DE69431327D1 - Substrathalter für die Abscheidung aus der Dampfphase - Google Patents

Substrathalter für die Abscheidung aus der Dampfphase

Info

Publication number
DE69431327D1
DE69431327D1 DE69431327T DE69431327T DE69431327D1 DE 69431327 D1 DE69431327 D1 DE 69431327D1 DE 69431327 T DE69431327 T DE 69431327T DE 69431327 T DE69431327 T DE 69431327T DE 69431327 D1 DE69431327 D1 DE 69431327D1
Authority
DE
Germany
Prior art keywords
substrate holder
vapor phase
phase deposition
deposition
vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69431327T
Other languages
English (en)
Other versions
DE69431327T2 (de
Inventor
Michio Aruga
Atsunobu Ohkura
Akihiko Saito
Katsumasa Anan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP5126100A external-priority patent/JPH0711446A/ja
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Publication of DE69431327D1 publication Critical patent/DE69431327D1/de
Application granted granted Critical
Publication of DE69431327T2 publication Critical patent/DE69431327T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
DE1994631327 1993-05-27 1994-05-24 Substrathalter für die Abscheidung aus der Dampfphase Expired - Fee Related DE69431327T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP5126100A JPH0711446A (ja) 1993-05-27 1993-05-27 気相成長用サセプタ装置
US08/146,370 US5456757A (en) 1993-05-27 1993-10-29 Susceptor for vapor deposition

Publications (2)

Publication Number Publication Date
DE69431327D1 true DE69431327D1 (de) 2002-10-17
DE69431327T2 DE69431327T2 (de) 2003-04-17

Family

ID=26462331

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1994631327 Expired - Fee Related DE69431327T2 (de) 1993-05-27 1994-05-24 Substrathalter für die Abscheidung aus der Dampfphase

Country Status (3)

Country Link
EP (1) EP0629716B1 (de)
KR (1) KR100208457B1 (de)
DE (1) DE69431327T2 (de)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0506391B1 (de) * 1991-03-26 2002-02-27 Ngk Insulators, Ltd. Verwendung eines Korrosion beständiger Substratshalter aus Aluminiumnitrid
EP0595054A1 (de) * 1992-10-30 1994-05-04 Applied Materials, Inc. Verfahren zur Behandlung von Halbleiterscheiben bei Temperaturen oberhalb 400 C

Also Published As

Publication number Publication date
EP0629716A3 (de) 1995-09-13
EP0629716A2 (de) 1994-12-21
DE69431327T2 (de) 2003-04-17
EP0629716B1 (de) 2002-09-11
KR100208457B1 (ko) 1999-07-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee