DE69819512D1 - 1-Vinylimidazol-Polymer oder -Copolymer enthaltende Deckschicht für lichtempfindliche Materialien - Google Patents

1-Vinylimidazol-Polymer oder -Copolymer enthaltende Deckschicht für lichtempfindliche Materialien

Info

Publication number
DE69819512D1
DE69819512D1 DE69819512T DE69819512T DE69819512D1 DE 69819512 D1 DE69819512 D1 DE 69819512D1 DE 69819512 T DE69819512 T DE 69819512T DE 69819512 T DE69819512 T DE 69819512T DE 69819512 D1 DE69819512 D1 DE 69819512D1
Authority
DE
Germany
Prior art keywords
copolymer
layer containing
top layer
photosensitive materials
vinylimidazole polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69819512T
Other languages
English (en)
Other versions
DE69819512T2 (de
Inventor
Socrates Peter Pappas
Harald Baumann
Udo Dwars
Celin M Savariar-Hauck
Hans-Joachim Timpe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Kodak Graphics Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Graphics Holding Inc filed Critical Kodak Graphics Holding Inc
Priority to DE69819512T priority Critical patent/DE69819512T2/de
Publication of DE69819512D1 publication Critical patent/DE69819512D1/de
Application granted granted Critical
Publication of DE69819512T2 publication Critical patent/DE69819512T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31—Surface property or characteristic of web, sheet or block
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31721—Of polyimide
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31855—Of addition polymer from unsaturated monomers
    • Y10T428/31935—Ester, halide or nitrile of addition polymer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Printing Plates And Materials Therefor (AREA)
DE69819512T 1997-07-30 1998-07-30 1-Vinylimidazol-Polymer oder -Copolymer enthaltende Deckschicht für lichtempfindliche Materialien Expired - Lifetime DE69819512T2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE69819512T DE69819512T2 (de) 1997-07-30 1998-07-30 1-Vinylimidazol-Polymer oder -Copolymer enthaltende Deckschicht für lichtempfindliche Materialien

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE19732902 1997-07-30
DE19732902A DE19732902A1 (de) 1997-07-30 1997-07-30 Deckschicht für lichtempfindliche Materialien umfassend ein (1-Vinylimidazol)-Polymer oder -Copolymer
DE69819512T DE69819512T2 (de) 1997-07-30 1998-07-30 1-Vinylimidazol-Polymer oder -Copolymer enthaltende Deckschicht für lichtempfindliche Materialien
PCT/EP1998/004765 WO1999006890A1 (en) 1997-07-30 1998-07-30 Overcoat for light-sensitive materials comprising a (1-vinylimidazole) polymer or copolymer

Publications (2)

Publication Number Publication Date
DE69819512D1 true DE69819512D1 (de) 2003-12-11
DE69819512T2 DE69819512T2 (de) 2004-09-23

Family

ID=7837422

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19732902A Withdrawn DE19732902A1 (de) 1997-07-30 1997-07-30 Deckschicht für lichtempfindliche Materialien umfassend ein (1-Vinylimidazol)-Polymer oder -Copolymer
DE69819512T Expired - Lifetime DE69819512T2 (de) 1997-07-30 1998-07-30 1-Vinylimidazol-Polymer oder -Copolymer enthaltende Deckschicht für lichtempfindliche Materialien

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE19732902A Withdrawn DE19732902A1 (de) 1997-07-30 1997-07-30 Deckschicht für lichtempfindliche Materialien umfassend ein (1-Vinylimidazol)-Polymer oder -Copolymer

Country Status (5)

Country Link
US (1) US6649323B2 (de)
EP (1) EP1000387B1 (de)
JP (1) JP2001512251A (de)
DE (2) DE19732902A1 (de)
WO (1) WO1999006890A1 (de)

Families Citing this family (43)

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DE10022786B4 (de) 1999-05-12 2008-04-10 Kodak Graphic Communications Gmbh Auf der Druckmaschine entwickelbare Druckplatte
IL133355A (en) 1999-12-07 2003-10-31 Creo Il Ltd Method and plate for digitally-imaged offset printing
US7129021B2 (en) 1999-12-17 2006-10-31 Creo Srl Polymer system with switchable physical properties and its use in direct exposure printing plates
US6893797B2 (en) 2001-11-09 2005-05-17 Kodak Polychrome Graphics Llc High speed negative-working thermal printing plates
DE10307451A1 (de) * 2003-02-21 2004-09-16 Kodak Polychrome Graphics Gmbh Strahlungsempfindliche Zusammensetzungen und darauf basierende bebilderbare Elemente
US7323288B2 (en) * 2003-04-14 2008-01-29 Kodak Graphic Communications Canada Company Layers in printing plates, printing plates and method of use of printing plates
US7205093B2 (en) * 2005-06-03 2007-04-17 International Business Machines Corporation Topcoats for use in immersion lithography
CA2623577C (en) 2005-08-11 2014-01-28 Basf Se Copolymers for cosmetic applications
US7816069B2 (en) * 2006-06-23 2010-10-19 International Business Machines Corporation Graded spin-on organic antireflective coating for photolithography
JP4911455B2 (ja) 2006-09-27 2012-04-04 富士フイルム株式会社 光重合型感光性平版印刷版原版
EP2098367A1 (de) 2008-03-05 2009-09-09 Eastman Kodak Company Sensibilisator/Initiator-Kombination für negativ arbeitende wärmeempfindliche Zusammensetzungen für Lithografieplatten
US7977031B2 (en) * 2008-03-26 2011-07-12 Gary Ganghui Teng Method of processing overcoated lithographic printing plate
US8084182B2 (en) 2008-04-29 2011-12-27 Eastman Kodak Company On-press developable elements and methods of use
EP2194429A1 (de) 2008-12-02 2010-06-09 Eastman Kodak Company Gummierzusammensetzungen mit Nanoteilchen zur Verbesserung der Kratzempfindlichkeit in Bild- und Nicht-Bild-Bereichen von lithografischen Druckplatten
EP2196851A1 (de) 2008-12-12 2010-06-16 Eastman Kodak Company Negativkopier-Lithographiedruckplattenvorläufer, die ein reaktives Bindemittel umfassen, das aliphatische bi- oder polycyclische Teile enthält
US20100151385A1 (en) 2008-12-17 2010-06-17 Ray Kevin B Stack of negative-working imageable elements
US8034538B2 (en) 2009-02-13 2011-10-11 Eastman Kodak Company Negative-working imageable elements
US20100215919A1 (en) 2009-02-20 2010-08-26 Ting Tao On-press developable imageable elements
US8257907B2 (en) 2009-06-12 2012-09-04 Eastman Kodak Company Negative-working imageable elements
US8247163B2 (en) 2009-06-12 2012-08-21 Eastman Kodak Company Preparing lithographic printing plates with enhanced contrast
EP2284005B1 (de) 2009-08-10 2012-05-02 Eastman Kodak Company Lithografische Druckplattenvorläufer mit Betahydroxy-Alkylamid-Vernetzern
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
EP2293144B1 (de) 2009-09-04 2012-11-07 Eastman Kodak Company Verfahren zum Trocknen von Lithographiedruckplatten nach einer Einstufenverarbeitung
US8426104B2 (en) 2009-10-08 2013-04-23 Eastman Kodak Company Negative-working imageable elements
BR112012024532A2 (pt) * 2010-03-26 2016-09-06 Fujifilm Corp precursor de placa de impressão litográfica e método de produção do mesmo
US20120090486A1 (en) 2010-10-18 2012-04-19 Celin Savariar-Hauck Lithographic printing plate precursors and methods of use
US20120141935A1 (en) 2010-12-03 2012-06-07 Bernd Strehmel Developer and its use to prepare lithographic printing plates
US20120141941A1 (en) 2010-12-03 2012-06-07 Mathias Jarek Developing lithographic printing plate precursors in simple manner
US20120141942A1 (en) 2010-12-03 2012-06-07 Domenico Balbinot Method of preparing lithographic printing plates
US20120199028A1 (en) 2011-02-08 2012-08-09 Mathias Jarek Preparing lithographic printing plates
US8632940B2 (en) 2011-04-19 2014-01-21 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8703381B2 (en) 2011-08-31 2014-04-22 Eastman Kodak Company Lithographic printing plate precursors for on-press development
JP5758263B2 (ja) * 2011-10-11 2015-08-05 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ 微細レジストパターン形成用組成物およびそれを用いたパターン形成方法
US8679726B2 (en) 2012-05-29 2014-03-25 Eastman Kodak Company Negative-working lithographic printing plate precursors
US8889341B2 (en) 2012-08-22 2014-11-18 Eastman Kodak Company Negative-working lithographic printing plate precursors and use
EP2735903B1 (de) 2012-11-22 2019-02-27 Eastman Kodak Company Negativ arbeitende Lithografiedruckplattenvorläufer mit hochverzweigtem Bindemittelmaterial
US9063423B2 (en) 2013-02-28 2015-06-23 Eastman Kodak Company Lithographic printing plate precursors and use
EP2778782B1 (de) 2013-03-13 2015-12-30 Kodak Graphic Communications GmbH Negativ arbeitende strahlungsempfindliche Elemente
US9201302B2 (en) 2013-10-03 2015-12-01 Eastman Kodak Company Negative-working lithographic printing plate precursor
US20170021656A1 (en) 2015-07-24 2017-01-26 Kevin Ray Lithographic imaging and printing with negative-working photoresponsive printing members
CN111841338B (zh) * 2019-04-25 2021-10-15 北京化工大学 一种用于分离二氧化碳的固定载体复合膜及其制备方法
US11633948B2 (en) 2020-01-22 2023-04-25 Eastman Kodak Company Method for making lithographic printing plates

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GB8700599D0 (en) * 1987-01-12 1987-02-18 Vickers Plc Printing plate precursors
GB9119518D0 (en) * 1991-09-12 1991-10-23 Minnesota Mining & Mfg Silver halide imaging materials
US6020436A (en) * 1993-03-09 2000-02-01 The Chromaline Corporation Photosensitive resin composition
US5696193A (en) * 1994-04-25 1997-12-09 Clinical Diagnostic Systems, Inc. Immunoassay elements comprising polymers containing vandium IV (V+4) ions
US5633127A (en) * 1996-03-29 1997-05-27 Eastman Kodak Company Imaging elements capable of providing in a single layer an image and an independent magnetic record
JPH10211764A (ja) * 1997-01-29 1998-08-11 Fuji Photo Film Co Ltd インクジェット記録用シート
US5919850A (en) * 1997-03-12 1999-07-06 Eastman Kodak Company UV absorbing polymer particle for use in imaging elements

Also Published As

Publication number Publication date
US6649323B2 (en) 2003-11-18
WO1999006890A1 (en) 1999-02-11
JP2001512251A (ja) 2001-08-21
EP1000387A1 (de) 2000-05-17
EP1000387B1 (de) 2003-11-05
DE69819512T2 (de) 2004-09-23
DE19732902A1 (de) 1999-02-04
US20020010264A1 (en) 2002-01-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: EASTMAN KODAK COMPANY, ROCHESTER, N.Y., US