DE69417627T2 - Verfahren zur dampfphasendiamantsynthese - Google Patents
Verfahren zur dampfphasendiamantsyntheseInfo
- Publication number
- DE69417627T2 DE69417627T2 DE69417627T DE69417627T DE69417627T2 DE 69417627 T2 DE69417627 T2 DE 69417627T2 DE 69417627 T DE69417627 T DE 69417627T DE 69417627 T DE69417627 T DE 69417627T DE 69417627 T2 DE69417627 T2 DE 69417627T2
- Authority
- DE
- Germany
- Prior art keywords
- diamond synthesis
- steam phase
- phase diamond
- steam
- synthesis
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/25—Diamond
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/25—Diamond
- C01B32/26—Preparation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
- C23C16/27—Diamond only
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geology (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Carbon And Carbon Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP470493 | 1993-01-14 | ||
PCT/JP1994/000035 WO1994016125A1 (en) | 1993-01-14 | 1994-01-13 | Process for vapor-phase diamond synthesis |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69417627D1 DE69417627D1 (de) | 1999-05-12 |
DE69417627T2 true DE69417627T2 (de) | 1999-09-09 |
Family
ID=11591273
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69417627T Expired - Fee Related DE69417627T2 (de) | 1993-01-14 | 1994-01-13 | Verfahren zur dampfphasendiamantsynthese |
Country Status (4)
Country | Link |
---|---|
US (1) | US5499601A (de) |
EP (1) | EP0630994B1 (de) |
DE (1) | DE69417627T2 (de) |
WO (1) | WO1994016125A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4032482B2 (ja) * | 1997-04-18 | 2008-01-16 | 住友電気工業株式会社 | 単結晶ダイヤモンドの製造方法 |
US7520930B2 (en) * | 2002-04-15 | 2009-04-21 | Sumitomo Metal Industries, Ltd. | Silicon carbide single crystal and a method for its production |
GB0223321D0 (en) * | 2002-10-08 | 2002-11-13 | Element Six Ltd | Heat spreader |
AT7522U1 (de) * | 2004-04-29 | 2005-04-25 | Plansee Ag | Wärmesenke aus borhaltigem diamant-kupfer-verbundwerkstoff |
JP4744118B2 (ja) * | 2004-09-30 | 2011-08-10 | 株式会社神戸製鋼所 | 単結晶ダイヤモンド合成用基板及び単結晶ダイヤモンド膜の製造方法 |
JP4461110B2 (ja) * | 2006-03-14 | 2010-05-12 | 株式会社東芝 | ダイヤモンドの成膜方法 |
TWI387417B (zh) * | 2008-08-29 | 2013-02-21 | Ind Tech Res Inst | 電路板結構及其製作方法 |
CN101785980B (zh) * | 2009-01-22 | 2012-09-05 | 宋健民 | 在拼图式钻石基板形成p-n结 |
WO2011049479A1 (en) * | 2009-10-21 | 2011-04-28 | Andrey Mikhailovich Abyzov | Composite material having high thermal conductivity and process of fabricating same |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4034066A (en) * | 1973-11-02 | 1977-07-05 | General Electric Company | Method and high pressure reaction vessel for quality control of diamond growth on diamond seed |
JPH0658891B2 (ja) * | 1987-03-12 | 1994-08-03 | 住友電気工業株式会社 | 薄膜単結晶ダイヤモンド基板 |
JPH01138198A (ja) * | 1987-11-26 | 1989-05-31 | Nec Corp | ダイヤモンド膜の製造方法 |
US4925701A (en) * | 1988-05-27 | 1990-05-15 | Xerox Corporation | Processes for the preparation of polycrystalline diamond films |
EP0417190A1 (de) * | 1988-06-03 | 1991-03-20 | Massachusetts Institute Of Technology | Siliziumdioxidfilme auf diamant |
WO1992001827A1 (en) * | 1988-06-03 | 1992-02-06 | Massachusetts Institute Of Technology | Oriented diamond crystals |
JP2686970B2 (ja) * | 1988-07-01 | 1997-12-08 | 旭ダイヤモンド工業株式会社 | 膜状ダイヤモンドの製造方法 |
JP2730145B2 (ja) * | 1989-03-07 | 1998-03-25 | 住友電気工業株式会社 | 単結晶ダイヤモンド層の形成法 |
US5127983A (en) * | 1989-05-22 | 1992-07-07 | Sumitomo Electric Industries, Ltd. | Method of producing single crystal of high-pressure phase material |
JP2722724B2 (ja) * | 1989-10-24 | 1998-03-09 | 富士通株式会社 | ダイヤモンド膜の被覆方法 |
JP2662608B2 (ja) * | 1990-09-21 | 1997-10-15 | 科学技術庁無機材質研究所長 | ダイヤモンド単結晶膜の合成法 |
JPH04182391A (ja) * | 1990-11-13 | 1992-06-29 | Japan Steel Works Ltd:The | ダイヤモンド板の製造方法 |
-
1994
- 1994-01-13 WO PCT/JP1994/000035 patent/WO1994016125A1/ja active IP Right Grant
- 1994-01-13 US US08/302,879 patent/US5499601A/en not_active Expired - Fee Related
- 1994-01-13 DE DE69417627T patent/DE69417627T2/de not_active Expired - Fee Related
- 1994-01-13 EP EP94904311A patent/EP0630994B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5499601A (en) | 1996-03-19 |
EP0630994A4 (de) | 1995-08-02 |
EP0630994B1 (de) | 1999-04-07 |
WO1994016125A1 (en) | 1994-07-21 |
EP0630994A1 (de) | 1994-12-28 |
DE69417627D1 (de) | 1999-05-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8320 | Willingness to grant licences declared (paragraph 23) | ||
8339 | Ceased/non-payment of the annual fee |