DE69226604T2 - Photoelektrochemisches Abbildungssystem - Google Patents

Photoelektrochemisches Abbildungssystem

Info

Publication number
DE69226604T2
DE69226604T2 DE69226604T DE69226604T DE69226604T2 DE 69226604 T2 DE69226604 T2 DE 69226604T2 DE 69226604 T DE69226604 T DE 69226604T DE 69226604 T DE69226604 T DE 69226604T DE 69226604 T2 DE69226604 T2 DE 69226604T2
Authority
DE
Germany
Prior art keywords
photoelectrochemical
imaging system
imaging
photoelectrochemical imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69226604T
Other languages
English (en)
Other versions
DE69226604D1 (de
Inventor
Morgan D Tench
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Boeing North American Inc
Original Assignee
Rockwell International Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rockwell International Corp filed Critical Rockwell International Corp
Publication of DE69226604D1 publication Critical patent/DE69226604D1/de
Application granted granted Critical
Publication of DE69226604T2 publication Critical patent/DE69226604T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1058—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by providing a magnetic pattern, a ferroelectric pattern or a semiconductive pattern, e.g. by electrophotography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/705—Compositions containing chalcogenides, metals or alloys thereof, as photosensitive substances, e.g. photodope systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/58—Processes for obtaining metallic images by vapour deposition or physical development
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Chemically Coating (AREA)
DE69226604T 1991-11-15 1992-10-30 Photoelektrochemisches Abbildungssystem Expired - Fee Related DE69226604T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/793,040 US5206102A (en) 1991-11-15 1991-11-15 Photoelectrochemical imaging system

Publications (2)

Publication Number Publication Date
DE69226604D1 DE69226604D1 (de) 1998-09-17
DE69226604T2 true DE69226604T2 (de) 1998-12-24

Family

ID=25158910

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69226604T Expired - Fee Related DE69226604T2 (de) 1991-11-15 1992-10-30 Photoelektrochemisches Abbildungssystem

Country Status (5)

Country Link
US (1) US5206102A (de)
EP (1) EP0542061B1 (de)
JP (1) JP3145807B2 (de)
CA (1) CA2081961C (de)
DE (1) DE69226604T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5595637A (en) * 1995-11-17 1997-01-21 Rockwell International Corporation Photoelectrochemical fabrication of electronic circuits
US5711804A (en) * 1996-05-03 1998-01-27 Rockwell International Corporation Method of forming a metallic oxide coating with a desired crystallographic orientation
DE19620993A1 (de) * 1996-05-24 1997-11-27 Bayer Ag Laserbeschriftbare Polymerformmassen
DE69805385T2 (de) * 1997-10-24 2002-09-12 Fuji Photo Film Co Ltd Vorrichtung zur Herstellung einer Druckplatte und Drucker und Drucksystem die diese Vorrichtung verwenden
DE69810733T2 (de) * 1997-10-24 2003-07-10 Fuji Photo Film Co Ltd Vorrichtung zur Herstellung einer Druckplatte und Drucker und Drucksystem die diese Vorrichtung verwenden
IL122953A (en) 1998-01-15 2000-11-21 Scitex Corp Ltd Printing member for use with a printing system and method of imaging the printing member
US5970873A (en) * 1998-04-27 1999-10-26 Eastman Kodak Company Imaging and printing methods to form imaging member by formation of insoluble crosslinked polymeric sol-gel matrix
DE59908521D1 (de) * 1998-10-10 2004-03-18 Heidelberger Druckmasch Ag Druckform und verfahren zum ändern ihrer benetzungseigenschaften
US6146798A (en) * 1998-12-30 2000-11-14 Xerox Corporation Printing plate with reversible charge-controlled wetting
US6447120B2 (en) 1999-07-28 2002-09-10 Moxtex Image projection system with a polarizing beam splitter
AU7038100A (en) 1999-09-15 2001-04-17 Scitex Corporation Ltd. A plateless printing system
JP2001322254A (ja) * 2000-05-17 2001-11-20 Komori Corp 印刷機および印刷機の制御方法
US6610458B2 (en) 2001-07-23 2003-08-26 Kodak Polychrome Graphics Llc Method and system for direct-to-press imaging
JP4671709B2 (ja) * 2005-02-25 2011-04-20 京セラミタ株式会社 現像ローラ及びその製造方法
US9878531B2 (en) 2013-12-19 2018-01-30 Goss International Americas, Inc. Reimageable and reusable printing sleeve for a variable cutoff printing press

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1290532A (de) * 1969-08-05 1972-09-27
US4204865A (en) * 1975-11-17 1980-05-27 Coulter Systems Corporation Direct-imaging flexible offset printing plate and method of manufacture
US4504126A (en) * 1980-04-11 1985-03-12 Coulter Systems Corporation Digital plate maker system and method
NL8105633A (nl) * 1981-12-15 1983-07-01 Philips Nv Werkwijze voor de vervaardiging van metaalbeelden of patronen op en/of onder het oppervlak van een substraat met een halfgeleidende lichtgevoelige verbinding.
DE3705439A1 (de) * 1987-02-20 1988-09-01 Man Technologie Gmbh Druckmaschine
US4814259A (en) * 1987-11-09 1989-03-21 Rockwell International Corporation Laser generated electrically conductive pattern
DE3740079A1 (de) * 1987-11-26 1989-06-08 Man Technologie Gmbh Elektrische aufzeichnungseinrichtung fuer druckformen von druckmaschinen
JPH0298833A (ja) * 1988-10-05 1990-04-11 Fuji Photo Film Co Ltd 情報記録媒体

Also Published As

Publication number Publication date
DE69226604D1 (de) 1998-09-17
US5206102A (en) 1993-04-27
CA2081961A1 (en) 1993-05-16
CA2081961C (en) 2001-01-23
EP0542061B1 (de) 1998-08-12
JP3145807B2 (ja) 2001-03-12
JPH05237982A (ja) 1993-09-17
EP0542061A1 (de) 1993-05-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee