DE69423212T2 - Selbstausrichtendes in-situ ellipsometer und verfahren zur verwendung bei prozessüberwachung - Google Patents
Selbstausrichtendes in-situ ellipsometer und verfahren zur verwendung bei prozessüberwachungInfo
- Publication number
- DE69423212T2 DE69423212T2 DE69423212T DE69423212T DE69423212T2 DE 69423212 T2 DE69423212 T2 DE 69423212T2 DE 69423212 T DE69423212 T DE 69423212T DE 69423212 T DE69423212 T DE 69423212T DE 69423212 T2 DE69423212 T2 DE 69423212T2
- Authority
- DE
- Germany
- Prior art keywords
- aligning
- self
- process monitoring
- situ ellipsometer
- ellipsometer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/21—Polarisation-affecting properties
- G01N21/211—Ellipsometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0641—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization
- G01B11/065—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of polarization using one or more discrete wavelengths
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/052,888 US5408322A (en) | 1993-04-26 | 1993-04-26 | Self aligning in-situ ellipsometer and method of using for process monitoring |
PCT/US1994/000478 WO1994025823A1 (en) | 1993-04-26 | 1994-01-14 | Self aligning in-situ ellipsometer and method of using for process monitoring |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69423212D1 DE69423212D1 (de) | 2000-04-06 |
DE69423212T2 true DE69423212T2 (de) | 2000-09-07 |
Family
ID=21980570
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69423212T Expired - Fee Related DE69423212T2 (de) | 1993-04-26 | 1994-01-14 | Selbstausrichtendes in-situ ellipsometer und verfahren zur verwendung bei prozessüberwachung |
Country Status (8)
Country | Link |
---|---|
US (1) | US5408322A (de) |
EP (1) | EP0696345B1 (de) |
JP (1) | JP2969950B2 (de) |
KR (1) | KR960702098A (de) |
AU (1) | AU6266794A (de) |
CA (1) | CA2159831A1 (de) |
DE (1) | DE69423212T2 (de) |
WO (1) | WO1994025823A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012024261A1 (de) * | 2012-12-12 | 2014-03-27 | STM Sensor Technologie München GmbH | Prüfverfahren und -Vorrichtung für Oberflächen |
Families Citing this family (73)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2737572B1 (fr) * | 1995-08-03 | 1997-10-24 | Centre Nat Rech Scient | Ellipsometre multi-detecteurs et procede de mesure ellipsometrique multi-detecteurs |
AU716900B2 (en) * | 1996-01-31 | 2000-03-09 | Gary W. Yanik | Improved optical activity detector for use with optically active compounds |
US5956148A (en) * | 1996-12-20 | 1999-09-21 | Texas Instruments Incorporated | Semiconductor surface measurement system and method |
DE19707926A1 (de) * | 1997-02-27 | 1998-09-03 | Gunther Dr Elender | Abbildendes Mikro-Ellipsometer |
US5838448A (en) * | 1997-03-11 | 1998-11-17 | Nikon Corporation | CMP variable angle in situ sensor |
US5798837A (en) | 1997-07-11 | 1998-08-25 | Therma-Wave, Inc. | Thin film optical measurement system and method with calibrating ellipsometer |
US6278519B1 (en) | 1998-01-29 | 2001-08-21 | Therma-Wave, Inc. | Apparatus for analyzing multi-layer thin film stacks on semiconductors |
US6483580B1 (en) | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
US6242739B1 (en) * | 1998-04-21 | 2001-06-05 | Alexander P. Cherkassky | Method and apparatus for non-destructive determination of film thickness and dopant concentration using fourier transform infrared spectrometry |
JP2000081371A (ja) * | 1998-09-07 | 2000-03-21 | Nec Corp | 薄膜分子配向評価方法、評価装置及び記録媒体 |
DE10001810B4 (de) * | 2000-01-18 | 2010-05-06 | A. Krüss Optronic GmbH | Polarimeter |
US6694275B1 (en) | 2000-06-02 | 2004-02-17 | Timbre Technologies, Inc. | Profiler business model |
JP2002267418A (ja) * | 2001-03-09 | 2002-09-18 | Horiba Ltd | 膜厚測定装置 |
US6547939B2 (en) * | 2001-03-29 | 2003-04-15 | Super Light Wave Corp. | Adjustable shadow mask for improving uniformity of film deposition using multiple monitoring points along radius of substrate |
US6741353B1 (en) * | 2001-07-20 | 2004-05-25 | J.A. Woollam Co., Inc. | Spectroscopic ellipsometry analysis of object coatings during deposition |
AU2002360738A1 (en) * | 2001-12-19 | 2003-07-09 | Kla-Tencor Technologies Corporation | Parametric profiling using optical spectroscopic systems |
FR2841339B1 (fr) * | 2002-06-19 | 2004-09-10 | Centre Nat Rech Scient | Supports anti-reflechissants et supports amplificateurs de contraste pour la lumiere polarisee en reflexion |
JP3886953B2 (ja) | 2003-10-22 | 2007-02-28 | 株式会社東芝 | 光学式プロセスモニタ装置、光学式プロセスモニタ方法及び半導体装置の製造方法 |
US7515253B2 (en) | 2005-01-12 | 2009-04-07 | Kla-Tencor Technologies Corporation | System for measuring a sample with a layer containing a periodic diffracting structure |
WO2007130295A2 (en) * | 2006-05-05 | 2007-11-15 | Metrosol, Inc. | Method and apparatus for accurate calibration of a reflectometer by using a relative reflectance measurement |
WO2009091902A1 (en) * | 2008-01-17 | 2009-07-23 | The Salk Institute For Biological Studies | 3d scanning acousto-optic microscope |
WO2014185818A1 (ru) * | 2013-05-13 | 2014-11-20 | Gurevich Aleksei Sergeevich | Эллипсометр |
US9396554B2 (en) | 2014-12-05 | 2016-07-19 | Symbol Technologies, Llc | Apparatus for and method of estimating dimensions of an object associated with a code in automatic response to reading the code |
US10352689B2 (en) | 2016-01-28 | 2019-07-16 | Symbol Technologies, Llc | Methods and systems for high precision locationing with depth values |
US10145955B2 (en) | 2016-02-04 | 2018-12-04 | Symbol Technologies, Llc | Methods and systems for processing point-cloud data with a line scanner |
US10721451B2 (en) | 2016-03-23 | 2020-07-21 | Symbol Technologies, Llc | Arrangement for, and method of, loading freight into a shipping container |
US9805240B1 (en) | 2016-04-18 | 2017-10-31 | Symbol Technologies, Llc | Barcode scanning and dimensioning |
US10776661B2 (en) | 2016-08-19 | 2020-09-15 | Symbol Technologies, Llc | Methods, systems and apparatus for segmenting and dimensioning objects |
US11042161B2 (en) | 2016-11-16 | 2021-06-22 | Symbol Technologies, Llc | Navigation control method and apparatus in a mobile automation system |
US10451405B2 (en) | 2016-11-22 | 2019-10-22 | Symbol Technologies, Llc | Dimensioning system for, and method of, dimensioning freight in motion along an unconstrained path in a venue |
US10354411B2 (en) | 2016-12-20 | 2019-07-16 | Symbol Technologies, Llc | Methods, systems and apparatus for segmenting objects |
WO2018146681A1 (en) * | 2017-02-08 | 2018-08-16 | Yissum Research Development Company Of The Hebrew University Of Jerusalem Ltd. | System and method for use in high spatial resolution ellipsometry |
WO2018204342A1 (en) | 2017-05-01 | 2018-11-08 | Symbol Technologies, Llc | Product status detection system |
US10726273B2 (en) | 2017-05-01 | 2020-07-28 | Symbol Technologies, Llc | Method and apparatus for shelf feature and object placement detection from shelf images |
US10949798B2 (en) | 2017-05-01 | 2021-03-16 | Symbol Technologies, Llc | Multimodal localization and mapping for a mobile automation apparatus |
US11449059B2 (en) | 2017-05-01 | 2022-09-20 | Symbol Technologies, Llc | Obstacle detection for a mobile automation apparatus |
US11978011B2 (en) | 2017-05-01 | 2024-05-07 | Symbol Technologies, Llc | Method and apparatus for object status detection |
US11367092B2 (en) | 2017-05-01 | 2022-06-21 | Symbol Technologies, Llc | Method and apparatus for extracting and processing price text from an image set |
US10663590B2 (en) | 2017-05-01 | 2020-05-26 | Symbol Technologies, Llc | Device and method for merging lidar data |
US10591918B2 (en) | 2017-05-01 | 2020-03-17 | Symbol Technologies, Llc | Fixed segmented lattice planning for a mobile automation apparatus |
US11600084B2 (en) | 2017-05-05 | 2023-03-07 | Symbol Technologies, Llc | Method and apparatus for detecting and interpreting price label text |
US10572763B2 (en) | 2017-09-07 | 2020-02-25 | Symbol Technologies, Llc | Method and apparatus for support surface edge detection |
US10521914B2 (en) | 2017-09-07 | 2019-12-31 | Symbol Technologies, Llc | Multi-sensor object recognition system and method |
US10809078B2 (en) | 2018-04-05 | 2020-10-20 | Symbol Technologies, Llc | Method, system and apparatus for dynamic path generation |
US11327504B2 (en) | 2018-04-05 | 2022-05-10 | Symbol Technologies, Llc | Method, system and apparatus for mobile automation apparatus localization |
US10832436B2 (en) | 2018-04-05 | 2020-11-10 | Symbol Technologies, Llc | Method, system and apparatus for recovering label positions |
US10823572B2 (en) | 2018-04-05 | 2020-11-03 | Symbol Technologies, Llc | Method, system and apparatus for generating navigational data |
US10740911B2 (en) | 2018-04-05 | 2020-08-11 | Symbol Technologies, Llc | Method, system and apparatus for correcting translucency artifacts in data representing a support structure |
US11506483B2 (en) | 2018-10-05 | 2022-11-22 | Zebra Technologies Corporation | Method, system and apparatus for support structure depth determination |
US11010920B2 (en) | 2018-10-05 | 2021-05-18 | Zebra Technologies Corporation | Method, system and apparatus for object detection in point clouds |
US11090811B2 (en) | 2018-11-13 | 2021-08-17 | Zebra Technologies Corporation | Method and apparatus for labeling of support structures |
US11003188B2 (en) | 2018-11-13 | 2021-05-11 | Zebra Technologies Corporation | Method, system and apparatus for obstacle handling in navigational path generation |
US11079240B2 (en) | 2018-12-07 | 2021-08-03 | Zebra Technologies Corporation | Method, system and apparatus for adaptive particle filter localization |
US11416000B2 (en) | 2018-12-07 | 2022-08-16 | Zebra Technologies Corporation | Method and apparatus for navigational ray tracing |
US11100303B2 (en) | 2018-12-10 | 2021-08-24 | Zebra Technologies Corporation | Method, system and apparatus for auxiliary label detection and association |
US11015938B2 (en) | 2018-12-12 | 2021-05-25 | Zebra Technologies Corporation | Method, system and apparatus for navigational assistance |
US10731970B2 (en) | 2018-12-13 | 2020-08-04 | Zebra Technologies Corporation | Method, system and apparatus for support structure detection |
CA3028708A1 (en) | 2018-12-28 | 2020-06-28 | Zih Corp. | Method, system and apparatus for dynamic loop closure in mapping trajectories |
US11200677B2 (en) | 2019-06-03 | 2021-12-14 | Zebra Technologies Corporation | Method, system and apparatus for shelf edge detection |
US11662739B2 (en) | 2019-06-03 | 2023-05-30 | Zebra Technologies Corporation | Method, system and apparatus for adaptive ceiling-based localization |
US11960286B2 (en) | 2019-06-03 | 2024-04-16 | Zebra Technologies Corporation | Method, system and apparatus for dynamic task sequencing |
US11080566B2 (en) | 2019-06-03 | 2021-08-03 | Zebra Technologies Corporation | Method, system and apparatus for gap detection in support structures with peg regions |
US11341663B2 (en) | 2019-06-03 | 2022-05-24 | Zebra Technologies Corporation | Method, system and apparatus for detecting support structure obstructions |
US11402846B2 (en) | 2019-06-03 | 2022-08-02 | Zebra Technologies Corporation | Method, system and apparatus for mitigating data capture light leakage |
US11151743B2 (en) | 2019-06-03 | 2021-10-19 | Zebra Technologies Corporation | Method, system and apparatus for end of aisle detection |
US11507103B2 (en) | 2019-12-04 | 2022-11-22 | Zebra Technologies Corporation | Method, system and apparatus for localization-based historical obstacle handling |
US11107238B2 (en) | 2019-12-13 | 2021-08-31 | Zebra Technologies Corporation | Method, system and apparatus for detecting item facings |
US11822333B2 (en) | 2020-03-30 | 2023-11-21 | Zebra Technologies Corporation | Method, system and apparatus for data capture illumination control |
US11450024B2 (en) | 2020-07-17 | 2022-09-20 | Zebra Technologies Corporation | Mixed depth object detection |
US11593915B2 (en) | 2020-10-21 | 2023-02-28 | Zebra Technologies Corporation | Parallax-tolerant panoramic image generation |
US11392891B2 (en) | 2020-11-03 | 2022-07-19 | Zebra Technologies Corporation | Item placement detection and optimization in material handling systems |
US11847832B2 (en) | 2020-11-11 | 2023-12-19 | Zebra Technologies Corporation | Object classification for autonomous navigation systems |
US11954882B2 (en) | 2021-06-17 | 2024-04-09 | Zebra Technologies Corporation | Feature-based georegistration for mobile computing devices |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3880524A (en) * | 1973-06-25 | 1975-04-29 | Ibm | Automatic ellipsometer |
JPS5240388A (en) * | 1975-09-26 | 1977-03-29 | Nippon Kogaku Kk <Nikon> | Spectroscopic autoellipsometer |
JPS5841331A (ja) * | 1981-09-05 | 1983-03-10 | Nippon Kogaku Kk <Nikon> | 偏光解析装置の主入射角設定装置 |
US4953982A (en) * | 1988-07-20 | 1990-09-04 | Applied Materials, Inc. | Method and apparatus for endpoint detection in a semiconductor wafer etching system |
US4983823A (en) * | 1989-01-20 | 1991-01-08 | Ricoh Company Ltd. | Method for determining incident angle in measurement of refractive index and thickness |
EP0566657B1 (de) * | 1991-01-11 | 1998-08-05 | Rudolph Research Corporation | Gleichzeitiges vielfach-winkel/vielfach-wellenlängen ellipsometer und methode |
-
1993
- 1993-04-26 US US08/052,888 patent/US5408322A/en not_active Expired - Fee Related
-
1994
- 1994-01-14 EP EP94910093A patent/EP0696345B1/de not_active Expired - Lifetime
- 1994-01-14 JP JP6524224A patent/JP2969950B2/ja not_active Expired - Fee Related
- 1994-01-14 WO PCT/US1994/000478 patent/WO1994025823A1/en active IP Right Grant
- 1994-01-14 DE DE69423212T patent/DE69423212T2/de not_active Expired - Fee Related
- 1994-01-14 AU AU62667/94A patent/AU6266794A/en not_active Abandoned
- 1994-01-14 CA CA002159831A patent/CA2159831A1/en not_active Abandoned
-
1995
- 1995-10-20 KR KR1019950704655A patent/KR960702098A/ko not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102012024261A1 (de) * | 2012-12-12 | 2014-03-27 | STM Sensor Technologie München GmbH | Prüfverfahren und -Vorrichtung für Oberflächen |
DE102012024261B4 (de) * | 2012-12-12 | 2015-02-12 | Balluff STM GmbH | Prüfverfahren und -vorrichtung für Oberflächen |
Also Published As
Publication number | Publication date |
---|---|
CA2159831A1 (en) | 1994-11-10 |
KR960702098A (ko) | 1996-03-28 |
EP0696345A1 (de) | 1996-02-14 |
EP0696345B1 (de) | 2000-03-01 |
US5408322A (en) | 1995-04-18 |
DE69423212D1 (de) | 2000-04-06 |
JPH08509810A (ja) | 1996-10-15 |
AU6266794A (en) | 1994-11-21 |
WO1994025823A1 (en) | 1994-11-10 |
JP2969950B2 (ja) | 1999-11-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69423212T2 (de) | Selbstausrichtendes in-situ ellipsometer und verfahren zur verwendung bei prozessüberwachung | |
DE59705591D1 (de) | Verfahren und vorrichtung zur qualitativen beurteilung von bearbeitetem material | |
DE69532091D1 (de) | Verfahren und Vorrichtung zur Durchführung von Messungen | |
DE69409732T2 (de) | Verfahren und Vorrichtung zum Schleifen mit elektrolytischem Abrichten | |
DE69400966D1 (de) | Verfahren und Vorrichtung zur Verbesserung der Wasserqualität | |
DE69422960T2 (de) | Verfahren und Vorrichtung zum Editieren oder zur Mischung von komprimierten Bildern | |
DE4498754T1 (de) | Verfahren und Gerät zur Bestimmung eines externen Leistungs-Versorgungs-Typs | |
DE69732788D1 (de) | Verfahren und vorrichtung zur vorhersage und abbildung der ionosphäre in echtzeit | |
DE69435074D1 (de) | Geraet und verfahren zur zellenverarbeitung in zellenrelaisknoten | |
DE69410900D1 (de) | Verfahren und Vorrichtung zur Überwachung von Oberflächen-Laserreinigung | |
DE69423251T2 (de) | Verfahren und Vorrichtung zur Datensicherung | |
DE69738306D1 (de) | Vorrichtung und Verfahren für entfernte Überwachung | |
DE69408440T2 (de) | Verfahren und vorrichtung zur reinigung von festen körpern | |
DE59905213D1 (de) | Verfahren und vorrichtung zur beurteilung von fehlern in textilen flächengebilden | |
ATA76093A (de) | Verfahren und vorrichtung zur ermittlung der korrosivität | |
DE69523550T2 (de) | Einrichtung und Verfahren zur Quantisierung | |
DE59403914D1 (de) | Verfahren und Vorrichtung zum Überwachen von Objekten | |
DE69413140D1 (de) | Verfahren und Vorrichtung zur Endarbeitung von Kommutatoren | |
DE69307694T2 (de) | Verfahren und Vorrichtung zur Überwachung der wirklich aufgebrachteten Bestrahlung | |
DE69320053D1 (de) | Vorrichtung und verfahren zur identifizierung und quantifizierung von geschichteten substanzen | |
DE69529888T2 (de) | Einrichtung und Verfahren zur Quantisierung | |
DE69818499D1 (de) | Verfahren und vorrichtung zum einklinken in ein objekt | |
DE69707425D1 (de) | Verfahren und vorrichtung mit gerätebeschreibung für konventionelles gerät | |
DE69306010T2 (de) | Verfahren und Schaltung zur Durchführung von laufenden Ungleichheitsmessungen | |
DE59303579D1 (de) | Verfahren und Vorrichtung zur On-line Qualitätsüberwachung im Spinnereivorwerk |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |