DE69414028D1 - Lasersystem und Verwendung des Lasersystems - Google Patents

Lasersystem und Verwendung des Lasersystems

Info

Publication number
DE69414028D1
DE69414028D1 DE69414028T DE69414028T DE69414028D1 DE 69414028 D1 DE69414028 D1 DE 69414028D1 DE 69414028 T DE69414028 T DE 69414028T DE 69414028 T DE69414028 T DE 69414028T DE 69414028 D1 DE69414028 D1 DE 69414028D1
Authority
DE
Germany
Prior art keywords
laser system
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69414028T
Other languages
English (en)
Other versions
DE69414028T2 (de
Inventor
Tatsuoki Nagaishi
Hideo Itozaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
New Energy and Industrial Technology Development Organization
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of DE69414028D1 publication Critical patent/DE69414028D1/de
Application granted granted Critical
Publication of DE69414028T2 publication Critical patent/DE69414028T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/70—Auxiliary operations or equipment
    • B23K26/702—Auxiliary equipment

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Lasers (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
DE69414028T 1993-04-19 1994-04-19 Lasersystem und Verwendung des Lasersystems Expired - Fee Related DE69414028T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5115427A JPH06302897A (ja) 1993-04-19 1993-04-19 レーザ装置、その運転方法およびその応用

Publications (2)

Publication Number Publication Date
DE69414028D1 true DE69414028D1 (de) 1998-11-26
DE69414028T2 DE69414028T2 (de) 1999-06-10

Family

ID=14662306

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69414028T Expired - Fee Related DE69414028T2 (de) 1993-04-19 1994-04-19 Lasersystem und Verwendung des Lasersystems

Country Status (4)

Country Link
US (1) US5544182A (de)
EP (1) EP0625401B1 (de)
JP (1) JPH06302897A (de)
DE (1) DE69414028T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5854803A (en) 1995-01-12 1998-12-29 Semiconductor Energy Laboratory Co., Ltd. Laser illumination system
US5963291A (en) * 1997-07-21 1999-10-05 Chorum Technologies Inc. Optical attenuator using polarization modulation and a feedback controller
US6987240B2 (en) * 2002-04-18 2006-01-17 Applied Materials, Inc. Thermal flux processing by scanning
JP4531323B2 (ja) * 2002-09-13 2010-08-25 株式会社半導体エネルギー研究所 レーザ装置、レーザ照射方法、および半導体装置の作製方法
TW200414280A (en) * 2002-09-25 2004-08-01 Adv Lcd Tech Dev Ct Co Ltd Semiconductor device, annealing method, annealing apparatus and display apparatus
EP3511693B1 (de) * 2003-03-28 2022-08-24 Inguran, LLC Vorrichtung zur anzeige des zerfallpunktes in einem tropfenerzeugungssystem
WO2005089185A2 (en) * 2004-03-15 2005-09-29 Visx, Incorporated Stabilizing delivered laser energy
US7244907B2 (en) * 2004-06-30 2007-07-17 Matsushita Electric Industrial Co., Ltd. Method of optimizing optical power use in a parallel processing laser system
WO2007006850A2 (en) * 2005-07-13 2007-01-18 Picodeon Ltd Oy Radiation arrangement
US20070117287A1 (en) * 2005-11-23 2007-05-24 Semiconductor Energy Laboratory Co., Ltd. Laser irradiation apparatus
US7683300B2 (en) * 2006-10-17 2010-03-23 Asml Netherlands B.V. Using an interferometer as a high speed variable attenuator
JP4551385B2 (ja) * 2006-10-24 2010-09-29 株式会社半導体エネルギー研究所 レーザー照射装置
ES2709073T3 (es) 2008-06-30 2019-04-15 Microbix Biosystems Inc Procedimiento y aparato para seleccionar células
US8665439B2 (en) * 2009-06-30 2014-03-04 Microbix Biosystems, Inc. Method and apparatus for limiting effects of refraction in cytometry
US8295316B2 (en) * 2010-03-24 2012-10-23 Cymer, Inc. Method and system for managing light source operation
AU2012217757B2 (en) 2011-02-15 2015-12-03 Microbix Biosystems Inc. Methods, systems, and apparatus for performing flow cytometry
CN102248293B (zh) * 2011-07-08 2013-09-25 厦门大学 旋转可调水波导激光加工装置
WO2024110044A1 (en) * 2022-11-24 2024-05-30 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Beam line for a laser beam, laser system, and tle system

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4730105A (en) * 1986-07-25 1988-03-08 American Telephone And Telegraph Company, At&T Bell Laboratories Apparatus for the stabilization of the output intensity of a laser using a Fabry-Perot cavity
JPS63227766A (ja) * 1986-10-27 1988-09-22 Hitachi Ltd 超微粒子膜の形成方法
JP2550541B2 (ja) * 1986-11-05 1996-11-06 株式会社ニコン レ−ザ加工装置
US4866243A (en) * 1987-04-30 1989-09-12 Canon Kabushiki Kaisha Laser applying apparatus
US4928284A (en) * 1988-09-28 1990-05-22 Lasa Industries, Inc. Laser power control system
AU8205891A (en) * 1990-06-21 1992-01-07 Phoenix Laser Systems, Inc. Dynamic control of laser energy output
LU87880A1 (fr) * 1991-01-24 1992-10-15 Europ Communities Methode permettant de deposer une couche mince par photo-ablation

Also Published As

Publication number Publication date
EP0625401A2 (de) 1994-11-23
JPH06302897A (ja) 1994-10-28
DE69414028T2 (de) 1999-06-10
EP0625401B1 (de) 1998-10-21
EP0625401A3 (de) 1995-03-15
US5544182A (en) 1996-08-06

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: SUMITOMO ELECTRIC INDUSTRIES, LTD., OSAKA, JP

Owner name: NEW ENERGY AND INDUSTRIAL TECHNOLOGY DEVELOPMENT O

8339 Ceased/non-payment of the annual fee