DE69916598D1 - Vorrichtung zur breitbandigen diffraktiven streuung und assoziierte verfahren - Google Patents

Vorrichtung zur breitbandigen diffraktiven streuung und assoziierte verfahren

Info

Publication number
DE69916598D1
DE69916598D1 DE69916598T DE69916598T DE69916598D1 DE 69916598 D1 DE69916598 D1 DE 69916598D1 DE 69916598 T DE69916598 T DE 69916598T DE 69916598 T DE69916598 T DE 69916598T DE 69916598 D1 DE69916598 D1 DE 69916598D1
Authority
DE
Germany
Prior art keywords
design wavelength
diffuser
approximately
phase shift
area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69916598T
Other languages
English (en)
Other versions
DE69916598T2 (de
Inventor
D Kathman
Adam S Fedor
Eric G Johnson
E Morris
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DigitalOptics Corp East
Original Assignee
Tessera North America Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tessera North America Inc filed Critical Tessera North America Inc
Publication of DE69916598D1 publication Critical patent/DE69916598D1/de
Application granted granted Critical
Publication of DE69916598T2 publication Critical patent/DE69916598T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
    • G02B5/0221—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having an irregular structure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
    • G02B5/0252—Diffusing elements; Afocal elements characterised by the diffusing properties using holographic or diffractive means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/02—Diffusing elements; Afocal elements
    • G02B5/0273—Diffusing elements; Afocal elements characterized by the use
    • G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/32—Holograms used as optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
    • G03H1/0236—Form or shape of the hologram when not registered to the substrate, e.g. trimming the hologram to alphanumerical shape
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/04—Processes or apparatus for producing holograms
    • G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
    • G03H1/0841—Encoding method mapping the synthesized field into a restricted set of values representative of the modulator parameters, e.g. detour phase coding
    • G03H2001/085—Kinoform, i.e. phase only encoding wherein the computed field is processed into a distribution of phase differences
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
    • G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
    • G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
    • G03H1/30—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
    • G03H2001/303—Interleaved sub-holograms, e.g. three RGB sub-holograms having interleaved pixels for reconstructing coloured holobject
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Holo Graphy (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Lasers (AREA)
  • Luminescent Compositions (AREA)
  • Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Ultra Sonic Daignosis Equipment (AREA)
DE69916598T 1998-05-05 1999-05-04 Vorrichtung zur breitbandigen diffraktiven streuung und assoziierte verfahren Expired - Fee Related DE69916598T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/071,762 US6118559A (en) 1996-12-20 1998-05-05 Broadband diffractive diffuser and associated methods
US71762 1998-05-05
PCT/US1999/009704 WO1999057583A1 (en) 1998-05-05 1999-05-04 Broadband diffractive diffuser and associated methods

Publications (2)

Publication Number Publication Date
DE69916598D1 true DE69916598D1 (de) 2004-05-27
DE69916598T2 DE69916598T2 (de) 2004-09-23

Family

ID=22103418

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69916598T Expired - Fee Related DE69916598T2 (de) 1998-05-05 1999-05-04 Vorrichtung zur breitbandigen diffraktiven streuung und assoziierte verfahren

Country Status (8)

Country Link
US (1) US6118559A (de)
EP (1) EP1076835B1 (de)
JP (1) JP2003517619A (de)
AT (1) ATE265053T1 (de)
AU (1) AU3970299A (de)
CA (1) CA2330862C (de)
DE (1) DE69916598T2 (de)
WO (1) WO1999057583A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2506090B1 (de) * 2000-05-30 2016-12-07 Dai Nippon Printing Co., Ltd. Computererzeugtes Hologramm, Reflektor mit einem computererzeugten Hologramm und reflektierende Flüssigkristallanzeige
US6927887B2 (en) * 2001-10-16 2005-08-09 Euv Llc Holographic illuminator for synchrotron-based projection lithography systems
EP1757959A1 (de) * 2004-06-16 2007-02-28 Nikon Corporation Brechendes diffusionselement und beleuchtungseinrichtung
DE102004035489A1 (de) * 2004-07-19 2006-02-16 Jenoptik Laser, Optik, Systeme Gmbh Optisches System zur Umwandlung einer primären Intensitätsverteilung in eine vorgegebene, raumwinkelabhängige Intensitätsverteilung
KR101273740B1 (ko) * 2004-09-22 2013-06-12 가부시키가이샤 니콘 조명 장치, 노광 장치 및 마이크로 디바이스의 제조 방법
US7813054B2 (en) * 2007-12-14 2010-10-12 Rpc Photonics, Inc. Optical elements with saddle shaped structures for diffusing or shaping light
US20200004036A1 (en) 2018-06-28 2020-01-02 Viavi Solutions Inc. Diffractive optical device providing structured light

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1900344A1 (de) * 1969-01-04 1970-08-20 Philips Patentverwaltung Synthetisches Phasenhologramm
JPS5589806A (en) * 1978-12-27 1980-07-07 Canon Inc Optical making method of diffusion plate
US4547037A (en) * 1980-10-16 1985-10-15 Regents Of The University Of Minnesota Holographic method for producing desired wavefront transformations
US5161058A (en) * 1988-05-31 1992-11-03 Canon Kabushiki Kaisha Focusing screen
US5089835A (en) * 1989-02-28 1992-02-18 Canon Kabushiki Kaisha Phase-type diffusing plate
US5189454A (en) * 1989-02-28 1993-02-23 Canon Kabushiki Kaisha Phase-type focusing screen and process for manufacturing the same
US5075800A (en) * 1989-12-04 1991-12-24 Yeda Research And Development Co. Ltd. Method of optimizing holographic optical elements
JPH03289692A (ja) * 1990-04-06 1991-12-19 Matsushita Electric Ind Co Ltd 空間光変調素子及びこれを用いたホログラム画像情報記録装置
JP2525962B2 (ja) * 1991-03-20 1996-08-21 富士通株式会社 ホログラフィック光学素子の最適化方法及びホログラムを用いた装置
US5202775A (en) * 1991-11-04 1993-04-13 University Of North Carolina Radically symmetric hologram and method of fabricating the same
GB2269055B (en) * 1992-07-09 1996-06-05 Flat Antenna Co Ltd Phase correcting zone plate
US5383000A (en) * 1992-11-24 1995-01-17 General Signal Corporation Partial coherence varier for microlithographic system
EP0714348A4 (de) * 1993-07-27 1998-05-06 Physical Optics Corp Vorrichtung zum destrukturieren und aufbauen einer lichtquelle
US5610733A (en) * 1994-02-28 1997-03-11 Digital Optics Corporation Beam-homogenizer
US5589982A (en) * 1994-06-03 1996-12-31 Rochester Photonics Corporation Polychromatic diffractive lens
US5559724A (en) * 1994-09-27 1996-09-24 Lucent Technologies Inc. Methods and systems for designing beam array generators
US5631721A (en) * 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography
US5630661A (en) * 1996-02-06 1997-05-20 Fox; Donald P. Metal arc flashlight
US5796499A (en) * 1997-02-28 1998-08-18 Polaroid Corporation Transmission holographic diffuser made and used to effect lateral color constancy in rear screen projection display systems

Also Published As

Publication number Publication date
CA2330862A1 (en) 1999-11-11
EP1076835A1 (de) 2001-02-21
JP2003517619A (ja) 2003-05-27
EP1076835A4 (de) 2002-06-12
WO1999057583A1 (en) 1999-11-11
CA2330862C (en) 2004-01-27
ATE265053T1 (de) 2004-05-15
US6118559A (en) 2000-09-12
AU3970299A (en) 1999-11-23
EP1076835B1 (de) 2004-04-21
DE69916598T2 (de) 2004-09-23

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee