DK1114067T3 - Fremgangsmåde til polymeristation og/eller tværbinding under elektronstråle og/eller gammastråler - Google Patents
Fremgangsmåde til polymeristation og/eller tværbinding under elektronstråle og/eller gammastrålerInfo
- Publication number
- DK1114067T3 DK1114067T3 DK99936669T DK99936669T DK1114067T3 DK 1114067 T3 DK1114067 T3 DK 1114067T3 DK 99936669 T DK99936669 T DK 99936669T DK 99936669 T DK99936669 T DK 99936669T DK 1114067 T3 DK1114067 T3 DK 1114067T3
- Authority
- DK
- Denmark
- Prior art keywords
- polymerization
- electron beam
- under electron
- crosslinking
- gamma rays
- Prior art date
Links
- 238000004132 cross linking Methods 0.000 title abstract 3
- 238000010894 electron beam technology Methods 0.000 title abstract 3
- 238000006116 polymerization reaction Methods 0.000 title abstract 3
- 238000000034 method Methods 0.000 title abstract 2
- 230000005855 radiation Effects 0.000 abstract 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 150000001638 boron Chemical class 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 125000001153 fluoro group Chemical group F* 0.000 abstract 1
- 125000000524 functional group Chemical group 0.000 abstract 1
- 239000003999 initiator Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 230000000737 periodic effect Effects 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 125000001424 substituent group Chemical group 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/027—Organoboranes and organoborohydrides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Silicon Polymers (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9810297A FR2782320B1 (fr) | 1998-08-11 | 1998-08-11 | Nouveaux amorceurs de polymerisation et/ou de reticulation activables sous faisceau d'electrons |
| FR9907421 | 1999-06-11 | ||
| PCT/FR1999/001911 WO2000009572A1 (fr) | 1998-08-11 | 1999-08-02 | Procede de polymerisation et/ou de reticulation sous faisceau d'electrons et/ou rayons gamma |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DK1114067T3 true DK1114067T3 (da) | 2002-12-02 |
Family
ID=26234493
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK99936669T DK1114067T3 (da) | 1998-08-11 | 1999-08-02 | Fremgangsmåde til polymeristation og/eller tværbinding under elektronstråle og/eller gammastråler |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US6590009B1 (de) |
| EP (1) | EP1114067B1 (de) |
| JP (1) | JP2002522601A (de) |
| AT (1) | ATE226600T1 (de) |
| AU (1) | AU761698B2 (de) |
| CA (1) | CA2339899A1 (de) |
| DE (1) | DE69903656T2 (de) |
| DK (1) | DK1114067T3 (de) |
| ES (1) | ES2183593T3 (de) |
| PT (1) | PT1114067E (de) |
| WO (1) | WO2000009572A1 (de) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2215912T3 (es) * | 2000-08-31 | 2004-10-16 | Textilma Ag | Instalacion para la fabricacion continua de cintas textiles impresas, en particular de cintas de etiquetas impresas. |
| US20030031802A1 (en) * | 2001-05-11 | 2003-02-13 | 3M Innovative Properties Company | Pulsed electron beam polymerization |
| EP1730214A1 (de) * | 2004-02-27 | 2006-12-13 | Rhodia Chimie | Matrix aus unter einem elektronenstrahl mit einer funktionellen organosiliciumverbindung modifiziertem polysaccharid |
| US20060283133A1 (en) * | 2005-06-17 | 2006-12-21 | The Boeing Company | Composite reinforcement of metallic structural elements |
| CN102964369B (zh) * | 2012-10-24 | 2016-04-06 | 中国科学院青岛生物能源与过程研究所 | 一类聚合物型硼酸酯锂盐及其制备方法和应用 |
| CN104183867B (zh) * | 2014-08-12 | 2018-06-19 | 中国科学院青岛生物能源与过程研究所 | 一种单离子导体纳米颗粒增强锂电池隔膜或聚合物电解质的制备方法和应用 |
| EP3426666A1 (de) * | 2016-03-09 | 2019-01-16 | Studiengesellschaft Kohle mbH | Verfahren zur entfernung von radioaktiven isotopen aus wässrigen flüssigkeiten durch fluorhaltige reagenzien, fluorhaltige, wasserunlösliche salze von radioaktiven isotopen und deren verwendung als therapeutika |
| EP3216794A1 (de) * | 2016-03-09 | 2017-09-13 | Studiengesellschaft Kohle mbH | Verfahren zur entfernung von radioaktiven isotopen aus wässrigen flüssigkeiten durch fluorhaltige reagenzien, fluorhaltige, wasserunlösliche salze von radioaktiven isotopen und deren verwendung als therapeutika |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3567453A (en) * | 1967-12-26 | 1971-03-02 | Eastman Kodak Co | Light sensitive compositions for photoresists and lithography |
| US4307182A (en) * | 1980-05-23 | 1981-12-22 | Minnesota Mining And Manufacturing Company | Imaging systems with tetra(aliphatic) borate salts |
| JP2641260B2 (ja) * | 1988-07-26 | 1997-08-13 | キヤノン株式会社 | 光重合開始剤及び感光性組成物 |
| FR2724660B1 (fr) * | 1994-09-16 | 1997-01-31 | Rhone Poulenc Chimie | Amorceurs de reticulation, par voie cationique, de polymeres a groupements organofonctionnels, compositions a base de polyorganosiloxanes reticulables et contenant ces amorceurs et application desdites compositions en antiadherence |
| AU717137B2 (en) * | 1995-11-24 | 2000-03-16 | Ciba Specialty Chemicals Holding Inc. | Borate coinitiators for photopolymerization |
| FR2762001B1 (fr) * | 1997-04-11 | 1999-07-02 | Rhodia Chimie Sa | Amorceurs non toxiques, resines a groupements organofonctionnels reticulables comprenant les amorceurs, et leur utilisation pour la preparation de polymeres stables et non toxiques |
-
1999
- 1999-08-02 ES ES99936669T patent/ES2183593T3/es not_active Expired - Lifetime
- 1999-08-02 PT PT99936669T patent/PT1114067E/pt unknown
- 1999-08-02 US US09/762,663 patent/US6590009B1/en not_active Expired - Fee Related
- 1999-08-02 EP EP99936669A patent/EP1114067B1/de not_active Expired - Lifetime
- 1999-08-02 AT AT99936669T patent/ATE226600T1/de not_active IP Right Cessation
- 1999-08-02 DK DK99936669T patent/DK1114067T3/da active
- 1999-08-02 CA CA002339899A patent/CA2339899A1/fr not_active Abandoned
- 1999-08-02 AU AU51683/99A patent/AU761698B2/en not_active Ceased
- 1999-08-02 WO PCT/FR1999/001911 patent/WO2000009572A1/fr active IP Right Grant
- 1999-08-02 JP JP2000565015A patent/JP2002522601A/ja active Pending
- 1999-08-02 DE DE69903656T patent/DE69903656T2/de not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002522601A (ja) | 2002-07-23 |
| ATE226600T1 (de) | 2002-11-15 |
| PT1114067E (pt) | 2003-03-31 |
| ES2183593T3 (es) | 2003-03-16 |
| DE69903656D1 (de) | 2002-11-28 |
| CA2339899A1 (fr) | 2000-02-24 |
| DE69903656T2 (de) | 2003-06-26 |
| EP1114067B1 (de) | 2002-10-23 |
| WO2000009572A1 (fr) | 2000-02-24 |
| AU761698B2 (en) | 2003-06-05 |
| US6590009B1 (en) | 2003-07-08 |
| EP1114067A1 (de) | 2001-07-11 |
| AU5168399A (en) | 2000-03-06 |
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