DK0458388T3 - Fremgangsmåde og apparat til måling af temperaturstråling ved anvendelse af et pyrometer udstyret med kompensationslamper - Google Patents

Fremgangsmåde og apparat til måling af temperaturstråling ved anvendelse af et pyrometer udstyret med kompensationslamper

Info

Publication number
DK0458388T3
DK0458388T3 DK91201121.0T DK91201121T DK0458388T3 DK 0458388 T3 DK0458388 T3 DK 0458388T3 DK 91201121 T DK91201121 T DK 91201121T DK 0458388 T3 DK0458388 T3 DK 0458388T3
Authority
DK
Denmark
Prior art keywords
pyrometer
measuring temperature
temperature radiation
radiation
compensation
Prior art date
Application number
DK91201121.0T
Other languages
Danish (da)
English (en)
Inventor
Karen Irma Jozef Maex
Peter Michel Noel Vandenabeele
Original Assignee
Imec Inter Uni Micro Electr
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Imec Inter Uni Micro Electr filed Critical Imec Inter Uni Micro Electr
Application granted granted Critical
Publication of DK0458388T3 publication Critical patent/DK0458388T3/da

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
    • G01J5/061—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity by controlling the temperature of the apparatus or parts thereof, e.g. using cooling means or thermostats
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0801—Means for wavelength selection or discrimination
    • G01J5/0802—Optical filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0806—Focusing or collimating elements, e.g. lenses or concave mirrors
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0875—Windows; Arrangements for fastening thereof
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0878—Diffusers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/08—Optical arrangements
    • G01J5/0896—Optical arrangements using a light source, e.g. for illuminating a surface
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/80—Calibration
    • G01J5/802—Calibration by correcting for emissivity
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/06—Arrangements for eliminating effects of disturbing radiation; Arrangements for compensating changes in sensitivity
    • G01J2005/066—Differential arrangement, i.e. sensitive/not sensitive

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Radiation Pyrometers (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
DK91201121.0T 1990-05-23 1991-05-09 Fremgangsmåde og apparat til måling af temperaturstråling ved anvendelse af et pyrometer udstyret med kompensationslamper DK0458388T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL9001200A NL9001200A (nl) 1990-05-23 1990-05-23 Werkwijze en inrichting voor het met behulp van een pyrometer meten van temperatuurstraling waarbij compensatielampen worden toegepast.

Publications (1)

Publication Number Publication Date
DK0458388T3 true DK0458388T3 (da) 1994-10-17

Family

ID=19857144

Family Applications (1)

Application Number Title Priority Date Filing Date
DK91201121.0T DK0458388T3 (da) 1990-05-23 1991-05-09 Fremgangsmåde og apparat til måling af temperaturstråling ved anvendelse af et pyrometer udstyret med kompensationslamper

Country Status (7)

Country Link
EP (1) EP0458388B1 (de)
JP (1) JPH0629365A (de)
AT (1) ATE109559T1 (de)
DE (1) DE69103207T2 (de)
DK (1) DK0458388T3 (de)
ES (1) ES2057735T3 (de)
NL (1) NL9001200A (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL9201155A (nl) * 1992-06-29 1994-01-17 Imec Inter Uni Micro Electr Inrichting en werkwijze voor het verwarmen van voorwerpen waarbij de temperatuur van het voorwerp wordt gemeten.
DE10222879A1 (de) * 2001-05-23 2005-03-17 Mattson Thermal Products Gmbh Messung niedriger Wafer-Temperaturen
US7422988B2 (en) 2004-11-12 2008-09-09 Applied Materials, Inc. Rapid detection of imminent failure in laser thermal processing of a substrate
US7910499B2 (en) 2004-11-12 2011-03-22 Applied Materials, Inc. Autofocus for high power laser diode based annealing system
US7438468B2 (en) * 2004-11-12 2008-10-21 Applied Materials, Inc. Multiple band pass filtering for pyrometry in laser based annealing systems
US7659187B2 (en) 2006-11-03 2010-02-09 Applied Materials, Inc. Method of forming PN junctions including a post-ion implant dynamic surface anneal process with minimum interface trap density at the gate insulator-silicon interface
JP5780002B2 (ja) * 2011-06-08 2015-09-16 株式会社ニコン 基板貼り合わせ装置及び基板貼り合わせ方法
DE102012024418A1 (de) * 2012-12-14 2014-06-18 Sikora Ag Verfahren und Vorrichtung zum berührungslosen Bestimmen der Temperatur eines bewegten Gegenstands mit unbekanntem Emissionsgrad
US9698041B2 (en) 2014-06-09 2017-07-04 Applied Materials, Inc. Substrate temperature control apparatus including optical fiber heating, substrate temperature control systems, electronic device processing systems, and methods
WO2016003633A1 (en) * 2014-07-02 2016-01-07 Applied Materials, Inc Apparatus, systems, and methods for temperature control of substrates using embedded fiber optics and epoxy optical diffusers
CN106463404B (zh) 2014-07-02 2019-11-19 应用材料公司 有沟槽引导式光纤加热的温度控制设备、基板温度控制系统、电子器件处理系统及处理方法
US10973088B2 (en) 2016-04-18 2021-04-06 Applied Materials, Inc. Optically heated substrate support assembly with removable optical fibers
JP6820717B2 (ja) * 2016-10-28 2021-01-27 株式会社日立ハイテク プラズマ処理装置
SG10201705708YA (en) * 2017-05-26 2018-12-28 Applied Materials Inc Detector for low temperature transmission pyrometry

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH547487A (de) * 1972-07-27 1974-03-29 Bbc Brown Boveri & Cie Verfahren zur beruehrungslosen und materialunabhaengigen temperaturmessung an oberflaechen mittels infrarot-pyrometer.
US4890245A (en) * 1986-09-22 1989-12-26 Nikon Corporation Method for measuring temperature of semiconductor substrate and apparatus therefor
NL8701479A (nl) * 1987-06-25 1989-01-16 Hoogovens Groep Bv Werkwijze en inrichting voor het bepalen van een emissiecoefficient van een stralend lichaam.

Also Published As

Publication number Publication date
JPH0629365A (ja) 1994-02-04
ES2057735T3 (es) 1994-10-16
DE69103207T2 (de) 1994-12-08
ATE109559T1 (de) 1994-08-15
NL9001200A (nl) 1991-12-16
DE69103207D1 (de) 1994-09-08
EP0458388A1 (de) 1991-11-27
EP0458388B1 (de) 1994-08-03

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