DE69512051D1 - Verfahren und vorrichtung zur in situ messung der dehnung in einem dunnfilm wahrend seines niederschlags auf einem substrat - Google Patents

Verfahren und vorrichtung zur in situ messung der dehnung in einem dunnfilm wahrend seines niederschlags auf einem substrat

Info

Publication number
DE69512051D1
DE69512051D1 DE69512051T DE69512051T DE69512051D1 DE 69512051 D1 DE69512051 D1 DE 69512051D1 DE 69512051 T DE69512051 T DE 69512051T DE 69512051 T DE69512051 T DE 69512051T DE 69512051 D1 DE69512051 D1 DE 69512051D1
Authority
DE
Germany
Prior art keywords
deposition
substrate
thin film
film during
measuring elongation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69512051T
Other languages
English (en)
Other versions
DE69512051T2 (de
Inventor
Fatima Frakso
Richard Bosmans
Luc Nouvelot
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EssilorLuxottica SA
Original Assignee
Essilor International Compagnie Generale dOptique SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Essilor International Compagnie Generale dOptique SA filed Critical Essilor International Compagnie Generale dOptique SA
Publication of DE69512051D1 publication Critical patent/DE69512051D1/de
Application granted granted Critical
Publication of DE69512051T2 publication Critical patent/DE69512051T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L1/00—Measuring force or stress, in general
    • G01L1/24—Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L5/00—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
    • G01L5/0047—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes measuring forces due to residual stresses
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
    • G01L5/00—Apparatus for, or methods of, measuring force, work, mechanical power, or torque, specially adapted for specific purposes
    • G01L5/0061—Force sensors associated with industrial machines or actuators
    • G01L5/0076—Force sensors associated with manufacturing machines
    • G01L5/008—Force sensors integrated in an article or a dummy workpiece

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Investigating Strength Of Materials By Application Of Mechanical Stress (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE69512051T 1994-05-11 1995-05-11 Verfahren und vorrichtung zur in situ messung der dehnung in einem dunnfilm wahrend seines niederschlags auf einem substrat Expired - Lifetime DE69512051T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9405793A FR2719900B1 (fr) 1994-05-11 1994-05-11 Procédé et dispositif pour la mesure in situ des contraintes se développant au sein d'une couche mince lors de son dépôt sur un substrat.
PCT/FR1995/000619 WO1995031706A1 (fr) 1994-05-11 1995-05-11 Procede et dispositif pour la mesure in situ des contraintes se developpant au sein d'une couche mince lors de son depot sur un substrat

Publications (2)

Publication Number Publication Date
DE69512051D1 true DE69512051D1 (de) 1999-10-14
DE69512051T2 DE69512051T2 (de) 2000-03-09

Family

ID=9463114

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69512051T Expired - Lifetime DE69512051T2 (de) 1994-05-11 1995-05-11 Verfahren und vorrichtung zur in situ messung der dehnung in einem dunnfilm wahrend seines niederschlags auf einem substrat

Country Status (6)

Country Link
US (1) US5745240A (de)
EP (1) EP0759155B1 (de)
DE (1) DE69512051T2 (de)
ES (1) ES2135737T3 (de)
FR (1) FR2719900B1 (de)
WO (1) WO1995031706A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19516256C1 (de) * 1995-04-26 1996-10-02 Fraunhofer Ges Forschung Vorrichtung zur in-situ Messung von mechanischen Spannungen in Schichten
US6649208B2 (en) * 2001-04-17 2003-11-18 Wayne E. Rodgers Apparatus and method for thin film deposition onto substrates
DE10207901A1 (de) * 2002-02-22 2003-09-04 Aixtron Ag Vorrichtung zum Abschneiden dünner Schichten mit drahtloser Prozessparameter-Aufnahme
US20050092246A1 (en) * 2002-02-22 2005-05-05 Peter Baumann Device for depositing thin layers with a wireless detection of process parameters
GB0218998D0 (en) * 2002-08-14 2002-09-25 Oxford Instr Plasma Technology Thin film deposition apparatus
DE102005008889B4 (de) * 2005-02-26 2016-07-07 Leybold Optics Gmbh Optisches Monitoringsystem für Beschichtungsprozesse
DE102005010681B4 (de) * 2005-03-09 2016-05-04 Leybold Optics Gmbh Messanordnung zum optischen Monitoring von Beschichtungsprozessen
CN102953037B (zh) 2011-08-19 2014-12-17 京东方科技集团股份有限公司 一种超薄玻璃基板上导电膜的制备方法
US20130101728A1 (en) * 2011-10-21 2013-04-25 John J. Keremes Additive manufacturing in situ stress relief
JP5949252B2 (ja) * 2011-12-02 2016-07-06 株式会社島津製作所 Ｍａｌｄｉ用試料作成装置および試料作成方法
US9601391B2 (en) 2015-03-12 2017-03-21 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Mechanical stress measurement during thin-film fabrication
CN105604547B (zh) * 2016-02-25 2019-03-05 中国电建集团华东勘测设计研究院有限公司 一种适用于破碎岩体的水压致裂法地应力量测方法
CN115255509B (zh) * 2022-09-29 2023-01-24 中铝材料应用研究院有限公司 一种用于表征薄板内部残余应力的薄板切割装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3383238A (en) * 1965-05-27 1968-05-14 Unzicker Arlyn Eugene Method and apparatus of controlling thin film deposition in a vacuum
US3570449A (en) * 1969-03-13 1971-03-16 United Aircraft Corp Sensor system for a vacuum deposition apparatus
CH522570A (it) * 1970-05-06 1972-06-30 Metal Lux Spa Apparecchiatura per la colorazione sotto vuoto di lenti per occhiali
US4024291A (en) * 1975-06-17 1977-05-17 Leybold-Heraeus Gmbh & Co. Kg Control of vapor deposition
JPS52113379A (en) * 1976-03-19 1977-09-22 Hitachi Ltd Vacuum evaporation
JPS60229255A (ja) * 1984-04-27 1985-11-14 Matsushita Electric Ind Co Ltd 光情報記録担体の蒸着方法
JPS63157869A (ja) * 1986-12-18 1988-06-30 Mitsubishi Electric Corp 被膜形成装置
DE3901017A1 (de) * 1989-01-14 1990-07-19 Leybold Ag Verfahren und vorrichtung zur ueberwachung des schichtabtrags bei einem trockenaetzprozess
US5154810A (en) * 1991-01-29 1992-10-13 Optical Coating Laboratory, Inc. Thin film coating and method
US5450205A (en) * 1993-05-28 1995-09-12 Massachusetts Institute Of Technology Apparatus and method for real-time measurement of thin film layer thickness and changes thereof
US5392124A (en) * 1993-12-17 1995-02-21 International Business Machines Corporation Method and apparatus for real-time, in-situ endpoint detection and closed loop etch process control

Also Published As

Publication number Publication date
EP0759155B1 (de) 1999-09-08
FR2719900A1 (fr) 1995-11-17
ES2135737T3 (es) 1999-11-01
EP0759155A1 (de) 1997-02-26
DE69512051T2 (de) 2000-03-09
FR2719900B1 (fr) 1996-09-20
US5745240A (en) 1998-04-28
WO1995031706A1 (fr) 1995-11-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition