DE69905201T2 - Schlammfrei aufbereitung von kupfer-cmp-abfällen - Google Patents

Schlammfrei aufbereitung von kupfer-cmp-abfällen

Info

Publication number
DE69905201T2
DE69905201T2 DE69905201T DE69905201T DE69905201T2 DE 69905201 T2 DE69905201 T2 DE 69905201T2 DE 69905201 T DE69905201 T DE 69905201T DE 69905201 T DE69905201 T DE 69905201T DE 69905201 T2 DE69905201 T2 DE 69905201T2
Authority
DE
Germany
Prior art keywords
sludge
free treatment
copper cmp
cmp waste
waste
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69905201T
Other languages
English (en)
Other versions
DE69905201D1 (de
Inventor
James Dungan
Leon Han
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Micro Devices Inc
Original Assignee
Advanced Micro Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Micro Devices Inc filed Critical Advanced Micro Devices Inc
Application granted granted Critical
Publication of DE69905201D1 publication Critical patent/DE69905201D1/de
Publication of DE69905201T2 publication Critical patent/DE69905201T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F11/00—Treatment of sludge; Devices therefor
    • C02F11/004—Sludge detoxification
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
    • C02F1/4676—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electroreduction
    • C02F1/4678—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electroreduction of metals
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/469—Treatment of water, waste water, or sewage by electrochemical methods by electrochemical separation, e.g. by electro-osmosis, electrodialysis, electrophoresis
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2101/00—Nature of the contaminant
    • C02F2101/10—Inorganic compounds
    • C02F2101/20—Heavy metals or heavy metal compounds
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Treatment Of Sludge (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
DE69905201T 1999-01-04 1999-08-10 Schlammfrei aufbereitung von kupfer-cmp-abfällen Expired - Fee Related DE69905201T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/225,210 US6306282B1 (en) 1999-01-04 1999-01-04 Sludge-free treatment of copper CMP wastes
PCT/US1999/018184 WO2000040512A1 (en) 1999-01-04 1999-08-10 Sludge-free treatment of copper cmp wastes

Publications (2)

Publication Number Publication Date
DE69905201D1 DE69905201D1 (de) 2003-03-06
DE69905201T2 true DE69905201T2 (de) 2003-10-23

Family

ID=22843982

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69905201T Expired - Fee Related DE69905201T2 (de) 1999-01-04 1999-08-10 Schlammfrei aufbereitung von kupfer-cmp-abfällen

Country Status (6)

Country Link
US (1) US6306282B1 (de)
EP (1) EP1149051B1 (de)
JP (1) JP2002534252A (de)
KR (1) KR20010101382A (de)
DE (1) DE69905201T2 (de)
WO (1) WO2000040512A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6203705B1 (en) * 1999-10-22 2001-03-20 Koch Microelectronic Service Company, Inc. Process for treating waste water containing copper
US6905608B2 (en) * 2002-01-22 2005-06-14 Exergy Technologies Corporation Advanced electrodeionization for fluid recycling
US7488423B2 (en) * 2005-08-02 2009-02-10 Siemens Water Technologies Holding Corp. System and method of slurry treatment
CN101758457B (zh) * 2010-01-19 2012-05-30 中国科学院上海微系统与信息技术研究所 一种化学机械抛光液回收和重复利用的方法
CN101786775A (zh) * 2010-02-10 2010-07-28 中南大学 一种从电镀污泥中选择性回收铜和镍的方法
JP5802609B2 (ja) * 2011-09-07 2015-10-28 ジー・フォースジャパン株式会社 クーラント再生方法
JP6499496B2 (ja) 2015-04-15 2019-04-10 株式会社Ｓｃｒｅｅｎホールディングス 廃液処理方法および廃液処理装置
KR101659707B1 (ko) * 2015-09-01 2016-09-26 인천화학 주식회사 구리함유폐액을 이용한 구리회수장치 및 이에 따른 구리회수방법
TW202144295A (zh) * 2020-04-07 2021-12-01 美商伊芙卡水科技有限公司 以超過濾和離子交換處理漿料銅廢水

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4066520A (en) * 1976-09-01 1978-01-03 Envirotech Corporation Slurry electrowinning process
FR2551768A1 (fr) 1983-09-08 1985-03-15 Little Inc A Procede ameliore de recuperation de metaux precieux a partir de matieres bimetalliques
ATE134186T1 (de) 1991-11-14 1996-02-15 Sparrman Jan Olov Methode zum spülen einer reinigungsanlage
DE4214974A1 (de) 1992-05-06 1993-11-11 Ultra Systems Gmbh Uv Oxidatio Zerstörung von freien und komplexen Cyaniden, AOX, Mineralöl, Komplexbildnern, CSB, Nitrit, Chromat und Abtrennung von Metallen in Abwässern
US5340370A (en) 1993-11-03 1994-08-23 Intel Corporation Slurries for chemical mechanical polishing
DE59807250D1 (de) 1997-04-28 2003-03-27 Infineon Technologies Ag Verfahren zur behandlung von abwasser aus einem chemisch-mechanischen polierprozess in der chipfertigung

Also Published As

Publication number Publication date
WO2000040512A1 (en) 2000-07-13
EP1149051B1 (de) 2003-01-29
JP2002534252A (ja) 2002-10-15
KR20010101382A (ko) 2001-11-14
EP1149051A1 (de) 2001-10-31
DE69905201D1 (de) 2003-03-06
US6306282B1 (en) 2001-10-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee