DE69631709D1 - Strahlungsempfindliche Zusammensetzung, die ein Polymer mit Schutzgruppen enthält - Google Patents

Strahlungsempfindliche Zusammensetzung, die ein Polymer mit Schutzgruppen enthält

Info

Publication number
DE69631709D1
DE69631709D1 DE69631709T DE69631709T DE69631709D1 DE 69631709 D1 DE69631709 D1 DE 69631709D1 DE 69631709 T DE69631709 T DE 69631709T DE 69631709 T DE69631709 T DE 69631709T DE 69631709 D1 DE69631709 D1 DE 69631709D1
Authority
DE
Germany
Prior art keywords
polymer
composition containing
protective groups
radiation sensitive
sensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69631709T
Other languages
English (en)
Other versions
DE69631709T2 (de
Inventor
James W Thackeray
George W Orsula
Mark D Denison
Roger Sinta
Sheri L Ablaza
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Rohm and Haas Electronic Materials LLC
Original Assignee
Shipley Co Inc
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US08/405,800 external-priority patent/US5514520A/en
Priority claimed from US08/404,933 external-priority patent/US5541263A/en
Application filed by Shipley Co Inc, Shipley Co LLC filed Critical Shipley Co Inc
Publication of DE69631709D1 publication Critical patent/DE69631709D1/de
Application granted granted Critical
Publication of DE69631709T2 publication Critical patent/DE69631709T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
DE69631709T 1995-03-16 1996-03-12 Strahlungsempfindliche Zusammensetzung, die ein Polymer mit Schutzgruppen enthält Expired - Fee Related DE69631709T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US404933 1989-09-08
US405800 1989-09-11
US08/405,800 US5514520A (en) 1995-03-16 1995-03-16 Radiation sensitive composition comprising polymer having inert blocking groups
US08/404,933 US5541263A (en) 1995-03-16 1995-03-16 Polymer having inert blocking groups

Publications (2)

Publication Number Publication Date
DE69631709D1 true DE69631709D1 (de) 2004-04-08
DE69631709T2 DE69631709T2 (de) 2005-02-10

Family

ID=27018837

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69631709T Expired - Fee Related DE69631709T2 (de) 1995-03-16 1996-03-12 Strahlungsempfindliche Zusammensetzung, die ein Polymer mit Schutzgruppen enthält

Country Status (4)

Country Link
EP (1) EP0732626B1 (de)
JP (2) JP4198765B2 (de)
KR (1) KR100492165B1 (de)
DE (1) DE69631709T2 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69621701T2 (de) * 1995-05-09 2003-02-13 Shipley Co., L.L.C. Säurekatalysierte Positiv-Photoresists
KR19980087477A (ko) * 1997-05-30 1998-12-05 마틴즈 길레모 방사선 민감성 중합체 조성물
KR19980087522A (ko) * 1997-05-30 1998-12-05 마티네츠 길러모 신규한 중합체를 함유하는 방사선 감응성 조성물
TWI289238B (en) 2000-01-13 2007-11-01 Fujifilm Corp Negative resist compositions using for electronic irradiation
KR20030063058A (ko) * 2002-01-22 2003-07-28 삼성전자주식회사 네가티브형 포토레지스트 및 이를 사용한 패턴의 형성 방법
KR101981579B1 (ko) * 2012-12-10 2019-05-23 엘지디스플레이 주식회사 표시장치용 감광성 조성물, 이를 포함하는 블랙 매트릭스 및 블랙 매트릭스의 패턴 형성 방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5128232A (en) * 1989-05-22 1992-07-07 Shiply Company Inc. Photoresist composition with copolymer binder having a major proportion of phenolic units and a minor proportion of non-aromatic cyclic alcoholic units
DE69125634T2 (de) * 1990-01-30 1998-01-02 Wako Pure Chem Ind Ltd Chemisch verstärktes Photolack-Material
US5258257A (en) * 1991-09-23 1993-11-02 Shipley Company Inc. Radiation sensitive compositions comprising polymer having acid labile groups
EP0555749B1 (de) * 1992-02-14 1999-05-19 Shipley Company Inc. Strahlungsempfindliche Zusammensetzungen und Verfahren
TW288112B (de) * 1993-06-02 1996-10-11 Sumitomo Chemical Co

Also Published As

Publication number Publication date
EP0732626A2 (de) 1996-09-18
EP0732626A3 (de) 1997-03-26
EP0732626B1 (de) 2004-03-03
KR100492165B1 (ko) 2005-10-12
JP2006291223A (ja) 2006-10-26
JP4291340B2 (ja) 2009-07-08
DE69631709T2 (de) 2005-02-10
JPH08339086A (ja) 1996-12-24
KR960034308A (ko) 1996-10-22
JP4198765B2 (ja) 2008-12-17

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee