DE69332355T2 - Verfahren und vorrichtung zur vakuumbeschichtung - Google Patents

Verfahren und vorrichtung zur vakuumbeschichtung

Info

Publication number
DE69332355T2
DE69332355T2 DE69332355T DE69332355T DE69332355T2 DE 69332355 T2 DE69332355 T2 DE 69332355T2 DE 69332355 T DE69332355 T DE 69332355T DE 69332355 T DE69332355 T DE 69332355T DE 69332355 T2 DE69332355 T2 DE 69332355T2
Authority
DE
Germany
Prior art keywords
aluminum
vacuum
unanodized
reflective surface
vacuum deposition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69332355T
Other languages
English (en)
Other versions
DE69332355D1 (de
DE69332355T3 (de
Inventor
Bischer, Jr
Small, Jr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dielectric Coating Industries
Original Assignee
Dielectric Coating Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26737851&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE69332355(T2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from US07/919,768 external-priority patent/US5312647A/en
Application filed by Dielectric Coating Industries filed Critical Dielectric Coating Industries
Publication of DE69332355D1 publication Critical patent/DE69332355D1/de
Publication of DE69332355T2 publication Critical patent/DE69332355T2/de
Application granted granted Critical
Publication of DE69332355T3 publication Critical patent/DE69332355T3/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0808—Mirrors having a single reflecting layer
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
DE69332355T 1992-07-24 1993-07-20 Verfahren und vorrichtung zur vakuumbeschichtung Expired - Fee Related DE69332355T3 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US919768 1992-07-24
US07/919,768 US5312647A (en) 1992-07-24 1992-07-24 Method and apparatus of vacuum deposition
US58642 1993-05-05
US08/058,642 US5395662A (en) 1992-07-24 1993-05-05 Improvements in high reflective aluminum sheeting and methods for making same
PCT/US1993/006794 WO1994002659A1 (en) 1992-07-24 1993-07-20 Improvements in the method and apparatus of vacuum deposition

Publications (3)

Publication Number Publication Date
DE69332355D1 DE69332355D1 (de) 2002-11-07
DE69332355T2 true DE69332355T2 (de) 2003-05-15
DE69332355T3 DE69332355T3 (de) 2008-11-27

Family

ID=26737851

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69332355T Expired - Fee Related DE69332355T3 (de) 1992-07-24 1993-07-20 Verfahren und vorrichtung zur vakuumbeschichtung

Country Status (5)

Country Link
US (1) US5395662A (de)
EP (1) EP0663963B2 (de)
AT (1) ATE225414T1 (de)
DE (1) DE69332355T3 (de)
WO (1) WO1994002659A1 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014166482A1 (de) 2013-04-10 2014-10-16 Uwe Beier Vorrichtung zum bearbeiten von flexiblen substraten
EP2937445A1 (de) 2014-04-23 2015-10-28 Uwe Beier Modulare vorrichtung zum bearbeiten von flexiblen substraten
DE102014106690A1 (de) 2014-05-12 2015-11-12 Uwe Beier Vorrichtung zum wechselweisen Bearbeiten von flexiblen, bandförmigen Substraten

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6124912A (en) * 1997-06-09 2000-09-26 National Semiconductor Corporation Reflectance enhancing thin film stack in which pairs of dielectric layers are on a reflector and liquid crystal is on the dielectric layers
US6716740B2 (en) * 2001-10-09 2004-04-06 Taiwan Semiconductor Manufacturing Co., Ltd. Method for depositing silicon oxide incorporating an outgassing step
EP1988186A1 (de) * 2007-04-24 2008-11-05 Galileo Vacuum Systems S.p.A. Multikammer-Vakuumbeschichtungssystem
CN101629283B (zh) * 2009-07-16 2011-04-27 江苏双登集团有限公司 一种卷对卷等离子体增强化学气相沉积装置

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2443196A (en) * 1944-06-16 1948-06-15 Raines Arnold Process for making front-surface mirrors
US2585128A (en) † 1946-03-01 1952-02-12 Bendix Aviat Corp Aluminum optical mirror and method of making same
US2812270A (en) * 1954-01-28 1957-11-05 Continental Can Co Method and apparatus for depositing metal coatings on metal bases
US2996410A (en) * 1957-11-25 1961-08-15 Nat Steel Corp Coating
US2952569A (en) * 1958-01-28 1960-09-13 Nat Steel Corp Method and apparatus forming an ice seal in vapor deposition
US3594238A (en) * 1968-08-15 1971-07-20 United States Steel Corp Method for treating aluminum surfaces to prevent discoloration
US3632406A (en) * 1970-01-20 1972-01-04 Norton Co Low-temperature vapor deposits of thick film coatings
DE2309288C3 (de) † 1973-02-24 1975-09-18 W.C. Heraeus Gmbh, 6450 Hanau Durchsichtige Scheibe, insbesondere Fensterscheibe, aus Glas oder Kunststoff mit wärmereflektierender, silberhaltiger Metallschicht und ihre Verwendung
FR2395130A1 (fr) * 1976-06-18 1979-01-19 Saint Gobain Fabrication d'un ruban par coulee sur une sole mobile constituee de plaques de verre
DE2750500A1 (de) † 1977-11-11 1979-05-17 Leybold Heraeus Gmbh & Co Kg Verfahren zur herstellung von infrarotreflektierenden, fuer sichtbares licht weitgehend transparenten scheiben und durch die verfahren hergestellte scheibe
US4331526A (en) * 1979-09-24 1982-05-25 Coulter Systems Corporation Continuous sputtering apparatus and method
JPS56128901A (en) * 1980-03-13 1981-10-08 Toshiba Electric Equip Corp Reflecting plate
US4430366A (en) * 1981-02-04 1984-02-07 Minnesota Mining And Manufacturing Company Metal/metal oxide coating
DE3107612A1 (de) * 1981-02-27 1982-09-16 Siemens AG, 1000 Berlin und 8000 München Laserspiegel, insbesondere laser-polygonspiegel
US4475794A (en) * 1982-02-03 1984-10-09 Martin Marietta Corporation Aluminum, aluminum oxide, cromium, gold mirror
JPS60119784A (ja) * 1983-12-01 1985-06-27 Kanegafuchi Chem Ind Co Ltd 絶縁金属基板の製法およびそれに用いる装置
JPS6082660A (ja) * 1983-10-08 1985-05-10 Konishiroku Photo Ind Co Ltd 酸化物層の形成装置
DE3436011C1 (de) † 1984-10-01 1986-05-22 Flachglas Ag Rueckblickspiegel fuer Fahrzeuge,insbesondere Kraftfahrzeuge,mit rueckseitiger Beschichtung
DE3726113A1 (de) * 1987-08-06 1989-02-16 Leybold Ag Vorrichtung zum beschichten von baendern
FR2630133B1 (fr) * 1988-04-18 1993-09-24 Siderurgie Fse Inst Rech Procede pour l'amelioration de la resistance a la corrosion de materiaux metalliques
US5151303A (en) * 1990-08-07 1992-09-29 Iit Research Institute Method and apparatus for using evacuated, detachable web containers with high vacuum treating means
JPH04127560A (ja) * 1990-09-19 1992-04-28 Hitachi Ltd 半導体装置
DE4034842A1 (de) * 1990-11-02 1992-05-07 Thyssen Edelstahlwerke Ag Verfahren zur plasmachemischen reinigung fuer eine anschliessende pvd oder pecvd beschichtung
US5312647A (en) * 1992-07-24 1994-05-17 Dielectric Coating Industries Method and apparatus of vacuum deposition
US5232747A (en) * 1992-07-27 1993-08-03 Radiant Technologies Platinum-aluminum connection system

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014166482A1 (de) 2013-04-10 2014-10-16 Uwe Beier Vorrichtung zum bearbeiten von flexiblen substraten
DE102013103590A1 (de) * 2013-04-10 2014-10-16 Uwe Beier Vorrichtung zum Bearbeiten von flexiblen Substraten
EP2937445A1 (de) 2014-04-23 2015-10-28 Uwe Beier Modulare vorrichtung zum bearbeiten von flexiblen substraten
DE102014105747A1 (de) 2014-04-23 2015-10-29 Uwe Beier Modulare Vorrichtung zum Bearbeiten von flexiblen Substraten
DE102014105747B4 (de) 2014-04-23 2024-02-22 Uwe Beier Modulare Vorrichtung zum Bearbeiten von flexiblen Substraten
DE102014106690A1 (de) 2014-05-12 2015-11-12 Uwe Beier Vorrichtung zum wechselweisen Bearbeiten von flexiblen, bandförmigen Substraten
EP2949610A1 (de) 2014-05-12 2015-12-02 Uwe Beier Vorrichtung zum wechselweisen bearbeiten von flexiblen, bandförmigen substraten

Also Published As

Publication number Publication date
EP0663963A1 (de) 1995-07-26
EP0663963A4 (de) 1997-05-02
US5395662A (en) 1995-03-07
EP0663963B2 (de) 2008-07-30
WO1994002659A1 (en) 1994-02-03
ATE225414T1 (de) 2002-10-15
DE69332355D1 (de) 2002-11-07
EP0663963B1 (de) 2002-10-02
DE69332355T3 (de) 2008-11-27

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8366 Restricted maintained after opposition proceedings
8339 Ceased/non-payment of the annual fee