DE8524244U1 - Hochsperrende Diodenanordnung auf der Basis von a-Si:H für Bildsensorzeilen - Google Patents

Hochsperrende Diodenanordnung auf der Basis von a-Si:H für Bildsensorzeilen

Info

Publication number
DE8524244U1
DE8524244U1 DE19858524244 DE8524244U DE8524244U1 DE 8524244 U1 DE8524244 U1 DE 8524244U1 DE 19858524244 DE19858524244 DE 19858524244 DE 8524244 U DE8524244 U DE 8524244U DE 8524244 U1 DE8524244 U1 DE 8524244U1
Authority
DE
Germany
Prior art keywords
layer
blocking
diode arrangement
blocking diode
sio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19858524244
Other languages
German (de)
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Priority to DE19858524244 priority Critical patent/DE8524244U1/de
Publication of DE8524244U1 publication Critical patent/DE8524244U1/de
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/09Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/095Devices sensitive to infrared, visible or ultraviolet radiation comprising amorphous semiconductors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/1446Devices controlled by radiation in a repetitive configuration
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/10Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
    • H01L31/101Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/102Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Light Receiving Elements (AREA)
DE19858524244 1985-08-23 1985-08-23 Hochsperrende Diodenanordnung auf der Basis von a-Si:H für Bildsensorzeilen Expired DE8524244U1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19858524244 DE8524244U1 (de) 1985-08-23 1985-08-23 Hochsperrende Diodenanordnung auf der Basis von a-Si:H für Bildsensorzeilen

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19858524244 DE8524244U1 (de) 1985-08-23 1985-08-23 Hochsperrende Diodenanordnung auf der Basis von a-Si:H für Bildsensorzeilen

Publications (1)

Publication Number Publication Date
DE8524244U1 true DE8524244U1 (de) 1987-02-19

Family

ID=6784525

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19858524244 Expired DE8524244U1 (de) 1985-08-23 1985-08-23 Hochsperrende Diodenanordnung auf der Basis von a-Si:H für Bildsensorzeilen

Country Status (1)

Country Link
DE (1) DE8524244U1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0361000A2 (de) * 1988-09-29 1990-04-04 Siemens Aktiengesellschaft Optische Sensorzeile aus amorphen oder polykristallinem photo-elektrischem Material mit einer Vielzahl von Sensorelementen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0361000A2 (de) * 1988-09-29 1990-04-04 Siemens Aktiengesellschaft Optische Sensorzeile aus amorphen oder polykristallinem photo-elektrischem Material mit einer Vielzahl von Sensorelementen
EP0361000A3 (de) * 1988-09-29 1991-10-09 Siemens Aktiengesellschaft Optische Sensorzeile aus amorphen oder polykristallinem photo-elektrischem Material mit einer Vielzahl von Sensorelementen

Similar Documents

Publication Publication Date Title
DE68912482T2 (de) Dünnfilm-Transistoren, ihre Verfahren zur Herstellung und Anzeigeeinrichtung, die mit solchen Transistoren hergestellt sind.
DE3688758T2 (de) Dünnfilmtransistor auf isolierendem Substrat.
DE2217538C3 (de) Verfahren zur Herstellung von Zwischenverbindungen in einer Halbleiteranordnung
DE69325849T2 (de) Verfahren zum Herstellen von Metalleiter auf einem isolierenden Substrat
DE19649670C2 (de) Verfahren zur Herstellung eines Kondensators einer Halbleitervorrichtung und auf diese Weise hergestellter Kondensator
DE19605669A1 (de) Aktivmatrix-Anzeigevorrichtung
EP0080652A2 (de) Fototransistor in MOS-Dünnschichttechnik, Verfahren zu seiner Herstellung und Verfahren zu seinem Betrieb
DE19623517C1 (de) MOS-Transistor für biotechnische Anwendungen
EP0215289B1 (de) Verfahren zur Herstellung einer hochsperrenden Diodenanordnung auf der Basis von a-Si:H für Bildsensorzeilen
DE3732619C2 (zh)
DE2846096C2 (de) Solarzelle aus Halbleitermaterial
DE19946437A1 (de) Ferroelektrischer Transistor
DE4313042C2 (de) Diamantschichten mit hitzebeständigen Ohmschen Elektroden und Herstellungsverfahren dafür
EP0198196B1 (de) Solarzelle mit einem aus amorphen Silizium bestehenden Halbleiterkörper der Schichtenfolge p-SiC/i/n
DE3050032C2 (de) Gettervorrichtung zum elektrochemischen Beseitigenvon Wasser
DE3109074A1 (de) Halbleitervorrichtung und verfahren zu ihrer herstellung
DE3915594C2 (de) Kondensator, insbesondere für integrierte Halbleiterschaltungen
EP0207486B1 (de) Integrierte MOS-Transistoren enthaltende Schaltung mit einer aus einem Metall oder Metallsilizid der Elemente Tantal oder Niob bestehenden Gatemetallisierung sowie Verfahren zur Herstellung dieser Gatemetallisierung
DE19751745A1 (de) Gateisolierschicht mit diamantähnlichem Kohlenstoff und Dünnfilmtransistor, der diese verwendet, und einen Prozeß zum Herstellen der Gateisolierschicht und des Dünnfilmtransistors
EP1114451A1 (de) Mikroelektronische struktur, verfahren zu deren herstellung und deren verwendung in einer speicherzelle
DE69122148T2 (de) Dünnschicht-Halbleiterbauelement
DE8524244U1 (de) Hochsperrende Diodenanordnung auf der Basis von a-Si:H für Bildsensorzeilen
EP0651433B1 (de) Verfahren zur Herstellung eines Kontaktlochs zu einem dotierten Bereich
DE3880109T2 (de) Sonnenzelle fuer niedrigen lichtpegel.
EP0075892A2 (de) Integrierter Halbleiterschaltkreis mit einer halbisolierenden Halbleiterschicht