DE69709440D1 - Tragvorrichtung unter Verwendung magnetische Energie - Google Patents

Tragvorrichtung unter Verwendung magnetische Energie

Info

Publication number
DE69709440D1
DE69709440D1 DE69709440T DE69709440T DE69709440D1 DE 69709440 D1 DE69709440 D1 DE 69709440D1 DE 69709440 T DE69709440 T DE 69709440T DE 69709440 T DE69709440 T DE 69709440T DE 69709440 D1 DE69709440 D1 DE 69709440D1
Authority
DE
Germany
Prior art keywords
carrier
magnetic energy
magnetic
energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69709440T
Other languages
English (en)
Other versions
DE69709440T2 (de
Inventor
Kazuyo Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of DE69709440D1 publication Critical patent/DE69709440D1/de
Application granted granted Critical
Publication of DE69709440T2 publication Critical patent/DE69709440T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q15/00—Automatic control or regulation of feed movement, cutting velocity or position of tool or work
    • B23Q15/20—Automatic control or regulation of feed movement, cutting velocity or position of tool or work before or after the tool acts upon the workpiece
    • B23Q15/22—Control or regulation of position of tool or workpiece
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/49—Nc machine tool, till multiple
    • G05B2219/49276—Floating, air, magnetic suspension xy table, sawyer motor, xenetics
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/50—Machine tool, machine tool null till machine tool work handling
    • G05B2219/50046—Control of level, horizontal, inclination of workholder, slide
DE69709440T 1996-06-07 1997-06-06 Tragvorrichtung unter Verwendung magnetische Energie Expired - Fee Related DE69709440T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14603196A JPH10521A (ja) 1996-06-07 1996-06-07 支持装置

Publications (2)

Publication Number Publication Date
DE69709440D1 true DE69709440D1 (de) 2002-02-07
DE69709440T2 DE69709440T2 (de) 2002-09-12

Family

ID=15398549

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69709440T Expired - Fee Related DE69709440T2 (de) 1996-06-07 1997-06-06 Tragvorrichtung unter Verwendung magnetische Energie

Country Status (5)

Country Link
US (1) US6040675A (de)
EP (1) EP0811899B1 (de)
JP (1) JPH10521A (de)
KR (1) KR980005335A (de)
DE (1) DE69709440T2 (de)

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WO1999010970A1 (fr) * 1997-08-21 1999-03-04 Nikon Corporation Dispositif de positionnement, unite d'entrainement et aligneur equipe d'un tel dispositif
JP2001230305A (ja) * 2000-02-18 2001-08-24 Canon Inc 支持装置
KR100434975B1 (ko) * 2001-07-09 2004-06-07 백윤수 범용 나노 스테이지의 구동장치 및 그 방법
US6879127B2 (en) 2002-02-12 2005-04-12 Nikon Corporation 3-ring magnetic anti-gravity support
US6838967B2 (en) * 2002-06-03 2005-01-04 Michael Martin Support surface that utilizes magnetic repulsive forces
JP2004132435A (ja) * 2002-10-09 2004-04-30 Canon Inc 軸受装置
JP2004228473A (ja) * 2003-01-27 2004-08-12 Canon Inc 移動ステージ装置
JP2004364392A (ja) * 2003-06-03 2004-12-24 Canon Inc リニアモータ、及びこれを備えるステージ装置、露光装置並びにデバイス製造方法
KR100572367B1 (ko) * 2003-10-09 2006-04-19 이상헌 평면 위치결정기구
JP2005142501A (ja) * 2003-11-10 2005-06-02 Canon Inc ステージ装置および露光装置ならびにデバイス製造方法
JP2005253179A (ja) * 2004-03-03 2005-09-15 Canon Inc 位置決め装置、露光装置およびデバイス製造方法
WO2006007167A2 (en) * 2004-06-17 2006-01-19 Nikon Corporation Magnetic levitation lithography apparatus and method
US7462958B2 (en) * 2004-09-21 2008-12-09 Nikon Corporation Z actuator with anti-gravity
US7583357B2 (en) * 2004-11-12 2009-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20080024749A1 (en) * 2006-05-18 2008-01-31 Nikon Corporation Low mass six degree of freedom stage for lithography tools
US20070267995A1 (en) * 2006-05-18 2007-11-22 Nikon Corporation Six Degree-of-Freedom Stage Apparatus
US7728462B2 (en) * 2006-05-18 2010-06-01 Nikon Corporation Monolithic stage devices providing motion in six degrees of freedom
US20080285004A1 (en) * 2007-05-18 2008-11-20 Nikon Corporation Monolithic, Non-Contact Six Degree-of-Freedom Stage Apparatus
US20100032397A1 (en) * 2008-08-09 2010-02-11 Chien-Cheng Lin Gantry with Adjustable Torsion Leaf Springs
JP5088270B2 (ja) * 2008-08-19 2012-12-05 株式会社安川電機 精密微動位置決めユニット、それを備えたステージ装置、露光装置及び検査装置
NL2004847A (en) * 2009-06-30 2011-01-04 Asml Holding Nv Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus.
JP5578485B2 (ja) * 2009-10-14 2014-08-27 株式会社ニコン 移動体装置、露光装置、及びデバイス製造方法
IT1397214B1 (it) * 2009-12-29 2013-01-04 Corvino Struttura di arredo con piano di lavoro flottante.
WO2011125260A1 (ja) * 2010-04-07 2011-10-13 株式会社安川電機 θＺ駆動装置およびステージ装置
NL2007451A (en) 2010-10-27 2012-05-01 Asml Netherlands Bv Leaf spring, stage system, and lithographic apparatus.
WO2013039401A1 (en) 2011-09-15 2013-03-21 Mapper Lithography Ip B.V. Support module for lithography system
US9726985B2 (en) * 2012-02-03 2017-08-08 Asml Netherland B.V. Stage system and a lithographic apparatus
CN104603924B (zh) * 2012-10-05 2017-06-20 皇家飞利浦有限公司 旋转定位设备
CN103066894B (zh) * 2012-12-12 2015-05-20 清华大学 一种六自由度磁悬浮工件台
NL2010418C2 (en) * 2013-03-11 2014-09-15 Mapper Lithography Ip Bv Support module for lithography system.
DE102013016065B4 (de) * 2013-09-27 2016-02-18 Mecatronix Ag Positioniervorrichtung und Verfahren
CN103775550B (zh) * 2014-02-14 2015-09-23 华中科技大学 单自由度磁力隔振装置
US9504163B2 (en) * 2014-08-28 2016-11-22 Wojciech B. Kosmowski Y axis beam positioning system for a PCB drilling machine
CN105988304B (zh) * 2015-02-28 2018-10-16 上海微电子装备（集团）股份有限公司 一种可调磁浮力重力补偿器
BR102016020900A2 (pt) * 2016-09-09 2018-03-20 Cnpem Centro Nac De Pesquisa Em Energia E Materiais método de controle de grau de liberdade em sistemas mecatrônicos e monocromador de duplo cristal
DE102018119641A1 (de) 2018-08-13 2020-02-13 Branson Ultraschall Niederlassung Der Emerson Technologies Gmbh & Co. Ohg Schweißanlagen-Positionier-Anordnung
CN109848537B (zh) * 2018-12-22 2022-04-12 山西汾西重工有限责任公司 铝合金厚板卷圆壳体纵焊缝收紧定位方法
CN113898693B (zh) * 2021-10-22 2024-04-19 合肥工业大学 减振执行器
CN114857429B (zh) * 2022-04-26 2024-02-20 深圳市大族机器人有限公司 定位平台和定位系统
CN116038273B (zh) * 2022-12-29 2024-04-16 广西松浦电子科技有限公司 脉冲式精密电磁计量阀自动生产线

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US3609356A (en) * 1968-12-16 1971-09-28 Ibm Feedback controlled scanning microscopy apparatus for x-ray diffraction topography
JPS51123565A (en) * 1975-04-21 1976-10-28 Nippon Telegr & Teleph Corp <Ntt> Three-dimention-position differential adjustment of processing article
US4952858A (en) * 1988-05-18 1990-08-28 Galburt Daniel N Microlithographic apparatus
DE69028217T2 (de) * 1989-06-13 1997-02-20 Toshiba Kawasaki Kk Elektromagnetisches Betätigungsgerät und optische Platte
EP0595785B1 (de) * 1989-06-13 1995-12-27 Kabushiki Kaisha Toshiba Elektromagnetisches Betätigungsgerät und optische Platte
NL8902472A (nl) * 1989-10-05 1991-05-01 Philips Nv Positioneerinrichting.
JPH04162610A (ja) * 1990-10-26 1992-06-08 Canon Inc マスク保持装置
US5157296A (en) * 1990-12-20 1992-10-20 Massachusetts Institute Of Technology Bearing for use in high resolution precision control device
NL9100421A (nl) * 1991-03-08 1992-10-01 Asm Lithography Bv Ondersteuningsinrichting met een kantelbare objecttafel alsmede optisch lithografische inrichting voorzien van een dergelijke ondersteuningsinrichting.
JP2974535B2 (ja) * 1993-03-11 1999-11-10 キヤノン株式会社 位置決め装置
US5537186A (en) * 1993-08-03 1996-07-16 Canon Kabushiki Kaisha Movable stage mechanism and exposure apparatus using the same
JP3196798B2 (ja) * 1993-10-12 2001-08-06 キヤノン株式会社 自重支持装置
JP3800616B2 (ja) * 1994-06-27 2006-07-26 株式会社ニコン 目標物移動装置、位置決め装置及び可動ステージ装置
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
JPH08229759A (ja) * 1995-02-24 1996-09-10 Canon Inc 位置決め装置並びにデバイス製造装置及び方法
US5780943A (en) * 1996-04-04 1998-07-14 Nikon Corporation Exposure apparatus and method
US5991005A (en) * 1996-04-11 1999-11-23 Nikon Corporation Stage apparatus and exposure apparatus having the same

Also Published As

Publication number Publication date
JPH10521A (ja) 1998-01-06
US6040675A (en) 2000-03-21
DE69709440T2 (de) 2002-09-12
KR980005335A (ko) 1998-03-30
EP0811899B1 (de) 2002-01-02
EP0811899A1 (de) 1997-12-10

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee