DE69417932D1 - Methode zur Herstellung eines optischen Wellenleiters - Google Patents

Methode zur Herstellung eines optischen Wellenleiters

Info

Publication number
DE69417932D1
DE69417932D1 DE69417932T DE69417932T DE69417932D1 DE 69417932 D1 DE69417932 D1 DE 69417932D1 DE 69417932 T DE69417932 T DE 69417932T DE 69417932 T DE69417932 T DE 69417932T DE 69417932 D1 DE69417932 D1 DE 69417932D1
Authority
DE
Germany
Prior art keywords
making
optical waveguide
waveguide
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69417932T
Other languages
English (en)
Other versions
DE69417932T2 (de
Inventor
Chisai Hirose
Hiroo Kanamori
Akira Urano
Shinji Ishikawa
Haruhiko Aikawa
Masahide Saito
Takashi Kogo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP5169259A external-priority patent/JPH06265743A/ja
Priority claimed from JP5188346A external-priority patent/JPH0743541A/ja
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of DE69417932D1 publication Critical patent/DE69417932D1/de
Application granted granted Critical
Publication of DE69417932T2 publication Critical patent/DE69417932T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • G02B6/136Integrated optical circuits characterised by the manufacturing method by etching
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C13/00Fibre or filament compositions
    • C03C13/04Fibre optics, e.g. core and clad fibre compositions
    • C03C13/045Silica-containing oxide glass compositions
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13Integrated optical circuits characterised by the manufacturing method
    • G02B6/132Integrated optical circuits characterised by the manufacturing method by deposition of thin films

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Optical Integrated Circuits (AREA)
DE69417932T 1993-01-14 1994-01-14 Methode zur Herstellung eines optischen Wellenleiters Expired - Fee Related DE69417932T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP507393 1993-01-14
JP5169259A JPH06265743A (ja) 1993-01-14 1993-07-08 光導波路の作製方法
JP5188346A JPH0743541A (ja) 1993-07-29 1993-07-29 光導波路の作製方法

Publications (2)

Publication Number Publication Date
DE69417932D1 true DE69417932D1 (de) 1999-05-27
DE69417932T2 DE69417932T2 (de) 1999-09-30

Family

ID=27276579

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69417932T Expired - Fee Related DE69417932T2 (de) 1993-01-14 1994-01-14 Methode zur Herstellung eines optischen Wellenleiters

Country Status (8)

Country Link
US (1) US5551966A (de)
EP (1) EP0607884B1 (de)
KR (1) KR0180921B1 (de)
CN (1) CN1088522C (de)
AU (1) AU665696B2 (de)
CA (1) CA2113379A1 (de)
DE (1) DE69417932T2 (de)
TW (2) TW263566B (de)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0854528A (ja) * 1994-08-10 1996-02-27 Furukawa Electric Co Ltd:The 光導波路の製造方法
GB2312525A (en) * 1996-04-24 1997-10-29 Northern Telecom Ltd Providing cladding on planar optical waveguide by heating to flow
GB2314346A (en) * 1996-06-22 1997-12-24 Northern Telecom Ltd Rapid thermal annealing
US7575784B1 (en) 2000-10-17 2009-08-18 Nanogram Corporation Coating formation by reactive deposition
WO2002032588A1 (en) * 2000-10-17 2002-04-25 Neophotonics Corporation Coating formation by reactive deposition
US6952504B2 (en) * 2001-12-21 2005-10-04 Neophotonics Corporation Three dimensional engineering of planar optical structures
US6919054B2 (en) * 2002-04-10 2005-07-19 Neophotonics Corporation Reactant nozzles within flowing reactors
US7384680B2 (en) 1997-07-21 2008-06-10 Nanogram Corporation Nanoparticle-based power coatings and corresponding structures
US6788866B2 (en) 2001-08-17 2004-09-07 Nanogram Corporation Layer materials and planar optical devices
US5930439A (en) * 1997-10-01 1999-07-27 Northern Telecom Limited Planar optical waveguide
DE19831719A1 (de) 1998-07-15 2000-01-20 Alcatel Sa Verfahren zur Herstellung planarer Wellenleiterstrukturen sowie Wellenleiterstruktur
GB2346452A (en) * 1999-02-05 2000-08-09 Univ Glasgow Waveguides
AU8015700A (en) * 1999-11-24 2001-06-04 Corning Incorporated Method for radially consolidating a porous optical fiber preform
JP3551895B2 (ja) * 2000-01-12 2004-08-11 住友電気工業株式会社 石英系光導波路及びその製造方法
JP2001281487A (ja) * 2000-03-30 2001-10-10 Furukawa Electric Co Ltd:The 光導波路装置およびその製造方法
CA2427103A1 (en) * 2000-10-26 2002-06-06 Neophotonics Corporation Multilayered optical structures
US6947651B2 (en) 2001-05-10 2005-09-20 Georgia Tech Research Corporation Optical waveguides formed from nano air-gap inter-layer dielectric materials and methods of fabrication thereof
US6917511B1 (en) 2001-08-14 2005-07-12 Neophotonics Corporation Reactive deposition for the formation of chip capacitors
US7521097B2 (en) * 2003-06-06 2009-04-21 Nanogram Corporation Reactive deposition for electrochemical cell production
US8865271B2 (en) * 2003-06-06 2014-10-21 Neophotonics Corporation High rate deposition for the formation of high quality optical coatings
US7491431B2 (en) * 2004-12-20 2009-02-17 Nanogram Corporation Dense coating formation by reactive deposition
KR20100029126A (ko) * 2007-06-15 2010-03-15 나노그램 코포레이션 무기물 포일의 반응성 유동 증착 및 합성
US20090233088A1 (en) * 2008-03-13 2009-09-17 Lewis Mark A In situ nano-particle matrix loading of metal oxide coatings via combustion deposition
DE102010063176A1 (de) * 2010-12-15 2012-06-21 Hilti Aktiengesellschaft Elektrisch betreibbares Bolzensetzgerät
JP5781303B2 (ja) * 2010-12-31 2015-09-16 株式会社Sumco シリカガラスルツボ製造方法およびシリカガラスルツボ製造装置
CN108646345B (zh) * 2018-05-16 2020-04-14 德州尧鼎光电科技有限公司 一种深紫外平面光波导制作方法
CN108427159B (zh) * 2018-05-16 2020-04-14 德州尧鼎光电科技有限公司 一种深紫外平面光波导

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3823945A (en) * 1971-07-02 1974-07-16 Peripheral Syst Corp Controlled transport of a flexible medium
US4425146A (en) * 1979-12-17 1984-01-10 Nippon Telegraph & Telephone Public Corporation Method of making glass waveguide for optical circuit
JPS5781213A (en) * 1980-11-11 1982-05-21 Nippon Telegr & Teleph Corp <Ntt> Production of thin film for optical waveguide
JPS58105111A (ja) * 1981-12-18 1983-06-22 Nippon Telegr & Teleph Corp <Ntt> ガラス光導波膜の製造方法および製造装置
US4494968A (en) * 1983-10-03 1985-01-22 Corning Glass Works Method of forming laminated single polarization fiber
CA1284921C (en) * 1984-02-27 1991-06-18 Hiroyuki Suda Method, apparatus and burner for fabricating an optical fiber preform
GB8515814D0 (en) * 1985-06-21 1985-07-24 British Telecomm Fabrication of optical waveguides
JP2599488B2 (ja) * 1990-02-26 1997-04-09 日本電信電話株式会社 光導波回路の特性調整方法およびその方法に使われる光導波回路
JP2855832B2 (ja) * 1990-09-20 1999-02-10 住友電気工業株式会社 石英系光導波路の製造方法
US5198008A (en) * 1990-11-09 1993-03-30 National Semiconductor Corporation Method of fabricating an optical interconnect structure
US5141549A (en) * 1991-05-17 1992-08-25 The Charles Stark Draper Laboratories Method of fabricating rare earth doped planar optical waveguide for integrated optical circuit
US5194079A (en) * 1991-09-17 1993-03-16 The Charles Stark Draper Laboratory, Inc. Method of forming an optical channel waveguide by thermal diffusion
US5196041A (en) * 1991-09-17 1993-03-23 The Charles Stark Draper Laboratory, Inc. Method of forming an optical channel waveguide by gettering

Also Published As

Publication number Publication date
AU665696B2 (en) 1996-01-11
US5551966A (en) 1996-09-03
CN1092178A (zh) 1994-09-14
CN1088522C (zh) 2002-07-31
TW263566B (de) 1995-11-21
EP0607884A1 (de) 1994-07-27
AU5314494A (en) 1994-07-21
DE69417932T2 (de) 1999-09-30
CA2113379A1 (en) 1994-07-15
EP0607884B1 (de) 1999-04-21
TW243500B (de) 1995-03-21
KR0180921B1 (ko) 1999-05-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee