DE69525106T2 - Elektron-Detektor mit grosser Akzeptanz für rückgestreute Elektronen für einen Teilchenstrahl-Apparat - Google Patents
Elektron-Detektor mit grosser Akzeptanz für rückgestreute Elektronen für einen Teilchenstrahl-ApparatInfo
- Publication number
- DE69525106T2 DE69525106T2 DE69525106T DE69525106T DE69525106T2 DE 69525106 T2 DE69525106 T2 DE 69525106T2 DE 69525106 T DE69525106 T DE 69525106T DE 69525106 T DE69525106 T DE 69525106T DE 69525106 T2 DE69525106 T2 DE 69525106T2
- Authority
- DE
- Germany
- Prior art keywords
- particle beam
- beam apparatus
- electron detector
- backscattered electrons
- high acceptance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24475—Scattered electron detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2448—Secondary particle detectors
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Measurement Of Radiation (AREA)
- Measurement Of Current Or Voltage (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/262,285 US5466940A (en) | 1994-06-20 | 1994-06-20 | Electron detector with high backscattered electron acceptance for particle beam apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69525106D1 DE69525106D1 (de) | 2002-03-14 |
DE69525106T2 true DE69525106T2 (de) | 2002-10-10 |
Family
ID=22996910
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69525106T Expired - Fee Related DE69525106T2 (de) | 1994-06-20 | 1995-06-19 | Elektron-Detektor mit grosser Akzeptanz für rückgestreute Elektronen für einen Teilchenstrahl-Apparat |
Country Status (4)
Country | Link |
---|---|
US (1) | US5466940A (de) |
EP (1) | EP0689063B1 (de) |
JP (1) | JP3836519B2 (de) |
DE (1) | DE69525106T2 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7157697B2 (en) | 2002-12-12 | 2007-01-02 | Micromass Uk Limited | Ion detector |
DE10357499B4 (de) * | 2002-12-12 | 2007-11-29 | Micromass Uk Ltd. | Ionendetektor |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5644132A (en) * | 1994-06-20 | 1997-07-01 | Opan Technologies Ltd. | System for high resolution imaging and measurement of topographic and material features on a specimen |
GB9719417D0 (en) * | 1997-09-13 | 1997-11-12 | Univ York | Electron microscope |
US6509564B1 (en) | 1998-04-20 | 2003-01-21 | Hitachi, Ltd. | Workpiece holder, semiconductor fabricating apparatus, semiconductor inspecting apparatus, circuit pattern inspecting apparatus, charged particle beam application apparatus, calibrating substrate, workpiece holding method, circuit pattern inspecting method, and charged particle beam application method |
DE19828476A1 (de) | 1998-06-26 | 1999-12-30 | Leo Elektronenmikroskopie Gmbh | Teilchenstrahlgerät |
US6353222B1 (en) | 1998-09-03 | 2002-03-05 | Applied Materials, Inc. | Determining defect depth and contour information in wafer structures using multiple SEM images |
US6501077B1 (en) | 1998-09-25 | 2002-12-31 | Hitachi, Ltd. | Scanning electron microscope |
US6300629B1 (en) | 1998-09-30 | 2001-10-09 | Applied Materials, Inc. | Defect review SEM with automatically switchable detector |
US6627886B1 (en) | 1999-05-14 | 2003-09-30 | Applied Materials, Inc. | Secondary electron spectroscopy method and system |
US6633034B1 (en) | 2000-05-04 | 2003-10-14 | Applied Materials, Inc. | Method and apparatus for imaging a specimen using low profile electron detector for charged particle beam imaging apparatus including electrostatic mirrors |
WO2001084590A2 (en) * | 2000-05-04 | 2001-11-08 | Etec Systems, Inc. | Method and apparatus for imaging a specimen using indirect in-column detection of secondary electrons in a microcolumn |
EP1160825B1 (de) | 2000-05-31 | 2008-02-13 | Advantest Corporation | Teilchenstrahlgerät |
US6545277B1 (en) | 2000-08-15 | 2003-04-08 | Applied Materials, Inc. | High efficiency, enhanced detecting in-lens light guide scintillator detector for SEM |
WO2002045125A1 (en) * | 2000-12-01 | 2002-06-06 | Yeda Research And Development Co. Ltd. | Device and method for the examination of samples in a non-vacuum environment using a scanning electron microscope |
AU2003228092A1 (en) | 2002-06-05 | 2003-12-22 | Quantomix Ltd. | Methods for sem inspection of fluid containing samples |
IL150056A0 (en) * | 2002-06-05 | 2002-12-01 | Yeda Res & Dev | Low-pressure chamber for scanning electron microscopy in a wet environment |
US6906317B2 (en) * | 2002-12-12 | 2005-06-14 | Micromass Uk Limited | Ion detector |
DE10301579A1 (de) * | 2003-01-16 | 2004-07-29 | Leo Elektronenmikroskopie Gmbh | Elektronenstrahlgerät und Detektoranordnung |
US6906318B2 (en) * | 2003-02-13 | 2005-06-14 | Micromass Uk Limited | Ion detector |
US20070125947A1 (en) * | 2003-02-20 | 2007-06-07 | David Sprinzak | Sample enclosure for a scanning electron microscope and methods of use thereof |
US7435956B2 (en) * | 2004-09-10 | 2008-10-14 | Multibeam Systems, Inc. | Apparatus and method for inspection and testing of flat panel display substrates |
US7928404B2 (en) * | 2003-10-07 | 2011-04-19 | Multibeam Corporation | Variable-ratio double-deflection beam blanker |
US7227142B2 (en) * | 2004-09-10 | 2007-06-05 | Multibeam Systems, Inc. | Dual detector optics for simultaneous collection of secondary and backscattered electrons |
US7456402B2 (en) * | 2004-09-10 | 2008-11-25 | Multibeam Systems, Inc. | Detector optics for multiple electron beam test system |
JP5227643B2 (ja) * | 2008-04-14 | 2013-07-03 | 株式会社日立ハイテクノロジーズ | 高分解能でかつ高コントラストな観察が可能な電子線応用装置 |
JP5655084B2 (ja) | 2010-09-25 | 2015-01-14 | 株式会社日立ハイテクノロジーズ | 荷電粒子ビーム顕微鏡 |
JP2012199052A (ja) * | 2011-03-22 | 2012-10-18 | Jeol Ltd | 電子検出機構及びそれを備えた荷電粒子線装置 |
JP6103678B2 (ja) * | 2011-05-25 | 2017-03-29 | 株式会社ホロン | 電子検出装置および電子検出方法 |
DE102013006535A1 (de) * | 2013-04-15 | 2014-10-30 | Carl Zeiss Microscopy Gmbh | Raster-Partikelstrahlmikroskop mit energiefilterndem Detektorsystem |
JP6440128B2 (ja) * | 2014-09-24 | 2018-12-19 | 国立研究開発法人物質・材料研究機構 | エネルギー弁別電子検出器及びそれを用いた走査電子顕微鏡 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1447983A (en) * | 1973-01-10 | 1976-09-02 | Nat Res Dev | Detector for electron microscopes |
GB1596105A (en) * | 1978-02-20 | 1981-08-19 | Nat Res Dev | Electrostatic engergy analysis |
US4933552A (en) * | 1988-10-06 | 1990-06-12 | International Business Machines Corporation | Inspection system utilizing retarding field back scattered electron collection |
US4958079A (en) * | 1989-02-21 | 1990-09-18 | Galileo Electro-Optics Corps. | Detector for scanning electron microscopy apparatus |
-
1994
- 1994-06-20 US US08/262,285 patent/US5466940A/en not_active Expired - Lifetime
-
1995
- 1995-06-19 DE DE69525106T patent/DE69525106T2/de not_active Expired - Fee Related
- 1995-06-19 EP EP95109468A patent/EP0689063B1/de not_active Expired - Lifetime
- 1995-06-20 JP JP15353495A patent/JP3836519B2/ja not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7157697B2 (en) | 2002-12-12 | 2007-01-02 | Micromass Uk Limited | Ion detector |
DE10357499B4 (de) * | 2002-12-12 | 2007-11-29 | Micromass Uk Ltd. | Ionendetektor |
DE10357498B4 (de) * | 2002-12-12 | 2012-05-16 | Micromass Uk Ltd. | Ionendetektor und Verfahren zum Detektieren von Ionen |
Also Published As
Publication number | Publication date |
---|---|
DE69525106D1 (de) | 2002-03-14 |
JP3836519B2 (ja) | 2006-10-25 |
EP0689063B1 (de) | 2002-01-23 |
EP0689063A3 (de) | 1997-02-26 |
US5466940A (en) | 1995-11-14 |
JPH08124513A (ja) | 1996-05-17 |
EP0689063A2 (de) | 1995-12-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |