DE69418569T2 - Resistmateralien und entsprechende Verfahren - Google Patents

Resistmateralien und entsprechende Verfahren

Info

Publication number
DE69418569T2
DE69418569T2 DE69418569T DE69418569T DE69418569T2 DE 69418569 T2 DE69418569 T2 DE 69418569T2 DE 69418569 T DE69418569 T DE 69418569T DE 69418569 T DE69418569 T DE 69418569T DE 69418569 T2 DE69418569 T2 DE 69418569T2
Authority
DE
Germany
Prior art keywords
resist materials
corresponding procedures
procedures
resist
materials
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69418569T
Other languages
English (en)
Other versions
DE69418569D1 (de
Inventor
Edwin Arthur Chandross
Janet Mihoko Kometani
Omkaram Nalamasu
Elsa Reichmanis
Katryn Elizabeth Uhrich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
AT&T Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by AT&T Corp filed Critical AT&T Corp
Application granted granted Critical
Publication of DE69418569D1 publication Critical patent/DE69418569D1/de
Publication of DE69418569T2 publication Critical patent/DE69418569T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE69418569T 1993-11-08 1994-10-26 Resistmateralien und entsprechende Verfahren Expired - Fee Related DE69418569T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14870693A 1993-11-08 1993-11-08

Publications (2)

Publication Number Publication Date
DE69418569D1 DE69418569D1 (de) 1999-06-24
DE69418569T2 true DE69418569T2 (de) 1999-10-21

Family

ID=22526978

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69418569T Expired - Fee Related DE69418569T2 (de) 1993-11-08 1994-10-26 Resistmateralien und entsprechende Verfahren

Country Status (5)

Country Link
US (1) US5741629A (de)
EP (1) EP0652488B1 (de)
JP (1) JPH07181691A (de)
CA (1) CA2131507C (de)
DE (1) DE69418569T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0954437A (ja) * 1995-06-05 1997-02-25 Fuji Photo Film Co Ltd 化学増幅型ポジレジスト組成物
TW480370B (en) * 1997-10-08 2002-03-21 Shinetsu Chemical Co Polystyrene-based polymer compound, chemical amplification positive type resist material and pattern formation
US5981143A (en) * 1997-11-26 1999-11-09 Trw Inc. Chemically treated photoresist for withstanding ion bombarded processing
US6103447A (en) 1998-02-25 2000-08-15 International Business Machines Corp. Approach to formulating irradiation sensitive positive resists
US6537736B1 (en) 1999-03-12 2003-03-25 Matsushita Electric Industrial Co., Ltd. Patten formation method
US6727047B2 (en) 1999-04-16 2004-04-27 Applied Materials, Inc. Method of extending the stability of a photoresist during direct writing of an image upon the photoresist
US6969569B2 (en) * 1999-04-16 2005-11-29 Applied Materials, Inc. Method of extending the stability of a photoresist during direct writing of an image
JP2019210274A (ja) 2018-12-28 2019-12-12 Ｊｆｅケミカル株式会社 ３−アセトキシスチレンの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4808511A (en) * 1987-05-19 1989-02-28 International Business Machines Corporation Vapor phase photoresist silylation process
US4996136A (en) * 1988-02-25 1991-02-26 At&T Bell Laboratories Radiation sensitive materials and devices made therewith
EP0366590B2 (de) * 1988-10-28 2001-03-21 International Business Machines Corporation Positiv arbeitende hochempfindliche Photolack-Zusammensetzung
EP0524759A1 (de) * 1991-07-23 1993-01-27 AT&T Corp. Verfahren zur Herstellung einer Vorrichtung

Also Published As

Publication number Publication date
CA2131507C (en) 1999-11-02
EP0652488B1 (de) 1999-05-19
US5741629A (en) 1998-04-21
EP0652488A2 (de) 1995-05-10
CA2131507A1 (en) 1995-05-09
JPH07181691A (ja) 1995-07-21
DE69418569D1 (de) 1999-06-24
EP0652488A3 (de) 1995-08-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee