DE69925430D1 - Verfahren zur Reduzierung von Artefakterscheinungen in der Raster-Elektronenmikroskopie - Google Patents

Verfahren zur Reduzierung von Artefakterscheinungen in der Raster-Elektronenmikroskopie

Info

Publication number
DE69925430D1
DE69925430D1 DE69925430T DE69925430T DE69925430D1 DE 69925430 D1 DE69925430 D1 DE 69925430D1 DE 69925430 T DE69925430 T DE 69925430T DE 69925430 T DE69925430 T DE 69925430T DE 69925430 D1 DE69925430 D1 DE 69925430D1
Authority
DE
Germany
Prior art keywords
scanning electron
electron microscopy
reducing artifacts
artifacts
reducing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69925430T
Other languages
English (en)
Other versions
DE69925430T2 (de
Inventor
Noam Dotan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of DE69925430D1 publication Critical patent/DE69925430D1/de
Application granted granted Critical
Publication of DE69925430T2 publication Critical patent/DE69925430T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H01J37/222—Image processing arrangements associated with the tube

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Image Processing (AREA)
  • Microscoopes, Condenser (AREA)
DE69925430T 1998-09-23 1999-09-23 Verfahren zur Reduzierung von Artefakterscheinungen in der Raster-Elektronenmikroskopie Expired - Lifetime DE69925430T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US158826 1998-09-23
US09/158,826 US6194718B1 (en) 1998-09-23 1998-09-23 Method for reducing aliasing effects in scanning beam microscopy

Publications (2)

Publication Number Publication Date
DE69925430D1 true DE69925430D1 (de) 2005-06-30
DE69925430T2 DE69925430T2 (de) 2006-02-02

Family

ID=22569881

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69925430T Expired - Lifetime DE69925430T2 (de) 1998-09-23 1999-09-23 Verfahren zur Reduzierung von Artefakterscheinungen in der Raster-Elektronenmikroskopie

Country Status (3)

Country Link
US (1) US6194718B1 (de)
EP (1) EP0993019B1 (de)
DE (1) DE69925430T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6782337B2 (en) 2000-09-20 2004-08-24 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension an a presence of defects on a specimen
US7196782B2 (en) 2000-09-20 2007-03-27 Kla-Tencor Technologies Corp. Methods and systems for determining a thin film characteristic and an electrical property of a specimen
US6891627B1 (en) 2000-09-20 2005-05-10 Kla-Tencor Technologies Corp. Methods and systems for determining a critical dimension and overlay of a specimen
US6812045B1 (en) 2000-09-20 2004-11-02 Kla-Tencor, Inc. Methods and systems for determining a characteristic of a specimen prior to, during, or subsequent to ion implantation
US6673637B2 (en) 2000-09-20 2004-01-06 Kla-Tencor Technologies Methods and systems for determining a presence of macro defects and overlay of a specimen
US6694284B1 (en) 2000-09-20 2004-02-17 Kla-Tencor Technologies Corp. Methods and systems for determining at least four properties of a specimen
WO2003005396A2 (en) * 2001-01-26 2003-01-16 Fei Company Method and apparatus for scanned instrument calibration
US6770867B2 (en) 2001-06-29 2004-08-03 Fei Company Method and apparatus for scanned instrument calibration
FR2820151A1 (fr) * 2001-01-30 2002-08-02 X Ion Procede et systeme de balayage d'un faisceau d'ions sur un substrat, ainsi qu'application a la formation d'oxyde de grille ou de nanocristaux
US7236847B2 (en) 2002-01-16 2007-06-26 Kla-Tencor Technologies Corp. Systems and methods for closed loop defect reduction
US7227984B2 (en) 2003-03-03 2007-06-05 Kla-Tencor Technologies Corporation Method and apparatus for identifying defects in a substrate surface by using dithering to reconstruct under-sampled images
DE102004034963A1 (de) * 2004-07-16 2006-02-16 Carl Zeiss Jena Gmbh Verfahren zur bildlichen Erfassung von Objekten mittels eines Lichtrastermikroskopes
DE102004034951A1 (de) * 2004-07-16 2006-02-02 Carl Zeiss Jena Gmbh Verfahren zur bildlichen Erfassung von Objekten mittels eines Lichtrastermikrokopes mit linienförmiger Abtastung
DE102004034974A1 (de) * 2004-07-16 2006-02-16 Carl Zeiss Jena Gmbh Verfahren zur bildlichen Erfassung von Objekten mittels eines Lichtrastermikroskopes mit punktförmiger Lichtquellenverteilung
JP2006203463A (ja) * 2005-01-19 2006-08-03 Matsushita Electric Ind Co Ltd 画像表示方法、画像撮像方法、及び画像合成方法
WO2011119678A2 (en) 2010-03-23 2011-09-29 California Institute Of Technology Super resolution optofluidic microscopes for 2d and 3d imaging
US9569664B2 (en) * 2010-10-26 2017-02-14 California Institute Of Technology Methods for rapid distinction between debris and growing cells
JP2013542468A (ja) 2010-10-26 2013-11-21 カリフォルニア インスティチュート オブ テクノロジー 走査型投影レンズレス顕微鏡システム
US9643184B2 (en) * 2010-10-26 2017-05-09 California Institute Of Technology e-Petri dishes, devices, and systems having a light detector for sampling a sequence of sub-pixel shifted projection images
CN103534627A (zh) 2011-03-03 2014-01-22 加州理工学院 光导像素
JP6548542B2 (ja) * 2015-09-29 2019-07-24 株式会社ホロン Ｓｅｍ画像取得装置およびｓｅｍ画像取得方法
JP7077260B2 (ja) * 2019-03-22 2022-05-30 株式会社日立ハイテク 電子ビーム装置及び画像処理方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3767926A (en) * 1972-05-08 1973-10-23 American Optical Corp Field emission scanning microscope display
DE2635674C3 (de) * 1976-08-07 1978-10-26 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Verfahren zur zeilenfreien Bildaufzeichnung
US4811409A (en) 1985-09-12 1989-03-07 Insystems, Inc. Method and apparatus for detecting defect information in a holographic image pattern
US4907287A (en) * 1985-10-16 1990-03-06 Hitachi, Ltd. Image correction system for scanning electron microscope
US5299308A (en) * 1990-02-28 1994-03-29 Ricoh Company, Ltd. Graphic data processing apparatus for producing a tone for an edge pixel and reducing aliasing effects
JP3071229B2 (ja) * 1990-04-09 2000-07-31 株式会社リコー 図形処理装置
US5717204A (en) * 1992-05-27 1998-02-10 Kla Instruments Corporation Inspecting optical masks with electron beam microscopy
US6005682A (en) * 1995-06-07 1999-12-21 Xerox Corporation Resolution enhancement by multiple scanning with a low-resolution, two-dimensional sensor array
US5925875A (en) * 1996-04-26 1999-07-20 Lockheed Martin Ir Imaging Systems Apparatus and method for compensating for fixed pattern noise in planar arrays

Also Published As

Publication number Publication date
EP0993019A3 (de) 2001-03-21
EP0993019A2 (de) 2000-04-12
US6194718B1 (en) 2001-02-27
EP0993019B1 (de) 2005-05-25
DE69925430T2 (de) 2006-02-02

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