DE69419101T2 - Hochreine thiol-en-zusammensetzung - Google Patents

Hochreine thiol-en-zusammensetzung

Info

Publication number
DE69419101T2
DE69419101T2 DE69419101T DE69419101T DE69419101T2 DE 69419101 T2 DE69419101 T2 DE 69419101T2 DE 69419101 T DE69419101 T DE 69419101T DE 69419101 T DE69419101 T DE 69419101T DE 69419101 T2 DE69419101 T2 DE 69419101T2
Authority
DE
Germany
Prior art keywords
composition
highly pure
pure thiol
thiol
highly
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69419101T
Other languages
English (en)
Other versions
DE69419101D1 (de
Inventor
David Glaser
Anthony Jacobine
Paul Grabek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Henkel Loctite Corp
Original Assignee
Henkel Loctite Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Henkel Loctite Corp filed Critical Henkel Loctite Corp
Application granted granted Critical
Publication of DE69419101D1 publication Critical patent/DE69419101D1/de
Publication of DE69419101T2 publication Critical patent/DE69419101T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
    • B29C64/10—Processes of additive manufacturing
    • B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
    • B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
    • B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
    • B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F6/00—Post-polymerisation treatments
    • C08F6/02—Neutralisation of the polymerisation mass, e.g. killing the catalyst also removal of catalyst residues
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G75/00—Macromolecular compounds obtained by reactions forming a linkage containing sulfur with or without nitrogen, oxygen, or carbon in the main chain of the macromolecule
    • C08G75/02—Polythioethers
    • C08G75/04—Polythioethers from mercapto compounds or metallic derivatives thereof
    • C08G75/045—Polythioethers from mercapto compounds or metallic derivatives thereof from mercapto compounds and unsaturated compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
DE69419101T 1993-04-30 1994-04-29 Hochreine thiol-en-zusammensetzung Expired - Fee Related DE69419101T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/056,128 US5399624A (en) 1990-12-21 1993-04-30 High purity resins for thiol-ene polymerizations and method for producing same
PCT/US1994/004793 WO1994025496A1 (en) 1993-04-30 1994-04-29 High purity thiol-ene composition

Publications (2)

Publication Number Publication Date
DE69419101D1 DE69419101D1 (de) 1999-07-22
DE69419101T2 true DE69419101T2 (de) 1999-12-23

Family

ID=22002340

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69419101T Expired - Fee Related DE69419101T2 (de) 1993-04-30 1994-04-29 Hochreine thiol-en-zusammensetzung

Country Status (6)

Country Link
US (1) US5399624A (de)
EP (1) EP0648232B1 (de)
JP (1) JPH07508556A (de)
DE (1) DE69419101T2 (de)
HK (1) HK1004224A1 (de)
WO (1) WO1994025496A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001509205A (ja) * 1997-01-17 2001-07-10 ロックタイト コーポレーション カルボン酸官能基を有する物質をヒドロキシアルキル化する方法
US7354977B1 (en) 1998-01-16 2008-04-08 Henkel Corporation Process for hydroxyalkylating carboxylic acid-functionalized materials
US8121465B2 (en) 2001-05-09 2012-02-21 No Climb Products Limited Mobile flue gas generator and method for testing a flue gas indicator
WO2003031483A1 (en) 2001-10-10 2003-04-17 The Regents Of The University Of Colorado Degradable thiol-ene polymers
US6852229B2 (en) * 2002-10-22 2005-02-08 Exxonmobil Research And Engineering Company Method for preparing high-purity ionic liquids
JP2005082795A (ja) * 2003-09-11 2005-03-31 Shinwa Kako Kk 固体基板への微粒子の表面コーティング法
US20100105795A1 (en) * 2005-02-01 2010-04-29 Henkel Corporation Liquid Stable Thiol-Acrylate/Vinyl Ether Compositions
US20090047531A1 (en) * 2007-08-17 2009-02-19 Ppg Industries Ohio, Inc. Packages having radiation-curable coatings
US9243083B2 (en) 2008-04-03 2016-01-26 Henkel IP & Holding GmbH Thiol-ene cured oil-resistant polyacrylate sealants for in-place gasketing applications
WO2012103445A2 (en) 2011-01-28 2012-08-02 The Regents Of The University Of Colorado, A Body Corporate Convalently cross linked hydrogels and methods of making and using same
US9988433B2 (en) 2013-03-14 2018-06-05 Mosaic Biosciences, Inc. Covalent modification of biological macromolecules
EP2822533B1 (de) 2012-02-02 2021-01-20 Mosaic Biosciences, Inc. Biomaterialien zur abgabe von blutextrakten und verwendungsverfahren dafür
TWI593755B (zh) 2012-10-18 2017-08-01 Mitsubishi Gas Chemical Co Polymerizable composition and hardened | cured material
WO2016130573A2 (en) 2015-02-09 2016-08-18 Mosaic Biosciences, Inc. Degradable thiol-ene polymers and methods of making thereof
CN108431172B (zh) 2015-12-31 2021-04-13 3M创新有限公司 包含具有量子点的颗粒的制品
WO2017116820A1 (en) 2015-12-31 2017-07-06 3M Innovative Properties Company Curable quantum dot compositions and articles
CN110945054B (zh) * 2017-07-24 2022-09-02 3M创新有限公司 制备聚合组合物的组合物和方法

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3445419A (en) * 1966-01-21 1969-05-20 Dow Corning Room temperature vulcanizable silicones
US3661744A (en) * 1966-07-26 1972-05-09 Grace W R & Co Photocurable liquid polyene-polythiol polymer compositions
DE1770328A1 (de) * 1967-05-04 1971-10-14 Eastman Kodak Co Verfahren zur Herstellung von praktisch aschefreien,festen Polyolefinen
US4008341A (en) * 1968-10-11 1977-02-15 W. R. Grace & Co. Curable liquid polymer compositions
US3619393A (en) * 1969-12-04 1971-11-09 Grace W R & Co Process for the preparation of shelf-stable, photocurable polythiols
US3582521A (en) * 1970-05-27 1971-06-01 Thiokol Chemical Corp Halogen adduct of ethylene sulfide
CA985848A (en) * 1971-04-16 1976-03-16 Du Pont Of Canada Limited Purification of polyolefins
JPS5729692B2 (de) * 1974-09-17 1982-06-24
JPS5314800A (en) * 1976-07-28 1978-02-09 Showa Highpolymer Co Ltd Curable resin composition
US4157421A (en) * 1976-09-07 1979-06-05 Thiokol Corporation Photocurable compositions comprising a polythiol and a polyene derived from a vinyl acetal
US4289867A (en) * 1978-12-11 1981-09-15 Sws Silicones Corporation Organofunctional polysiloxane polymers and a method for preparing the same
US4230740A (en) * 1979-04-23 1980-10-28 W. R. Grace & Co. Heat stable, non-yellowing photopolymer compositions
JPS59157035A (ja) * 1983-02-28 1984-09-06 Kyowa Chem Ind Co Ltd ハロゲン含有触媒を含む有機化合物中のハロゲン成分除去方法
US4585838A (en) * 1985-08-06 1986-04-29 The Dow Chemical Company Process for preparing epoxy resins containing low levels of total halide
US4668807A (en) * 1984-12-21 1987-05-26 Ciba-Geigy Corporation Process for reducing the content of hydrolyzable chlorine in glycidyl compounds
IE60271B1 (en) * 1986-01-07 1994-06-29 Loctite Ireland Ltd "Thiol/ene compositions"
US5034490A (en) * 1986-10-14 1991-07-23 Loctite Corporation Curable norbornenyl functional silicone formulations
US5171816A (en) * 1986-10-14 1992-12-15 Loctite Corporation Curable norbornenyl functional silicone formulations
US4808638A (en) * 1986-10-14 1989-02-28 Loctite Corporation Thiolene compositions on based bicyclic 'ene compounds
EP0325617B1 (de) * 1986-10-14 1993-04-28 Loctite Corporation Thiolenzusammensetzungen aus bizyklischen en-verbindungen
JPS63260971A (ja) * 1987-04-20 1988-10-27 Hitachi Chem Co Ltd 放射線硬化型粘着剤組成物
US5128235A (en) * 1989-04-21 1992-07-07 E. I. Du Pont De Nemours And Company Method of forming a three-dimensional object comprising additives imparting reduction of shrinkage to photohardenable compositions
US4962221A (en) * 1990-03-12 1990-10-09 Dow Corning Corporation Chloride reduction in polysiloxanes
US5208281A (en) * 1991-02-05 1993-05-04 Loctite Corporation Stabilization of thiolene compositions
US5167882A (en) * 1990-12-21 1992-12-01 Loctite Corporation Stereolithography method
CA2057526A1 (en) * 1990-12-14 1992-06-15 Keisaku Yamamoto Method for purifying ethylene-.alpha.-olefin copolymer
US5182360A (en) * 1991-10-17 1993-01-26 Loctite Corporation Tris(norbornenyl) isocyanurate

Also Published As

Publication number Publication date
JPH07508556A (ja) 1995-09-21
EP0648232B1 (de) 1999-06-16
EP0648232A4 (de) 1995-09-27
US5399624A (en) 1995-03-21
EP0648232A1 (de) 1995-04-19
HK1004224A1 (en) 1998-11-20
DE69419101D1 (de) 1999-07-22
WO1994025496A1 (en) 1994-11-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee