ATE265053T1 - Vorrichtung zur breitbandigen diffraktiven streuung und assoziierte verfahren - Google Patents
Vorrichtung zur breitbandigen diffraktiven streuung und assoziierte verfahrenInfo
- Publication number
- ATE265053T1 ATE265053T1 AT99922784T AT99922784T ATE265053T1 AT E265053 T1 ATE265053 T1 AT E265053T1 AT 99922784 T AT99922784 T AT 99922784T AT 99922784 T AT99922784 T AT 99922784T AT E265053 T1 ATE265053 T1 AT E265053T1
- Authority
- AT
- Austria
- Prior art keywords
- design wavelength
- diffuser
- approximately
- phase shift
- area
- Prior art date
Links
- 230000010363 phase shift Effects 0.000 abstract 4
- 239000013598 vector Substances 0.000 abstract 2
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/021—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures
- G02B5/0221—Diffusing elements; Afocal elements characterised by the diffusing properties the diffusion taking place at the element's surface, e.g. by means of surface roughening or microprismatic structures the surface having an irregular structure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
- G02B27/0938—Using specific optical elements
- G02B27/0944—Diffractive optical elements, e.g. gratings, holograms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0205—Diffusing elements; Afocal elements characterised by the diffusing properties
- G02B5/0252—Diffusing elements; Afocal elements characterised by the diffusing properties using holographic or diffractive means
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
- G02B5/0273—Diffusing elements; Afocal elements characterized by the use
- G02B5/0278—Diffusing elements; Afocal elements characterized by the use used in transmission
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1814—Diffraction gratings structurally combined with one or more further optical elements, e.g. lenses, mirrors, prisms or other diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/32—Holograms used as optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H1/0236—Form or shape of the hologram when not registered to the substrate, e.g. trimming the hologram to alphanumerical shape
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/04—Processes or apparatus for producing holograms
- G03H1/08—Synthesising holograms, i.e. holograms synthesized from objects or objects from holograms
- G03H1/0841—Encoding method mapping the synthesized field into a restricted set of values representative of the modulator parameters, e.g. detour phase coding
- G03H2001/085—Kinoform, i.e. phase only encoding wherein the computed field is processed into a distribution of phase differences
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/26—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique
- G03H1/30—Processes or apparatus specially adapted to produce multiple sub- holograms or to obtain images from them, e.g. multicolour technique discrete holograms only
- G03H2001/303—Interleaved sub-holograms, e.g. three RGB sub-holograms having interleaved pixels for reconstructing coloured holobject
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S359/00—Optical: systems and elements
- Y10S359/90—Methods
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Holo Graphy (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Lasers (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Ultra Sonic Daignosis Equipment (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Luminescent Compositions (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/071,762 US6118559A (en) | 1996-12-20 | 1998-05-05 | Broadband diffractive diffuser and associated methods |
| PCT/US1999/009704 WO1999057583A1 (en) | 1998-05-05 | 1999-05-04 | Broadband diffractive diffuser and associated methods |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE265053T1 true ATE265053T1 (de) | 2004-05-15 |
Family
ID=22103418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT99922784T ATE265053T1 (de) | 1998-05-05 | 1999-05-04 | Vorrichtung zur breitbandigen diffraktiven streuung und assoziierte verfahren |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6118559A (de) |
| EP (1) | EP1076835B1 (de) |
| JP (1) | JP2003517619A (de) |
| AT (1) | ATE265053T1 (de) |
| AU (1) | AU3970299A (de) |
| CA (1) | CA2330862C (de) |
| DE (1) | DE69916598T2 (de) |
| WO (1) | WO1999057583A1 (de) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2506090B1 (de) * | 2000-05-30 | 2016-12-07 | Dai Nippon Printing Co., Ltd. | Computererzeugtes Hologramm, Reflektor mit einem computererzeugten Hologramm und reflektierende Flüssigkristallanzeige |
| US6927887B2 (en) * | 2001-10-16 | 2005-08-09 | Euv Llc | Holographic illuminator for synchrotron-based projection lithography systems |
| US20070206287A1 (en) * | 2004-06-16 | 2007-09-06 | Nikon Corporation | Diffusion Element And Lighting Device |
| DE102004035489A1 (de) * | 2004-07-19 | 2006-02-16 | Jenoptik Laser, Optik, Systeme Gmbh | Optisches System zur Umwandlung einer primären Intensitätsverteilung in eine vorgegebene, raumwinkelabhängige Intensitätsverteilung |
| CN100452295C (zh) * | 2004-09-22 | 2009-01-14 | 尼康股份有限公司 | 照明装置、曝光装置及微元件的制造方法 |
| US7813054B2 (en) * | 2007-12-14 | 2010-10-12 | Rpc Photonics, Inc. | Optical elements with saddle shaped structures for diffusing or shaping light |
| US12298530B2 (en) | 2018-06-28 | 2025-05-13 | Viavi Solutions Inc. | Diffractive optical device providing structured light |
| EP4118467A1 (de) * | 2020-03-11 | 2023-01-18 | Nil Technology ApS | Diffraktive optische elemente |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1900344A1 (de) * | 1969-01-04 | 1970-08-20 | Philips Patentverwaltung | Synthetisches Phasenhologramm |
| JPS5589806A (en) * | 1978-12-27 | 1980-07-07 | Canon Inc | Optical making method of diffusion plate |
| US4547037A (en) * | 1980-10-16 | 1985-10-15 | Regents Of The University Of Minnesota | Holographic method for producing desired wavefront transformations |
| US5161058A (en) * | 1988-05-31 | 1992-11-03 | Canon Kabushiki Kaisha | Focusing screen |
| US5089835A (en) * | 1989-02-28 | 1992-02-18 | Canon Kabushiki Kaisha | Phase-type diffusing plate |
| US5189454A (en) * | 1989-02-28 | 1993-02-23 | Canon Kabushiki Kaisha | Phase-type focusing screen and process for manufacturing the same |
| US5075800A (en) * | 1989-12-04 | 1991-12-24 | Yeda Research And Development Co. Ltd. | Method of optimizing holographic optical elements |
| JPH03289692A (ja) * | 1990-04-06 | 1991-12-19 | Matsushita Electric Ind Co Ltd | 空間光変調素子及びこれを用いたホログラム画像情報記録装置 |
| JP2525962B2 (ja) * | 1991-03-20 | 1996-08-21 | 富士通株式会社 | ホログラフィック光学素子の最適化方法及びホログラムを用いた装置 |
| US5202775A (en) * | 1991-11-04 | 1993-04-13 | University Of North Carolina | Radically symmetric hologram and method of fabricating the same |
| GB2269055B (en) * | 1992-07-09 | 1996-06-05 | Flat Antenna Co Ltd | Phase correcting zone plate |
| US5383000A (en) * | 1992-11-24 | 1995-01-17 | General Signal Corporation | Partial coherence varier for microlithographic system |
| JPH08512003A (ja) * | 1993-07-27 | 1996-12-17 | フィジィカル オプティクス コーポレーション | 光源の解体成形装置 |
| US5610733A (en) * | 1994-02-28 | 1997-03-11 | Digital Optics Corporation | Beam-homogenizer |
| US5589982A (en) * | 1994-06-03 | 1996-12-31 | Rochester Photonics Corporation | Polychromatic diffractive lens |
| US5559724A (en) * | 1994-09-27 | 1996-09-24 | Lucent Technologies Inc. | Methods and systems for designing beam array generators |
| US5631721A (en) * | 1995-05-24 | 1997-05-20 | Svg Lithography Systems, Inc. | Hybrid illumination system for use in photolithography |
| US5630661A (en) * | 1996-02-06 | 1997-05-20 | Fox; Donald P. | Metal arc flashlight |
| US5796499A (en) * | 1997-02-28 | 1998-08-18 | Polaroid Corporation | Transmission holographic diffuser made and used to effect lateral color constancy in rear screen projection display systems |
-
1998
- 1998-05-05 US US09/071,762 patent/US6118559A/en not_active Expired - Lifetime
-
1999
- 1999-05-04 CA CA002330862A patent/CA2330862C/en not_active Expired - Fee Related
- 1999-05-04 EP EP99922784A patent/EP1076835B1/de not_active Expired - Lifetime
- 1999-05-04 JP JP2000547496A patent/JP2003517619A/ja active Pending
- 1999-05-04 AU AU39702/99A patent/AU3970299A/en not_active Abandoned
- 1999-05-04 AT AT99922784T patent/ATE265053T1/de not_active IP Right Cessation
- 1999-05-04 DE DE69916598T patent/DE69916598T2/de not_active Expired - Fee Related
- 1999-05-04 WO PCT/US1999/009704 patent/WO1999057583A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| US6118559A (en) | 2000-09-12 |
| DE69916598D1 (de) | 2004-05-27 |
| JP2003517619A (ja) | 2003-05-27 |
| EP1076835B1 (de) | 2004-04-21 |
| EP1076835A4 (de) | 2002-06-12 |
| CA2330862A1 (en) | 1999-11-11 |
| EP1076835A1 (de) | 2001-02-21 |
| WO1999057583A1 (en) | 1999-11-11 |
| CA2330862C (en) | 2004-01-27 |
| DE69916598T2 (de) | 2004-09-23 |
| AU3970299A (en) | 1999-11-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| SE8704079L (sv) | Skaerverktyg foersett med tillstaandsgivare | |
| DE69427308D1 (de) | Diffraktive Vorrichtung | |
| ATE338292T1 (de) | Achromatisches beugungselement | |
| WO1998021629A3 (en) | In-line holographic mask for micromachining | |
| DE60142022D1 (de) | Vorrichtung und verfahren zur ausrichtung von riemenscheiben | |
| ATE382485T1 (de) | Sicherheitsdokumente oder -anordnungen und verfahren zur herstellung einer optischen beugungsstruktur in sicherheitsdokumenten oder - anordnungen | |
| EP1178429A3 (de) | Authentifizierungssystem und -Verfahren | |
| ATE199263T1 (de) | Für den chemilumineszenz-nachweis verwendbare aryl-n-alkylacridanthiocarboxylat-derivate | |
| ATE265053T1 (de) | Vorrichtung zur breitbandigen diffraktiven streuung und assoziierte verfahren | |
| TW350912B (en) | Method and device for surface testing | |
| DE69911403D1 (de) | Licht verteilungssystem | |
| ATE242902T1 (de) | Sicherheitselement für dokumente und verfahren zu seiner herstellung | |
| EP0886163A3 (de) | Strichplatte und optische Einrichtung mit einer beleuchtbaren Strichplatte | |
| ATE156073T1 (de) | Pyrotechnischer gurtstraffer | |
| WO2003075048A3 (en) | Binary optical interconnection | |
| WO2007076184A3 (en) | Method and apparatus for intensity control of multiple light sources | |
| ES2133487T3 (es) | Monomeros de oxido de bisfosfina y policarbonatos preparados a partir de los mismos. | |
| CH692638A8 (de) | Vorrichtung zum unterbrechungsfreien Auslenken eines Lichtstrahls. | |
| TW200508812A (en) | Optical illumination device, exposure device and exposure method | |
| TW200630604A (en) | Method and apparatus for inspection of optical component | |
| FR2442510A1 (fr) | Composant a semi-conducteur activable par voie optique | |
| NO20011093D0 (no) | Kantbelyst belysningsanordning | |
| DE50005483D1 (de) | Vorrichtung zur variablen Anordnung von Objekten | |
| ATE344906T1 (de) | Leuchtkörper | |
| ATE280959T1 (de) | Optisches verfahren zur brechung von licht mit entsprechendem optischen system und gerät |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |