DE69424388T2 - Verfahren und Dielektrikumstruktur zur Erleichterung der Metallüberätzung ohne Beschädigung des Zwischendielektrikums - Google Patents
Verfahren und Dielektrikumstruktur zur Erleichterung der Metallüberätzung ohne Beschädigung des ZwischendielektrikumsInfo
- Publication number
- DE69424388T2 DE69424388T2 DE69424388T DE69424388T DE69424388T2 DE 69424388 T2 DE69424388 T2 DE 69424388T2 DE 69424388 T DE69424388 T DE 69424388T DE 69424388 T DE69424388 T DE 69424388T DE 69424388 T2 DE69424388 T2 DE 69424388T2
- Authority
- DE
- Germany
- Prior art keywords
- dielectric
- overetching
- damaging
- facilitate metal
- dielectric structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000002184 metal Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
- H01L21/32135—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by vapour etching only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76804—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics by forming tapered via holes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76829—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/528—Geometry or layout of the interconnection structure
- H01L23/5283—Cross-sectional geometry
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
- H01L23/5329—Insulating materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geometry (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US17249193A | 1993-12-23 | 1993-12-23 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69424388D1 DE69424388D1 (de) | 2000-06-15 |
DE69424388T2 true DE69424388T2 (de) | 2000-08-31 |
Family
ID=22627918
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69424388T Expired - Fee Related DE69424388T2 (de) | 1993-12-23 | 1994-11-25 | Verfahren und Dielektrikumstruktur zur Erleichterung der Metallüberätzung ohne Beschädigung des Zwischendielektrikums |
Country Status (3)
Country | Link |
---|---|
US (1) | US5766974A (de) |
EP (1) | EP0660393B1 (de) |
DE (1) | DE69424388T2 (de) |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5763910A (en) * | 1995-01-31 | 1998-06-09 | Fujitsu Limited | Semiconductor device having a through-hole formed on diffused layer by self-alignment |
US5883007A (en) * | 1996-12-20 | 1999-03-16 | Lam Research Corporation | Methods and apparatuses for improving photoresist selectivity and reducing etch rate loading |
US6060385A (en) * | 1997-02-14 | 2000-05-09 | Micro Technology, Inc. | Method of making an interconnect structure |
KR100266749B1 (ko) * | 1997-06-11 | 2000-09-15 | 윤종용 | 반도체 장치의 콘택 플러그 형성 방법 |
US6025263A (en) * | 1997-07-15 | 2000-02-15 | Nanya Technology Corporation | Underlayer process for high O3 /TEOS interlayer dielectric deposition |
US6103593A (en) * | 1998-02-13 | 2000-08-15 | Advanced Micro Devices, Inc. | Method and system for providing a contact on a semiconductor device |
US6228760B1 (en) | 1999-03-08 | 2001-05-08 | Taiwan Semiconductor Manufacturing Company | Use of PE-SiON or PE-OXIDE for contact or via photo and for defect reduction with oxide and W chemical-mechanical polish |
US6242362B1 (en) | 1999-08-04 | 2001-06-05 | Taiwan Semiconductor Manufacturing Company | Etch process for fabricating a vertical hard mask/conductive pattern profile to improve T-shaped profile for a silicon oxynitride hard mask |
US6297162B1 (en) | 1999-09-27 | 2001-10-02 | Taiwan Semiconductor Manufacturing Company | Method to reduce silicon oxynitride etch rate in a silicon oxide dry etch |
US6274499B1 (en) | 1999-11-19 | 2001-08-14 | Chartered Semiconductor Manufacturing Ltd. | Method to avoid copper contamination during copper etching and CMP |
US6207566B1 (en) * | 1999-12-02 | 2001-03-27 | United Microelectronics Corp. | Method for forming a metal plug on a semiconductor wafer |
DE10057463A1 (de) * | 2000-11-20 | 2002-05-29 | Promos Technologies Inc | Herstellungsverfahren für eine Metallleitung |
EP1595282A1 (de) | 2003-02-07 | 2005-11-16 | Koninklijke Philips Electronics N.V. | METALLûTZVERFAHREN FÜR EINE VERBINDUNGSSTRUKTUR UND DURCH EINSOLCHES VERFAHREN ERHALTENE METALLVERBINDUNGSSTRUKTUR |
US8463080B1 (en) | 2004-01-22 | 2013-06-11 | Vescent Photonics, Inc. | Liquid crystal waveguide having two or more control voltages for controlling polarized light |
US20050271325A1 (en) * | 2004-01-22 | 2005-12-08 | Anderson Michael H | Liquid crystal waveguide having refractive shapes for dynamically controlling light |
US8989523B2 (en) | 2004-01-22 | 2015-03-24 | Vescent Photonics, Inc. | Liquid crystal waveguide for dynamically controlling polarized light |
US8860897B1 (en) | 2004-01-22 | 2014-10-14 | Vescent Photonics, Inc. | Liquid crystal waveguide having electric field orientated for controlling light |
US7720116B2 (en) * | 2004-01-22 | 2010-05-18 | Vescent Photonics, Inc. | Tunable laser having liquid crystal waveguide |
US7570320B1 (en) | 2005-09-01 | 2009-08-04 | Vescent Photonics, Inc. | Thermo-optic liquid crystal waveguides |
US9366938B1 (en) | 2009-02-17 | 2016-06-14 | Vescent Photonics, Inc. | Electro-optic beam deflector device |
US8995038B1 (en) | 2010-07-06 | 2015-03-31 | Vescent Photonics, Inc. | Optical time delay control device |
JP6536814B2 (ja) * | 2015-09-18 | 2019-07-03 | サンケン電気株式会社 | 半導体装置 |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2024505B (en) * | 1978-05-26 | 1983-03-23 | Rockwell International Corp | Manufacture of integrated circuits |
US4367119A (en) * | 1980-08-18 | 1983-01-04 | International Business Machines Corporation | Planar multi-level metal process with built-in etch stop |
US4412885A (en) * | 1982-11-03 | 1983-11-01 | Applied Materials, Inc. | Materials and methods for plasma etching of aluminum and aluminum alloys |
US4444618A (en) * | 1983-03-03 | 1984-04-24 | General Electric Company | Processes and gas mixtures for the reactive ion etching of aluminum and aluminum alloys |
US4505782A (en) * | 1983-03-25 | 1985-03-19 | Lfe Corporation | Plasma reactive ion etching of aluminum and aluminum alloys |
FR2630588A1 (fr) * | 1988-04-22 | 1989-10-27 | Philips Nv | Procede pour realiser une configuration d'interconnexion sur un dispositif semiconducteur notamment un circuit a densite d'integration elevee |
JP2556138B2 (ja) * | 1989-06-30 | 1996-11-20 | 日本電気株式会社 | 半導体装置の製造方法 |
JPH03156927A (ja) * | 1989-10-24 | 1991-07-04 | Hewlett Packard Co <Hp> | アルミ・メタライゼーションのパターン形成方法 |
JP3170791B2 (ja) * | 1990-09-11 | 2001-05-28 | ソニー株式会社 | Al系材料膜のエッチング方法 |
JPH04355916A (ja) * | 1990-10-12 | 1992-12-09 | Seiko Epson Corp | ドライエッチング装置 |
US5117273A (en) * | 1990-11-16 | 1992-05-26 | Sgs-Thomson Microelectronics, Inc. | Contact for integrated circuits |
US5270254A (en) * | 1991-03-27 | 1993-12-14 | Sgs-Thomson Microelectronics, Inc. | Integrated circuit metallization with zero contact enclosure requirements and method of making the same |
US5318667A (en) * | 1991-04-04 | 1994-06-07 | Hitachi, Ltd. | Method and apparatus for dry etching |
US5612254A (en) * | 1992-06-29 | 1997-03-18 | Intel Corporation | Methods of forming an interconnect on a semiconductor substrate |
US5288665A (en) * | 1992-08-12 | 1994-02-22 | Applied Materials, Inc. | Process for forming low resistance aluminum plug in via electrically connected to overlying patterned metal layer for integrated circuit structures |
JPH06151382A (ja) * | 1992-11-11 | 1994-05-31 | Toshiba Corp | ドライエッチング方法 |
US5444022A (en) * | 1993-12-29 | 1995-08-22 | Intel Corporation | Method of fabricating an interconnection structure for an integrated circuit |
US5534462A (en) * | 1995-02-24 | 1996-07-09 | Motorola, Inc. | Method for forming a plug and semiconductor device having the same |
-
1994
- 1994-11-25 DE DE69424388T patent/DE69424388T2/de not_active Expired - Fee Related
- 1994-11-25 EP EP94308743A patent/EP0660393B1/de not_active Expired - Lifetime
-
1996
- 1996-06-06 US US08/659,558 patent/US5766974A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0660393A1 (de) | 1995-06-28 |
US5766974A (en) | 1998-06-16 |
DE69424388D1 (de) | 2000-06-15 |
EP0660393B1 (de) | 2000-05-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |