DE69506396D1 - Bildfixierungsverfahren - Google Patents

Bildfixierungsverfahren

Info

Publication number
DE69506396D1
DE69506396D1 DE69506396T DE69506396T DE69506396D1 DE 69506396 D1 DE69506396 D1 DE 69506396D1 DE 69506396 T DE69506396 T DE 69506396T DE 69506396 T DE69506396 T DE 69506396T DE 69506396 D1 DE69506396 D1 DE 69506396D1
Authority
DE
Germany
Prior art keywords
acid
sensitizer
color
exposed areas
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69506396T
Other languages
English (en)
Other versions
DE69506396T2 (de
Inventor
Anne Ehret
John Marshall
Baker Rita Shon
Larry Takiff
Stephen Telfer
John Warner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
POLAROID CORP., WALTHAM, MASS., US
Original Assignee
Polaroid Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polaroid Corp filed Critical Polaroid Corp
Application granted granted Critical
Publication of DE69506396D1 publication Critical patent/DE69506396D1/de
Publication of DE69506396T2 publication Critical patent/DE69506396T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0045Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
DE69506396T 1994-04-25 1995-04-25 Bildfixierungsverfahren Expired - Fee Related DE69506396T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/232,757 US5741630A (en) 1994-04-25 1994-04-25 Process for fixing an image, and medium for use therein
PCT/US1995/005128 WO1995029067A1 (en) 1994-04-25 1995-04-25 Process for fixing an image

Publications (2)

Publication Number Publication Date
DE69506396D1 true DE69506396D1 (de) 1999-01-14
DE69506396T2 DE69506396T2 (de) 1999-05-20

Family

ID=22874440

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69506396T Expired - Fee Related DE69506396T2 (de) 1994-04-25 1995-04-25 Bildfixierungsverfahren

Country Status (10)

Country Link
US (2) US5741630A (de)
EP (1) EP0757628B1 (de)
JP (1) JPH09512498A (de)
KR (1) KR970702792A (de)
AT (1) ATE173979T1 (de)
AU (1) AU684637B2 (de)
BR (1) BR9507854A (de)
CA (1) CA2186514A1 (de)
DE (1) DE69506396T2 (de)
WO (1) WO1995029067A1 (de)

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US6110638A (en) * 1996-11-27 2000-08-29 Polaroid Corporation Process and composition for generation of acid
US5914213A (en) 1996-11-27 1999-06-22 Polaroid Corporation Process and composition for generation of acid
EP0951661A1 (de) * 1996-11-27 1999-10-27 Polaroid Corporation Verfahren und zusammensetzung zur erzeugung einer saüre
US5919608A (en) * 1997-10-29 1999-07-06 Polaroid Corporation Medium and process for generating acid using sensitizing dye and supersensitizer
US6448333B1 (en) 1999-12-16 2002-09-10 Shell Oil Company Polyfunctional polyolefins
DE10124125A1 (de) * 2000-05-17 2001-11-22 Asahi Optical Co Ltd Bildaufzeichungszusammensetzung und Blattmaterial zur Bildaufzeichnung
US6624839B2 (en) 2000-12-20 2003-09-23 Polaroid Corporation Integral organic light emitting diode printhead utilizing color filters
US6606110B2 (en) 2000-12-27 2003-08-12 Polaroid Corporation Integral organic light emitting diode printhead
US6525758B2 (en) 2000-12-28 2003-02-25 Polaroid Corporation Integral organic light emitting diode fiber optic printhead utilizing color filters
JP2008311474A (ja) 2007-06-15 2008-12-25 Fujifilm Corp パターン形成方法
US8088550B2 (en) 2007-07-30 2012-01-03 Fujifilm Corporation Positive resist composition and pattern forming method
JP5802369B2 (ja) 2010-07-29 2015-10-28 富士フイルム株式会社 感活性光線性又は感放射線性樹脂組成物、並びに、それを用いたレジスト膜及びパターン形成方法
JP5662832B2 (ja) 2010-08-31 2015-02-04 富士フイルム株式会社 画像形成材料、平版印刷版原版及び平版印刷版の作製方法
EP2447773B1 (de) 2010-11-02 2013-07-10 Fujifilm Corporation Musterherstellungsverfahren, Verfahren zur Herstellung einer MEMS-Struktur, Verwendung eines gehärteten Films aus lichtempfindlicher Harzzusammensetzung als Opferschicht oder als Komponente einer MEMS-Struktur
JP5241871B2 (ja) 2011-03-11 2013-07-17 富士フイルム株式会社 サーマルポジ型平版印刷版原版及び平版印刷版の作製方法
JP5635449B2 (ja) 2011-03-11 2014-12-03 富士フイルム株式会社 樹脂パターン及びその製造方法、mems構造体の製造方法、半導体素子の製造方法、並びに、メッキパターン製造方法
EP2796928B1 (de) 2011-03-31 2015-12-30 Fujifilm Corporation Lithographiedruckplattenvorläufer und Verfahren zur Herstellung davon
EP2796929B1 (de) 2011-03-31 2015-12-30 Fujifilm Corporation Lithographiedruckplattenvorläufer und Verfahren zur Herstellung davon
US20130083286A1 (en) 2011-09-30 2013-04-04 Johnson & Johnson Vision Care, Inc. Method of creating a visible mark on lens using a leuco dye
US20130083287A1 (en) 2011-09-30 2013-04-04 Johnson & Johnson Vision Care, Inc. Method of creating a visible mark on lens using a leuco dye

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US3932514A (en) * 1970-09-17 1976-01-13 Bayer Aktiengesellschaft Catalyst for the preparation of cyclohexanone from phenol and process therefor
US3915706A (en) * 1974-03-11 1975-10-28 Xerox Corp Imaging system based on photodegradable polyaldehydes
NL7603598A (nl) * 1975-04-18 1976-10-20 Ciba Geigy Werkwijze voor het bereiden van preparaten voor het beinvloeden van de plantegroei alsmede de toepassing daarvan.
CH621107A5 (de) * 1976-12-03 1981-01-15 Ciba Geigy Ag
JPS542720A (en) * 1977-06-08 1979-01-10 Konishiroku Photo Ind Co Ltd Forming method of photopolymerized image
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US4345017A (en) * 1980-10-06 1982-08-17 Polaroid Corporation Photographic products and processes with a pH sensitive xanthene light screening dye
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EP0187015B1 (de) * 1984-12-19 1991-05-29 Mitsubishi Kasei Corporation Squarilium-Verbindungen und Flüssigkristallzusammensetzungen, die diese enthalten
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DE3730783A1 (de) * 1987-09-13 1989-03-23 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial
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US5141969A (en) * 1988-11-21 1992-08-25 Eastman Kodak Company Onium salts and the use thereof as photoinitiators
US4992571A (en) * 1989-10-31 1991-02-12 General Electric Company Method for making octyloxy substituted diphenyl iodonium hexafluoro metalloid salts
US5055376A (en) * 1990-11-13 1991-10-08 Eastman Kodak Company Curable compositions containing onium salt photoinitiators which have a chromophore linked to the onium salt moiety through the 3-position and method of use
US5405976A (en) * 1990-11-21 1995-04-11 Polaroid Corporation Benzpyrylium squarylium and croconylium dyes, and processes for their preparation and use
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US5227499A (en) * 1991-11-20 1993-07-13 Polaroid Corporation Substituted squarylium dyes, and processes and intermediates for the preparation thereof
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US5354873A (en) * 1991-11-20 1994-10-11 Polaroid Corporation Squarylium dyes, and processes and intermediates for the preparation thereof
US5219703A (en) * 1992-02-10 1993-06-15 Eastman Kodak Company Laser-induced thermal dye transfer with bleachable near-infrared absorbing sensitizers
US5334489A (en) * 1992-10-23 1994-08-02 Polaroid Corporation Process for generation of squaric acid and for imaging, and imaging medium for use therein
US5278031A (en) * 1992-10-23 1994-01-11 Polaroid Corporation Process for thermochemical generation of squaric acid and for thermal imaging, and imaging medium for use therein
US5286612A (en) * 1992-10-23 1994-02-15 Polaroid Corporation Process for generation of free superacid and for imaging, and imaging medium for use therein

Also Published As

Publication number Publication date
AU684637B2 (en) 1997-12-18
DE69506396T2 (de) 1999-05-20
JPH09512498A (ja) 1997-12-16
US5582956A (en) 1996-12-10
EP0757628B1 (de) 1998-12-02
KR970702792A (ko) 1997-06-10
EP0757628A1 (de) 1997-02-12
CA2186514A1 (en) 1995-11-02
ATE173979T1 (de) 1998-12-15
WO1995029067A1 (en) 1995-11-02
US5741630A (en) 1998-04-21
AU2365095A (en) 1995-11-16
BR9507854A (pt) 1997-09-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: POLAROID CORP., WALTHAM, MASS., US

8339 Ceased/non-payment of the annual fee