DE69603629T2 - Rechnergesteuerte chemische Abgabevorrichtung mit Wahl der Betriebsarten - Google Patents
Rechnergesteuerte chemische Abgabevorrichtung mit Wahl der BetriebsartenInfo
- Publication number
- DE69603629T2 DE69603629T2 DE1996603629 DE69603629T DE69603629T2 DE 69603629 T2 DE69603629 T2 DE 69603629T2 DE 1996603629 DE1996603629 DE 1996603629 DE 69603629 T DE69603629 T DE 69603629T DE 69603629 T2 DE69603629 T2 DE 69603629T2
- Authority
- DE
- Germany
- Prior art keywords
- choice
- operating modes
- computer controlled
- chemical dispenser
- controlled chemical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67D—DISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
- B67D7/00—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
- B67D7/02—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants
- B67D7/0238—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants utilising compressed air or other gas acting directly or indirectly on liquids in storage containers
- B67D7/0266—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants utilising compressed air or other gas acting directly or indirectly on liquids in storage containers by gas acting directly on the liquid
- B67D7/0272—Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants utilising compressed air or other gas acting directly or indirectly on liquids in storage containers by gas acting directly on the liquid specially adapted for transferring liquids of high purity
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C10/00—Solid state diffusion of only metal elements or silicon into metallic material surfaces
- C23C10/18—Solid state diffusion of only metal elements or silicon into metallic material surfaces using liquids, e.g. salt baths, liquid suspensions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
- C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D9/00—Level control, e.g. controlling quantity of material stored in vessel
- G05D9/12—Level control, e.g. controlling quantity of material stored in vessel characterised by the use of electric means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/2496—Self-proportioning or correlating systems
- Y10T137/2559—Self-controlled branched flow systems
- Y10T137/2564—Plural inflows
- Y10T137/2567—Alternate or successive inflows
- Y10T137/2569—Control by depletion of source
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Automation & Control Theory (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Control Of Non-Electrical Variables (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/374,000 US5551309A (en) | 1995-01-17 | 1995-01-17 | Computer-controlled chemical dispensing with alternative operating modes |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69603629D1 DE69603629D1 (de) | 1999-09-16 |
DE69603629T2 true DE69603629T2 (de) | 2000-03-09 |
Family
ID=23474810
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1996603629 Expired - Lifetime DE69603629T2 (de) | 1995-01-17 | 1996-01-16 | Rechnergesteuerte chemische Abgabevorrichtung mit Wahl der Betriebsarten |
Country Status (5)
Country | Link |
---|---|
US (1) | US5551309A (de) |
EP (1) | EP0723214B1 (de) |
KR (1) | KR100369089B1 (de) |
DE (1) | DE69603629T2 (de) |
ES (1) | ES2137568T3 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10338290B3 (de) * | 2003-08-20 | 2005-01-20 | Cs Clean Systems Ag | Vorrichtung zum Abwiegen der Restmenge einer Substanz in einem Vorratsbehälter |
Families Citing this family (53)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6260588B1 (en) | 1993-04-28 | 2001-07-17 | Advanced Technology Materials, Inc. | Bulk chemical delivery system |
US5950693A (en) * | 1993-04-28 | 1999-09-14 | Advanced Delivery & Chemical Systems, Ltd. | Bulk chemical delivery system |
JPH08335539A (ja) * | 1995-06-06 | 1996-12-17 | Sony Corp | 生産管理装置および生産管理方法 |
AUPO296896A0 (en) * | 1996-10-15 | 1996-11-07 | Philmae Pty Ltd | Liquor dispensing machine |
US6296026B1 (en) | 1997-06-26 | 2001-10-02 | Advanced Technology Materials, Inc. | Chemical delivery system having purge system utilizing multiple purge techniques |
US6199599B1 (en) | 1997-07-11 | 2001-03-13 | Advanced Delivery & Chemical Systems Ltd. | Chemical delivery system having purge system utilizing multiple purge techniques |
US6435229B1 (en) * | 1997-07-11 | 2002-08-20 | Advanced Technology Materials, Inc. | Bulk chemical delivery system |
US6296025B1 (en) | 1997-07-11 | 2001-10-02 | Advanced Technology Materials, Inc. | Chemical delivery system having purge system utilizing multiple purge techniques |
JP5346620B2 (ja) * | 1997-07-11 | 2013-11-20 | アドバンスト テクノロジー マテリアルズ,インコーポレイテッド | バルク化学物質供給システム |
AU8481798A (en) * | 1997-07-11 | 1999-02-08 | Advanced Delivery & Chemical Systems, Ltd. | Bulk chemical delivery system |
US6332559B1 (en) | 1997-10-15 | 2001-12-25 | Ekolink Pty Ltd | Liquor dispensing apparatus |
KR100454156B1 (ko) * | 1998-12-30 | 2004-10-26 | 더 비오씨 그룹, 인크. | 화학물질 송출 시스템 및 송출 방법 |
US6148667A (en) * | 1999-01-28 | 2000-11-21 | Chemand Corporation | Pressure vessel isolation carriage |
JP2000225334A (ja) * | 1999-02-04 | 2000-08-15 | Shimadzu Corp | 自動合成装置 |
US6311959B1 (en) * | 1999-04-22 | 2001-11-06 | Applied Materials, Inc. | Method and apparatus for generating controlled mixture of organic vapor and inert gas |
US6345772B1 (en) * | 1999-07-30 | 2002-02-12 | Case Corporation | Field marking system |
EP1309820B1 (de) | 2000-08-04 | 2007-09-26 | FujiFilm Electronic Materials USA, Inc. | Automatisches auffüllsystem für hochreine oder kontaminationsempfindliche chemikalien |
US6604555B2 (en) | 2000-08-04 | 2003-08-12 | Arch Specialty Chemicals, Inc. | Automatic refill system for ultra pure or contamination sensitive chemicals |
JP2003014193A (ja) * | 2001-06-27 | 2003-01-15 | Nec Corp | シリンダキャビネット及びその配管内の残留ガスのパージ方法 |
JP3693324B2 (ja) * | 2001-10-30 | 2005-09-07 | ダイセル化学工業株式会社 | 擬似移動床式クロマトグラフィー用試料供給装置 |
US6953047B2 (en) * | 2002-01-14 | 2005-10-11 | Air Products And Chemicals, Inc. | Cabinet for chemical delivery with solvent purging |
US6805484B2 (en) * | 2002-12-19 | 2004-10-19 | Canon U.S.A., Inc. | Handle for digital radiography panel |
KR100587682B1 (ko) * | 2004-05-28 | 2006-06-08 | 삼성전자주식회사 | 케미컬 공급 장치 및 그에 따른 공급방법 |
WO2007033123A2 (en) * | 2005-09-12 | 2007-03-22 | Fujifilm Electronic Materials U.S.A., Inc. | Additives to prevent degradation of cyclic alkene derivatives |
US7883639B2 (en) * | 2005-09-12 | 2011-02-08 | Fujifilm Electronic Materials, U.S.A., Inc. | Additives to prevent degradation of cyclic alkene derivatives |
US7871536B2 (en) | 2005-09-12 | 2011-01-18 | Fujifilm Electronic Materials U.S.A., Inc. | Additives to prevent degradation of cyclic alkene derivatives |
US20070202603A1 (en) * | 2006-02-27 | 2007-08-30 | Steven Wayne Counts | Apparatus and method for sampling and correcting fluids |
EP1944084B1 (de) * | 2006-12-08 | 2010-05-26 | ibidi GmbH | Ventilvorrichtung für ein Mikrofluidsystem |
IL180875A0 (en) * | 2007-01-22 | 2007-07-04 | Ricor Ltd | Gas purge method and apparatus |
US8173213B2 (en) | 2008-05-28 | 2012-05-08 | Air Products And Chemicals, Inc. | Process stability of NBDE using substituted phenol stabilizers |
JP5155895B2 (ja) * | 2009-01-27 | 2013-03-06 | 日本エア・リキード株式会社 | 充填容器内の液体材料の供給装置および該液体材料の供給装置における充填容器内の液面管理方法 |
JP5690498B2 (ja) | 2009-03-27 | 2015-03-25 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 基体上に膜を堆積する方法および気化前駆体化合物を送達する装置 |
US9347616B2 (en) | 2011-05-28 | 2016-05-24 | Entegris, Inc. | Refillable ampoule with purge capability |
US9238865B2 (en) * | 2012-02-06 | 2016-01-19 | Asm Ip Holding B.V. | Multiple vapor sources for vapor deposition |
CN104154418A (zh) * | 2013-05-13 | 2014-11-19 | 上海鸿辉光通科技股份有限公司 | 一种高纯度三氯氧磷供料钢瓶 |
ES2527968B1 (es) * | 2013-08-02 | 2016-02-26 | Eulen, S.A. | Equipo de trasvase de lodos, de ciclo continuo de trabajo. |
US10072962B2 (en) | 2016-07-05 | 2018-09-11 | Ecolab Usa Inc. | Liquid out-of-product alarm system and method |
US10289126B2 (en) | 2016-10-11 | 2019-05-14 | Fuel Automation Station, LLC | Mobile distribution station with guided wave radar fuel level sensors |
US10087065B2 (en) | 2016-10-11 | 2018-10-02 | Fuel Automation Station, LLC | Mobile distribution station having sensor communication lines routed with hoses |
US9815683B1 (en) | 2016-10-11 | 2017-11-14 | Fuel Automation Station, LLC | Method and system for mobile distribution station |
US9790080B1 (en) | 2016-10-11 | 2017-10-17 | Fuel Automation Station, LLC | Mobile distribution station with fail-safes |
US9586805B1 (en) | 2016-10-11 | 2017-03-07 | Fuel Automation Station, LLC | Mobile distribution station with aisle walkway |
US10633243B2 (en) | 2017-02-24 | 2020-04-28 | Fuel Automation Station, Llc. | Mobile distribution station |
US10150662B1 (en) | 2017-10-27 | 2018-12-11 | Fuel Automation Station, Llc. | Mobile distribution station with additive injector |
US10926996B2 (en) | 2018-05-04 | 2021-02-23 | Fuel Automation Station, Llc. | Mobile distribution station having adjustable feed network |
KR102063276B1 (ko) * | 2018-06-19 | 2020-01-07 | 포이스주식회사 | 반도체 제조용 화학약품 충전시스템 |
CA3051985C (en) | 2018-08-24 | 2022-08-09 | Fuel Automation Station, LLC | Mobile distribution station having satellite dish |
US11788190B2 (en) | 2019-07-05 | 2023-10-17 | Asm Ip Holding B.V. | Liquid vaporizer |
CN210449065U (zh) * | 2019-08-09 | 2020-05-05 | 深圳市帝拓电子有限公司 | 一种气压推送式精油定量滴注装置 |
US11946136B2 (en) | 2019-09-20 | 2024-04-02 | Asm Ip Holding B.V. | Semiconductor processing device |
KR102271246B1 (ko) * | 2019-12-12 | 2021-06-29 | 버슘머트리얼즈한양기공 주식회사 | 기체처리가 가능한 액상 케미컬 공급장치 |
US11142449B2 (en) | 2020-01-02 | 2021-10-12 | Fuel Automation Station, LLC | Method and system for dispensing fuel using side-diverting fuel outlets |
US11827421B2 (en) | 2020-01-17 | 2023-11-28 | Fuel Automation Station, LLC | Fuel cap assembly with cylindrical coupler |
Family Cites Families (26)
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US4393013A (en) * | 1970-05-20 | 1983-07-12 | J. C. Schumacher Company | Vapor mass flow control system |
US3901182A (en) * | 1972-05-18 | 1975-08-26 | Harris Corp | Silicon source feed process |
US4134514A (en) * | 1976-12-02 | 1979-01-16 | J C Schumacher Co. | Liquid source material container and method of use for semiconductor device manufacturing |
US4298037A (en) * | 1976-12-02 | 1981-11-03 | J. C. Schumacher Co. | Method of shipping and using semiconductor liquid source materials |
US4276243A (en) * | 1978-12-08 | 1981-06-30 | Western Electric Company, Inc. | Vapor delivery control system and method |
US4220460A (en) * | 1979-02-05 | 1980-09-02 | Western Electric Company, Inc. | Vapor delivery system and method |
