DE69323828D1 - Verfahren zur Herstellung von wärmebeständigen Mikrobildern - Google Patents

Verfahren zur Herstellung von wärmebeständigen Mikrobildern

Info

Publication number
DE69323828D1
DE69323828D1 DE69323828T DE69323828T DE69323828D1 DE 69323828 D1 DE69323828 D1 DE 69323828D1 DE 69323828 T DE69323828 T DE 69323828T DE 69323828 T DE69323828 T DE 69323828T DE 69323828 D1 DE69323828 D1 DE 69323828D1
Authority
DE
Germany
Prior art keywords
microimages
resistant
production
heat
resistant microimages
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69323828T
Other languages
English (en)
Other versions
DE69323828T2 (de
Inventor
Akiko Katsuyama
Masayuki Endo
Masaru Sasago
Fumiyoshi Urano
Hirotoshi Fujie
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Wako Pure Chemical Corp
Panasonic Holdings Corp
Original Assignee
Wako Pure Chemical Industries Ltd
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wako Pure Chemical Industries Ltd, Matsushita Electric Industrial Co Ltd filed Critical Wako Pure Chemical Industries Ltd
Application granted granted Critical
Publication of DE69323828D1 publication Critical patent/DE69323828D1/de
Publication of DE69323828T2 publication Critical patent/DE69323828T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE1993623828 1992-10-30 1993-10-29 Verfahren zur Herstellung von wärmebeständigen Mikrobildern Expired - Fee Related DE69323828T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29245392 1992-10-30

Publications (2)

Publication Number Publication Date
DE69323828D1 true DE69323828D1 (de) 1999-04-15
DE69323828T2 DE69323828T2 (de) 1999-07-01

Family

ID=17782002

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1993623828 Expired - Fee Related DE69323828T2 (de) 1992-10-30 1993-10-29 Verfahren zur Herstellung von wärmebeständigen Mikrobildern

Country Status (3)

Country Link
EP (1) EP0595361B1 (de)
KR (1) KR970007792B1 (de)
DE (1) DE69323828T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3372739B2 (ja) * 1996-01-12 2003-02-04 キヤノン株式会社 液体噴射記録ヘッドの製造方法
EP0825492A1 (de) * 1996-08-23 1998-02-25 Samsung Electronics Co., Ltd. Behandlungsverfahren eines Resistmusters auf einer Halbleiterscheibe
US6117622A (en) * 1997-09-05 2000-09-12 Fusion Systems Corporation Controlled shrinkage of photoresist
JPH11242336A (ja) * 1998-02-25 1999-09-07 Sharp Corp フォトレジストパターンの形成方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0768435B2 (ja) * 1987-09-30 1995-07-26 日本合成ゴム株式会社 感放射線性樹脂組成物
EP0358871B1 (de) * 1988-07-07 1998-09-30 Sumitomo Chemical Company, Limited Strahlungsempfindliche, positiv arbeitende Resistzusammensetzung
JPH04304616A (ja) * 1991-04-01 1992-10-28 Canon Inc レジストパターンの形成方法

Also Published As

Publication number Publication date
KR970007792B1 (en) 1997-05-16
DE69323828T2 (de) 1999-07-01
EP0595361A3 (en) 1997-04-02
EP0595361A2 (de) 1994-05-04
EP0595361B1 (de) 1999-03-10

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee