeaktivt middel (f.eks. "Armeen 12"), og for at hindre udfældning af det kationiske middel er det også nødvendigt at tilsætte et Ikke-ionogent middel (f.eks. "Lissapol N"). En passende detergentmængde er 0,001-0,1 vægtprocent.Higher contrast and optical density can be achieved by reducing the amount of sodium = thiosulfate and increasing the pH by adding ammonia solution or sodium carbonate. It is necessary that this solution be stabilized against silver precipitation by the addition of a cationic surfactant (e.g., "Army 12"), and to prevent the precipitation of the cationic agent, it is also necessary to add a nonionic agent (e.g. e.g., "Lissapol N"). An appropriate amount of detergent is 0.001-0.1% by weight.

Eksempel 2.Example 2.

Denne fremkaldende opløsning giver en højere optisk tæthed, men er uegnet til filmmaterialer, hvori der indgår halogenider, på grund af at sølvhalogenidet udfældes. Fremkalderen blev fremstillet ved at opløse de følgende komponenter i vand og fortynde til 1 liter.This developing solution gives a higher optical density but is unsuitable for film materials containing halides due to the silver halide precipitating. The developer was prepared by dissolving the following components in water and diluting to 1 liter.

18 t«SS?118 t «SS? 1

Citronsyre 20 dele Sølvnitrat Ij7? dele p-methylaminophenolsulfat 0 dele "Lissapol Nu>| 0,2 dele >overfladeaktive midler "Armeen 12" J 0,2 deleCitric acid 20 parts Silver nitrate Ij7? parts p-methylaminophenol sulfate 0 parts "Lissapol Nu> | 0.2 parts> surfactants" Army 12 "J 0.2 parts

Vandfri natriumsulfat ifO deleAnhydrous sodium sulfate ifO parts

En polyvinylalkoholfilm indeholdende 10 vægtprocent N,N'-dimethylbi= pyridylinmmethylsulfat blev belyst med ultraviolet lys gennem et trådnet til den opnåede optiske tæthed var ca. 2. Efter neddypning i ovennævnte opløsning i 10 minutter ved 20°C, vaskning og tørring havde sølvbilledet en optisk tæthed på mere end på de eksponerede områder.A polyvinyl alcohol film containing 10% by weight of N, N'-dimethylbi = pyridylinmethylsulphate was illuminated with ultraviolet light through a wire mesh to obtain the optical density obtained was approx. 2. After immersing in the above solution for 10 minutes at 20 ° C, washing and drying, the silver image had an optical density of more than the exposed areas.

Eksempel λ.Example λ.

Den i eksempel 2 beskrevne fremgangsmåde blev gentaget, men de overfladeaktive midler blev erstattet med polyvinylpyrrolidon (20 dele).The procedure described in Example 2 was repeated, but the surfactants were replaced with polyvinylpyrrolidone (20 parts).

Med denne opløsning viste det sig muligt at anvende aktive komponenter uden halogenider uden utilladelig uklarhed.With this solution it became possible to use active components without halides without unacceptable obscurity.

EksempelExample

En glasplade belagt med gelatine blev neddyppet i en 10 % vandig opløsning af N,Nr-dimethylbipyridyliumdichlorido Pladen blev tørret og belyst med ultraviolet lys gennem et metalnet.A glass plate coated with gelatin was immersed in a 10% aqueous solution of N, N-dimethylbipyridylium dichlorido. The plate was dried and illuminated with ultraviolet light through a metal mesh.

Efter eksponering blev pladen neddyppet i en opløsning indeholdendeAfter exposure, the plate was immersed in a solution containing

Kobbersulfatpentahydrat 10 deleCopper sulfate pentahydrate 10 parts

Natriumhydroxid 10 deleSodium hydroxide 10 parts

Natriumtartrat 50 dele fortyndet til 1000 dele, hvortil var tilsat 10 dele 37 f° formaldehyd= opløsning. Det blå billede blev mørkebrunt. Efter vaskning og tørring var tætheden større end 2.Sodium tartrate 50 parts diluted to 1000 parts, to which were added 10 parts 37 ° formaldehyde = solution. The blue image turned dark brown. After washing and drying, the density was greater than 2.

