DE69603629T2 - Rechnergesteuerte chemische Abgabevorrichtung mit Wahl der Betriebsarten - Google Patents

Rechnergesteuerte chemische Abgabevorrichtung mit Wahl der Betriebsarten

Info

Publication number
DE69603629T2
DE69603629T2 DE1996603629 DE69603629T DE69603629T2 DE 69603629 T2 DE69603629 T2 DE 69603629T2 DE 1996603629 DE1996603629 DE 1996603629 DE 69603629 T DE69603629 T DE 69603629T DE 69603629 T2 DE69603629 T2 DE 69603629T2
Authority
DE
Germany
Prior art keywords
choice
operating modes
computer controlled
chemical dispenser
controlled chemical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE1996603629
Other languages
English (en)
Other versions
DE69603629D1 (de
Inventor
Dirk Goossens
Henry J Boeglin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olin Corp
Original Assignee
Olin Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olin Corp filed Critical Olin Corp
Publication of DE69603629D1 publication Critical patent/DE69603629D1/de
Application granted granted Critical
Publication of DE69603629T2 publication Critical patent/DE69603629T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/22Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B67OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
    • B67DDISPENSING, DELIVERING OR TRANSFERRING LIQUIDS, NOT OTHERWISE PROVIDED FOR
    • B67D7/00Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes
    • B67D7/02Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants
    • B67D7/0238Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants utilising compressed air or other gas acting directly or indirectly on liquids in storage containers
    • B67D7/0266Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants utilising compressed air or other gas acting directly or indirectly on liquids in storage containers by gas acting directly on the liquid
    • B67D7/0272Apparatus or devices for transferring liquids from bulk storage containers or reservoirs into vehicles or into portable containers, e.g. for retail sale purposes for transferring liquids other than fuel or lubricants utilising compressed air or other gas acting directly or indirectly on liquids in storage containers by gas acting directly on the liquid specially adapted for transferring liquids of high purity
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C10/00Solid state diffusion of only metal elements or silicon into metallic material surfaces
    • C23C10/18Solid state diffusion of only metal elements or silicon into metallic material surfaces using liquids, e.g. salt baths, liquid suspensions
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05DSYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D9/00Level control, e.g. controlling quantity of material stored in vessel
    • G05D9/12Level control, e.g. controlling quantity of material stored in vessel characterised by the use of electric means
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/2496Self-proportioning or correlating systems
    • Y10T137/2559Self-controlled branched flow systems
    • Y10T137/2564Plural inflows
    • Y10T137/2567Alternate or successive inflows
    • Y10T137/2569Control by depletion of source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Automation & Control Theory (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Control Of Non-Electrical Variables (AREA)
DE1996603629 1995-01-17 1996-01-16 Rechnergesteuerte chemische Abgabevorrichtung mit Wahl der Betriebsarten Expired - Lifetime DE69603629T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/374,000 US5551309A (en) 1995-01-17 1995-01-17 Computer-controlled chemical dispensing with alternative operating modes

Publications (2)

Publication Number Publication Date
DE69603629D1 DE69603629D1 (de) 1999-09-16
DE69603629T2 true DE69603629T2 (de) 2000-03-09

Family

ID=23474810

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1996603629 Expired - Lifetime DE69603629T2 (de) 1995-01-17 1996-01-16 Rechnergesteuerte chemische Abgabevorrichtung mit Wahl der Betriebsarten

Country Status (5)

Country Link
US (1) US5551309A (de)
EP (1) EP0723214B1 (de)
KR (1) KR100369089B1 (de)
DE (1) DE69603629T2 (de)
ES (1) ES2137568T3 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10338290B3 (de) * 2003-08-20 2005-01-20 Cs Clean Systems Ag Vorrichtung zum Abwiegen der Restmenge einer Substanz in einem Vorratsbehälter

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CN210449065U (zh) * 2019-08-09 2020-05-05 深圳市帝拓电子有限公司 一种气压推送式精油定量滴注装置
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10338290B3 (de) * 2003-08-20 2005-01-20 Cs Clean Systems Ag Vorrichtung zum Abwiegen der Restmenge einer Substanz in einem Vorratsbehälter
US7202423B2 (en) 2003-08-20 2007-04-10 Cs Clean Systems Ag Apparatus for weighing out the remaining quantity of a substance in a storage vessel

Also Published As

Publication number Publication date
DE69603629D1 (de) 1999-09-16
KR100369089B1 (ko) 2003-05-09
EP0723214A1 (de) 1996-07-24
US5551309A (en) 1996-09-03
EP0723214B1 (de) 1999-08-11
ES2137568T3 (es) 1999-12-16
KR960030321A (ko) 1996-08-17

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