DE69704572D1 - Verfahren zur herstellung von wasserunlöslichen, in wässrigem alkali löslichen novolack-harzen - Google Patents
Verfahren zur herstellung von wasserunlöslichen, in wässrigem alkali löslichen novolack-harzenInfo
- Publication number
- DE69704572D1 DE69704572D1 DE69704572T DE69704572T DE69704572D1 DE 69704572 D1 DE69704572 D1 DE 69704572D1 DE 69704572 T DE69704572 T DE 69704572T DE 69704572 T DE69704572 T DE 69704572T DE 69704572 D1 DE69704572 D1 DE 69704572D1
- Authority
- DE
- Germany
- Prior art keywords
- insoluble
- aqueous alkali
- producing water
- resins soluble
- novolack
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US76854296A | 1996-12-18 | 1996-12-18 | |
PCT/EP1997/007053 WO1998027128A1 (en) | 1996-12-18 | 1997-12-16 | Isolation of novolak resin without high temperature distillation and photoresist composition therefrom |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69704572D1 true DE69704572D1 (de) | 2001-05-17 |
DE69704572T2 DE69704572T2 (de) | 2001-09-13 |
Family
ID=25082790
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69704572T Expired - Fee Related DE69704572T2 (de) | 1996-12-18 | 1997-12-16 | Gewinnung von novolakharz ohne hochtemperaturdestillation und photoresistzubereitung aus diesem harz |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP0948552B1 (de) |
JP (1) | JP2001506294A (de) |
KR (1) | KR100445856B1 (de) |
CN (1) | CN1120190C (de) |
DE (1) | DE69704572T2 (de) |
TW (1) | TW475099B (de) |
WO (1) | WO1998027128A1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6121412A (en) * | 1998-11-12 | 2000-09-19 | Clariant Finance (Bvi) Limited | Preparation of fractionated novolak resins by a novel extraction technique |
US8822123B2 (en) * | 2012-07-13 | 2014-09-02 | Momentive Specialty Chemicals Inc. | Polymeric materials and methods for making the polymeric materials |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2590342B2 (ja) * | 1986-11-08 | 1997-03-12 | 住友化学工業株式会社 | ポジ型フォトレジスト用ノボラック樹脂及びそれを含有するポジ型フォトレジスト組成物 |
US5750632A (en) * | 1994-12-30 | 1998-05-12 | Clariant Finance (Bvi) Limited | Isolation of novolak resin by low temperature sub surface forced steam distillation |
US5693749A (en) * | 1995-09-20 | 1997-12-02 | Hoechst Celanese Corporation | Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom |
-
1997
- 1997-11-21 TW TW086117448A patent/TW475099B/zh not_active IP Right Cessation
- 1997-12-16 EP EP97954406A patent/EP0948552B1/de not_active Expired - Lifetime
- 1997-12-16 DE DE69704572T patent/DE69704572T2/de not_active Expired - Fee Related
- 1997-12-16 CN CN97181410A patent/CN1120190C/zh not_active Expired - Fee Related
- 1997-12-16 WO PCT/EP1997/007053 patent/WO1998027128A1/en active IP Right Grant
- 1997-12-16 KR KR10-1999-7005464A patent/KR100445856B1/ko not_active IP Right Cessation
- 1997-12-16 JP JP52730998A patent/JP2001506294A/ja not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
TW475099B (en) | 2002-02-01 |
KR20000057654A (ko) | 2000-09-25 |
CN1120190C (zh) | 2003-09-03 |
JP2001506294A (ja) | 2001-05-15 |
KR100445856B1 (ko) | 2004-08-25 |
EP0948552B1 (de) | 2001-04-11 |
CN1244876A (zh) | 2000-02-16 |
EP0948552A1 (de) | 1999-10-13 |
WO1998027128A1 (en) | 1998-06-25 |
DE69704572T2 (de) | 2001-09-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: AZ ELECTRONIC MATERIALS USA CORP. (N.D.GES.D. STAA |
|
8328 | Change in the person/name/address of the agent |
Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU |
|
8339 | Ceased/non-payment of the annual fee |