DK1258988T3 - Fremgangsmåde og system til afstemning på waferniveau af akustiske volumenbölgeresonatorer og -filtre - Google Patents
Fremgangsmåde og system til afstemning på waferniveau af akustiske volumenbölgeresonatorer og -filtreInfo
- Publication number
- DK1258988T3 DK1258988T3 DK02008094T DK02008094T DK1258988T3 DK 1258988 T3 DK1258988 T3 DK 1258988T3 DK 02008094 T DK02008094 T DK 02008094T DK 02008094 T DK02008094 T DK 02008094T DK 1258988 T3 DK1258988 T3 DK 1258988T3
- Authority
- DK
- Denmark
- Prior art keywords
- wafer
- filters
- wave resonators
- tuning method
- acoustic volume
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/013—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/844,218 US6462460B1 (en) | 2001-04-27 | 2001-04-27 | Method and system for wafer-level tuning of bulk acoustic wave resonators and filters |
Publications (1)
Publication Number | Publication Date |
---|---|
DK1258988T3 true DK1258988T3 (da) | 2008-03-17 |
Family
ID=25292149
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK02008094T DK1258988T3 (da) | 2001-04-27 | 2002-04-11 | Fremgangsmåde og system til afstemning på waferniveau af akustiske volumenbölgeresonatorer og -filtre |
Country Status (4)
Country | Link |
---|---|
US (1) | US6462460B1 (ja) |
EP (1) | EP1258988B1 (ja) |
JP (1) | JP4267249B2 (ja) |
DK (1) | DK1258988T3 (ja) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20020074897A1 (en) * | 2000-12-15 | 2002-06-20 | Qing Ma | Micro-electromechanical structure resonator frequency adjustment using radient energy trimming and laser/focused ion beam assisted deposition |
US6922118B2 (en) * | 2002-11-01 | 2005-07-26 | Hrl Laboratories, Llc | Micro electrical mechanical system (MEMS) tuning using focused ion beams |
US20040227578A1 (en) * | 2003-05-14 | 2004-11-18 | Miikka Hamalainen | Acoustic resonance-based frequency synthesizer using at least one bulk acoustic wave (BAW) or thin film bulk acoustic wave (FBAR) device |
US20070139140A1 (en) * | 2005-12-20 | 2007-06-21 | Rao Valluri R | Frequency tuning of film bulk acoustic resonators (FBAR) |
DE112006003970T5 (de) * | 2006-07-28 | 2009-07-30 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Vorrichtung und Verfahren zum Prozessieren eines Wafers |
US8586195B2 (en) * | 2007-07-11 | 2013-11-19 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Method for forming an acoustic mirror with reduced metal layer roughness and related structure |
JP4987684B2 (ja) * | 2007-12-19 | 2012-07-25 | シチズンホールディングス株式会社 | ジャイロセンサ素子の製造方法 |
DE102008003820B4 (de) * | 2008-01-10 | 2013-01-17 | Epcos Ag | Frontendschaltung |
JP5339582B2 (ja) | 2008-07-31 | 2013-11-13 | 太陽誘電株式会社 | 弾性波デバイス |
US20100068831A1 (en) * | 2008-09-12 | 2010-03-18 | Skyworks Solutions, Inc. | Method for wafer trimming for increased device yield |
FR2947398B1 (fr) * | 2009-06-30 | 2013-07-05 | Commissariat Energie Atomique | Dispositif resonant a ondes acoustiques guidees et procede de realisation du dispositif |
US20110121916A1 (en) * | 2009-11-24 | 2011-05-26 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Hybrid bulk acoustic wave resonator |
US8479363B2 (en) * | 2010-05-11 | 2013-07-09 | Hao Zhang | Methods for wafer level trimming of acoustically coupled resonator filter |
CN102064369B (zh) * | 2010-11-05 | 2013-07-17 | 张�浩 | 声耦合谐振滤波器晶圆级调整方法 |
FR2973608A1 (fr) * | 2011-03-31 | 2012-10-05 | St Microelectronics Sa | Procede d'ajustement de la frequence de resonance d'un element vibrant micro-usine |
US8922302B2 (en) | 2011-08-24 | 2014-12-30 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Acoustic resonator formed on a pedestal |
US9054671B2 (en) | 2011-11-09 | 2015-06-09 | International Business Machines Corporation | Tunable filter structures and design structures |
WO2015157507A1 (en) * | 2014-04-09 | 2015-10-15 | Tokyo Electron Limited | Method for correcting wafer bow from overlay |
DE102015215204A1 (de) * | 2015-08-10 | 2017-02-16 | Continental Automotive Gmbh | Herstellungsverfahren zum Herstellen eines elektromechanischen Aktors und elektromechanischer Aktor. |
JP2017046225A (ja) * | 2015-08-27 | 2017-03-02 | 株式会社ディスコ | Bawデバイス及びbawデバイスの製造方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4638536A (en) * | 1986-01-17 | 1987-01-27 | The United States Of America As Represented By The Secretary Of The Army | Method of making a resonator having a desired frequency from a quartz crystal resonator plate |
FR2699765B1 (fr) * | 1992-12-22 | 1995-01-20 | Cepe | Procédé d'ajustage en fréquence d'un dispositif piézoélectrique et équipement pour la mise en Óoeuvre du procédé. |
JPH08148968A (ja) * | 1994-11-24 | 1996-06-07 | Mitsubishi Electric Corp | 薄膜圧電素子 |
US6051907A (en) * | 1996-10-10 | 2000-04-18 | Nokia Mobile Phones Limited | Method for performing on-wafer tuning of thin film bulk acoustic wave resonators (FBARS) |
WO1998038736A1 (fr) * | 1997-02-26 | 1998-09-03 | Toyo Communication Equipment Co., Ltd. | Vibrateur piezoelectrique et son procede de fabrication |
US6963155B1 (en) * | 1997-04-24 | 2005-11-08 | Mitsubishi Denki Kabushiki Kaisha | Film acoustic wave device, manufacturing method and circuit device |
US6081171A (en) | 1998-04-08 | 2000-06-27 | Nokia Mobile Phones Limited | Monolithic filters utilizing thin film bulk acoustic wave devices and minimum passive components for controlling the shape and width of a passband response |
US6307447B1 (en) * | 1999-11-01 | 2001-10-23 | Agere Systems Guardian Corp. | Tuning mechanical resonators for electrical filter |
US6456173B1 (en) * | 2001-02-15 | 2002-09-24 | Nokia Mobile Phones Ltd. | Method and system for wafer-level tuning of bulk acoustic wave resonators and filters |
-
2001
- 2001-04-27 US US09/844,218 patent/US6462460B1/en not_active Expired - Fee Related
-
2002
- 2002-04-11 EP EP02008094A patent/EP1258988B1/en not_active Expired - Fee Related
- 2002-04-11 DK DK02008094T patent/DK1258988T3/da active
- 2002-04-25 JP JP2002124693A patent/JP4267249B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP1258988A2 (en) | 2002-11-20 |
JP4267249B2 (ja) | 2009-05-27 |
EP1258988B1 (en) | 2007-11-21 |
US6462460B1 (en) | 2002-10-08 |
US20020158702A1 (en) | 2002-10-31 |
EP1258988A3 (en) | 2004-02-04 |
JP2002344271A (ja) | 2002-11-29 |
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