DE69312145D1 - Plasmaquelle und Herstellungsverfahren - Google Patents

Plasmaquelle und Herstellungsverfahren

Info

Publication number
DE69312145D1
DE69312145D1 DE69312145T DE69312145T DE69312145D1 DE 69312145 D1 DE69312145 D1 DE 69312145D1 DE 69312145 T DE69312145 T DE 69312145T DE 69312145 T DE69312145 T DE 69312145T DE 69312145 D1 DE69312145 D1 DE 69312145D1
Authority
DE
Germany
Prior art keywords
manufacturing process
plasma source
plasma
source
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69312145T
Other languages
English (en)
Other versions
DE69312145T2 (de
Inventor
Ajit P Paranjpe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of DE69312145D1 publication Critical patent/DE69312145D1/de
Application granted granted Critical
Publication of DE69312145T2 publication Critical patent/DE69312145T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69312145T 1992-04-15 1993-04-01 Plasmaquelle und Herstellungsverfahren Expired - Fee Related DE69312145T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/868,818 US5231334A (en) 1992-04-15 1992-04-15 Plasma source and method of manufacturing

Publications (2)

Publication Number Publication Date
DE69312145D1 true DE69312145D1 (de) 1997-08-21
DE69312145T2 DE69312145T2 (de) 1998-01-02

Family

ID=25352372

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69312145T Expired - Fee Related DE69312145T2 (de) 1992-04-15 1993-04-01 Plasmaquelle und Herstellungsverfahren

Country Status (4)

Country Link
US (2) US5231334A (de)
EP (1) EP0565960B1 (de)
JP (1) JP3373885B2 (de)
DE (1) DE69312145T2 (de)

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US7253109B2 (en) * 1997-11-26 2007-08-07 Applied Materials, Inc. Method of depositing a tantalum nitride/tantalum diffusion barrier layer system
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Also Published As

Publication number Publication date
EP0565960B1 (de) 1997-07-16
JP3373885B2 (ja) 2003-02-04
DE69312145T2 (de) 1998-01-02
EP0565960A1 (de) 1993-10-20
US5231334A (en) 1993-07-27
JPH0696719A (ja) 1994-04-08
US5436528A (en) 1995-07-25

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Legal Events

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8339 Ceased/non-payment of the annual fee