DE69423212T2 - Selbstausrichtendes in-situ ellipsometer und verfahren zur verwendung bei prozessüberwachung - Google Patents

Selbstausrichtendes in-situ ellipsometer und verfahren zur verwendung bei prozessüberwachung

Info

Publication number
DE69423212T2
DE69423212T2 DE69423212T DE69423212T DE69423212T2 DE 69423212 T2 DE69423212 T2 DE 69423212T2 DE 69423212 T DE69423212 T DE 69423212T DE 69423212 T DE69423212 T DE 69423212T DE 69423212 T2 DE69423212 T2 DE 69423212T2
Authority
DE
Germany
Prior art keywords
aligning
self
process monitoring
situ ellipsometer
ellipsometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69423212T
Other languages
English (en)
Other versions
DE69423212D1 (de
Inventor
Shaochung Hsu
N De
L Robison
Tugrul Yasar
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of DE69423212D1 publication Critical patent/DE69423212D1/de
Publication of DE69423212T2 publication Critical patent/DE69423212T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21Polarisation-affecting properties
    • G01N21/211Ellipsometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques
    • G01B11/02Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0641Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
    • G01B11/065Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
DE69423212T 1993-04-26 1994-01-14 Selbstausrichtendes in-situ ellipsometer und verfahren zur verwendung bei prozessüberwachung Expired - Fee Related DE69423212T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/052,888 US5408322A (en) 1993-04-26 1993-04-26 Self aligning in-situ ellipsometer and method of using for process monitoring
PCT/US1994/000478 WO1994025823A1 (en) 1993-04-26 1994-01-14 Self aligning in-situ ellipsometer and method of using for process monitoring

Publications (2)

Publication Number Publication Date
DE69423212D1 DE69423212D1 (de) 2000-04-06
DE69423212T2 true DE69423212T2 (de) 2000-09-07

Family

ID=21980570

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69423212T Expired - Fee Related DE69423212T2 (de) 1993-04-26 1994-01-14 Selbstausrichtendes in-situ ellipsometer und verfahren zur verwendung bei prozessüberwachung

Country Status (8)

Country Link
US (1) US5408322A (de)
EP (1) EP0696345B1 (de)
JP (1) JP2969950B2 (de)
KR (1) KR960702098A (de)
AU (1) AU6266794A (de)
CA (1) CA2159831A1 (de)
DE (1) DE69423212T2 (de)
WO (1) WO1994025823A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012024261A1 (de) * 2012-12-12 2014-03-27 STM Sensor Technologie München GmbH Prüfverfahren und -Vorrichtung für Oberflächen

Families Citing this family (73)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2737572B1 (fr) * 1995-08-03 1997-10-24 Centre Nat Rech Scient Ellipsometre multi-detecteurs et procede de mesure ellipsometrique multi-detecteurs
AU716900B2 (en) * 1996-01-31 2000-03-09 Gary W. Yanik Improved optical activity detector for use with optically active compounds
US5956148A (en) * 1996-12-20 1999-09-21 Texas Instruments Incorporated Semiconductor surface measurement system and method
DE19707926A1 (de) * 1997-02-27 1998-09-03 Gunther Dr Elender Abbildendes Mikro-Ellipsometer
US5838448A (en) * 1997-03-11 1998-11-17 Nikon Corporation CMP variable angle in situ sensor
US5798837A (en) 1997-07-11 1998-08-25 Therma-Wave, Inc. Thin film optical measurement system and method with calibrating ellipsometer
US6278519B1 (en) 1998-01-29 2001-08-21 Therma-Wave, Inc. Apparatus for analyzing multi-layer thin film stacks on semiconductors
US6483580B1 (en) 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
US6242739B1 (en) * 1998-04-21 2001-06-05 Alexander P. Cherkassky Method and apparatus for non-destructive determination of film thickness and dopant concentration using fourier transform infrared spectrometry
JP2000081371A (ja) * 1998-09-07 2000-03-21 Nec Corp 薄膜分子配向評価方法、評価装置及び記録媒体
DE10001810B4 (de) * 2000-01-18 2010-05-06 A. Krüss Optronic GmbH Polarimeter
US6694275B1 (en) 2000-06-02 2004-02-17 Timbre Technologies, Inc. Profiler business model
JP2002267418A (ja) * 2001-03-09 2002-09-18 Horiba Ltd 膜厚測定装置
US6547939B2 (en) * 2001-03-29 2003-04-15 Super Light Wave Corp. Adjustable shadow mask for improving uniformity of film deposition using multiple monitoring points along radius of substrate
US6741353B1 (en) * 2001-07-20 2004-05-25 J.A. Woollam Co., Inc. Spectroscopic ellipsometry analysis of object coatings during deposition
AU2002360738A1 (en) * 2001-12-19 2003-07-09 Kla-Tencor Technologies Corporation Parametric profiling using optical spectroscopic systems
FR2841339B1 (fr) * 2002-06-19 2004-09-10 Centre Nat Rech Scient Supports anti-reflechissants et supports amplificateurs de contraste pour la lumiere polarisee en reflexion
JP3886953B2 (ja) 2003-10-22 2007-02-28 株式会社東芝 光学式プロセスモニタ装置、光学式プロセスモニタ方法及び半導体装置の製造方法
US7515253B2 (en) 2005-01-12 2009-04-07 Kla-Tencor Technologies Corporation System for measuring a sample with a layer containing a periodic diffracting structure
WO2007130295A2 (en) * 2006-05-05 2007-11-15 Metrosol, Inc. Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement
WO2009091902A1 (en) * 2008-01-17 2009-07-23 The Salk Institute For Biological Studies 3d scanning acousto-optic microscope
WO2014185818A1 (ru) * 2013-05-13 2014-11-20 Gurevich Aleksei Sergeevich Эллипсометр
US9396554B2 (en) 2014-12-05 2016-07-19 Symbol Technologies, Llc Apparatus for and method of estimating dimensions of an object associated with a code in automatic response to reading the code
US10352689B2 (en) 2016-01-28 2019-07-16 Symbol Technologies, Llc Methods and systems for high precision locationing with depth values
US10145955B2 (en) 2016-02-04 2018-12-04 Symbol Technologies, Llc Methods and systems for processing point-cloud data with a line scanner
US10721451B2 (en) 2016-03-23 2020-07-21 Symbol Technologies, Llc Arrangement for, and method of, loading freight into a shipping container
US9805240B1 (en) 2016-04-18 2017-10-31 Symbol Technologies, Llc Barcode scanning and dimensioning
US10776661B2 (en) 2016-08-19 2020-09-15 Symbol Technologies, Llc Methods, systems and apparatus for segmenting and dimensioning objects
US11042161B2 (en) 2016-11-16 2021-06-22 Symbol Technologies, Llc Navigation control method and apparatus in a mobile automation system
US10451405B2 (en) 2016-11-22 2019-10-22 Symbol Technologies, Llc Dimensioning system for, and method of, dimensioning freight in motion along an unconstrained path in a venue
US10354411B2 (en) 2016-12-20 2019-07-16 Symbol Technologies, Llc Methods, systems and apparatus for segmenting objects
WO2018146681A1 (en) * 2017-02-08 2018-08-16 Yissum Research Development Company Of The Hebrew University Of Jerusalem Ltd. System and method for use in high spatial resolution ellipsometry
WO2018204342A1 (en) 2017-05-01 2018-11-08 Symbol Technologies, Llc Product status detection system
US10726273B2 (en) 2017-05-01 2020-07-28 Symbol Technologies, Llc Method and apparatus for shelf feature and object placement detection from shelf images
US10949798B2 (en) 2017-05-01 2021-03-16 Symbol Technologies, Llc Multimodal localization and mapping for a mobile automation apparatus
US11449059B2 (en) 2017-05-01 2022-09-20 Symbol Technologies, Llc Obstacle detection for a mobile automation apparatus
US11978011B2 (en) 2017-05-01 2024-05-07 Symbol Technologies, Llc Method and apparatus for object status detection
US11367092B2 (en) 2017-05-01 2022-06-21 Symbol Technologies, Llc Method and apparatus for extracting and processing price text from an image set
US10663590B2 (en) 2017-05-01 2020-05-26 Symbol Technologies, Llc Device and method for merging lidar data
US10591918B2 (en) 2017-05-01 2020-03-17 Symbol Technologies, Llc Fixed segmented lattice planning for a mobile automation apparatus
US11600084B2 (en) 2017-05-05 2023-03-07 Symbol Technologies, Llc Method and apparatus for detecting and interpreting price label text
US10572763B2 (en) 2017-09-07 2020-02-25 Symbol Technologies, Llc Method and apparatus for support surface edge detection
US10521914B2 (en) 2017-09-07 2019-12-31 Symbol Technologies, Llc Multi-sensor object recognition system and method
US10809078B2 (en) 2018-04-05 2020-10-20 Symbol Technologies, Llc Method, system and apparatus for dynamic path generation
US11327504B2 (en) 2018-04-05 2022-05-10 Symbol Technologies, Llc Method, system and apparatus for mobile automation apparatus localization
US10832436B2 (en) 2018-04-05 2020-11-10 Symbol Technologies, Llc Method, system and apparatus for recovering label positions
US10823572B2 (en) 2018-04-05 2020-11-03 Symbol Technologies, Llc Method, system and apparatus for generating navigational data
US10740911B2 (en) 2018-04-05 2020-08-11 Symbol Technologies, Llc Method, system and apparatus for correcting translucency artifacts in data representing a support structure
US11506483B2 (en) 2018-10-05 2022-11-22 Zebra Technologies Corporation Method, system and apparatus for support structure depth determination
US11010920B2 (en) 2018-10-05 2021-05-18 Zebra Technologies Corporation Method, system and apparatus for object detection in point clouds
US11090811B2 (en) 2018-11-13 2021-08-17 Zebra Technologies Corporation Method and apparatus for labeling of support structures
US11003188B2 (en) 2018-11-13 2021-05-11 Zebra Technologies Corporation Method, system and apparatus for obstacle handling in navigational path generation
US11079240B2 (en) 2018-12-07 2021-08-03 Zebra Technologies Corporation Method, system and apparatus for adaptive particle filter localization
US11416000B2 (en) 2018-12-07 2022-08-16 Zebra Technologies Corporation Method and apparatus for navigational ray tracing
US11100303B2 (en) 2018-12-10 2021-08-24 Zebra Technologies Corporation Method, system and apparatus for auxiliary label detection and association
US11015938B2 (en) 2018-12-12 2021-05-25 Zebra Technologies Corporation Method, system and apparatus for navigational assistance
US10731970B2 (en) 2018-12-13 2020-08-04 Zebra Technologies Corporation Method, system and apparatus for support structure detection
CA3028708A1 (en) 2018-12-28 2020-06-28 Zih Corp. Method, system and apparatus for dynamic loop closure in mapping trajectories
US11200677B2 (en) 2019-06-03 2021-12-14 Zebra Technologies Corporation Method, system and apparatus for shelf edge detection
US11662739B2 (en) 2019-06-03 2023-05-30 Zebra Technologies Corporation Method, system and apparatus for adaptive ceiling-based localization
US11960286B2 (en) 2019-06-03 2024-04-16 Zebra Technologies Corporation Method, system and apparatus for dynamic task sequencing
US11080566B2 (en) 2019-06-03 2021-08-03 Zebra Technologies Corporation Method, system and apparatus for gap detection in support structures with peg regions
US11341663B2 (en) 2019-06-03 2022-05-24 Zebra Technologies Corporation Method, system and apparatus for detecting support structure obstructions
US11402846B2 (en) 2019-06-03 2022-08-02 Zebra Technologies Corporation Method, system and apparatus for mitigating data capture light leakage
US11151743B2 (en) 2019-06-03 2021-10-19 Zebra Technologies Corporation Method, system and apparatus for end of aisle detection
US11507103B2 (en) 2019-12-04 2022-11-22 Zebra Technologies Corporation Method, system and apparatus for localization-based historical obstacle handling
US11107238B2 (en) 2019-12-13 2021-08-31 Zebra Technologies Corporation Method, system and apparatus for detecting item facings
US11822333B2 (en) 2020-03-30 2023-11-21 Zebra Technologies Corporation Method, system and apparatus for data capture illumination control
US11450024B2 (en) 2020-07-17 2022-09-20 Zebra Technologies Corporation Mixed depth object detection
US11593915B2 (en) 2020-10-21 2023-02-28 Zebra Technologies Corporation Parallax-tolerant panoramic image generation
US11392891B2 (en) 2020-11-03 2022-07-19 Zebra Technologies Corporation Item placement detection and optimization in material handling systems
US11847832B2 (en) 2020-11-11 2023-12-19 Zebra Technologies Corporation Object classification for autonomous navigation systems
US11954882B2 (en) 2021-06-17 2024-04-09 Zebra Technologies Corporation Feature-based georegistration for mobile computing devices

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3880524A (en) * 1973-06-25 1975-04-29 Ibm Automatic ellipsometer
JPS5240388A (en) * 1975-09-26 1977-03-29 Nippon Kogaku Kk <Nikon> Spectroscopic autoellipsometer
JPS5841331A (ja) * 1981-09-05 1983-03-10 Nippon Kogaku Kk <Nikon> 偏光解析装置の主入射角設定装置
US4953982A (en) * 1988-07-20 1990-09-04 Applied Materials, Inc. Method and apparatus for endpoint detection in a semiconductor wafer etching system
US4983823A (en) * 1989-01-20 1991-01-08 Ricoh Company Ltd. Method for determining incident angle in measurement of refractive index and thickness
EP0566657B1 (de) * 1991-01-11 1998-08-05 Rudolph Research Corporation Gleichzeitiges vielfach-winkel/vielfach-wellenlängen ellipsometer und methode

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102012024261A1 (de) * 2012-12-12 2014-03-27 STM Sensor Technologie München GmbH Prüfverfahren und -Vorrichtung für Oberflächen
DE102012024261B4 (de) * 2012-12-12 2015-02-12 Balluff STM GmbH Prüfverfahren und -vorrichtung für Oberflächen

Also Published As

Publication number Publication date
CA2159831A1 (en) 1994-11-10
KR960702098A (ko) 1996-03-28
EP0696345A1 (de) 1996-02-14
EP0696345B1 (de) 2000-03-01
US5408322A (en) 1995-04-18
DE69423212D1 (de) 2000-04-06
JPH08509810A (ja) 1996-10-15
AU6266794A (en) 1994-11-21
WO1994025823A1 (en) 1994-11-10
JP2969950B2 (ja) 1999-11-02

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Legal Events

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8339 Ceased/non-payment of the annual fee