DE69714251D1 - Tröpfchenablageapparat - Google Patents

Tröpfchenablageapparat

Info

Publication number
DE69714251D1
DE69714251D1 DE69714251T DE69714251T DE69714251D1 DE 69714251 D1 DE69714251 D1 DE 69714251D1 DE 69714251 T DE69714251 T DE 69714251T DE 69714251 T DE69714251 T DE 69714251T DE 69714251 D1 DE69714251 D1 DE 69714251D1
Authority
DE
Germany
Prior art keywords
droplets
storage apparatus
storage
droplets storage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69714251T
Other languages
English (en)
Other versions
DE69714251T2 (de
Inventor
James Ashe
Christopher David Phillips
Stephen Temple
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xaar Technology Ltd
Original Assignee
Xaar Technology Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GBGB9608373.8A external-priority patent/GB9608373D0/en
Priority claimed from GBGB9624408.2A external-priority patent/GB9624408D0/en
Application filed by Xaar Technology Ltd filed Critical Xaar Technology Ltd
Publication of DE69714251D1 publication Critical patent/DE69714251D1/de
Application granted granted Critical
Publication of DE69714251T2 publication Critical patent/DE69714251T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/164—Manufacturing processes thin film formation
    • B41J2/1643—Manufacturing processes thin film formation thin film formation by plating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/14201—Structure of print heads with piezoelectric elements
    • B41J2/14209—Structure of print heads with piezoelectric elements of finger type, chamber walls consisting integrally of piezoelectric material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1607—Production of print heads with piezoelectric elements
    • B41J2/1609—Production of print heads with piezoelectric elements of finger type, chamber walls consisting integrally of piezoelectric material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1632—Manufacturing processes machining
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2002/14387—Front shooter
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/42—Piezoelectric device making
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49401—Fluid pattern dispersing device making, e.g., ink jet

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
DE69714251T 1996-04-23 1997-04-18 Tröpfchenablageapparat Expired - Lifetime DE69714251T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GBGB9608373.8A GB9608373D0 (en) 1996-04-23 1996-04-23 Droplet deposition apparatus
GBGB9624408.2A GB9624408D0 (en) 1996-11-23 1996-11-23 Droplet deposition apparatus
PCT/GB1997/001083 WO1997039897A1 (en) 1996-04-23 1997-04-18 Droplet deposition apparatus

Publications (2)

Publication Number Publication Date
DE69714251D1 true DE69714251D1 (de) 2002-08-29
DE69714251T2 DE69714251T2 (de) 2003-03-27

Family

ID=26309190

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69714251T Expired - Lifetime DE69714251T2 (de) 1996-04-23 1997-04-18 Tröpfchenablageapparat

Country Status (9)

Country Link
US (2) US6286943B1 (de)
EP (1) EP0901415B1 (de)
JP (1) JP3177897B2 (de)
CN (1) CN1191936C (de)
CA (1) CA2248807C (de)
DE (1) DE69714251T2 (de)
IN (1) IN191904B (de)
RU (1) RU2165853C2 (de)
WO (1) WO1997039897A1 (de)

Families Citing this family (46)

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GB9622177D0 (en) 1996-10-24 1996-12-18 Xaar Ltd Passivation of ink jet print heads
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US7321485B2 (en) * 1997-04-08 2008-01-22 X2Y Attenuators, Llc Arrangement for energy conditioning
US6603646B2 (en) * 1997-04-08 2003-08-05 X2Y Attenuators, Llc Multi-functional energy conditioner
US7274549B2 (en) * 2000-12-15 2007-09-25 X2Y Attenuators, Llc Energy pathway arrangements for energy conditioning
US7336468B2 (en) 1997-04-08 2008-02-26 X2Y Attenuators, Llc Arrangement for energy conditioning
US7301748B2 (en) 1997-04-08 2007-11-27 Anthony Anthony A Universal energy conditioning interposer with circuit architecture
AU2001287943A1 (en) 2000-09-26 2002-04-08 Xaar Technology Limited Droplet deposition apparatus
EP1334542A4 (de) * 2000-10-17 2008-10-29 X2Y Attenuators Llc Amalgam aus abschirm- und abgeschirmten energiewegen und anderen elementen für einzel- oder mehrfachschaltkreise mit gemeinsamem bezugsknoten
US7193831B2 (en) * 2000-10-17 2007-03-20 X2Y Attenuators, Llc Energy pathway arrangement
US7895530B2 (en) 2000-11-09 2011-02-22 Change Tools, Inc. User definable interface system, method, support tools, and computer program product
JP4030871B2 (ja) * 2000-12-12 2008-01-09 独立行政法人科学技術振興機構 電気自動車の操舵機構
US6864620B2 (en) * 2000-12-22 2005-03-08 Ngk Insulators, Ltd. Matrix type actuator
JP2003246058A (ja) * 2002-02-27 2003-09-02 Sharp Corp インクジェットヘッド
US6844960B2 (en) * 2002-09-24 2005-01-18 Eastman Kodak Company Microelectromechanical device with continuously variable displacement
JP4473532B2 (ja) * 2002-10-10 2010-06-02 日本碍子株式会社 圧電／電歪デバイス及び製造方法
US7180718B2 (en) * 2003-01-31 2007-02-20 X2Y Attenuators, Llc Shielded energy conditioner
US8251471B2 (en) * 2003-08-18 2012-08-28 Fujifilm Dimatix, Inc. Individual jet voltage trimming circuitry
JP4878111B2 (ja) * 2003-10-30 2012-02-15 日本碍子株式会社 セル駆動型圧電／電歪アクチュエータ及びその製造方法
US7675729B2 (en) 2003-12-22 2010-03-09 X2Y Attenuators, Llc Internally shielded energy conditioner
KR101193918B1 (ko) * 2004-06-03 2012-10-29 몰레큘러 임프린츠 인코퍼레이티드 나노-스케일 제조공정을 위한 유체 배분방법과 필요에 따른액적 배분방법
US20070228593A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Residual Layer Thickness Measurement and Correction
JP4274555B2 (ja) * 2004-07-16 2009-06-10 キヤノン株式会社 液体吐出素子基板の製造方法および液体吐出素子の製造方法
US7911625B2 (en) * 2004-10-15 2011-03-22 Fujifilm Dimatrix, Inc. Printing system software architecture
US8085428B2 (en) 2004-10-15 2011-12-27 Fujifilm Dimatix, Inc. Print systems and techniques
US8068245B2 (en) * 2004-10-15 2011-11-29 Fujifilm Dimatix, Inc. Printing device communication protocol
US7722147B2 (en) * 2004-10-15 2010-05-25 Fujifilm Dimatix, Inc. Printing system architecture
US7907298B2 (en) * 2004-10-15 2011-03-15 Fujifilm Dimatix, Inc. Data pump for printing
US8199342B2 (en) * 2004-10-29 2012-06-12 Fujifilm Dimatix, Inc. Tailoring image data packets to properties of print heads
US7234788B2 (en) * 2004-11-03 2007-06-26 Dimatix, Inc. Individual voltage trimming with waveforms
US7556327B2 (en) * 2004-11-05 2009-07-07 Fujifilm Dimatix, Inc. Charge leakage prevention for inkjet printing
US7811505B2 (en) * 2004-12-07 2010-10-12 Molecular Imprints, Inc. Method for fast filling of templates for imprint lithography using on template dispense
WO2006093831A2 (en) 2005-03-01 2006-09-08 X2Y Attenuators, Llc Energy conditioner with tied through electrodes
US7782587B2 (en) * 2005-03-01 2010-08-24 X2Y Attenuators, Llc Internally overlapped conditioners
KR101390426B1 (ko) 2006-03-07 2014-04-30 엑스2와이 어테뉴에이터스, 엘.엘.씨 에너지 컨디셔너 구조물들
JP5123532B2 (ja) * 2007-01-30 2013-01-23 太陽誘電株式会社 マイクロカンチレバー
KR101064043B1 (ko) 2007-06-15 2011-09-08 실버브룩 리서치 피티와이 리미티드 잉크젯 노즐 조립체에서의 전극과 액츄에이터 사이의 연결형성방법
JP5112889B2 (ja) * 2008-01-11 2013-01-09 エスアイアイ・プリンテック株式会社 インクジェットヘッドチップ、インクジェットヘッドチップの製造方法、インクジェットヘッド、及びインクジェット記録装置
JP2010158864A (ja) * 2009-01-09 2010-07-22 Sii Printek Inc 液体噴射ヘッドチップ及びその製造方法、並びに液体噴射ヘッド及び液体噴射記録装置
JP5633200B2 (ja) * 2010-06-08 2014-12-03 株式会社リコー 圧電アクチュエータ、液体吐出ヘッド及び画像形成装置
JP6121708B2 (ja) * 2012-12-19 2017-04-26 エスアイアイ・プリンテック株式会社 液体噴射ヘッド、液体噴射ヘッドの製造方法および液体噴射装置
JP6314062B2 (ja) * 2014-08-28 2018-04-18 セイコーインスツル株式会社 液体噴射ヘッドの製造方法及び液体噴射装置
JP6371639B2 (ja) * 2014-08-28 2018-08-08 セイコーインスツル株式会社 液体噴射ヘッド及び液体噴射装置
JP6393180B2 (ja) * 2014-12-16 2018-09-19 エスアイアイ・プリンテック株式会社 液体噴射ヘッド、液体噴射装置及び液体噴射ヘッドの製造方法
US10029473B2 (en) * 2016-01-08 2018-07-24 Canon Kabushiki Kaisha Liquid discharge head and recording apparatus
JP6983504B2 (ja) * 2016-01-08 2021-12-17 キヤノン株式会社 液体吐出ヘッド及び液体吐出装置

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JP3120638B2 (ja) * 1993-10-01 2000-12-25 ブラザー工業株式会社 インク噴射装置
JPH07132591A (ja) 1993-11-10 1995-05-23 Brother Ind Ltd 印字ヘッド
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Also Published As

Publication number Publication date
DE69714251T2 (de) 2003-03-27
US20020005880A1 (en) 2002-01-17
CA2248807C (en) 2006-01-03
EP0901415B1 (de) 2002-07-24
US6286943B1 (en) 2001-09-11
RU2165853C2 (ru) 2001-04-27
EP0901415A1 (de) 1999-03-17
JPH11506402A (ja) 1999-06-08
IN191904B (de) 2004-01-17
US6618943B2 (en) 2003-09-16
CA2248807A1 (en) 1997-10-30
CN1191936C (zh) 2005-03-09
CN1216502A (zh) 1999-05-12
JP3177897B2 (ja) 2001-06-18
WO1997039897A1 (en) 1997-10-30

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Legal Events

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