DE69828469D1 - Sekundäremission-Elektronenquelle für Ionenimplantierungsgerät - Google Patents
Sekundäremission-Elektronenquelle für IonenimplantierungsgerätInfo
- Publication number
- DE69828469D1 DE69828469D1 DE69828469T DE69828469T DE69828469D1 DE 69828469 D1 DE69828469 D1 DE 69828469D1 DE 69828469 T DE69828469 T DE 69828469T DE 69828469 T DE69828469 T DE 69828469T DE 69828469 D1 DE69828469 D1 DE 69828469D1
- Authority
- DE
- Germany
- Prior art keywords
- ion implantation
- electron source
- implantation device
- emission electron
- secondary emission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31701—Ion implantation
Landscapes
- Engineering & Computer Science (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- High Energy & Nuclear Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/924,969 US5909031A (en) | 1997-09-08 | 1997-09-08 | Ion implanter electron shower having enhanced secondary electron emission |
US924969 | 1997-09-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69828469D1 true DE69828469D1 (de) | 2005-02-10 |
DE69828469T2 DE69828469T2 (de) | 2006-05-18 |
Family
ID=25451002
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69828469T Expired - Lifetime DE69828469T2 (de) | 1997-09-08 | 1998-09-04 | Sekundäremission-Elektronenquelle für Ionenimplantierungsgerät |
Country Status (6)
Country | Link |
---|---|
US (1) | US5909031A (de) |
EP (1) | EP0901149B1 (de) |
JP (1) | JP4470126B2 (de) |
KR (1) | KR100386875B1 (de) |
DE (1) | DE69828469T2 (de) |
TW (1) | TW399239B (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010043738A (ko) * | 1998-05-22 | 2001-05-25 | 베리안 세미콘덕터 이큅먼트 어소시에이츠, 인크. | 저 에너지 이온 주입을 위한 방법 및 장치 |
US6541780B1 (en) * | 1998-07-28 | 2003-04-01 | Varian Semiconductor Equipment Associates, Inc. | Particle beam current monitoring technique |
JP2000133197A (ja) * | 1998-10-30 | 2000-05-12 | Applied Materials Inc | イオン注入装置 |
US7378670B2 (en) * | 2001-06-22 | 2008-05-27 | Toyo Tanso Co., Ltd. | Shielding assembly for a semiconductor manufacturing apparatus and method of using the same |
JP2005527965A (ja) * | 2001-08-28 | 2005-09-15 | ハイニックス セミコンダクター マニュファクチュアリング アメリカ インコーポレイテッド | プラズマチャンバ用チャンバシールド |
KR100546336B1 (ko) * | 2003-07-03 | 2006-01-26 | 삼성전자주식회사 | 복수의 교점을 가지는 오버레이 키 및 이를 이용한오버레이 측정 방법 |
KR100598102B1 (ko) * | 2004-05-12 | 2006-07-07 | 삼성전자주식회사 | 이온 주입 설비에 사용되는 이온 발생 장치 |
US7358508B2 (en) * | 2005-11-10 | 2008-04-15 | Axcelis Technologies, Inc. | Ion implanter with contaminant collecting surface |
GB2440414B (en) * | 2006-07-12 | 2010-10-27 | Applied Materials Inc | An ion beam guide tube |
US7629597B2 (en) * | 2006-08-18 | 2009-12-08 | Axcelis Technologies, Inc. | Deposition reduction system for an ion implanter |
US8330127B2 (en) * | 2008-03-31 | 2012-12-11 | Varian Semiconductor Equipment Associates, Inc. | Flexible ion source |
CN105097460A (zh) * | 2014-05-09 | 2015-11-25 | 中芯国际集成电路制造(上海)有限公司 | 一种解决离子注入机路径污染的方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6410563A (en) * | 1987-07-02 | 1989-01-13 | Sumitomo Eaton Nova | Electric charging suppressor of ion implanter |
US4804837A (en) * | 1988-01-11 | 1989-02-14 | Eaton Corporation | Ion implantation surface charge control method and apparatus |
JP2805795B2 (ja) * | 1989-02-13 | 1998-09-30 | 富士通株式会社 | イオンビーム照射装置 |
JPH07120516B2 (ja) * | 1990-07-26 | 1995-12-20 | 株式会社東芝 | 低エネルギ−電子の照射方法および照射装置 |
US5134299A (en) * | 1991-03-13 | 1992-07-28 | Eaton Corporation | Ion beam implantation method and apparatus for particulate control |
US5164599A (en) * | 1991-07-19 | 1992-11-17 | Eaton Corporation | Ion beam neutralization means generating diffuse secondary emission electron shower |
US5466929A (en) * | 1992-02-21 | 1995-11-14 | Hitachi, Ltd. | Apparatus and method for suppressing electrification of sample in charged beam irradiation apparatus |
US5343047A (en) * | 1992-06-27 | 1994-08-30 | Tokyo Electron Limited | Ion implantation system |
JP3054302B2 (ja) * | 1992-12-02 | 2000-06-19 | アプライド マテリアルズ インコーポレイテッド | イオン注入中の半導体ウェハにおける帯電を低減するプラズマ放出システム |
JPH06216060A (ja) * | 1993-01-12 | 1994-08-05 | Tokyo Electron Ltd | 真空処理方法 |
US5531420A (en) * | 1994-07-01 | 1996-07-02 | Eaton Corporation | Ion beam electron neutralizer |
US5656092A (en) * | 1995-12-18 | 1997-08-12 | Eaton Corporation | Apparatus for capturing and removing contaminant particles from an interior region of an ion implanter |
-
1997
- 1997-09-08 US US08/924,969 patent/US5909031A/en not_active Expired - Lifetime
-
1998
- 1998-08-19 TW TW087113626A patent/TW399239B/zh not_active IP Right Cessation
- 1998-09-04 EP EP98307168A patent/EP0901149B1/de not_active Expired - Lifetime
- 1998-09-04 DE DE69828469T patent/DE69828469T2/de not_active Expired - Lifetime
- 1998-09-07 KR KR10-1998-0036755A patent/KR100386875B1/ko not_active IP Right Cessation
- 1998-09-08 JP JP25367798A patent/JP4470126B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0901149A2 (de) | 1999-03-10 |
TW399239B (en) | 2000-07-21 |
JP4470126B2 (ja) | 2010-06-02 |
DE69828469T2 (de) | 2006-05-18 |
EP0901149B1 (de) | 2005-01-05 |
JPH11154484A (ja) | 1999-06-08 |
KR100386875B1 (ko) | 2003-08-21 |
EP0901149A3 (de) | 2000-10-18 |
KR19990029595A (ko) | 1999-04-26 |
US5909031A (en) | 1999-06-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |