DE69719427D1 - Optische Vorrichtung zur schnellen Defektanalyse - Google Patents

Optische Vorrichtung zur schnellen Defektanalyse

Info

Publication number
DE69719427D1
DE69719427D1 DE69719427T DE69719427T DE69719427D1 DE 69719427 D1 DE69719427 D1 DE 69719427D1 DE 69719427 T DE69719427 T DE 69719427T DE 69719427 T DE69719427 T DE 69719427T DE 69719427 D1 DE69719427 D1 DE 69719427D1
Authority
DE
Germany
Prior art keywords
optical device
defect analysis
rapid defect
rapid
analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69719427T
Other languages
English (en)
Other versions
DE69719427T2 (de
Inventor
Alan D Dorundo
Michael Gerard Lisanke
Huizong Lu
Richard J Mccormick
Lanphuong Thi Pena
Eric V Schnetzer
Ali Reza Taheri
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE69719427D1 publication Critical patent/DE69719427D1/de
Publication of DE69719427T2 publication Critical patent/DE69719427T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0608—Height gauges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02017—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations
    • G01B9/02019—Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations contacting different points on same face of object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02041—Interferometers characterised by particular imaging or detection techniques
    • G01B9/02048—Rough and fine measurement
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02055—Reduction or prevention of errors; Testing; Calibration
    • G01B9/02062—Active error reduction, i.e. varying with time
    • G01B9/02067—Active error reduction, i.e. varying with time by electronic control systems, i.e. using feedback acting on optics or light
    • G01B9/02068—Auto-alignment of optical elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9506—Optical discs
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Optics & Photonics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
DE69719427T 1996-09-23 1997-09-12 Optische Vorrichtung zur schnellen Defektanalyse Expired - Fee Related DE69719427T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/710,805 US5926266A (en) 1996-09-23 1996-09-23 Optical apparatus for rapid defect analysis

Publications (2)

Publication Number Publication Date
DE69719427D1 true DE69719427D1 (de) 2003-04-10
DE69719427T2 DE69719427T2 (de) 2003-12-04

Family

ID=24855618

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69719427T Expired - Fee Related DE69719427T2 (de) 1996-09-23 1997-09-12 Optische Vorrichtung zur schnellen Defektanalyse

Country Status (6)

Country Link
US (1) US5926266A (de)
EP (1) EP0831296B1 (de)
JP (1) JP4384737B2 (de)
KR (1) KR100266439B1 (de)
DE (1) DE69719427T2 (de)
TW (1) TW328587B (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6287322B1 (en) * 1995-12-07 2001-09-11 Loma Linda University Medical Center Tissue opening locator and everter and method
US5987189A (en) * 1996-12-20 1999-11-16 Wyko Corporation Method of combining multiple sets of overlapping surface-profile interferometric data to produce a continuous composite map
US6608676B1 (en) * 1997-08-01 2003-08-19 Kla-Tencor Corporation System for detecting anomalies and/or features of a surface
US6507394B1 (en) * 1999-11-30 2003-01-14 Taiwan Semiconductor Manufacturing Co., Ltd Method and apparatus for inspecting the surface of a semiconductor device
US6566885B1 (en) * 1999-12-14 2003-05-20 Kla-Tencor Multiple directional scans of test structures on semiconductor integrated circuits
US7655482B2 (en) * 2000-04-18 2010-02-02 Kla-Tencor Chemical mechanical polishing test structures and methods for inspecting the same
US6870611B2 (en) * 2001-07-26 2005-03-22 Orbotech Ltd. Electrical circuit conductor inspection
US20050018199A1 (en) * 2003-07-24 2005-01-27 Leblanc Philip R. Fiber array interferometer for inspecting glass sheets
US20070183074A1 (en) * 2005-11-23 2007-08-09 Fujifilm Microdisks Usa Inc. Disk drive defect map encoding scheme
US7595874B1 (en) 2006-02-08 2009-09-29 Sciperio, Inc. Method of condensed cell slide preparation and detection of rarely occurring cells on microscope slides
US7869022B2 (en) * 2007-07-18 2011-01-11 Asml Netherlands B.V. Inspection method and apparatus lithographic apparatus, lithographic processing cell, device manufacturing method and distance measuring system
US7821647B2 (en) * 2008-02-21 2010-10-26 Corning Incorporated Apparatus and method for measuring surface topography of an object
TWI426262B (zh) * 2010-01-18 2014-02-11 Univ Yuanpei Application of Color Image Analysis in Screen Printing Carbon Electrode
EP3146291A2 (de) * 2014-05-18 2017-03-29 ADOM Advanced Optical Technologies Ltd. System für tomografie- und/oder topografiemessungen eines überlagerten objekts
EP3073249B1 (de) * 2015-03-26 2019-11-20 Goodrich Lighting Systems GmbH Erosionsdetektor für eine äussere flugzeugbeleuchtungsvorrichtung und äussere flugzeugbeleuchtungsvorrichtung damit
CN107296597A (zh) * 2017-06-20 2017-10-27 淮阴师范学院 一种采用红外线非接触式测量的人体心跳测量器
FR3109627B1 (fr) * 2020-04-27 2022-10-14 Michelin & Cie Systeme de generation de signal representatif du profil d’une surface en mouvement par rapport au systeme
CN114088734B (zh) * 2021-11-18 2022-06-24 广东电网有限责任公司 一种复合绝缘子内部缺陷检测系统及方法
TWI815632B (zh) * 2022-08-31 2023-09-11 虹光精密工業股份有限公司 媒體厚度偵測裝置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2133687A1 (de) * 1971-07-07 1973-01-25 Ibm Deutschland Anordnung zur stabilisierung der optischen weglaengendifferenz
FR2300998A2 (fr) * 1975-02-11 1976-09-10 Anvar Dispositif pour la spectrometrie interferentielle a modulation selective
DE2851750B1 (de) * 1978-11-30 1980-03-06 Ibm Deutschland Verfahren und Vorrichtung zur Messung der Ebenheit der Rauhigkeit oder des Kruemmungsradius einer Messflaeche
US4534649A (en) * 1981-10-30 1985-08-13 Downs Michael J Surface profile interferometer
US5293211A (en) * 1983-10-06 1994-03-08 The United States Of America As Represented By The Secretary Of The Air Force Microreflectometer system
JPS62211503A (ja) * 1986-03-13 1987-09-17 Hitachi Ltd 段差計測装置
US4844616A (en) * 1988-05-31 1989-07-04 International Business Machines Corporation Interferometric dimensional measurement and defect detection method
US5225886A (en) * 1989-09-18 1993-07-06 Hitachi, Ltd. Method of and apparatus for detecting foreign substances
US5062021A (en) * 1990-03-12 1991-10-29 Magnetic Peripherals Inc. Selectively textured magnetic recording media
US5108781A (en) * 1990-03-12 1992-04-28 Magnetic Peripherals Inc. Process for manufacturing selectively textured magnetic recording media
US5122648A (en) * 1990-06-01 1992-06-16 Wyko Corporation Apparatus and method for automatically focusing an interference microscope
JPH076923B2 (ja) * 1990-11-09 1995-01-30 三菱電機株式会社 空間周波数フィルタ、その空間周波数フィルタの製造方法及びパターン欠陥検査装置
US5469259A (en) * 1994-01-03 1995-11-21 International Business Machines Corporation Inspection interferometer with scanning autofocus, and phase angle control features
US5471303A (en) * 1994-04-29 1995-11-28 Wyko Corporation Combination of white-light scanning and phase-shifting interferometry for surface profile measurements

Also Published As

Publication number Publication date
DE69719427T2 (de) 2003-12-04
EP0831296B1 (de) 2003-03-05
EP0831296A1 (de) 1998-03-25
JPH10103914A (ja) 1998-04-24
KR100266439B1 (ko) 2001-01-15
US5926266A (en) 1999-07-20
TW328587B (en) 1998-03-21
JP4384737B2 (ja) 2009-12-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee