DE69328590D1 - Verfahren und Vorrichtung zum Abschneiden einer Halbleiterscheibe - Google Patents

Verfahren und Vorrichtung zum Abschneiden einer Halbleiterscheibe

Info

Publication number
DE69328590D1
DE69328590D1 DE69328590T DE69328590T DE69328590D1 DE 69328590 D1 DE69328590 D1 DE 69328590D1 DE 69328590 T DE69328590 T DE 69328590T DE 69328590 T DE69328590 T DE 69328590T DE 69328590 D1 DE69328590 D1 DE 69328590D1
Authority
DE
Germany
Prior art keywords
cutting
semiconductor wafer
wafer
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69328590T
Other languages
English (en)
Other versions
DE69328590T2 (de
Inventor
Katsuo Honda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Seimitsu Co Ltd
Original Assignee
Tokyo Seimitsu Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Seimitsu Co Ltd filed Critical Tokyo Seimitsu Co Ltd
Application granted granted Critical
Publication of DE69328590D1 publication Critical patent/DE69328590D1/de
Publication of DE69328590T2 publication Critical patent/DE69328590T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • B28D5/0088Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being angularly adjustable
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/02Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills
    • B28D5/022Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels
    • B28D5/028Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by rotary tools, e.g. drills by cutting with discs or wheels with a ring blade having an inside cutting edge

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
DE69328590T 1992-07-16 1993-07-15 Verfahren und Vorrichtung zum Abschneiden einer Halbleiterscheibe Expired - Fee Related DE69328590T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP18936992 1992-07-16
JP4295313A JP3060445B2 (ja) 1992-07-16 1992-11-04 半導体ウエハのスライシング方法及びその装置

Publications (2)

Publication Number Publication Date
DE69328590D1 true DE69328590D1 (de) 2000-06-15
DE69328590T2 DE69328590T2 (de) 2000-08-24

Family

ID=26505436

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69328590T Expired - Fee Related DE69328590T2 (de) 1992-07-16 1993-07-15 Verfahren und Vorrichtung zum Abschneiden einer Halbleiterscheibe

Country Status (5)

Country Link
US (1) US5524604A (de)
EP (1) EP0579227B1 (de)
JP (1) JP3060445B2 (de)
KR (1) KR940006247A (de)
DE (1) DE69328590T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6074442A (en) * 1994-10-28 2000-06-13 Shin-Etsu Handotai Co., Ltd. Method of separating slice base mounting member from wafer and jig adapted therefor
CN101885085B (zh) * 2010-06-07 2012-04-04 谢展鹏 内圆切片机及其柔性自动进给装置
JP6046101B2 (ja) * 2014-11-21 2016-12-14 京セラドキュメントソリューションズ株式会社 給紙カセットおよびこれを備える画像形成装置
CN113290722B (zh) * 2021-06-22 2023-08-18 浙江森尼克半导体有限公司 适用于半导体材料的拉丝式切割机

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3025738A (en) * 1959-10-29 1962-03-20 Clevite Corp Cutting apparatus
US3039235A (en) * 1961-01-31 1962-06-19 Hamco Mach & Elect Co Cutting apparatus
DE1217840B (de) * 1961-07-24 1966-05-26 Telefunken Patent Innenlochsaegevorrichtung
IT939391B (it) * 1970-09-08 1973-02-10 Pasticca semiconduttrice nonche metodo e dispositivo per la sua produzione
US4084354A (en) * 1977-06-03 1978-04-18 International Business Machines Corporation Process for slicing boules of single crystal material
FR2469259A1 (fr) * 1979-08-08 1981-05-22 Radiotechnique Compelec Procede d'elaboration de plaquettes de materiaux durs, notamment de silicium et appareil de mise en oeuvre du procede
JPS6213305A (ja) * 1985-07-12 1987-01-22 株式会社日立製作所 ワ−ク回転式切断法およびその装置
JPS62127206A (ja) * 1985-11-28 1987-06-09 旭ダイヤモンド工業株式会社 切断方式
JPS6357203A (ja) * 1986-08-29 1988-03-11 株式会社 サンキツト 木工部品における接着補強バンドの取付穴加工機および取付穴加工方法

Also Published As

Publication number Publication date
DE69328590T2 (de) 2000-08-24
JP3060445B2 (ja) 2000-07-10
KR940006247A (ko) 1994-03-23
EP0579227B1 (de) 2000-05-10
JPH0679717A (ja) 1994-03-22
EP0579227A1 (de) 1994-01-19
US5524604A (en) 1996-06-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee