DE69325959T2 - Herstellungsverfahren eines weichmagnetischen Filmes - Google Patents

Herstellungsverfahren eines weichmagnetischen Filmes

Info

Publication number
DE69325959T2
DE69325959T2 DE69325959T DE69325959T DE69325959T2 DE 69325959 T2 DE69325959 T2 DE 69325959T2 DE 69325959 T DE69325959 T DE 69325959T DE 69325959 T DE69325959 T DE 69325959T DE 69325959 T2 DE69325959 T2 DE 69325959T2
Authority
DE
Germany
Prior art keywords
manufacturing process
soft magnetic
magnetic film
film
soft
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69325959T
Other languages
English (en)
Other versions
DE69325959D1 (de
Inventor
Kumio Nago
Isamu Aokura
Hitoshi Yamanishi
Koichi Osano
Hiroshi Sakakima
Toshiyuki Suemitsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69325959D1 publication Critical patent/DE69325959D1/de
Publication of DE69325959T2 publication Critical patent/DE69325959T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00—Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/147—Structure or manufacture of heads, e.g. inductive with cores being composed of metal sheets, i.e. laminated cores with cores composed of isolated magnetic layers, e.g. sheets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/30—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE]
    • H01F41/302—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates for applying nanostructures, e.g. by molecular beam epitaxy [MBE] for applying spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49034—Treating to affect magnetic properties

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Thin Magnetic Films (AREA)
  • Magnetic Heads (AREA)
DE69325959T 1992-08-24 1993-08-24 Herstellungsverfahren eines weichmagnetischen Filmes Expired - Fee Related DE69325959T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22377392 1992-08-24

Publications (2)

Publication Number Publication Date
DE69325959D1 DE69325959D1 (de) 1999-09-16
DE69325959T2 true DE69325959T2 (de) 2000-04-20

Family

ID=16803488

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69325959T Expired - Fee Related DE69325959T2 (de) 1992-08-24 1993-08-24 Herstellungsverfahren eines weichmagnetischen Filmes

Country Status (3)

Country Link
US (1) US5403457A (de)
EP (1) EP0584768B1 (de)
DE (1) DE69325959T2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2780588B2 (ja) * 1993-01-14 1998-07-30 松下電器産業株式会社 積層型磁気ヘッドコア
JPH06338410A (ja) * 1993-03-31 1994-12-06 Matsushita Electric Ind Co Ltd 軟磁性多層膜と磁気ヘッド
JP2970317B2 (ja) * 1993-06-24 1999-11-02 松下電器産業株式会社 スパッタリング装置及びスパッタリング方法
JP3100837B2 (ja) * 1993-12-24 2000-10-23 松下電器産業株式会社 スパッタリング装置
JPH0835064A (ja) * 1994-07-20 1996-02-06 Matsushita Electric Ind Co Ltd スパッタリング装置
JPH09293207A (ja) * 1996-04-26 1997-11-11 Sony Corp 磁気ヘッド
JP3108637B2 (ja) * 1996-09-19 2000-11-13 ティーディーケイ株式会社 軟磁性薄膜の製造方法
US6104414A (en) * 1997-03-12 2000-08-15 Cybex Computer Products Corporation Video distribution hub
US6333750B1 (en) 1997-03-12 2001-12-25 Cybex Computer Products Corporation Multi-sourced video distribution hub
AU9410498A (en) 1997-11-26 1999-06-17 Vapor Technologies, Inc. Apparatus for sputtering or arc evaporation
US5997705A (en) * 1999-04-14 1999-12-07 Vapor Technologies, Inc. Rectangular filtered arc plasma source
US6410449B1 (en) * 2000-08-11 2002-06-25 Applied Materials, Inc. Method of processing a workpiece using an externally excited torroidal plasma source
AU2002242018A1 (en) * 2001-07-17 2003-03-03 Seagate Technology Llc Method for making uniaxial, high moment fe-co alloys
JP3971697B2 (ja) * 2002-01-16 2007-09-05 Ｔｄｋ株式会社 高周波用磁性薄膜及び磁気素子
JP3671012B2 (ja) * 2002-03-07 2005-07-13 三洋電機株式会社 表示装置
US6857937B2 (en) * 2002-05-30 2005-02-22 Komag, Inc. Lapping a head while powered up to eliminate expansion of the head due to heating
US7989095B2 (en) * 2004-12-28 2011-08-02 General Electric Company Magnetic layer with nanodispersoids having a bimodal distribution
US7498587B2 (en) * 2006-05-01 2009-03-03 Vapor Technologies, Inc. Bi-directional filtered arc plasma source
TW201106456A (en) * 2009-08-04 2011-02-16 Everlight Electronics Co Ltd Fabrication method for lead frame of light emitting diode
CN113284694B (zh) * 2021-05-21 2022-05-27 广州新莱福磁材有限公司 一种减少磁粉用量的可喷绘柔性膜片

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59172225A (ja) * 1983-03-18 1984-09-28 Matsushita Electric Ind Co Ltd 薄膜磁性体の作製法
JPS5916322A (ja) * 1983-06-27 1984-01-27 Toshiba Corp 磁性皮膜の製造方法
DE3603726A1 (de) * 1986-02-06 1987-08-13 Siemens Ag Anordnung zum aetzen oder bestaeuben eines substrats
JPS62195109A (ja) * 1986-02-21 1987-08-27 Hitachi Ltd スパツタ装置
DE3852430T2 (de) * 1987-06-16 1995-05-04 Hitachi Ltd Magnetron-Zerstäubungsgerät und Verfahren zur Anwendung desselben zur Schichtenherstellung.
JPS6465262A (en) * 1987-09-05 1989-03-10 Fujitsu Ltd Three-electrode sputtering gun
KR920003999B1 (ko) * 1989-03-08 1992-05-21 알프스 덴기 가부시기가이샤 연자성 합금막
JPH0387365A (ja) * 1989-08-30 1991-04-12 Sumitomo Metal Ind Ltd 平行磁場印加用電磁石を備えたスパッタリング装置
US5026470A (en) * 1989-12-19 1991-06-25 International Business Machines Sputtering apparatus
US5045166A (en) * 1990-05-21 1991-09-03 Mcnc Magnetron method and apparatus for producing high density ionic gas discharge
JP2789806B2 (ja) * 1990-09-28 1998-08-27 松下電器産業株式会社 軟磁性窒化合金膜の作製方法

Also Published As

Publication number Publication date
EP0584768B1 (de) 1999-08-11
US5403457A (en) 1995-04-04
EP0584768A1 (de) 1994-03-02
DE69325959D1 (de) 1999-09-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee