DE69907382T2 - Mit kationischem Polymer modifizierte Silicadispersion und Verfahren zur Herstellung - Google Patents

Mit kationischem Polymer modifizierte Silicadispersion und Verfahren zur Herstellung

Info

Publication number
DE69907382T2
DE69907382T2 DE69907382T DE69907382T DE69907382T2 DE 69907382 T2 DE69907382 T2 DE 69907382T2 DE 69907382 T DE69907382 T DE 69907382T DE 69907382 T DE69907382 T DE 69907382T DE 69907382 T2 DE69907382 T2 DE 69907382T2
Authority
DE
Germany
Prior art keywords
preparation
cationic polymer
silica dispersion
dispersion modified
modified
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Revoked
Application number
DE69907382T
Other languages
English (en)
Other versions
DE69907382D1 (de
Inventor
Hiroyuki Kono
Kenji Fukunaga
Kenichi Ishizu
Yoshinori Tagashira
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=18489509&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69907382(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Application granted granted Critical
Publication of DE69907382D1 publication Critical patent/DE69907382D1/de
Publication of DE69907382T2 publication Critical patent/DE69907382T2/de
Anticipated expiration legal-status Critical
Revoked legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00Processes of treating or compounding macromolecular substances
    • C08J3/02Making solutions, dispersions, lattices or gels by other methods than by solution, emulsion or suspension polymerisation techniques
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146After-treatment of sols
    • C01B33/149Coating
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L101/00Compositions of unspecified macromolecular compounds
    • C08L101/02Compositions of unspecified macromolecular compounds characterised by the presence of specified groups, e.g. terminal or pendant functional groups
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/50Recording sheets characterised by the coating used to improve ink, dye or pigment receptivity, e.g. for ink-jet or thermal dye transfer recording
    • B41M5/52Macromolecular coatings
    • B41M5/5218Macromolecular coatings characterised by inorganic additives, e.g. pigments, clays

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Silicon Compounds (AREA)
DE69907382T 1998-12-24 1999-12-21 Mit kationischem Polymer modifizierte Silicadispersion und Verfahren zur Herstellung Revoked DE69907382T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP36751598 1998-12-24

Publications (2)

Publication Number Publication Date
DE69907382D1 DE69907382D1 (de) 2003-06-05
DE69907382T2 true DE69907382T2 (de) 2003-11-20

Family

ID=18489509

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69907382T Revoked DE69907382T2 (de) 1998-12-24 1999-12-21 Mit kationischem Polymer modifizierte Silicadispersion und Verfahren zur Herstellung

Country Status (6)

Country Link
US (1) US6417264B1 (de)
EP (1) EP1013605B1 (de)
KR (1) KR20000048167A (de)
CA (1) CA2293087C (de)
DE (1) DE69907382T2 (de)
TW (1) TW458944B (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6599631B2 (en) 2001-01-26 2003-07-29 Nanogram Corporation Polymer-inorganic particle composites
US7226966B2 (en) 2001-08-03 2007-06-05 Nanogram Corporation Structures incorporating polymer-inorganic particle blends
CN1199856C (zh) 1999-12-20 2005-05-04 阿克佐诺贝尔公司 含水氧化硅基溶胶及其制备方法和用途
US7985392B2 (en) * 2002-07-10 2011-07-26 Tokuyama Corporation Cake of easily dispersible precipitated silica
AU2003285254A1 (en) * 2002-12-02 2004-06-23 Genesis International Oilfield Services Inc. Drilling fluid and methods of use thereof
GB0308937D0 (en) 2003-04-17 2003-05-28 Eastman Kodak Co Inkjet recording element comprising particles and polymers
US20050014851A1 (en) 2003-07-18 2005-01-20 Eastman Kodak Company Colloidal core-shell assemblies and methods of preparation
DE102004021092A1 (de) * 2004-04-29 2005-11-24 Degussa Ag Verwendung einer kationischen Siliciumdioxid-Dispersion als Textilveredlungsmittel
JP4954519B2 (ja) * 2004-11-12 2012-06-20 富士フイルム株式会社 インクジェット記録用媒体、及びインクジェット記録用媒体の製造方法
US20060293396A1 (en) * 2005-01-14 2006-12-28 Eastman Kodak Company Amine polymer-modified nanoparticulate carriers
JP4971371B2 (ja) * 2006-02-28 2012-07-11 エボニック デグサ コーポレーション 印刷性能を高めるために塗工された着色紙及び基材
DE102007012578A1 (de) * 2006-09-01 2008-03-06 Bühler PARTEC GmbH Kationisch stabilisierte wässrige Silicadispersion, Verfahren zu deren Herstellung und deren Verwendung
US20080075869A1 (en) * 2006-09-26 2008-03-27 Degussa Corporation Multi-functional paper for enhanced printing performance
US7972691B2 (en) * 2006-12-22 2011-07-05 Nanogram Corporation Composites of polymers and metal/metalloid oxide nanoparticles and methods for forming these composites
US8087450B2 (en) 2007-01-29 2012-01-03 Evonik Degussa Corporation Fumed metal oxides for investment casting
DE102009002499A1 (de) 2009-04-20 2010-10-21 Evonik Degussa Gmbh Dispersion enthaltend mit quartären, aminofunktionellen siliciumorganischen Verbindungen oberflächenmodifizierte Siliciumdioxidpartikel
DE102010001135A1 (de) * 2010-01-22 2011-07-28 Evonik Degussa GmbH, 45128 Stabile wässrige Dispersionen aus gefällter Kieselsäure
DE102010031184A1 (de) 2010-07-09 2012-01-12 Evonik Degussa Gmbh Verfahren zur Herstellung einer Siliciumdioxidpartikel und Kationisierungsmittel aufweisenden Dispersion

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6143593A (ja) * 1984-08-07 1986-03-03 Mitsubishi Paper Mills Ltd インクジエツト記録媒体
US4795531A (en) * 1987-09-22 1989-01-03 Nalco Chemical Company Method for dewatering paper
US5004550A (en) * 1988-08-01 1991-04-02 Nalco Chemical Company Method of paint sludge conversion for disposal
US4863615A (en) * 1988-08-01 1989-09-05 Nalco Chemical Company Cationic coagulants plus collidal silica for use in paint detackification
JPH0419037A (ja) 1990-05-10 1992-01-23 Daikin Ind Ltd 工作機械の冷却装置
JPH0557114A (ja) 1991-01-11 1993-03-09 Millipore Corp 高効率の毛管電気泳動分離法
JPH081038B2 (ja) * 1991-08-27 1996-01-10 日本製紙株式会社 インクジェット記録用紙
JPH09142827A (ja) * 1995-09-12 1997-06-03 Tokuyama Corp シリカ分散液及びその製造方法
US5840158A (en) * 1995-09-28 1998-11-24 Nalco Chemical Company Colloidal silica/polyelectrolyte blends for pulp and paper applications
US5620629A (en) * 1995-09-28 1997-04-15 Nalco Chemical Company Colloidal silica/polyelectrolyte blends for natural water clarification
DE69611653T2 (de) * 1995-11-10 2001-05-03 Tokuyama Corp Poliersuspensionen und Verfahren zu ihrer Herstellung
JP3332386B2 (ja) * 1996-02-21 2002-10-07 花王株式会社 紫外線遮蔽性複合微粒子、及びその製造方法
KR100510815B1 (ko) * 1997-05-07 2005-10-24 제이에스알 가부시끼가이샤 무기입자의 수성분산체 및 그의 제조방법

Also Published As

Publication number Publication date
CA2293087A1 (en) 2000-06-24
TW458944B (en) 2001-10-11
EP1013605B1 (de) 2003-05-02
EP1013605A2 (de) 2000-06-28
EP1013605A3 (de) 2000-07-05
CA2293087C (en) 2008-04-29
KR20000048167A (ko) 2000-07-25
US6417264B1 (en) 2002-07-09
DE69907382D1 (de) 2003-06-05

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8331 Complete revocation