US4247018A (en) * | 1979-12-14 | 1981-01-27 | The Coca-Cola Company | Non-pressurized fluid transfer system |
US4436674A (en) * | 1981-07-30 | 1984-03-13 | J.C. Schumacher Co. | Vapor mass flow control system |
US4619072A (en) * | 1983-09-09 | 1986-10-28 | Privett Eric B | Method and apparatus for irrigating plants |
US4487619A (en) * | 1984-03-23 | 1984-12-11 | Apache Chemicals, Inc. | Thermoelectric temperature controller for liquid chemical bubbler containers |
US4582480A (en) * | 1984-08-02 | 1986-04-15 | At&T Technologies, Inc. | Methods of and apparatus for vapor delivery control in optical preform manufacture |
US4979643A (en) * | 1985-06-21 | 1990-12-25 | Air Products And Chemicals, Inc. | Chemical refill system |
AU578297B2 (en) * | 1985-06-21 | 1988-10-20 | Air Products And Chemicals Inc. | Chemical refill system |
US4612772A (en) * | 1985-11-04 | 1986-09-23 | Jones David E | Thermo-electric temperature controller for liquid chemical bubbler containers |
JP2556313B2 (ja) * | 1986-10-15 | 1996-11-20 | キヤノン株式会社 | 薬液供給装置 |
US4851821A (en) * | 1986-12-29 | 1989-07-25 | Air Products And Chemicals, Inc. | Disposable chemical container |
US5041267A (en) * | 1986-12-30 | 1991-08-20 | Air Products And Chemicals, Inc. | Ultra high purity reagent container with large breakseal |
FR2616783B1 (fr) * | 1987-06-19 | 1989-10-06 | Atochem | Composes polyfluores, leur preparation et leur utilisation comme additifs pour lubrifiants |
US4886178A (en) * | 1988-04-27 | 1989-12-12 | Air Products And Chemicals, Inc. | Method and apparatus for packaging, shipping and using poisonous liquids |
US5029602A (en) * | 1988-07-25 | 1991-07-09 | Mckinney John M | Automated chemical storage and chemical feed system |
US4979545A (en) * | 1988-10-31 | 1990-12-25 | Olin Corporation | Bubbler container automatic refill system |
US5038840A (en) * | 1990-07-31 | 1991-08-13 | Olin Corporation | Bubbler container automatic refill system |
US5370269A (en) * | 1990-09-17 | 1994-12-06 | Applied Chemical Solutions | Process and apparatus for precise volumetric diluting/mixing of chemicals |
JPH0692558A (ja) * | 1990-09-28 | 1994-04-05 | Otis Elevator Co | 発進時の揺れ及び過剰加速を低減するエレベータの発進制御装置 |
US5293893A (en) * | 1993-01-27 | 1994-03-15 | Fsi International, Inc. | Empty drum detecting apparatus |
US5607002A (en) * | 1993-04-28 | 1997-03-04 | Advanced Delivery & Chemical Systems, Inc. | Chemical refill system for high purity chemicals |
-
1995
- 1995-01-17 US US08/374,000 patent/US5551309A/en not_active Expired - Lifetime
-
1996
- 1996-01-16 ES ES96100551T patent/ES2137568T3/es not_active Expired - Lifetime
- 1996-01-16 EP EP19960100551 patent/EP0723214B1/de not_active Expired - Lifetime
- 1996-01-16 DE DE1996603629 patent/DE69603629T2/de not_active Expired - Lifetime
- 1996-01-17 KR KR1019960001262A patent/KR100369089B1/ko not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10338290B3 (de) * | 2003-08-20 | 2005-01-20 | Cs Clean Systems Ag | Vorrichtung zum Abwiegen der Restmenge einer Substanz in einem Vorratsbehälter |
US7202423B2 (en) | 2003-08-20 | 2007-04-10 | Cs Clean Systems Ag | Apparatus for weighing out the remaining quantity of a substance in a storage vessel |
Also Published As
Publication number | Publication date |
---|---|
DE69603629D1 (de) | 1999-09-16 |
KR100369089B1 (ko) | 2003-05-09 |
EP0723214A1 (de) | 1996-07-24 |
US5551309A (en) | 1996-09-03 |
EP0723214B1 (de) | 1999-08-11 |
ES2137568T3 (es) | 1999-12-16 |
KR960030321A (ko) | 1996-08-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |