DE69400592T2 - Verfahren und Vorrichtung zur Bildung von Strukturen durch chemische Abscheidung aus der Dampfphase - Google Patents

Verfahren und Vorrichtung zur Bildung von Strukturen durch chemische Abscheidung aus der Dampfphase

Info

Publication number
DE69400592T2
DE69400592T2 DE69400592T DE69400592T DE69400592T2 DE 69400592 T2 DE69400592 T2 DE 69400592T2 DE 69400592 T DE69400592 T DE 69400592T DE 69400592 T DE69400592 T DE 69400592T DE 69400592 T2 DE69400592 T2 DE 69400592T2
Authority
DE
Germany
Prior art keywords
vapor deposition
chemical vapor
forming structures
structures
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69400592T
Other languages
English (en)
Other versions
DE69400592D1 (de
Inventor
Alexander Teverovsky
James C Mcdonald
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CVD Inc
Original Assignee
CVD Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CVD Inc filed Critical CVD Inc
Application granted granted Critical
Publication of DE69400592D1 publication Critical patent/DE69400592D1/de
Publication of DE69400592T2 publication Critical patent/DE69400592T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
DE69400592T 1993-04-05 1994-01-21 Verfahren und Vorrichtung zur Bildung von Strukturen durch chemische Abscheidung aus der Dampfphase Expired - Lifetime DE69400592T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/042,942 US5453233A (en) 1993-04-05 1993-04-05 Method of producing domes of ZNS and ZNSE via a chemical vapor deposition technique

Publications (2)

Publication Number Publication Date
DE69400592D1 DE69400592D1 (de) 1996-10-31
DE69400592T2 true DE69400592T2 (de) 1997-02-06

Family

ID=21924578

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69400592T Expired - Lifetime DE69400592T2 (de) 1993-04-05 1994-01-21 Verfahren und Vorrichtung zur Bildung von Strukturen durch chemische Abscheidung aus der Dampfphase

Country Status (4)

Country Link
US (1) US5453233A (de)
EP (1) EP0619384B1 (de)
JP (1) JP2574643B2 (de)
DE (1) DE69400592T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5820681A (en) * 1995-05-03 1998-10-13 Chorus Corporation Unibody crucible and effusion cell employing such a crucible
US6042758A (en) * 1998-05-05 2000-03-28 Cvd, Inc. Precision replication by chemical vapor deposition
US6464912B1 (en) * 1999-01-06 2002-10-15 Cvd, Incorporated Method for producing near-net shape free standing articles by chemical vapor deposition
US6616870B1 (en) * 2000-08-07 2003-09-09 Shipley Company, L.L.C. Method of producing high aspect ratio domes by vapor deposition
DE602004016440D1 (de) * 2003-11-06 2008-10-23 Rohm & Haas Elect Mat Optischer Gegenstand mit leitender Struktur
US8252823B2 (en) * 2008-01-28 2012-08-28 New York University Oxazole and thiazole compounds as beta-catenin modulators and uses thereof
TW201122148A (en) * 2009-12-24 2011-07-01 Hon Hai Prec Ind Co Ltd Chemical vapor deposition device

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2883708A (en) * 1955-03-09 1959-04-28 Elektrokemisk As Manufacture of carbon blocks for use as electrodes
DE2158257A1 (de) * 1971-11-24 1973-05-30 Siemens Ag Anordnung zum herstellen von einseitig geschlossenen rohren aus halbleitermaterial
US3895084A (en) * 1972-03-28 1975-07-15 Ducommun Inc Fiber reinforced composite product
US4823736A (en) * 1985-07-22 1989-04-25 Air Products And Chemicals, Inc. Barrel structure for semiconductor epitaxial reactor
DD288844A5 (de) * 1987-03-05 1991-04-11 Veb Jenaer Glaswerk,De Vorrichtung zum herstellen polykristalliner halbzeuge ueber den prozess der chemischen dampfablagerung
US5018271A (en) * 1988-09-09 1991-05-28 Airfoil Textron Inc. Method of making a composite blade with divergent root
FR2655364B1 (fr) * 1989-12-01 1992-04-10 Europ Propulsion Procede de fabrication d'une piece en materiau composite, notamment a texture fibres de carbone ou refractaires et matrice carbone ou ceramique.
US5075055A (en) * 1990-06-06 1991-12-24 Union Carbide Coatings Service Technology Corporation Process for producing a boron nitride crucible
US5221501A (en) * 1991-06-11 1993-06-22 The United States Of America As Represented By The Secretary Of Commerce Method of producing a smooth plate of diamond

Also Published As

Publication number Publication date
DE69400592D1 (de) 1996-10-31
EP0619384B1 (de) 1996-09-25
EP0619384A1 (de) 1994-10-12
JPH06306614A (ja) 1994-11-01
JP2574643B2 (ja) 1997-01-22
US5453233A (en) 1995-09-26

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