Eksempel H.Example H.

19 1«3$7119 1 «3 $ 71

En glasplade belagt med gelatine (25 μ tyk) blev neddyppet i en opløsning af N,N,-dimetbylbis-(pyridini'um)-methylsulfat (10 % vandig opløsning) i 1 minut, skyllet med destilleret vand i J sekunder og fik derpå lov til at tørre. Efter eksponering i ea. ? minutter gennem en linienegativ med en 100 watt kviksølvdamplampe ved JO cm blev pladen neddyppet i en palladiumchloridopløsning fremstillet af PdClr, (0,1 dele), koncentreret saltsyre 10 dele og vand (til 1000 dele). Efter 1 minuts forløb blev pladen fjernet, vasket med vand og fremkaldt i en nikkel-baseret strømløs pletteringsopløsning fremstillet afA glass plate coated with gelatin (25 µm thick) was immersed in a solution of N, N, -dimethylbis- (pyridinium) methylsulfate (10% aqueous solution) for 1 minute, rinsed with distilled water for J seconds and then allowed allowed to dry. After exposure in ea. ? Minutes through a line negative with a 100 watt mercury vapor lamp at 100 cm, the plate was immersed in a palladium chloride solution made of PdClr, (0.1 parts), concentrated hydrochloric acid 10 parts and water (to 1000 parts). After 1 minute, the plate was removed, washed with water and developed in a nickel-based powerless plating solution made from

Nikkeldichlorid (6^0) 2j dele Æblesyre (mononatriumsalt) 6J deleNickel dichloride (6 ^ 0) 2j parts Malic acid (monosodium salt) 6J parts

Gluconsyre (natriumsalt) JJ deleGluconic acid (sodium salt) JJ parts

Ammoniak (opløsning densitet 0,880) til pH-værdi 9Ammonia (solution density 0.880) to pH 9

Natriumhypophosphit 35 deleSodium hypophosphite 35 parts

Man fik et kraftigt sort billede efter 1 minuts forløb og den optiske tæthed på fuldt belyste områder var større end 3.A strong black image was obtained after 1 minute and the optical density in fully illuminated areas was greater than 3.

Den ovenfor beskrevne fremgangsmåde blev gentaget, idet man successivt som sensibilisator anvendte 0,1 del PtCl^ og AuCl^ med saltsyre (10 dele) og derpå anvendte AgNO^ (0,1 del) med salpetersyre (10 dele).The procedure described above was repeated using successively as a sensitizer 0.1 part PtCl 2 and AuCl 2 with hydrochloric acid (10 parts) and then AgNO 2 (0.1 part) with nitric acid (10 parts).

Der blev konstateret tilsvarende sensibilisering.Similar sensitization was noted.

Eksempel 6.Example 6

Fremgangsmåden fra eksempel J blev gentaget under anvendelse af palla= diumsensibilisatoren, men opholdstiden i nikkelopløsningen blev forøget til 30 minutter. Billedet fik et metallisk udseende og var tilstrækkeligt ledende til at blive pletteret ad elektrolytisk vej.The procedure of Example J was repeated using the palladium sensitizer, but the residence time in the nickel solution was increased to 30 minutes. The image had a metallic appearance and was sufficiently conductive to be plated electrolytically.

Eksempel 7.Example 7

En polyethylenterephthalatfilm ("Melinex") forbelagt med en alkydhar-piksfernis blev belagt med en opløsning indeholdende 20 røSfl poly-iFjN'-p-xylylen-^j^'-bipyridyliumdichlorid) 0,5 dele polyvinylalkohol højmolekulært, høj hydrolysegrad 10 dele Glyoxalbydrat 1,0 deleA polyethylene terephthalate film ("Melinex") pre-coated with an alkyd resin varnish was coated with a solution containing 20 parts of poly (N-poly (p , 0 parts

Ammoniumchlorid 0,2 deleAmmonium chloride 0.2 parts

Vand til 150 deleWater to 150 parts

Opløsningen blev inddampet til dannelse af en følsom belægning med en tykkelse på ca. 0,025 mm. Behandlingen blev gennemført under dæmpet kunstigt lys. Filmen blev eksponeret gennem en linienegativ i 3 minutter under de i eksempel 5 beskrevne betingelser. Efter eksponeringen blev filmen neddyppet i en opløsning af aurichlorid (0,5 dele) og koncentreret saltsyre (10 dele) i vand (til 1000 dele) i 1 minut.The solution was evaporated to form a sensitive coating of approx. 0.025 mm. The treatment was performed under subdued artificial light. The film was exposed through a line negative for 3 minutes under the conditions described in Example 5. After exposure, the film was immersed in a solution of aurichloride (0.5 parts) and concentrated hydrochloric acid (10 parts) in water (to 1000 parts) for 1 minute.

Efter vaskning blev fremkaldelsen gennemført ved neddypning i en i handelen værende strømløs nikkelpietteringsopløsning "Enplate Ni-410" ved stuetemperatur i 5 minutter. Man fik et sort billede med en optisk tæthed på de fuldt eksponerede områder på større end 2.After washing, the development was carried out by immersing in a commercially available, nickel-pitting, nickel-pitting solution "Enplate Ni-410" at room temperature for 5 minutes. A black image was obtained with an optical density in the fully exposed areas larger than 2.

Eksempel 8.Example 8.

To stykker belagt film, fremstillet som i eksempel 7, blev eksponeret og sensibiliseret med et palladiumsalt som i eksempel 5· De blev derpå vasket og fremkaldt i følgende opløsning.Two pieces of coated film, prepared as in Example 7, were exposed and sensitized with a palladium salt as in Example 5. They were then washed and developed in the following solution.

' Cobolttrichlorid (βΗ^Ο) 27 dele'Cobalt Trichloride (βΗ ^ Ο) 27 parts

Natriumeitrat (2^0) 90 deleSodium citrate (20%) 90 parts

Ammoniumchlorid deleAmmonium chloride parts

Natriumhypophosphit 7,5 deleSodium hypophosphite 7.5 parts

Vand til 1000 dele pH-værdien med ammoniakopløsning indstillet på 8,5.Water to 1000 parts pH with ammonia solution set to 8.5.

Man fik et brunt billede.You got a brown picture.

Et stykke blev udsat for forlænget fremkaldelse (*+5 minutter) og det andet for en højere opløsningstemperatur (~80°C, 3 minutter). I begge tilfælde fik man ledende coboltfilm.One piece was subjected to prolonged development (* + 5 minutes) and the other to a higher dissolution temperature (~ 80 ° C, 3 minutes). In both cases, conductive cobalt films were obtained.

Eksempel 9.Example 9

21 f*3C9121 f * 3C91

En glasplade blev belagt, eksponeret og sensibiliseret ved hjælp af den i eksempel 5 beskrevne fremgangsmåde. Efter vaskning blev gelatinelaget gjort hårdt ved formaldehydbehandling (5 minutter) i en opløsning bestående afA glass plate was coated, exposed and sensitized by the procedure described in Example 5. After washing, the gelatin layer was hardened by formaldehyde treatment (5 minutes) in a solution consisting of

Formaldehydopløsning (*f0 %) 10 deleFormaldehyde solution (* f0%) 10 parts

Natriumcarbonat (vandfri) 5 deleSodium carbonate (anhydrous) 5 parts

Vand til 1000 deleWater to 1000 parts

Den blev fremkaldt i følgende opløsning i 3 minutter ved 80°C.It was developed in the following solution for 3 minutes at 80 ° C.

Coboltchlorid (6H^O) 60 deleCobalt chloride (6H2O) 60 parts

Nikkelchlorid (6^0) 2 deleNickel chloride (6 ^ 0) 2 parts

Natriumkaliumtartrat (tøgO) 200 deleSodium potassium tartrate (ten oz) 200 parts

Ammoniumchlorid 50 deleAmmonium chloride 50 parts

Natriumhypophosphit 17 deleSodium hypophosphite 17 parts

Vand til 1000 deleWater to 1000 parts

Ammoniak til pH-værdi 9·Ammonia to pH 9 ·

Man fik et tæt sort billede.You got a dense black picture.

Eksempel 10.Example 10.

En plade blev belagt, eksponeret og sensibiliseret som i eksempel 5 og derpå fremkaldt i 10 minutter ved stuetemperatur i følgende opløsning.A plate was coated, exposed and sensitized as in Example 5 and then developed for 10 minutes at room temperature in the following solution.

Ferrosulfat (7H20) 120 deleFerrosulfate (7H2O) 120 parts

Natriumcitrat (2H,jO) I70 dele EDTA 50 deleSodium citrate (2H, 10) 70 parts EDTA 50 parts

Natriumhypophosphit 85 dele 38 % formaldehydopløsning 200 deleSodium hypophosphite 85 parts 38% formaldehyde solution 200 parts

Vand til 800 deleWater to 800 parts

Ammoniumhydroxidopløsning til pH-værdi 10.Ammonium hydroxide solution to pH 10.

Man fik et tæt sort billede.You got a dense black picture.

Eksempel 11.Example 11.

22 f«8sn22 f «8sn

En opløsning af diphenylpicrylhydrazyl (2 % i acetone) blev anvendt til at tegne et billede på et stykke af en polyvinylalkoholfilm, som derpå blev tørret under nitrogen. Filmen blev sensibiliseret med 0,1 % palladiumchloridopløsning og derpå fremkaldt i kobberplette-ringsopløsningen ifølge eksempel Efter 5 minutters forløb havde et- billedet et mørkt brun-sort udseende. Efter 30 minutters forløb var billedet metallisk og det havde en specifik modstand på ca. 200 ohm/arealenhsd.A solution of diphenylpicrylhydrazyl (2% in acetone) was used to draw a picture on a piece of a polyvinyl alcohol film which was then dried under nitrogen. The film was sensitized with 0.1% palladium chloride solution and then developed in the copper plating solution of Example. After 5 minutes, the image had a dark brown-black appearance. After 30 minutes, the image was metallic and had a specific resistance of approx. 200 ohm / area hsd.

Eksempel 12.Example 12.

Et åbencellet polyurethanskumstof blev imprægneret med en opløsning indeholdendeAn open cell polyurethane foam was impregnated with a solution containing

Poly vinylalkohol 20 delePoly vinyl alcohol 20 parts

WjN'-dimethylbipyridyliummethylsulfat 1 delWjN'-dimethylbipyridylium methylsulfate 1 part

Vand til 1000 deleWater to 1000 parts

Skumstoffet blev befriet for væskeoverskud, tørret og radikalet blev dannet ved opvarmning til 100°C i 30 minutter„ Skumstoffet blev derpå neddyppet i en pletteringsopløsning, som beskrevet i eksempel og et rød-brunt kobberbundfaid dannet i skumstoffet, som derpå viste sig at være ledende.The foam was freed from excess liquid, dried and the radical formed by heating to 100 ° C for 30 minutes. .

Eksempel 13.Example 13

Overfladen på et stykke phenolformaldehydlaminat blev gjort ru (ved slibning med smergelpapir), belagt med følgende opløsning og fik derpå lov til at tørre«, 23 *49571The surface of a piece of phenolic formaldehyde laminate was roughened (by sanding with scrap paper), coated with the following solution and then allowed to dry ', 23 * 49571

Polyvinylalkohol ("Elvanol 100-30") 10 dele (tværbindings- dannende mid- Glyoxalhydrat 1 del del)Polyvinyl Alcohol ("Elvanol 100-30") 10 parts (cross-linking middle Glyoxalhydrate 1 part)

Paraquatdichlorid 0,|? deleParaquatichloride 0, | parts

Annnoniumeillorid 0,2 dele0.2 ml

Vand til 100 deleWater to 100 parts

Efter belysning med ultraviolet lys gennem et trykt kredsløbsnegativ blev pladen fremkaldt i følgende opløsning i 30 minutter ved stuetemperatur (20°C).After ultraviolet light illumination through a printed circuit negative, the plate was developed in the following solution for 30 minutes at room temperature (20 ° C).

Kobbersulfatpentahydrat CuSO^j^H^O 10 deleCopper sulfate pentahydrate CuSO ^ j ^ H ^ O 10 parts

Natriumkaliumtartrat !?0 deleSodium potassium tartrate!? 0 parts

Natriumhydroxid 10 dele 37 % formaldehydopløsning 10 deleSodium hydroxide 10 parts 37% formaldehyde solution 10 parts

Vand til 1000 deleWater to 1000 parts

Det resulterende bundfald af kobber havde en specifik modstand på mindre end 1 ohm/arealenhed og tykkelsen kunne opbygges ved elektroly-tisk plettering eller fortsat neddypning i ovennævnte opløsning. Disse tykkere kobberbundfaid (25 - 50 μ) kunne forenes på sædvanlig måde.The resulting copper precipitate had a specific resistance of less than 1 ohm / area unit and the thickness could be built up by electrolytic plating or continued immersion in the above solution. These thicker copper bottom faids (25 - 50 μ) could be reconciled in the usual manner.

Eksempel l*f.Example 1 * f.

En polyehtylenterephthalatfilm ("Melinex") med en forbelægning af en alkydharpiksfernis blev belagt med en opløsning indeholdende N,N* -p-cyanophenyl-1+)lfl -bipyridyliumdimethyl sulfat 1,0 delA polyethylene terephthalate film ("Melinex") with a coating of an alkyd resin varnish was coated with a solution containing N, N * -p-cyanophenyl-1 +) -lf-bipyridylium dimethyl sulfate 1.0 part

Polyvinylalkohol, højmolekulær, høj hydrolysegrad 10 dele H^O^ til pH-værdi 3-kPolyvinyl alcohol, high molecular weight, high degree of hydrolysis 10 parts H₂O ^ to pH 3-k

Vand til 100 deleWater to 100 parts

Opløsningen blev inddampet ved en temperatur på højst 7^°c» hvilket gav en følsom belægning med en tykkelse på ca. 0,003 mm.The solution was evaporated at a temperature of not more than 7 ° C, giving a sensitive coating of approx. 0.003 mm.

2424

Behandlingen blev gennemført under dæmpet kunstigt lys. Filmen blev udsat for elektroner fra et skanderende elektronmikroskop. Elektron= energien blev varieret fra 10-80 keV. Bestemt pletstørrelse var 0,2-0,5 μ» Billedets farve var mørkegrønt. Efter fremkaldelse i pletteringsopløsningen fra eksempel 1 i 5 minutter viste den eksponerede film regulære liniemønstre. 2000 liniepar pr. mm blev opløst udmærket.The treatment was performed under subdued artificial light. The film was exposed to electrons from a scanning electron microscope. Electron = energy was varied from 10-80 keV. Specific spot size was 0.2-0.5 µ »The color of the image was dark green. After developing in the plating solution of Example 1 for 5 minutes, the exposed film showed regular line patterns. 2000 line pairs per mm was dissolved very well.

Ved udvidet eksponering med elektroner blev billedet rødt på grund af dannelsen af den neutrale forbindelse, som også kunne pletteres med opløsningen fra eksempel 1.Upon extended exposure with electrons, the image turned red due to the formation of the neutral compound, which could also be plated with the solution of Example 1.

Eksempel 15.Example 15

En belagt polyethylenterephthalatfilm blev fremstillet som i eksempel 14 og belyst med ultraviolet lys i hulrummet i et elektronspinreso= nansspektrometer, Der blev dannet en grøn farve af radikalkationen, og spinkoneentrationen voksede lineært med ekseponeringstid indtil 2,5 x 10 ' spin/cm . Den optiske tæthed nåede 0,5 ved 610 nm. Radi-kalkationbilledet blev neddyppet i pletteringsopløsningen fra eksempel 1 og et meget mørkebrunt billede med optisk tæthed på mere en 4 blev opnået.A coated polyethylene terephthalate film was prepared as in Example 14 and illuminated with ultraviolet light in the cavity of an electron spin resonance spectrometer. The optical density reached 0.5 at 610 nm. The radiocalculation image was immersed in the plating solution of Example 1 and a very dark brown image with optical density greater than 4 was obtained.

Eksempel 16.Example 16.

En belagt polyethylenterephthalatfilm blev fremstillet som i eksempel 14 og eksponeret med elektroner i et skanderende elektronmikroskop ved en energi på 5° kev. Den eksponerede film havde en optisk tæthed på 0,5 ved 610 nm, og radikalkoncentrationen var 1,4 x 10 ° spin/cm , målt ved hjælp af elektronspinresonans. Efter neddypning i pletteringsopløsningen ifølge eksempel 1 blev billedet undersøgt ved hjælp af elektronmikroskopi, og det viste sig at have opløst mere end 1500 liniepar/mm.A coated polyethylene terephthalate film was prepared as in Example 14 and exposed to electrons in a scanning electron microscope at an energy of 5 ° Kev. The exposed film had an optical density of 0.5 at 610 nm, and the radical concentration was 1.4 x 10 ° spin / cm, measured by electron spin resonance. After immersion in the plating solution of Example 1, the image was examined by electron microscopy and it was found to have dissolved more than 1500 line pairs / mm.

Eksempel 17«.Example 17

En belagt polyethylenterephthalatfilm blev fremstillet som i eksempel 14 og belyst med ultraviolet lys gennem et metalnet til fremstilling 25 røsri et mørkegrønt radikalkationbillede. En elektrolysefri pletteringsopløsning blev fremstillet ved hjælp af den i beskrivelsen til belgisk patent nr. 637398 beskrevne metode;A coated polyethylene terephthalate film was prepared as in Example 14 and illuminated with ultraviolet light through a metal mesh for Preparation 25, a dark green radical cation image. An electrolysis-free plating solution was prepared by the method described in Belgian Patent No. 637398;

Opløsning ASolution A

Ferroammoniumsulfat 78 deleFerroammonium sulfate 78 parts

Ferrinitrat 8 deleFerrin nitrate 8 parts

Citronsyre 10,5 dele "Lissapol M" 0,2 deleCitric acid 10.5 parts "Lissapol M" 0.2 parts

Dodecylamin 0,2 deleDodecylamine 0.2 parts

Vand til 1000 deleWater to 1000 parts

Opløsning BSolution B

Sølvnitrat 8,5 deleSilver nitrate 8.5 parts

Vand til 100 dele Før brug blev 1 del B blandet med 9 dele A. Efter 5 minutters neddyp- ning i denne opløsning blev der opnået et sort billede.Water to 100 parts Before use, 1 part B was mixed with 9 parts A. After 5 minutes immersion in this solution a black image was obtained.

Eksempel 18.Example 18.

En vandig opløsning indeholdende 3 dele af en polymer bestående af enheder med strukturen ^ - P - 2 HSO^- og 15 dele polyvinylalkohol blev fremstillet.An aqueous solution containing 3 parts of a polymer consisting of units of structure β - 2 - 2 HSO 4 - and 15 parts of polyvinyl alcohol was prepared.

En film dannet ved skrivning på en glasplade gav et blåt eller purpur radikalkationbillede ved belysning med ultraviolet lys. Billedet blev fremkaldt med pletteringsopløsningen fra eksempel 1, hvilket gav et sort billede.A film formed by writing on a glass plate provided a blue or purple radical cation image by ultraviolet light illumination. The image was developed with the plating solution of Example 1 to give a black image.

Eksempel 19.Example 19.

En polymer blev fremstillet ud fra p-xylylendichlorid og 2,2'-bipyridyl, Polymeranalysen svarede til de gentagne enheder:A polymer was prepared from p-xylylene dichloride and 2,2'-bipyridyl. The polymer analysis corresponded to the repeating units:

Claims (2)

26 143571 -ch2-/ \ch2 - B -2C1" En polyvinylalkohol-filia inc eholdende denne polymer blev hurtigt blå ved eksponering i sollys, og ved neddypning i pletteringsopløsningen fra eksempel 1 fik man et sort udfældningsprodukt. Eksempel 20. En film blev støbt fra en opløsning indeholdende 10 % polyvinylalko-hol , 1 % N,N'-bisphenyl-2,7-diazapyriniumdifluorborat, 0,2 % ammo-niumchlorid, 0,5 % glucose. Filmen reagerede overfor lys af en bølgelængde på indtil mindst *+36 nm under dannelse af et radikalkationbil-lede, som blev sort ved neddypning i pletteringsopløsningen fra eksempel 3. Eksempel 21. En film blev støbt i overensstemmelse med den i eksempel 20 beskrevne fremgangsmåde under anvendelse af l,2-bis-(l'-methyl-lf'-pyridinium)-ethylen-di-(methylsulfat). Det gav et magentabillede i sollys, når der blev eksponeret gennem et metalnet. Det magentarøde billede blev sort ved neddypning i pletteringsopløsningen fra eksempel 3. Patentkrav .A polyvinyl alcohol filia containing this polymer quickly turned blue by exposure to sunlight, and by immersing in the plating solution of Example 1, a black precipitate product was obtained. Example 20. A film was cast from a solution containing 10% polyvinyl alcohol, 1% N, N'-bisphenyl-2,7-diazapyrinium difluoroborate, 0.2% ammonium chloride, 0.5% glucose The film reacted to light of a wavelength of up to at least * +36 nm to form a radical cation image which was blackened by immersion in the plating solution of Example 3. Example 21. A film was cast according to the procedure described in Example 20 using 1,2-bis- (1 '). -methyl-lf'-pyridinium) -ethylene-di- (methylsulfate) It provided a magenta image in sunlight when exposed through a metal mesh.The magenta image became black by immersion in the plating solution of Example 3. Patent Claim. 1. Fremgangsmåde til udfældning af metal i eller på et substrat vedat bringe substratet i kontakt med en strømløs pletteringsopløsning, kendetegnet ved, at der i eller på substratet er en aktiv komponent dannet ved mindst partiel reduktion af et salt med formlen: f R8 H r4 r7 r9 I GI <ch=ch)n-fGi R1 R R6/ls,NvAsR10 eller R11A method of precipitating metal in or on a substrate by contacting the substrate with a powerless plating solution, characterized in that in or on the substrate there is an active component formed by at least partial reduction of a salt of the formula: f R8 H r4 r7 r9 In GI <ch = ch) n-fGi R1 R R6 / ls, NvAsR10 or R11
DK604170A 1969-11-26 1970-11-26 METHOD OF DEPOSITION OF METAL DK143571C (en)

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