DE69800370D1 - 4-(Alkoxyhydroxy)styryl-triazin Photoinitiatoren - Google Patents

4-(Alkoxyhydroxy)styryl-triazin Photoinitiatoren

Info

Publication number
DE69800370D1
DE69800370D1 DE69800370T DE69800370T DE69800370D1 DE 69800370 D1 DE69800370 D1 DE 69800370D1 DE 69800370 T DE69800370 T DE 69800370T DE 69800370 T DE69800370 T DE 69800370T DE 69800370 D1 DE69800370 D1 DE 69800370D1
Authority
DE
Germany
Prior art keywords
alkoxyhydroxy
styryl
triazine photoinitiators
photoinitiators
triazine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69800370T
Other languages
English (en)
Other versions
DE69800370T2 (de
Inventor
Paul A Perron
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Graphics Holding Inc
Original Assignee
Kodak Graphics Holding Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Graphics Holding Inc filed Critical Kodak Graphics Holding Inc
Publication of DE69800370D1 publication Critical patent/DE69800370D1/de
Application granted granted Critical
Publication of DE69800370T2 publication Critical patent/DE69800370T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Paints Or Removers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
DE69800370T 1997-02-14 1998-02-07 4-(Alkoxyhydroxy)styryl-triazin Photoinitiatoren Expired - Fee Related DE69800370T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/801,735 US5837586A (en) 1997-02-14 1997-02-14 4-(alkoxyhydroxy)styryl triazine photinitiators and photo sensitive composition

Publications (2)

Publication Number Publication Date
DE69800370D1 true DE69800370D1 (de) 2000-12-07
DE69800370T2 DE69800370T2 (de) 2001-05-31

Family

ID=25181915

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69800370T Expired - Fee Related DE69800370T2 (de) 1997-02-14 1998-02-07 4-(Alkoxyhydroxy)styryl-triazin Photoinitiatoren

Country Status (4)

Country Link
US (1) US5837586A (de)
EP (1) EP0859283B1 (de)
JP (1) JP2958760B2 (de)
DE (1) DE69800370T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3962781B2 (ja) * 2000-06-12 2007-08-22 エルジー・ケミカル・カンパニー・リミテッド 機能性アルキルチオ基を含むトリアジン系化合物及び光重合開始剤（ｔｒｉａｚｉｎｅ−ｂａｓｅｄｃｏｍｐｏｕｎｄｃｏｍｐｒｉｓｉｎｇｆｕｎｃｔｉｏｎａｌｉｚｅｄａｌｋｙｌｔｈｉｏｇｒｏｕｐｓ、ａｎｄｐｈｏｔｐｏｌｙｍｅｒｉｚａｔｉｏｎｉｎｉｔｉａｔｏｒ）
US6790588B2 (en) * 2001-04-06 2004-09-14 Kodak Polychrome Graphics Llc Imagable articles and compositions therefor
US6723493B2 (en) 2001-06-04 2004-04-20 Gary Ganghui Teng Negative lithographic printing plate comprising a specific compound in the photosensitive layer
DE20204840U1 (de) * 2002-03-26 2003-07-31 Foiltec Verarbeitung Von Folie Gebäudeumhüllungselement
US7147801B2 (en) * 2003-03-13 2006-12-12 Videojet Technologies Inc. Ink jet ink composition and method for security marking
US8048607B2 (en) * 2006-03-09 2011-11-01 Fujifilm Corporation Compound having polymethine-chain structure, image forming material, planographic printing plate precursor, and image forming method using the same, method of making planographic printing plate, and planographic printing method
US9366957B2 (en) 2010-02-02 2016-06-14 Covestro Deutschland Ag Photopolymer formulation having triazine-based writing monomers

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3987037A (en) * 1971-09-03 1976-10-19 Minnesota Mining And Manufacturing Company Chromophore-substituted vinyl-halomethyl-s-triazines
US3954475A (en) * 1971-09-03 1976-05-04 Minnesota Mining And Manufacturing Company Photosensitive elements containing chromophore-substituted vinyl-halomethyl-s-triazines
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
US4189323A (en) * 1977-04-25 1980-02-19 Hoechst Aktiengesellschaft Radiation-sensitive copying composition
JPS6053300B2 (ja) * 1978-08-29 1985-11-25 富士写真フイルム株式会社 感光性樹脂組成物
US4507382A (en) * 1983-03-03 1985-03-26 Minnesota Mining And Manufacturing Company Water developable positive acting lithographic printing plate
DE3337024A1 (de) * 1983-10-12 1985-04-25 Hoechst Ag, 6230 Frankfurt Lichtempfindliche, trichlormethylgruppen aufweisende verbindungen, verfahren zu ihrer herstellung und diese verbindungen enthaltendes lichtempfindliches gemisch
US4476215A (en) * 1983-11-25 1984-10-09 Minnesota Mining And Manufacturing Company Negative-acting photoresist composition
US4559401A (en) * 1984-06-04 1985-12-17 Polychrome Corporation Process for preparing chromophore-substituted vinyl-halomethyl-s-triazines
US4946373A (en) * 1985-02-28 1990-08-07 Hoechst Celanese Corporation Radiation-polymerizable composition
US4851319A (en) * 1985-02-28 1989-07-25 Hoechst Celanese Corporation Radiation polymerizable composition, photographic element, and method of making element with diazonium salt, and monofunctional and polyfunctional acrylic monomers
JPH0766185B2 (ja) * 1985-09-09 1995-07-19 富士写真フイルム株式会社 感光性組成物
DE3606155A1 (de) * 1986-02-26 1987-08-27 Basf Ag Photopolymerisierbares gemisch, dieses enthaltendes lichtempfindliches aufzeichnungselement sowie verfahren zur herstellung einer flachdruckform mittels dieses lichtempfindlichen aufzeichnungselements
US4837128A (en) * 1986-08-08 1989-06-06 Fuji Photo Film Co., Ltd. Light-sensitive composition
JPH0642074B2 (ja) * 1986-09-10 1994-06-01 富士写真フイルム株式会社 感光性組成物
GB8627059D0 (en) * 1986-11-12 1986-12-10 Cookson Group Plc Substituted trialine derivatives
GB8719730D0 (en) * 1987-08-20 1987-09-30 Vickers Plc Radiation sensitive compounds
JPH0820734B2 (ja) * 1988-08-11 1996-03-04 富士写真フイルム株式会社 感光性組成物及びそれを用いた光重合性組成物
JP2571113B2 (ja) * 1988-12-29 1997-01-16 富士写真フイルム株式会社 光重合性組成物
JPH0480758A (ja) * 1990-07-23 1992-03-13 Fuji Photo Film Co Ltd 感光性組成物
US5298361A (en) * 1991-08-30 1994-03-29 Minnesota Mining And Manufacturing Company Light-sensitive article containing migration-resistant halomethyl-1,3,5-triazine photoinitiator
US5278023A (en) * 1992-11-16 1994-01-11 Minnesota Mining And Manufacturing Company Propellant-containing thermal transfer donor elements

Also Published As

Publication number Publication date
JP2958760B2 (ja) 1999-10-06
EP0859283A1 (de) 1998-08-19
DE69800370T2 (de) 2001-05-31
JPH10237119A (ja) 1998-09-08
EP0859283B1 (de) 2000-11-02
US5837586A (en) 1998-11-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee